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1. 发明授权

US07619230B2 Charged particle beam writing method and apparatus and readable storage medium 有权
标题翻译：带电粒子束写入方法和装置以及可读存储介质
公开(公告)号：US07619230B2
公开(公告)日：2009-11-17
申请号：US11535725
申请日：2006-09-27
申请人： Junichi Suzuki , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Junichi Suzuki , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G21K5/10 , H01J37/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31769
摘要： A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.
摘要翻译：带电粒子束写入方法包括输入用于写入写入区域的图形数据，预测用于写入图案数据的图案的写入时间，通过使用从写入开始时间所需的时间，预测写入时间和带电粒子束的基本剂量，在写入图案的情况下从写入开始的任意时间之后的带电粒子束的基本剂量，通过使用写入开始时间所需的时间之间的相关性来获取，预测写入时间和接近效应校正系数，在写入图案的情况下从写入开始的可选时间之后的邻近效应校正系数，通过使用基本剂量和后面的邻近效应校正系数可选时间，在写入时间从写入开始的可选时间之后的带电粒子束的曝光剂量，以及写入可选的posi 通过使用与剂量对应的带电粒子束，在写入区域中进行。

2. 发明申请

US20070114459A1 CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS AND READABLE STORAGE MEDIUM 有权
标题翻译：充电颗粒光束写入方法和装置和可读存储介质
公开(公告)号：US20070114459A1
公开(公告)日：2007-05-24
申请号：US11535725
申请日：2006-09-27
申请人： Junichi SUZUKI , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Junichi SUZUKI , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31769
摘要： A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.
摘要翻译：带电粒子束写入方法包括输入用于写入写入区域的图形数据，预测用于写入图案数据的图案的写入时间，通过使用从写入开始时间所需的时间，预测写入时间和带电粒子束的基本剂量，在写入图案的情况下从写入开始的任意时间之后的带电粒子束的基本剂量，通过使用写入开始时间所需的时间之间的相关性来获取，预测写入时间和接近效应校正系数，在写入图案的情况下从写入开始的可选时间之后的邻近效应校正系数，通过使用基本剂量和后面的邻近效应校正系数可选时间，在写入时间从写入开始的可选时间之后的带电粒子束的曝光剂量，以及写入可选的posi 通过使用与剂量对应的带电粒子束，在写入区域中进行。

3. 发明授权

US07608845B2 Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect 有权
标题翻译：带电粒子束写入装置及其方法，以及由于负载效应而调整尺寸变化的方法
公开(公告)号：US07608845B2
公开(公告)日：2009-10-27
申请号：US11942307
申请日：2007-11-19
申请人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： H01J3/14 , G21K5/10 , G03F9/00 , G03C5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/004 , H01J2237/30455 , Y10S430/143
摘要： A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.
摘要翻译：带电粒子束写入装置包括：第一部分，基于图案数据构造，以估计总写入时间;第二部分，被配置为在写入开始时间之后并且在总写入时间内通过使用在任意时间获取基本剂量从写入开始时刻起的时间，总写入时间和基本剂量之间的时间之间的第一相关性，第三部分，被配置为通过使用时间之间的第二相关性在任意时间获取起雾效果校正系数，总和写入时间和系数，配置为通过使用基本剂量和系数来计算任意时间的束剂量的第四部分，被配置为基于束剂量计算束照射时间的第五部分，用于偏转光束的偏转器，以及用于阻挡光束的孔。

4. 发明申请

US20080182185A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF, AND METHOD FOR RESIZING DIMENSION VARIATION DUE TO LOADING EFFECT 有权
标题翻译：充电颗粒光束写入装置及其方法，以及用于对装载效应进行尺寸变化的方法
公开(公告)号：US20080182185A1
公开(公告)日：2008-07-31
申请号：US11942307
申请日：2007-11-19
申请人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Takayuki Abe , Junichi Suzuki , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G03C5/00 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/004 , H01J2237/30455 , Y10S430/143
摘要： A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.
摘要翻译：带电粒子束写入装置包括：第一部分，基于图案数据构造，以估计总写入时间;第二部分，被配置为在写入开始时间之后并且在总写入时间内通过使用在任意时间获取基本剂量从写入开始时刻起的时间，总写入时间和基本剂量之间的时间之间的第一相关性，第三部分，被配置为通过使用时间之间的第二相关性在任意时间获取起雾效果校正系数，总和写入时间和系数，配置为通过使用基本剂量和系数来计算任意时间的束剂量的第四部分，被配置为基于束剂量计算束照射时间的第五部分，用于偏转光束的偏转器，以及用于阻挡光束的孔。

5. 发明授权

US5822450A Method for monitoring equipment state by distribution measurement data, and equipment monitoring apparatus 失效
公开(公告)号：US5822450A
公开(公告)日：1998-10-13
申请号：US519894
申请日：1995-08-28
申请人： Akio Arakawa , Hideyuki Tsurumaki , Yoshiaki Hattori , Shigeru Kanemoto , Ichiro Tai , Riyoko Haneda
发明人： Akio Arakawa , Hideyuki Tsurumaki , Yoshiaki Hattori , Shigeru Kanemoto , Ichiro Tai , Riyoko Haneda
IPC分类号： G06T7/00 , G06K9/00
CPC分类号： G06T7/0006 , G06T2207/20136 , G06T2207/30164
摘要： A method for monitoring equipment state by distribution measurement data comprises: the steps of momentarily taking in two-dimensional distribution measurement data relating to the state of equipments including an equipment to be monitored; allowing the two-dimensional distribution measurement data and a display result by a three-dimensional shape model of the equipment to be monitored to undergo positioning and carrying out overlaid display in such a manner that they are caused to correspond to each other; designating an equipment portion to be inspected from the display content; allowing measurement data of the equipment to be monitored to undergo mapping onto the three-dimensional shape model corresponding to the designated equipment portion; and detecting changes in the measurement data to judge presence or absence of unusual condition of the equipment. Moreover, an equipment state monitoring apparatus comprises: a distribution measurement unit for measuring distribution of temperature, vibration or sound, etc. at the plant equipment surface; a distribution measurement image data positioning unit for determining position and direction of the distribution measurement unit in order to allow distribution measurement image data from the distribution measurement unit to undergo positioning so that it is in correspondence with a projection chart of a corresponding plant equipment spatial shape model; a texture-mapping unit for allowing the distribution measurement image data to undergo texture-mapping onto the surface of the spatial shape model of the plant equipment on the basis of the position and the direction of the measurement unit determined by the distribution measurement image data positioning unit; a projecting unit for describing a projection chart of the texture-mapped plant equipment spatial shape model; and an image display unit for displaying the projection chart from the projecting unit.

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