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1. 发明授权

US08278736B2 Electrostatic discharge protection device 有权
标题翻译：静电放电保护装置
公开(公告)号：US08278736B2
公开(公告)日：2012-10-02
申请号：US12875217
申请日：2010-09-03
申请人： Yeh-Ning Jou , Chia-Wei Hung , Shu-Ling Chang , Hwa-Chyi Chiou , Yeh-Jen Huang
发明人： Yeh-Ning Jou , Chia-Wei Hung , Shu-Ling Chang , Hwa-Chyi Chiou , Yeh-Jen Huang
IPC分类号： H01L29/739 , H01L23/60
CPC分类号： H01L27/0259 , H01L27/0274
摘要： An electrostatic discharge protection device coupled between a first power line and a second power line is provided. A first N-type doped region is formed in a P-type well. A first P-type doped region is formed in the first N-type doped region. A second P-type doped region includes a first portion and a second portion. The first portion of the second P-type doped region is formed in the first N-type doped region. The second portion of the second P-type doped region is formed outside of the first N-type doped region. A second N-type doped region is formed in the first portion of the second P-type doped region. The first P-type doped region, the first N-type doped region, the second P-type doped region and the second N-type doped region constitute an insulated gate bipolar transistor (IGBT).
摘要翻译：提供耦合在第一电力线和第二电力线之间的静电放电保护装置。在P型阱中形成第一N型掺杂区。在第一N型掺杂区域中形成第一P型掺杂区域。第二P型掺杂区域包括第一部分和第二部分。第二P型掺杂区的第一部分形成在第一N型掺杂区中。第二P型掺杂区的第二部分形成在第一N型掺杂区的外部。在第二P型掺杂区域的第一部分中形成第二N型掺杂区域。第一P型掺杂区域，第一N型掺杂区域，第二P型掺杂区域和第二N型掺杂区域构成绝缘栅双极晶体管（IGBT）。

2. 发明申请

US20120056239A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE 有权
标题翻译：静电放电保护装置
公开(公告)号：US20120056239A1
公开(公告)日：2012-03-08
申请号：US12875217
申请日：2010-09-03
申请人： Yeh-Ning JOU , Chia-Wei Hung , Shu-Ling Chang , Hwa-Chyi Chiou , Yeh-Jen Huang
发明人： Yeh-Ning JOU , Chia-Wei Hung , Shu-Ling Chang , Hwa-Chyi Chiou , Yeh-Jen Huang
IPC分类号： H01L29/739 , H01L23/60
CPC分类号： H01L27/0259 , H01L27/0274
摘要： An electrostatic discharge protection device is coupled between a first power line and a second power line and comprises a P-type well, a first N-type doped region, a first P-type doped region, a second P-type doped region and a second N-type doped region. The first N-type doped region is formed in the P-type well. The first P-type doped region is formed in the first N-type doped region. The second P-type doped region comprises a first portion and a second portion. The first portion of the second P-type doped region is formed in the first N-type doped region. The second portion of the second P-type doped region is formed outside of the first N-type doped region. The second N-type doped region is formed in the first portion of the second P-type doped region. The first P-type doped region, the first N-type doped region, the second P-type doped region and the second N-type doped region constitute an insulated gate bipolar transistor (IGBT).
摘要翻译：静电放电保护装置耦合在第一电力线和第二电力线之间，并且包括P型阱，第一N型掺杂区，第一P型掺杂区，第二P型掺杂区和第二N型掺杂区域。第一个N型掺杂区形成在P型阱中。第一P型掺杂区域形成在第一N型掺杂区域中。第二P型掺杂区域包括第一部分和第二部分。第二P型掺杂区的第一部分形成在第一N型掺杂区中。第二P型掺杂区的第二部分形成在第一N型掺杂区的外部。第二N型掺杂区形成在第二P型掺杂区的第一部分中。第一P型掺杂区域，第一N型掺杂区域，第二P型掺杂区域和第二N型掺杂区域构成绝缘栅双极晶体管（IGBT）。

3. 发明授权

US08278715B2 Electrostatic discharge protection device 有权
标题翻译：静电放电保护装置
公开(公告)号：US08278715B2
公开(公告)日：2012-10-02
申请号：US13019846
申请日：2011-02-02
申请人： Yeh-Ning Jou , Chia-Wei Hung , Hwa-Chyi Chiou , Yeh-Jen Huang , Shu-Ling Chang
发明人： Yeh-Ning Jou , Chia-Wei Hung , Hwa-Chyi Chiou , Yeh-Jen Huang , Shu-Ling Chang
IPC分类号： H01L23/62 , H01L29/772
CPC分类号： H01L23/60 , H01L2924/0002 , H01L2924/00
摘要： An ESD protection structure is disclosed. A substrate comprises a first conductive type. A first diffusion region is formed in the substrate. A first doped region is formed in the first diffusion region. A second doped region is formed in the first diffusion region. A third doped region is formed in the substrate. A first isolation region is formed in the substrate, covers a portion of the first diffusion region and is located between the second and the third doped regions. A fourth doped region is formed in the substrate. When the first doped region is coupled to a first power line and the third and the fourth doped regions are coupled to a second power line, an ESD current can be released to the second power line from the first power line. During the release of the ESD current, the second doped region is not electrically connected to the first power line.
摘要翻译：公开了ESD保护结构。衬底包括第一导电类型。在基板中形成第一扩散区。第一掺杂区形成在第一扩散区中。在第一扩散区域中形成第二掺杂区域。在衬底中形成第三掺杂区。第一隔离区形成在衬底中，覆盖第一扩散区的一部分并位于第二和第三掺杂区之间。在衬底中形成第四掺杂区。当第一掺杂区耦合到第一电源线并且第三和第四掺杂区耦合到第二电源线时，ESD电流可以从第一电力线释放到第二电力线。在释放ESD电流期间，第二掺杂区域不与第一电力线电连接。

4. 发明申请

US20120193718A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE 有权
标题翻译：静电放电保护装置
公开(公告)号：US20120193718A1
公开(公告)日：2012-08-02
申请号：US13019846
申请日：2011-02-02
申请人： Yeh-Ning JOU , Chia-Wei Hung , Hwa-Chyi Chiou , Yeh-Jen Huang , Shu-Ling Chang
发明人： Yeh-Ning JOU , Chia-Wei Hung , Hwa-Chyi Chiou , Yeh-Jen Huang , Shu-Ling Chang
IPC分类号： H01L23/60
CPC分类号： H01L23/60 , H01L2924/0002 , H01L2924/00
摘要： An ESD protection structure is disclosed. A substrate comprises a first conductive type. A first diffusion region is formed in the substrate. A first doped region is formed in the first diffusion region. A second doped region is formed in the first diffusion region. A third doped region is formed in the substrate. A first isolation region is formed in the substrate, covers a portion of the first diffusion region and is located between the second and the third doped regions. A fourth doped region is formed in the substrate. When the first doped region is coupled to a first power line and the third and the fourth doped regions are coupled to a second power line, an ESD current can be released to the second power line from the first power line. During the release of the ESD current, the second doped region is not electrically connected to the first power line.
摘要翻译：公开了ESD保护结构。衬底包括第一导电类型。在基板中形成第一扩散区。第一掺杂区形成在第一扩散区中。在第一扩散区域中形成第二掺杂区域。在衬底中形成第三掺杂区。第一隔离区形成在衬底中，覆盖第一扩散区的一部分并位于第二和第三掺杂区之间。在衬底中形成第四掺杂区。当第一掺杂区耦合到第一电源线并且第三和第四掺杂区耦合到第二电源线时，ESD电流可以从第一电力线释放到第二电力线。在释放ESD电流期间，第二掺杂区域不与第一电力线电连接。

5. 发明授权

US08507946B2 Electrostatic discharge protection device 有权
标题翻译：静电放电保护装置
公开(公告)号：US08507946B2
公开(公告)日：2013-08-13
申请号：US13040415
申请日：2011-03-04
申请人： Yeh-Jen Huang , Yeh-Ning Jou , Ming-Dou Ker , Wen-Yi Chen , Chia-Wei Hung , Hwa-Chyi Chiou
发明人： Yeh-Jen Huang , Yeh-Ning Jou , Ming-Dou Ker , Wen-Yi Chen , Chia-Wei Hung , Hwa-Chyi Chiou
IPC分类号： H01L29/74 , H01L31/111 , H01L23/62
CPC分类号： H01L23/62 , H01L27/0262 , H01L2924/0002 , H01L2924/00
摘要： An electrostatic discharge (ESD) protection device including a substrate, a first doped region, a second doped region, and a third doped region, a gate and a plurality of contacts is disclosed. The substrate includes a first conductive type. The first doped region is formed in the substrate and includes a second conductive type. The second doped region is formed in the substrate and includes the second conductive type. The third doped region is formed in the substrate, includes the first conductive type and is located between the first and the second doped regions. The gate is formed on the substrate, located between the first and the second doped regions and comprises a first through hole. The contacts pass through the first through hole to contact with the third doped region.
摘要翻译：公开了一种包括衬底，第一掺杂区域，第二掺杂区域和第三掺杂区域的静电放电（ESD）保护器件，栅极和多个触点。基板包括第一导电类型。第一掺杂区域形成在衬底中并且包括第二导电类型。第二掺杂区域形成在衬底中并且包括第二导电类型。第三掺杂区域形成在衬底中，包括第一导电类型并且位于第一和第二掺杂区域之间。栅极形成在衬底上，位于第一和第二掺杂区之间，并且包括第一通孔。触点通过第一通孔以与第三掺杂区域接触。

6. 发明申请

US20120146151A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE 有权
标题翻译：静电放电保护装置
公开(公告)号：US20120146151A1
公开(公告)日：2012-06-14
申请号：US13040415
申请日：2011-03-04
申请人： Yeh-Jen HUANG , Yeh-Ning Jou , Ming-Dou Ker , Wen-Yi Chen , Chia-Wei Hung , Hwa-Chyi Chiou
发明人： Yeh-Jen HUANG , Yeh-Ning Jou , Ming-Dou Ker , Wen-Yi Chen , Chia-Wei Hung , Hwa-Chyi Chiou
IPC分类号： H01L23/62
CPC分类号： H01L23/62 , H01L27/0262 , H01L2924/0002 , H01L2924/00
摘要： An electrostatic discharge (ESD) protection device including a substrate, a first doped region, a second doped region, and a third doped region, a gate and a plurality of contacts is disclosed. The substrate includes a first conductive type. The first doped region is formed in the substrate and includes a second conductive type. The second doped region is formed in the substrate and includes the second conductive type. The third doped region is formed in the substrate, includes the first conductive type and is located between the first and the second doped regions. The gate is formed on the substrate, located between the first and the second doped regions and comprises a first through hole. The contacts pass through the first through hole to contact with the third doped region.
摘要翻译：公开了一种包括衬底，第一掺杂区域，第二掺杂区域和第三掺杂区域的静电放电（ESD）保护器件，栅极和多个触点。基板包括第一导电类型。第一掺杂区域形成在衬底中并且包括第二导电类型。第二掺杂区域形成在衬底中并且包括第二导电类型。第三掺杂区域形成在衬底中，包括第一导电类型并且位于第一和第二掺杂区域之间。栅极形成在衬底上，位于第一和第二掺杂区之间，并且包括第一通孔。触点通过第一通孔以与第三掺杂区域接触。

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