会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Method of producing organosilicon compound
    • 生产有机硅化合物的方法
    • US08097745B2
    • 2012-01-17
    • US12749735
    • 2010-03-30
    • Yohei NobeKang-go ChungRyuichi Saito
    • Yohei NobeKang-go ChungRyuichi Saito
    • C07F7/18
    • C07F7/188C07F7/1876
    • A simple method of producing an organosilicon compound of a formula R2n(OR4)mSi—R1—Si(OR4)mR2n is disclosed. The method comprises the following two steps, Y—R1—Y+SiXm+1R2n->R2nXmSi—R1—SiXmR2n R2nXmSi—R1—SiXmR2n+M(OR4)r,->R2n(OR4)mSi—R1—Si(OR4)mR2n In the formulas, R1 is methylene, alkylene, or arylene, R2 is alkyl, alkenyl, alkynyl, or aryl, m and n is 0 to 3, provided m+n=3, at least one m being 1 or more, Y is halogen, X is hydrogen or halogen, R4 is alkyl, alkenyl, alkynyl, or aryl, M is metal, and r is the valence of the metal). The organosilicon compound is used to form a film having excellent heat resistance, chemical resistance, conductivity, and modulus of elasticity.
    • 公开了制备式R 2n(OR 4)m Si-R 1 -Si(OR 4)m R 2n的有机硅化合物的简单方法。 该方法包括以下两个步骤:Y-R1-Y + SiXm + 1R2n-> R2nXmSi-R1-SiXmR2n R2nXmSi-R1-SiXmR2n + M(OR4)r - →R2n(OR4)mSi-R1-Si(OR4) mR2n在式中,R1是亚甲基,亚烷基或亚芳基,R2是烷基,烯基,炔基或芳基,m和n是0-3,如果m + n = 3,至少一个m是1或更大,Y 是卤素,X是氢或卤素,R4是烷基,烯基,炔基或芳基,M是金属,r是金属的价)。 有机硅化合物用于形成具有优异的耐热性,耐化学性,导电性和弹性模量的膜。
    • 3. 发明申请
    • RUTHENIUM FILM-FORMING MATERIAL AND RUTHENIUM FILM-FORMING METHOD
    • 形成薄膜的成膜材料和成膜方法
    • US20120282414A1
    • 2012-11-08
    • US13503899
    • 2010-10-20
    • Ryuichi SaitoKang-go ChungHideki NishimuraTatsuya Sakai
    • Ryuichi SaitoKang-go ChungHideki NishimuraTatsuya Sakai
    • C07F15/00B05D3/02B05D3/06B05D7/24
    • C23C16/18C07C49/92C07F15/0046H01L21/76843H01L28/65
    • Disclosed is a ruthenium film-forming material having a lower melting point and a higher vapor pressure that facilitates supply of the material onto a base and moreover enables a high-quality ruthenium film to be obtained.A ruthenium film-forming material includes a compound represented by general formula (1) below (wherein R1 is independently at each occurrence a hydrogen atom, a halogen atom, a hydrocarbon group having 1 to 4 carbon atoms or a halogenated hydrocarbon group having 1 to 4 carbon atoms; R2 is independently at each occurrence a halogenated hydrocarbon group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogenated alkoxy group having 1 to 4 carbon atoms, with the proviso that R1 and R2 are mutually differing groups; R3 is independently at each occurrence a hydrogen atom or a hydrocarbon group having 1 to 4 carbon atoms; and L is an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and having at least two double bonds).
    • 公开了一种具有较低熔点和较高蒸气压的钌膜形成材料,其有助于将材料供应到基底上,并且还能够获得高质量的钌膜。 钌膜形成材料包括由下述通式(1)表示的化合物(其中R 1在每次出现时独立地为氢原子,卤素原子,具有1至4个碳原子的烃基或卤代烃基,其具有1至 4个碳原子; R 2在每次出现时独立地为具有1至4个碳原子的卤代烃基,具有1至4个碳原子的烷氧基或具有1至4个碳原子的卤代烷氧基,条件是R 1和R 2为 相互不同的基团; R 3在每次出现时独立地为氢原子或具有1至4个碳原子的烃基; L为具有4至10个碳原子且具有至少两个双键的不饱和烃化合物)。