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1. 发明申请

US20060082754A1 Stage apparatus, exposure apparatus, and device manufacturing method 失效
标题翻译：舞台装置，曝光装置和装置的制造方法
公开(公告)号：US20060082754A1
公开(公告)日：2006-04-20
申请号：US11249700
申请日：2005-10-13
申请人： Yasuhito Sasaki , Yoshikazu Miyajima , Naosuke Nishimura , Hideo Tanaka , Toshihiko Nishida
发明人： Yasuhito Sasaki , Yoshikazu Miyajima , Naosuke Nishimura , Hideo Tanaka , Toshihiko Nishida
IPC分类号： G03B27/58
CPC分类号： G03F7/70766
摘要： A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on the second member. With this arrangement, drive reaction-forces generated due to movement of the stage can be canceled by moving the first and second members, resulting in a smaller space needed for accommodating a canceling mechanism.
摘要翻译：舞台装置包括基座，可在第一和第二方向上在基座上移动的台架，可在第一方向上相对于基座移动的第一构件，以及可相对于基座沿第二方向移动的第二构件。第一个成员放置在第二个成员上。通过这种布置，可以通过移动第一和第二构件来消除由于台的移动产生的驱动反作用力，导致容纳取消机构所需的较小的空间。

2. 发明授权

US07321418B2 Stage apparatus, exposure apparatus, and device manufacturing method 失效
标题翻译：舞台装置，曝光装置和装置的制造方法
公开(公告)号：US07321418B2
公开(公告)日：2008-01-22
申请号：US11249700
申请日：2005-10-13
申请人： Yasuhito Sasaki , Yoshikazu Miyajima , Naosuke Nishimura , Hideo Tanaka , Toshihiko Nishida
发明人： Yasuhito Sasaki , Yoshikazu Miyajima , Naosuke Nishimura , Hideo Tanaka , Toshihiko Nishida
IPC分类号： G03B27/58 , G03B27/42 , G03B27/32 , H02K41/00
CPC分类号： G03F7/70766
摘要： A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on the second member. With this arrangement, drive reaction-forces generated due to movement of the stage can be canceled by moving the first and second members, resulting in a smaller space needed for accommodating a canceling mechanism.
摘要翻译：舞台装置包括基座，可在第一和第二方向上在基座上移动的台架，可在第一方向上相对于基座移动的第一构件，以及可相对于基座沿第二方向移动的第二构件。第一个成员放置在第二个成员上。通过这种布置，可以通过移动第一和第二构件来消除由于台的移动产生的驱动反作用力，导致容纳取消机构所需的较小的空间。

3. 发明授权

US07751029B2 Load-lock apparatus, device manufacturing apparatus, and device manufacturing method 失效
标题翻译：装载锁定装置，装置制造装置和装置制造方法
公开(公告)号：US07751029B2
公开(公告)日：2010-07-06
申请号：US11560978
申请日：2006-11-17
申请人： Naosuke Nishimura
发明人： Naosuke Nishimura
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70841
摘要： A load-lock apparatus includes a housing having a movable member, a first opening to allow a load-lock chamber to communicate with a processing chamber and a second opening, different from the first opening. The housing defines a volume of the load-lock chamber. A driving mechanism drives the movable member. A first gate valve is provided at the first opening, a second gate valve is provided at the second opening, and a pump reduces a pressure in the load-lock chamber. The driving mechanism drives the movable member, after loading an object into the load-lock chamber and before unloading the object from the load-lock chamber, to change the volume of the load-lock chamber. The driving mechanism decreases the volume of the load-lock chamber after the object is loaded into the load-lock chamber through the second gate valve and before the second gate valve is closed, and the pump reduces the pressure in the load-lock chamber after the volume of the load-lock chamber is decreased and the second gate valve is closed.
摘要翻译：一种装载锁定装置包括具有可移动部件的壳体，允许装载锁定室与不同于第一开口的处理室和第二开口连通的第一开口。壳体限定了装载锁定室的体积。驱动机构驱动可动件。第一闸阀设置在第一开口处，第二闸阀设置在第二开口处，泵减小了加载锁定室中的压力。驱动机构驱动可移动部件，在将物体装载到装载锁定室中之后并且在从装载锁定室卸载物体之前，改变装载锁定室的容积。驱动机构通过第二闸阀将物体装载到装载锁定室中之后并且在第二闸阀关闭之前减小了装载锁定室的容积，并且泵在下面减小了装载锁定室中的压力负载锁定室的容积减小，第二闸阀关闭。

4. 发明授权

US06552308B2 Substrate temperature adjustment apparatus for estimating a time taken until a substrate temperature falls within a target temperature range 失效
标题翻译：基板温度调节装置，用于估计基板温度落在目标温度范围内所需的时间
公开(公告)号：US06552308B2
公开(公告)日：2003-04-22
申请号：US09945728
申请日：2001-09-05
申请人： Naosuke Nishimura
发明人： Naosuke Nishimura
IPC分类号： H05B102
CPC分类号： G05D23/1951 , G05D23/1919
摘要： A substrate temperature adjustment apparatus includes a temperature adjustment device for adjusting a temperature of a substrate, and a temperature measurement device for measuring a temperature of the temperature adjustment device, when the temperature is out of a target temperature range. The time taken until the temperature of the substrate falls within the target temperature range is predicted on the basis of the temperature of the temperature adjustment device measured by the temperature measurement device.
摘要翻译：基板温度调节装置包括温度调节装置，用于调节基板的温度，以及温度测量装置，用于在温度超出目标温度范围时测量温度调节装置的温度。基于由温度测量装置测量的温度调节装置的温度来预测基板的温度落在目标温度范围内所花费的时间。

5. 发明授权

US07307692B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07307692B2
公开(公告)日：2007-12-11
申请号：US11091590
申请日：2005-03-29
申请人： Nobushige Korenaga , Naosuke Nishimura
发明人： Nobushige Korenaga , Naosuke Nishimura
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70775 , G03F7/70641 , G03F7/70733
摘要： The start of exposure or a process delays because reference alignment such as abutment must be executed along the optical axis after a substrate stage is moved between the exposure position and the processing position. To solve this problem, an exposure apparatus according to this invention includes an exposure optical system which exposes a substrate to a pattern, a substrate processing system which performs a predetermined process for the substrate at a position apart from the exposure optical system, a substrate stage which moves along a plane perpendicular to the optical axis of the exposure optical system, and a measurement device which continuously measures the position of the substrate stage along the optical axis in the moving range of the substrate stage while the substrate stage moves from below the substrate processing system to below the exposure optical system.
摘要翻译：曝光开始或处理延迟，因为在曝光位置和处理位置之间移动衬底台之后，必须沿着光轴执行诸如邻接的参考对准。为了解决这个问题，根据本发明的曝光装置包括曝光光学系统，其将衬底暴露于图案;衬底处理系统，其在离开曝光光学系统的位置处对衬底执行预定的处理;衬底台其沿着与曝光光学系统的光轴垂直的平面移动;以及测量装置，其在衬底台从衬底的下方连续地测量衬底台的移动范围中沿着光轴的位置的位置处理系统到曝光光学系统下方。

6. 发明申请

US20050219486A1 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20050219486A1
公开(公告)日：2005-10-06
申请号：US11091590
申请日：2005-03-29
申请人： Nobushige Korenaga , Naosuke Nishimura
发明人： Nobushige Korenaga , Naosuke Nishimura
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/68 , G03B27/42
CPC分类号： G03F7/70775 , G03F7/70641 , G03F7/70733
摘要： The start of exposure or a process delays because reference alignment such as abutment must be executed along the optical axis after a substrate stage is moved between the exposure position and the processing position. To solve this problem, an exposure apparatus according to this invention includes an exposure optical system which exposes a substrate to a pattern, a substrate processing system which performs a predetermined process for the substrate at a position apart from the exposure optical system, a substrate stage which moves along a plane perpendicular to the optical axis of the exposure optical system, and a measurement device which continuously measures the position of the substrate stage along the optical axis in the moving range of the substrate stage while the substrate stage moves from below the substrate processing system to below the exposure optical system.
摘要翻译：曝光开始或处理延迟，因为在曝光位置和处理位置之间移动衬底台之后，必须沿着光轴执行诸如邻接的参考对准。为了解决这个问题，根据本发明的曝光装置包括曝光光学系统，其将衬底暴露于图案;衬底处理系统，其在离开曝光光学系统的位置处对衬底执行预定的处理;衬底台其沿着与曝光光学系统的光轴垂直的平面移动;以及测量装置，其在衬底台从衬底的下方连续地测量衬底台的移动范围中沿着光轴的位置的位置处理系统到曝光光学系统下方。

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