专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4267258A Negative type deep ultraviolet resist 失效
标题翻译：负型深紫外线抗蚀剂
公开(公告)号：US4267258A
公开(公告)日：1981-05-12
申请号：US101688
申请日：1979-12-10
申请人： Yasuhiro Yoneda , Kenro Kitamura , Jiro Naito , Toshisuke Kitakohji
发明人： Yasuhiro Yoneda , Kenro Kitamura , Jiro Naito , Toshisuke Kitakohji
IPC分类号： G03F7/20 , G03F7/038 , H01L21/027 , G03C1/68
CPC分类号： G03F7/038 , G03F7/0388
摘要： A negative type resist is provided for deep ultraviolet light lithography. This resist comprises a polymer of a diallyl ester of a dicarboxylic acid having a degree of dispersion of 3 or less, which is given by the ratio of a weight-average molecular weight Mw to a number-average molecular weight Mn. This deep UV resist can produce a fine detail resist pattern having a high resolution, and it has a high sensitivity to irradiating the coated film of the polymer on a substrate with deep UV light followed by development.
摘要翻译：为深紫外光光刻提供负型抗蚀剂。该抗蚀剂包含通过重均分子量Mw与数均分子量Mn的比率给出的分散度为3以下的二羧酸的二烯丙基酯的聚合物。这种深紫外线抗蚀剂可以产生具有高分辨率的精细细节抗蚀剂图案，并且对具有深紫外光的基板上的聚合物的涂覆膜进行照射，然后显影，具有高灵敏度。

2. 发明授权

US4345020A Positive resist polymer composition and method of forming resist pattern 失效
标题翻译：正型抗蚀剂聚合物组合物和形成抗蚀剂图案的方法
公开(公告)号：US4345020A
公开(公告)日：1982-08-17
申请号：US212609
申请日：1980-12-03
申请人： Yasuhiro Yoneda , Toshisuke Kitakohji , Kenro Kitamura
发明人： Yasuhiro Yoneda , Toshisuke Kitakohji , Kenro Kitamura
IPC分类号： G03F7/004 , C08F20/00 , C08F20/02 , C08F20/26 , C08F220/00 , C08F220/04 , C08F220/10 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , Y10S430/143
摘要： A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition including: in polymerized form,(a) units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3).COOR where R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, benzyl or cyclohexyl,(b) units derived from a monoolefinically unsaturated carboxylic acid having from 3 to 12 carbon atoms and from 1 to 3 carboxyl groups, and(c) units derived from methacrylic acid chloride.The amount of the units (c) in the polymer composition is such that the number of moles of the units (b), multiplied by the number of the carboxyl group or groups in each of the units (b), ranges from about 1 to about 20% based on the total number of moles of the units (a), (b) and (c); the amount of the units (c) ranges from about 0.05 to about 3.0% by mole based on the total number of moles of the units (a), (b) and (c); and the molar ratio of the units (b), multiplied by the number of the carboxyl groups in each of the units (b), to the units (c) is greater than 2/1 but less than 250/1. The polymer composition is preferably in the form of either a copolymer having the units (a), (b) and (c), or a polymer blend of a copolymer comprised of the units (b) and a portion of the units (a) and a copolymer comprised of the units (c) and the remainder of the units (a). The resist polymer composition exhibits enhanced sensitivity as well as good thermal resistance, contrast and resolution.
摘要翻译：一种可交联正性电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，包括：聚合形式，（a）衍生自下式的甲基丙烯酸酯的单元：CH 2 = C（CH 3）.COOR，其中R是具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）衍生自具有3至12个碳原子和1至3个羧基的单烯属不饱和羧酸的单元，和（c）衍生自甲基丙烯酸酰氯。

3. 发明授权

US4276365A Positive resist terpolymer composition and method of forming resist pattern 失效
标题翻译：正抗蚀剂三聚物组合物和形成抗蚀剂图案的方法
公开(公告)号：US4276365A
公开(公告)日：1981-06-30
申请号：US061291
申请日：1979-07-02
申请人： Yasuhiro Yoneda , Toshisuke Kitakohji , Kenro Kitamura
发明人： Yasuhiro Yoneda , Toshisuke Kitakohji , Kenro Kitamura
IPC分类号： G03F7/039 , G03C1/68
CPC分类号： G03F7/039 , Y10S430/143
摘要： PCT No. PCT/JP78/00022 Sec. 371 Date July 7, 1979 Sec. 102(e) Date July 2, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00284 PCT Pub. Date May 31, 1979A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray- resist polymer composition including: in polymerized form,(a) units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3).COOR where R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, benzyl or cyclohexyl,(b) units derived from a monoolefinically unsaturated carboxylic acid from 3 to 12 carbon atoms and having from 1 to 3 carboxyl groups, and(c) units derived from methacrylic acid chloride.The amount of the units (c) in the polymer composition is such that the number of moles of the units (b), multiplied by the number of the carboxyl group or groups in each of the units (b) ranges from about 1 to about 20% based on the total number of moles of the units (a), (b) and (c); the amount of the units (c) ranges from about 0.05 to about 3.0% by mole based on the total number of moles of the units (a), (b) and (c); and the molar ratio of the units (b), multiplied by the number of the carboxyl groups in each of the units (b), to the units (c) is greater than 2/1 but less than 250/1.
摘要翻译： PCT No.PCT / JP78 / 00022 Sec。 371日期1979年7月7日 102（e）日期1979年7月2日PCT申请日1978年11月6日PCT公布。出版物WO79 / 00284 日期：1979年5月31日一种可交联正电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，其包含：聚合形式，（a）衍生自下式的甲基丙烯酸酯的单元：CH 2 = C（CH 3）。 COOR，其中R是具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）衍生自3至12个碳原子并具有1至3个羧基的单烯属不饱和羧酸的单元和（c ）单元衍生自甲基丙烯酰氯。

4. 发明授权

US4273856A Positive resist terpolymer composition and method of forming resist pattern 失效
标题翻译：正抗蚀剂三聚物组合物和形成抗蚀剂图案的方法
公开(公告)号：US4273856A
公开(公告)日：1981-06-16
申请号：US112309
申请日：1979-07-02
申请人： Yasuhiro Yoneda , Toshisuke Kitakohji , Kenro Kitamura
发明人： Yasuhiro Yoneda , Toshisuke Kitakohji , Kenro Kitamura
IPC分类号： C08F220/00 , C08F20/52 , C08F220/04 , C08F220/10 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , Y10S430/143
摘要： PCT No. PCT/JP78/00021 Sec. 371 Date July 2, 1979 Sec. 102(e) Date July 7, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00283 PCT Pub. Date May 31, 1979A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition comprising, in polymerized form,(a) from about 70 to about 99% by mole of units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3). COORwhere R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, a benzyl group or a cyclohexyl group,(b) from about 1 to about 20% by mole of units derived from methacrylamide, and(c) from about 0.05 to about 20% by mole of units derived from methacrylic acid chloride;each amount of the units (a), (b) and (c) being based on the total moles of the units (a), (b) and (c). The polymer composition is preferably in the form of either a copolymer comprised of the units (a), (b) and (c), or a blend of a copolymer comprised of the units (b) and a portion of the units (a) and a copolymer comprised of the units (c) and the remainder of the units (a). The resist polymer composition exhibits enhanced sensitivity as well as good thermal resistance, contrast and resolution.
摘要翻译： PCT No.PCT / JP78 / 00021 Sec。 371日期1979年7月2日 102（e）日期1979年7月7日PCT提交1978年11月6日PCT公布。出版物WO79 / 00283 日期：1979年5月31日一种可交联的正电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，其包含聚合形式的（a）约70-约99摩尔％的衍生自式：CH 2 = C（CH 3）。 COOR，其中R是具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）约1至约20摩尔％来自甲基丙烯酰胺的单元，和（c）约0.05 至约20摩尔％的衍生自甲基丙烯酰氯的单元; 单位（a），（b）和（c）的单位为单位（a），（b）和（c）的总摩尔数。聚合物组合物优选为由单元（a），（b）和（c）组成的共聚物的形式，或由单元（b）和单元（a）的一部分组成的共聚物的共混物，和由单元（c）和单元（a）的其余部分组成的共聚物。抗蚀剂聚合物组合物具有增强的灵敏度以及良好的耐热性，对比度和分辨率。

5. 发明授权

US4464455A Dry-developing negative resist composition 失效
标题翻译：干显影负性抗蚀剂组合物
公开(公告)号：US4464455A
公开(公告)日：1984-08-07
申请号：US385887
申请日：1982-06-07
申请人： Yasuhiro Yoneda , Kenroh Kitamura , Jiro Naito , Toshisuke Kitakohji
发明人： Yasuhiro Yoneda , Kenroh Kitamura , Jiro Naito , Toshisuke Kitakohji
IPC分类号： G03F7/004 , G03F7/038 , G03F7/075 , G03F7/09 , G03F7/30 , G03F7/36 , G03C5/16
CPC分类号： G03F7/094 , G03F7/038 , G03F7/0755 , G03F7/36 , Y10S430/143
摘要： A dry-developing negative resist composition consisting of (a) a polymer of a monomer of the following formula I or II or a copolymer of a monomer of the following formula I with a monomer of the following formula II, ##STR1## in which R represents alkyl of 1 to 6 carbon atoms, benzyl, phenyl, or cyclohexyl and (b) 1% to 70% by weight, based on the weight of the composition, of a silicone compound. A negative resist pattern can be formed on a substrate by a process comprising coating the substrate with the resist composition, exposing the resist layer to an ionizing radiation, subjecting the resist layer to a relief treatment, and developing a resist pattern on the substrate by treatment with gas plasma.
摘要翻译：由（a）下式I或II的单体的聚合物或下式I的单体的共聚物与下式II的单体组成的干显影负性抗蚀剂组合物， > II，其中R表示1至6个碳原子的烷基，苄基，苯基或环己基，和（b）1重量％至70重量％，基于组合物的重量，硅氧烷化合物。可以通过包括用抗蚀剂组合物涂覆基板，将抗蚀剂层暴露于电离辐射，使抗蚀剂层进行浮雕处理，以及通过处理在基板上显影抗蚀剂图案的方法，在基板上形成负的抗蚀剂图案与气体等离子体。

6. 发明授权

US5994144A Simplified environmental atmosphere measuring method 失效
标题翻译：简化环境气氛测量方法
公开(公告)号：US5994144A
公开(公告)日：1999-11-30
申请号：US178357
申请日：1994-01-04
申请人： Eiichi Nakajima , Yasuo Udoh , Tsutomu Iikawa , Toshisuke Kitakohji , Teruo Motoyoshi , Takashi Furusawa , Shiori Yamazaki , Masao Nakayama , Michiko Satoh , Shigeru Fukushima , Mayumi Itabashi
发明人： Eiichi Nakajima , Yasuo Udoh , Tsutomu Iikawa , Toshisuke Kitakohji , Teruo Motoyoshi , Takashi Furusawa , Shiori Yamazaki , Masao Nakayama , Michiko Satoh , Shigeru Fukushima , Mayumi Itabashi
IPC分类号： G01N1/22 , G01N1/34 , G01N1/40 , G01N17/04 , G01N33/00
CPC分类号： G01N1/405 , G01N1/2273 , G01N1/2214 , Y10T436/177692 , Y10T436/186 , Y10T436/204998 , Y10T436/255
摘要： When adsorbed gas is analyzed after metal, ceramics or metallic salt has been left in an environmental atmosphere for a predetermined period of time, an average concentration of specific gas over a long period of time can be accurately measured with an inexpensive small apparatus. Especially, porous metal or ceramics (transition metal oxide) are excellent in selective adsorption properties for NO.sub.x, porous ceramics (rare earth element oxide) are excellent in selective adsorption properties for CO.sub.2, and a specific chloride such as copper chloride and silver chloride is excellent in selective adsorption properties for SO.sub.2. A test kit accommodating such test pieces in a case, a protective case for the test kit to put the test kit into practical use, an umbrella and a forced air blowing unit are also disclosed.
摘要翻译：当在金属之后分析吸附气体时，陶瓷或金属盐已经在环境气氛中保持预定的时间，可以用便宜的小型设备来精确地测量长时间的比气体的平均浓度。特别是，多孔金属或陶瓷（过渡金属氧化物）对于NOx的选择性吸附性优异，多孔质陶瓷（稀土元素氧化物）对于CO 2的选择性吸附性优异，氯化铜和氯化银等特定氯化物优异在SO2的选择吸附性能。还公开了一种在壳体中容纳这种测试件的测试组件，用于将测试组件投入实际使用的测试套件的保护壳，伞和强制吹风单元。

7. 发明授权

US4600685A Patterning process using ladder-type organosiloxane resin and process for production of electronic devices utilizing said patterning process 失效
标题翻译：使用梯型有机硅氧烷树脂的图案化工艺和利用所述图案化工艺生产电子器件的方法
公开(公告)号：US4600685A
公开(公告)日：1986-07-15
申请号：US738891
申请日：1985-05-29
申请人： Toshisuke Kitakohji , Shiro Takeda , Minoru Nakajima , Hiroshi Tokunaga
发明人： Toshisuke Kitakohji , Shiro Takeda , Minoru Nakajima , Hiroshi Tokunaga
IPC分类号： G03F7/004 , G03F7/038 , G03F7/075 , H01L21/312 , G03C5/00
CPC分类号： H01L21/02137 , G03F7/0757 , H01L21/02282 , H01L21/02348 , H01L21/02351 , H01L21/3122
摘要： A patterning process is provided wherein a material to be etched is coated with a ladder type organosiloxane resin, the coated resin is irradiated with energy rays according to a desired pattern, the irradiated resin is subjected to a development treatment, and then, the material is etched by using the resin left after the development as a mask. The ladder type organosiloxane resin used is represented by the formula: ##STR1## wherein each R.sub.1 is independently selected from alkyl (Cl-6) groups, and phenyl and halophenyl groups, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are independently selected from hydrogen, alkoxy (Cl-3) groups, a hydroxyl group and alkyl (Cl-3) groups, and n is a number giving a Mw of about 1,000 to about 1,000,000. The patterning process can be advantageously employed for the production of electronic devices.
摘要翻译：提供了一种图案化工艺，其中待蚀刻的材料涂覆有梯形有机硅氧烷树脂，涂覆的树脂根据期望的图案用能量射线照射，照射的树脂经受显影处理，然后材料是通过使用在显影后留下的树脂作为掩模进行蚀刻。使用的梯型有机硅氧烷树脂由下式表示：其中每个R 1独立地选自烷基（C 1-6）基团，苯基和卤代苯基，R 2，R 3，R 4和R 5独立地选自氢，烷氧基（C1-3）基团，羟基和烷基（C1-3）基团，n是Mw为约1,000至约1,000,000的数。图案化工艺可以有利地用于生产电子设备。

8. 发明授权

US5985213A Simplified environmental atmosphere measuring apparatus 失效
标题翻译：简化环境气体测量仪
公开(公告)号：US5985213A
公开(公告)日：1999-11-16
申请号：US475502
申请日：1995-06-07
申请人： Eiichi Nakajima , Yasuo Udoh , Tsutomu Iikawa , Toshisuke Kitakohji , Teruo Motoyoshi , Takashi Furusawa , Shiori Yamazaki , Masao Nakayama , Michiko Satoh , Shigeru Fukushima , Mayumi Itabashi
发明人： Eiichi Nakajima , Yasuo Udoh , Tsutomu Iikawa , Toshisuke Kitakohji , Teruo Motoyoshi , Takashi Furusawa , Shiori Yamazaki , Masao Nakayama , Michiko Satoh , Shigeru Fukushima , Mayumi Itabashi
IPC分类号： G01N1/22 , G01N1/34 , G01N1/40 , G01N17/04 , G01N33/00
CPC分类号： G01N1/405 , G01N1/2273 , G01N1/2214 , Y10T436/177692 , Y10T436/186 , Y10T436/204998 , Y10T436/255
摘要： When adsorbed gas is analyzed after metal, ceramics or metallic salt has been left in an environmental atmosphere for a predetermined period of time, an average concentration of specific gas over a long period of time can be accurately measured with an inexpensive small apparatus. Especially, porous metal or ceramics (transition metal oxide) are excellent in selective adsorption properties for NO.sub.x, porous ceramics (rare earth element oxide) are excellent in selective adsorption properties for CO.sub.2, and a specific chloride such as copper chloride and silver chloride is excellent in selective adsorption properties for SO.sub.2. A test kit accommodating such test pieces in a case, a protective case for the test kit to put the test kit into practical use, an umbrella and a forced air blowing unit are also disclosed.
摘要翻译：当在金属之后分析吸附气体时，陶瓷或金属盐已经在环境气氛中保持预定的时间，可以用便宜的小型设备来精确地测量长时间的比气体的平均浓度。特别是，多孔金属或陶瓷（过渡金属氧化物）对于NOx的选择性吸附性优异，多孔质陶瓷（稀土元素氧化物）对于CO 2的选择性吸附性优异，氯化铜和氯化银等特定氯化物优异在SO2的选择吸附性能。还公开了一种在壳体中容纳这种测试件的测试组件，用于将测试组件投入实际使用的测试套件的保护壳，伞和强制吹风单元。

9. 发明授权

US5750406A Environment monitoring test piece and test method 失效
标题翻译：环境监测试验片及试验方法
公开(公告)号：US5750406A
公开(公告)日：1998-05-12
申请号：US432259
申请日：1995-05-01
申请人： Eiichi Nakajima , Yasuo Udoh , Tsutomu Iikawa , Toshisuke Kitakohji , Teruo Motoyoshi , Takashi Furusawa , Shiori Yamazaki , Masao Nakayama , Michiko Satoh , Shigeru Fukushima , Mayumi Itabashi
发明人： Eiichi Nakajima , Yasuo Udoh , Tsutomu Iikawa , Toshisuke Kitakohji , Teruo Motoyoshi , Takashi Furusawa , Shiori Yamazaki , Masao Nakayama , Michiko Satoh , Shigeru Fukushima , Mayumi Itabashi
IPC分类号： G01N1/22 , G01N17/04
CPC分类号： G01N17/043 , G01N1/2273 , Y10T436/173845 , Y10T436/177692 , Y10T436/18
摘要： There is provided a test piece by which NO.sub.x, present in an environment may be visually observed apart from the influence of other gases, and with which qualitative and quantitative analysis may be performed. The test piece has a layered structure prepared by vacuum deposition a metal thin-film (Ag, Pt, Au, etc.) on a metal substrate (Cu, Zn, etc.). The rough amounts of NO.sub.x, SO.sub.x and NH.sub.3 in the environment are determined on the basis of the corrosion products (nitrates, etc.) produced when NO.sub.x, SO.sub.x and NH.sub.3 are collected after the test piece has been exposed to the environment for a prescribed period of time.
摘要翻译：提供了一种测试件，通过该测试件可以在环境中存在的NO x除了其它气体的影响之外，并且可以进行定性和定量分析。测试件具有通过在金属基底（Cu，Zn等）上真空沉积金属薄膜（Ag，Pt，Au等）而制备的层状结构。在环境中大量的NOx，SOx和NH3基于在试样暴露于环境规定期间之后收集NOx，SO x和NH 3时产生的腐蚀产物（硝酸盐等）来确定的时间。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式