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1. 发明申请

US20050125202A1 Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection 有权
标题翻译：用于过程状态监测和端点检测的斜率到阈值转换的方法和装置
公开(公告)号：US20050125202A1
公开(公告)日：2005-06-09
申请号：US11030374
申请日：2005-01-05
申请人： Yehiel Gotkis , Vladimir Katz , David Hemker , Rodney Kistler , Nicolas Bright
发明人： Yehiel Gotkis , Vladimir Katz , David Hemker , Rodney Kistler , Nicolas Bright
IPC分类号： G05B23/02 , H01L21/66 , H03F1/26 , G06F15/00 , H04B15/00
CPC分类号： G05B23/0254 , H01L22/26
摘要： A method for converting a slope based detection task to a threshold based detection task is provided. The method initiates with defining an approximation equation for a set of points corresponding to values of a process being monitored. Then, an expected value at a current point of the process being monitored is predicted. Next, a difference between a measured value at the current point of the process being monitored and the corresponding expected value is calculated. Then, the difference is monitored for successive points to detect a deviation value between the measured value and the expected value. Next, a transition point for the process being monitored is identified based on the detection of the deviation value. A processing system configured to provide real time data for a slope based transition and a computer readable media are also provided.
摘要翻译：提供了一种将基于斜率的检测任务转换为基于阈值的检测任务的方法。该方法通过为对应于被监视的进程的值的一组点定义近似方程来启动。然后，预测在被监视的处理的当前点的期望值。接下来，计算被监视处理当前点的测量值与对应的期望值之间的差值。然后，对连续点监测差异，以检测测量值和预期值之间的偏差值。接下来，基于偏差值的检测来识别被监视处理的转变点。还提供了一种处理系统，其被配置为提供用于基于斜率的转换的实时数据和计算机可读介质。

2. 发明授权

US07010468B2 Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection 有权
标题翻译：用于过程状态监测和端点检测的斜率到阈值转换的方法和装置
公开(公告)号：US07010468B2
公开(公告)日：2006-03-07
申请号：US11030374
申请日：2005-01-05
申请人： Yehiel Gotkis , Vladimir Katz , David Hemker , Rodney Kistler , Nicolas J. Bright
发明人： Yehiel Gotkis , Vladimir Katz , David Hemker , Rodney Kistler , Nicolas J. Bright
IPC分类号： H04B15/00
CPC分类号： G05B23/0254 , H01L22/26
摘要： A method for converting a slope based detection task to a threshold based detection task is provided. The method initiates with defining an approximation equation for a set of points corresponding to values of a process being monitored. Then, an expected value at a current point of the process being monitored is predicted. Next, a difference between a measured value at the current point of the process being monitored and the corresponding expected value is calculated. Then, the difference is monitored for successive points to detect a deviation value between the measured value and the expected value. Next, a transition point for the process being monitored is identified based on the detection of the deviation value. A processing system configured to provide real time data for a slope based transition and a computer readable media are also provided.
摘要翻译：提供了一种将基于斜率的检测任务转换为基于阈值的检测任务的方法。该方法通过为对应于被监视的进程的值的一组点定义近似方程来启动。然后，预测在被监视的处理的当前点的期望值。接下来，计算被监视处理的当前点的测量值与对应的期望值之间的差。然后，对连续点监测差异，以检测测量值和预期值之间的偏差值。接下来，基于偏差值的检测来识别被监视处理的转变点。还提供了一种处理系统，其被配置为提供用于基于斜率的转换的实时数据和计算机可读介质。

3. 发明授权

US06859765B2 Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection 失效
公开(公告)号：US06859765B2
公开(公告)日：2005-02-22
申请号：US10318967
申请日：2002-12-13
申请人： Yehiel Gotkis , Vladimir Katz , David Hemker , Rodney Kistler , Nicolas J. Bright
发明人： Yehiel Gotkis , Vladimir Katz , David Hemker , Rodney Kistler , Nicolas J. Bright
IPC分类号： G05B23/02 , H01L21/66 , H04B15/00
CPC分类号： G05B23/0254 , H01L22/26
摘要： A method for converting a slope based detection task to a threshold based detection task is provided. The method initiates with defining an approximation equation for a set of points corresponding to values of a process being monitored. Then, an expected value at a current point of the process being monitored is predicted. Next, a difference between a measured value at the current point of the process being monitored and the corresponding expected value is calculated. Then, the difference is monitored for successive points to detect a deviation value between the measured value and the expected value. Next, a transition point for the process being monitored is identified based on the detection of the deviation value. A processing system configured to provide real time data for a slope based transition and a computer readable media are also provided.

4. 发明授权

US06806948B2 System and method of broad band optical end point detection for film change indication 失效
标题翻译：用于胶片变化指示的宽带光端点检测系统和方法
公开(公告)号：US06806948B2
公开(公告)日：2004-10-19
申请号：US10112425
申请日：2002-03-29
申请人： Vladimir Katz , Bella Mitchell
发明人： Vladimir Katz , Bella Mitchell
IPC分类号： G01N2100
CPC分类号： B24B49/12 , B24B37/013 , G01B11/0625 , G01B11/0683 , G01J3/00
摘要： A system and method for detecting an endpoint during a chemical mechanical polishing process is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.
摘要翻译：公开了一种用于在化学机械抛光工艺期间检测端点的系统和方法，其包括用第一宽光束照射晶片表面的第一部分。接收到第一反射光谱数据。数据的第一反射光谱对应于从晶片表面的第一照射部分反射的光的第一光谱。具有第二宽光束的晶片表面的第二部分。接收第二反射光谱数据。数据的第二反射光谱对应于从晶片的表面的第二照射部分反射的光的第二光谱。将第一反射光谱数据归一化，并将第二反射光谱数据归一化。基于归一化的第一光谱数据和归一化的第二光谱数据之间的差来确定端点。

5. 发明授权

US07099013B2 System and method of broad band optical end point detection for film change indication 有权
标题翻译：用于胶片变化指示的宽带光端点检测系统和方法
公开(公告)号：US07099013B2
公开(公告)日：2006-08-29
申请号：US10721136
申请日：2003-11-24
申请人： Vladimir Katz , Bella Mitchell
发明人： Vladimir Katz , Bella Mitchell
IPC分类号： G01N21/55 , G01N21/00
CPC分类号： B24B49/12 , B24B37/013 , G01B11/0625 , G01B11/0683 , G01J3/00
摘要： A system and method for detecting an endpoint is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.
摘要翻译：公开了一种用于检测端点的系统和方法，其包括用第一宽光束照射晶片表面的第一部分。接收到第一反射光谱数据。数据的第一反射光谱对应于从晶片表面的第一照射部分反射的光的第一光谱。具有第二宽光束的晶片表面的第二部分。接收第二反射光谱数据。数据的第二反射光谱对应于从晶片的表面的第二照射部分反射的光的第二光谱。将第一反射光谱数据归一化，并将第二反射光谱数据归一化。基于归一化的第一光谱数据和归一化的第二光谱数据之间的差来确定端点。

6. 发明授权

US06876455B1 Method and apparatus for broadband optical end point determination for in-situ film thickness measurement 失效
标题翻译：用于原位膜厚度测量的宽带光学终点测定方法和装置
公开(公告)号：US06876455B1
公开(公告)日：2005-04-05
申请号：US10210921
申请日：2002-08-01
申请人： Vladimir Katz , Bella Mitchell
发明人： Vladimir Katz , Bella Mitchell
IPC分类号： G01B11/06 , G01B11/02
CPC分类号： G01B11/0625
摘要： A method for determining a film thickness in a semiconductor substrate is provided. The method initiates with providing multiple layers on the semiconductor substrate. Then, two reflectance spectra are generated where each of the two reflectance spectra are associated with different time periods while an upper layer is being removed. Next, a difference between the two reflectance spectra is calculated. Then, a curve is defined from the difference between the two reflectance spectra. Next, the defined curve is fitted by a known parametric function to determine the film thickness. An endpoint detector and a CMP system are also provided.
摘要翻译：提供了一种用于确定半导体衬底中的膜厚度的方法。该方法通过在半导体衬底上提供多个层而开始。然后，产生两个反射光谱，其中两个反射光谱中的每一个与不同的时间周期相关联，同时去除上层。接下来，计算两个反射光谱之间的差。然后，根据两个反射光谱之间的差定义曲线。接下来，通过已知的参数函数拟合定义的曲线以确定膜厚度。还提供端点检测器和CMP系统。

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