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    • 5. 发明授权
    • Lamp unit
    • 灯泡单元
    • US08287167B2
    • 2012-10-16
    • US12749005
    • 2010-03-29
    • Tetsuaki Inaba
    • Tetsuaki Inaba
    • B60Q1/04
    • F21S41/43F21S41/147F21S41/19F21S41/255F21S41/295F21S41/321F21S41/336F21S41/365F21S41/39F21S41/47F21S45/43F21W2102/00
    • A lamp unit includes a first semiconductor light-emitting element that serves as a light source; a second semiconductor light-emitting element that serves as a light source; a support member that supports the first semiconductor light-emitting element and the second semiconductor light-emitting element; a first reflector provided above the first semiconductor light-emitting element, which reflects light radiated from the first semiconductor light-emitting element forward; a shade that blocks a portion of reflected light from the first reflector; a projection lens provided in front of the first reflector with the shade disposed therebetween, which forms a light distribution pattern with a cut-off line from light reflected by the first reflector; a positioning portion that positions the projection lens; and a second reflector provided below the second semiconductor light-emitting element, which reflects light radiated from the second semiconductor light-emitting element forward.
    • 灯单元包括用作光源的第一半导体发光元件; 用作光源的第二半导体发光元件; 支撑构件,其支撑所述第一半导体发光元件和所述第二半导体发光元件; 设置在第一半导体发光元件上方的第一反射器,其将从第一半导体发光元件辐射的光向前方反射; 阻挡来自第一反射器的反射光的一部分的阴影; 投影透镜,设置在所述第一反射器的前面,其间设置有所述阴影,所述投影透镜形成具有从所述第一反射器反射的光的切断线的配光图案; 定位部,其定位所述投影透镜; 以及第二反射器,设置在第二半导体发光元件的下方,其将从第二半导体发光元件辐射的光向前方反射。
    • 10. 发明申请
    • OPTICAL AXIS INSPECTION METHOD AND OPTICAL AXIS INSPECTION APPARATUS
    • 光轴检查方法和光轴检查装置
    • US20090073703A1
    • 2009-03-19
    • US12208982
    • 2008-09-11
    • Tetsuaki Inaba
    • Tetsuaki Inaba
    • G01B9/00
    • G01M11/064F21S41/00G01M11/065
    • An optical axis inspection apparatus is provided with: a camera for capturing a light distribution pattern of a light source device projected on a screen; an image processing device for finding a cutoff line in the light distribution pattern; an acceptance reference cutoff line setting unit; and a shade having an oblong slit and arranged to be opposed to a projection lens of the projection type light source device. Whether or not an optical axis is proper is inspected based oh a shift of the cutoff line with respect to the acceptance reference cutoff line. Only a transmissive light passing through a substantially central portion in a vertical direction of a projection lens including an optical axis of the projection lens is guided onto the screen by the shade.
    • 光轴检查装置设置有:摄像机,用于拍摄投影在屏幕上的光源装置的配光图案; 用于在所述配光图案中找到截止线的图像处理装置; 验收基准截止线设定单元; 以及具有长方形狭缝并且被布置成与投影型光源装置的投影透镜相对的阴影。 基于截止线相对于接受基准截止线的移动来检查光轴是否适当。 只有通过包括投影透镜的光轴在内的投影透镜的垂直方向上的基本上中心部分的透射光被阴影引导到屏幕上。