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    • 10. 发明授权
    • Pattern measurement apparatus and pattern measurement method
    • 图案测量装置和图案测量方法
    • US08605985B2
    • 2013-12-10
    • US13066939
    • 2011-04-28
    • Hiroshi FukayaJun Matsumoto
    • Hiroshi FukayaJun Matsumoto
    • G06K9/00
    • H01J37/28H01J37/222H01J2237/221H01J2237/24578H01J2237/28H01J2237/2817
    • A pattern measurement apparatus includes: an irradiation unit for irradiating a sample with an electron beam; an electron detection unit for detecting the amount of electrons generated from the sample on which a pattern is formed; an image processor for generating an SEM image of the pattern based on the amount of electrons; and a controller for acquiring a rectangular measurement specification region of the SEM image and calculating a loss ratio of a corner portion of the pattern from areas of the measurement specification region and the corner portion of the pattern. The controller detects edge positions in a predetermined range including a position where a corner of the measurement specification region intersects with a side of the SEM image, and adjusts the measurement specification region in accordance with the edge positions.
    • 图案测量装置包括:用电子束照射样品的照射单元; 电子检测单元,用于检测从其上形成图案的样品产生的电子的量; 图像处理器,用于基于所述电子量产生所述图案的SEM图像; 以及控制器,用于获取SEM图像的矩形测量指定区域,并且从测量指定区域和图案的拐角部分的面积计算图案的角部的损耗率。 控制器检测包括测量指定区域的角部与SEM图像的一侧相交的位置的预定范围内的边缘位置,并且根据边缘位置来调整测量指定区域。