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    • 1. 发明申请
    • Manufacturing apparatus for oriented film, liquid crystal device and electronic device
    • 取向膜,液晶装置和电子装置的制造装置
    • US20070013845A1
    • 2007-01-18
    • US11484490
    • 2006-07-11
    • Yasushi NagataYuichi Shimizu
    • Yasushi NagataYuichi Shimizu
    • G02F1/1337
    • G02F1/133734C23C14/044C23C14/545G02F2001/1316
    • A manufacturing apparatus for manufacturing an oriented film of a liquid crystal device holding a liquid crystal between a pair of substrates facing each other, includes: a film formation chamber; an evaporation section evaporating an oriented film material on the substrate by a physical vapor deposition, and forming the oriented film in the film formation chamber; a shielding plate formed between the evaporation section and the substrate, having an elongated opening for selectively evaporating the oriented film material, and covering an area of the substrate on which the oriented film is not formed; and a cleaning section providing a cleaning medium for removing the oriented film material adhered on the shielding plate, toward the opening of the shielding plate, and on the side of the shielding plate that faces the evaporation section.
    • 一种用于制造在彼此面对的一对基板之间保持液晶的液晶装置的取向膜的制造装置包括:成膜室; 蒸发部通过物理气相沉积在基板上蒸发定向膜材料,并在成膜室中形成取向膜; 形成在所述蒸发部和所述基板之间的遮蔽板,具有用于选择性地蒸发所述取向膜材料的细长开口,并覆盖未形成所述取向膜的所述基板的区域; 以及清洁部,其提供用于去除附着在所述屏蔽板上的取向膜材料,朝向所述屏蔽板的开口以及所述屏蔽板的面对所述蒸发部的一侧的清洁介质。
    • 2. 发明授权
    • Manufacturing apparatus for oriented film, liquid crystal device and electronic device
    • 取向膜,液晶装置和电子装置的制造装置
    • US07518681B2
    • 2009-04-14
    • US11484490
    • 2006-07-11
    • Yasushi NagataYuichi Shimizu
    • Yasushi NagataYuichi Shimizu
    • G02F1/1337
    • G02F1/133734C23C14/044C23C14/545G02F2001/1316
    • A manufacturing apparatus for manufacturing an oriented film of a liquid crystal device holding a liquid crystal between a pair of substrates facing each other, includes: a film formation chamber; an evaporation section evaporating an oriented film material on the substrate by a physical vapor deposition, and forming the oriented film in the film formation chamber; a shielding plate formed between the evaporation section and the substrate, having an elongated opening for selectively evaporating the oriented film material, and covering an area of the substrate on which the oriented film is not formed; and a cleaning section providing a cleaning medium for removing the oriented film material adhered on the shielding plate, toward the opening of the shielding plate, and on the side of the shielding plate that faces the evaporation section.
    • 一种用于制造在彼此面对的一对基板之间保持液晶的液晶装置的取向膜的制造装置包括:成膜室; 蒸发部通过物理气相沉积在基板上蒸发定向膜材料,并在成膜室中形成取向膜; 形成在所述蒸发部和所述基板之间的遮蔽板,具有用于选择性地蒸发所述取向膜材料的细长开口,并覆盖未形成所述取向膜的所述基板的区域; 以及清洁部,其提供用于去除附着在所述屏蔽板上的取向膜材料,朝向所述屏蔽板的开口以及所述屏蔽板的面对所述蒸发部的一侧的清洁介质。
    • 8. 发明申请
    • Apparatus and method for detecting hole area
    • 孔面积检测装置及方法
    • US20050254700A1
    • 2005-11-17
    • US11102770
    • 2005-04-11
    • Yasushi NagataHiroshi SanoAtsushi ImamuraEiji Nishihara
    • Yasushi NagataHiroshi SanoAtsushi ImamuraEiji Nishihara
    • G01B11/00G01N21/956G06K9/00G06T1/00G06T7/00
    • G06T7/0004G06T2207/30141
    • A board (9) is placed on a stage part (20) so that the back surface of the board is opposed to the stage part (20). The stage part cuts off light entering a hole penetrating the board (9) from a side of its back surface which is a reverse surface with respect to its pattern formed surface and has a reflection property which is different from that of the pattern formed surface with respect to an illumination light, and the illumination light is emitted from a light source part (31) onto the pattern formed surface (9a). An image pickup part (33) receives light from the pattern formed surface to acquire an inspection image, and a hole-area specifying part implemented by a computer (4) specifies a hole area in the inspection image, which corresponds to a hole of the board (9), by using only the inspection image as image information, in accordance with criteria of pixel values affected by a reflection state of the illumination light entering a hole penetrating the board (9) and being reflected on the stage part (20). Thus, it is possible to detect an area of a hole on the board (9) by using only the inspection image acquired with a reflected light of the illumination light from the light source part (31).
    • 板(9)放置在平台部分(20)上,使得板的后表面与平台部分(20)相对。 舞台部分从其背面的相对于其图案形成表面的反面的一侧切断穿入基板(9)的孔,并具有与图案形成面不同的反射特性, 相对于照明光,照明光从光源部(31)发射到图案形成面(9a)上。 图像拾取部分(33)从图案形成表面接收光以获取检查图像,并且由计算机(4)实现的孔区域指定部分指定检查图像中的与孔的区域相对应的孔面积 (9)中,仅通过仅使用检查图像作为图像信息,根据影响入射穿过基板(9)的孔的照明光的反射状态并被反射在台面部(20)上的像素值的标准, 。 因此,可以通过仅使用由来自光源部分(31)的照明光的反射光获取的检查图像来检测板(9)上的孔的区域。