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1. 发明申请

US20100173235A1 METHOD AND APPARATUS FOR WRITING 有权
标题翻译：书写方法与装置
公开(公告)号：US20100173235A1
公开(公告)日：2010-07-08
申请号：US12649846
申请日：2009-12-30
申请人： Yasuo KATO , Jun Yashima , Hiroshi Matsumoto , Tomoo Motosugi , Tomohiro Iijima , Takayuki Abe
发明人： Yasuo KATO , Jun Yashima , Hiroshi Matsumoto , Tomoo Motosugi , Tomohiro Iijima , Takayuki Abe
IPC分类号： G03F7/20 , G21K5/00 , G21K1/00
CPC分类号： G03F1/68 , B82Y10/00 , B82Y40/00 , G21K1/025 , H01J37/3174
摘要： A writing method includes calculating a proximity effect-corrected dose for correcting a proximity effect in charged particle beam writing, for each first mesh region made by virtually dividing a writing region of a target object into a plurality of first mesh regions of a first mesh size, calculating a fogging effect-corrected dose by using the proximity effect-corrected dose calculated and an area density in the first mesh size with respect to a part of a calculation region for calculating the fogging effect-corrected dose for correcting a fogging effect in the charged particle beam writing, and by using an area density in a second mesh size larger than the first mesh size with respect to a remaining part of the calculation region, synthesizing the fogging effect-corrected dose and the proximity effect-corrected dose for the each first mesh region, and writing a pattern on the target object by using a charged particle beam based on a synthesized correction dose.
摘要翻译：一种写入方法包括计算用于校正带电粒子束写入中的邻近效应的邻近效应校正剂量，对于通过将目标对象的写入区域虚拟地分成多个第一网格尺寸的第一网格区域而制成的每个第一网格区域通过使用计算的邻近效应校正剂量和相对于计算区域的一部分的第一网格尺寸的面积密度来计算雾化效果校正剂量，以计算用于校正雾化效果的起雾效果校正剂量带电粒子束写入，并且相对于计算区域的剩余部分使用相对于第一网格尺寸大的第二网格尺寸的面积密度，合成每个图像的雾化效果校正剂量和邻近效应校正剂量第一网格区域，并且基于合成的校正剂量，通过使用带电粒子束将目标物体上的图案写入。

2. 发明授权

US08309283B2 Method and apparatus for writing 有权
标题翻译：写作方法和装置
公开(公告)号：US08309283B2
公开(公告)日：2012-11-13
申请号：US12649846
申请日：2009-12-30
申请人： Yasuo Kato , Jun Yashima , Hiroshi Matsumoto , Tomoo Motosugi , Tomohiro Iijima , Takayuki Abe
发明人： Yasuo Kato , Jun Yashima , Hiroshi Matsumoto , Tomoo Motosugi , Tomohiro Iijima , Takayuki Abe
IPC分类号： G03C5/00
CPC分类号： G03F1/68 , B82Y10/00 , B82Y40/00 , G21K1/025 , H01J37/3174
摘要： A writing method includes calculating a proximity effect-corrected dose for correcting a proximity effect in charged particle beam writing, for each first mesh region made by virtually dividing a writing region of a target object into a plurality of first mesh regions of a first mesh size, calculating a fogging effect-corrected dose by using the proximity effect-corrected dose calculated and an area density in the first mesh size with respect to a part of a calculation region for calculating the fogging effect-corrected dose for correcting a fogging effect in the charged particle beam writing, and by using an area density in a second mesh size larger than the first mesh size with respect to a remaining part of the calculation region, synthesizing the fogging effect-corrected dose and the proximity effect-corrected dose for the each first mesh region, and writing a pattern on the target object by using a charged particle beam based on a synthesized correction dose.
摘要翻译：一种写入方法包括计算用于校正带电粒子束写入中的邻近效应的邻近效应校正剂量，对于通过将目标对象的写入区域虚拟地分成多个第一网格尺寸的第一网格区域而制成的每个第一网格区域通过使用计算的邻近效应校正剂量和相对于计算区域的一部分的第一网格尺寸的面积密度来计算雾化效果校正剂量，以计算用于校正雾化效果的雾化效果校正剂量带电粒子束写入，并且相对于计算区域的剩余部分使用相对于第一网格尺寸大的第二网格尺寸的面积密度，合成每个图像的雾化效果校正剂量和邻近效应校正剂量第一网格区域，并且通过使用基于合成校正剂量的带电粒子束将目标物体上的图案写入。

3. 发明授权

US08352889B2 Beam dose computing method and writing method and record carrier body and writing apparatus 有权
标题翻译：光束剂量计算方法和写入方法和记录载体体和书写装置
公开(公告)号：US08352889B2
公开(公告)日：2013-01-08
申请号：US13323986
申请日：2011-12-13
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
IPC分类号： G06F17/50 , G06F19/00 , G03F1/00 , G06K9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：射束剂量计算方法包括将目标物体的表面积分成包括不同尺寸的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域，确定带电粒子束的第一校正剂量，以便校正第一区域中的雾化效果，确定用于校正由于第二区域中的负载效应而发生的图案线宽度偏差的校正大小值，以在所述第二区域的各自中创建所述光束的基本剂量图，并且准备接近的图在所述第二区域的各个区域中的效应校正系数，使用该图确定在第三区域中用于邻近效应校正的光束的第二校正剂量，并且使用第一和第二校正剂量来确定表面上每个位置处的实际光束剂量的所述物体。

4. 发明申请

US20070114453A1 BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS 有权
标题翻译：光束剂量计算方法和书写方法和记录载体体系和书写装置
公开(公告)号：US20070114453A1
公开(公告)日：2007-05-24
申请号：US11460848
申请日：2006-07-28
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

5. 发明授权

US07740991B2 Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam 有权
标题翻译：光束剂量计算方法和写入方法和记录载体体和书写装置，用于确定带电粒子束的最佳剂量
公开(公告)号：US07740991B2
公开(公告)日：2010-06-22
申请号：US11460848
申请日：2006-07-28
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
IPC分类号： G06F1/00 , G06F19/00 , G06F17/50 , G06K9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

6. 发明申请

US20080182185A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF, AND METHOD FOR RESIZING DIMENSION VARIATION DUE TO LOADING EFFECT 有权
标题翻译：充电颗粒光束写入装置及其方法，以及用于对装载效应进行尺寸变化的方法
公开(公告)号：US20080182185A1
公开(公告)日：2008-07-31
申请号：US11942307
申请日：2007-11-19
申请人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G03C5/00 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/004 , H01J2237/30455 , Y10S430/143
摘要： A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.
摘要翻译：带电粒子束写入装置包括：第一部分，基于图案数据构造，以估计总写入时间;第二部分，被配置为在写入开始时间之后并且在总写入时间内通过使用在任意时间获取基本剂量从写入开始时刻起的时间，总写入时间和基本剂量之间的时间之间的第一相关性，第三部分，被配置为通过使用时间之间的第二相关性在任意时间获取起雾效果校正系数，总和写入时间和系数，配置为通过使用基本剂量和系数来计算任意时间的束剂量的第四部分，被配置为基于束剂量计算束照射时间的第五部分，用于偏转光束的偏转器，以及用于阻挡光束的孔。

7. 发明授权

US07872745B2 Pattern inspection apparatus and pattern inspection method 有权
标题翻译：图案检验装置和图案检验方法
公开(公告)号：US07872745B2
公开(公告)日：2011-01-18
申请号：US12186874
申请日：2008-08-06
申请人： Takayuki Abe , Tomohiro Iijima , Hideo Tsuchiya , Tetsuyuki Arai
发明人： Takayuki Abe , Tomohiro Iijima , Hideo Tsuchiya , Tetsuyuki Arai
IPC分类号： G01N21/00
CPC分类号： G01N21/95607
摘要： A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.
摘要翻译：图案检查装置包括被配置为发射脉冲光的光源，放置有检查对象工件的台，包括多个二维排列的光接收元件的传感器，被配置为以二维方式捕获图案图像通过使用多个光接收元件，用脉冲光照射的检查对象工件的三维区域，以及比较单元，被配置为将图案图像的数据与预定的参考图案图像数据进行比较，其中，该台移动为在脉冲光的脉冲之间移动多个像素，即自然数乘以1个像素的数量。

8. 发明授权

US07619230B2 Charged particle beam writing method and apparatus and readable storage medium 有权
标题翻译：带电粒子束写入方法和装置以及可读存储介质
公开(公告)号：US07619230B2
公开(公告)日：2009-11-17
申请号：US11535725
申请日：2006-09-27
申请人： Junichi Suzuki , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Junichi Suzuki , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G21K5/10 , H01J37/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31769
摘要： A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.
摘要翻译：带电粒子束写入方法包括输入用于写入写入区域的图形数据，预测用于写入图案数据的图案的写入时间，通过使用从写入开始时间所需的时间，预测写入时间和带电粒子束的基本剂量，在写入图案的情况下从写入开始的任意时间之后的带电粒子束的基本剂量，通过使用写入开始时间所需的时间之间的相关性来获取，预测写入时间和接近效应校正系数，在写入图案的情况下从写入开始的可选时间之后的邻近效应校正系数，通过使用基本剂量和后面的邻近效应校正系数可选时间，在写入时间从写入开始的可选时间之后的带电粒子束的曝光剂量，以及写入可选的posi 通过使用与剂量对应的带电粒子束，在写入区域中进行。

9. 发明申请

US20070114459A1 CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS AND READABLE STORAGE MEDIUM 有权
标题翻译：充电颗粒光束写入方法和装置和可读存储介质
公开(公告)号：US20070114459A1
公开(公告)日：2007-05-24
申请号：US11535725
申请日：2006-09-27
申请人： Junichi SUZUKI , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Junichi SUZUKI , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31769
摘要： A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.
摘要翻译：带电粒子束写入方法包括输入用于写入写入区域的图形数据，预测用于写入图案数据的图案的写入时间，通过使用从写入开始时间所需的时间，预测写入时间和带电粒子束的基本剂量，在写入图案的情况下从写入开始的任意时间之后的带电粒子束的基本剂量，通过使用写入开始时间所需的时间之间的相关性来获取，预测写入时间和接近效应校正系数，在写入图案的情况下从写入开始的可选时间之后的邻近效应校正系数，通过使用基本剂量和后面的邻近效应校正系数可选时间，在写入时间从写入开始的可选时间之后的带电粒子束的曝光剂量，以及写入可选的posi 通过使用与剂量对应的带电粒子束，在写入区域中进行。

10. 发明授权

US07608845B2 Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect 有权
标题翻译：带电粒子束写入装置及其方法，以及由于负载效应而调整尺寸变化的方法
公开(公告)号：US07608845B2
公开(公告)日：2009-10-27
申请号：US11942307
申请日：2007-11-19
申请人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： H01J3/14 , G21K5/10 , G03F9/00 , G03C5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/004 , H01J2237/30455 , Y10S430/143
摘要： A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.
摘要翻译：带电粒子束写入装置包括：第一部分，基于图案数据构造，以估计总写入时间;第二部分，被配置为在写入开始时间之后并且在总写入时间内通过使用在任意时间获取基本剂量从写入开始时刻起的时间，总写入时间和基本剂量之间的时间之间的第一相关性，第三部分，被配置为通过使用时间之间的第二相关性在任意时间获取起雾效果校正系数，总和写入时间和系数，配置为通过使用基本剂量和系数来计算任意时间的束剂量的第四部分，被配置为基于束剂量计算束照射时间的第五部分，用于偏转光束的偏转器，以及用于阻挡光束的孔。

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