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    • 2. 发明授权
    • Electrodeposited copper foil with its surface prepared, process for producing the same and use thereof
    • 其表面电沉积铜箔,其制备方法及其用途
    • US06475638B1
    • 2002-11-05
    • US09654769
    • 2000-09-05
    • Masakazu MitsuhashiYasuaki MashikoHitoshi Kurabe
    • Masakazu MitsuhashiYasuaki MashikoHitoshi Kurabe
    • B32B1508
    • C25D1/04C25D5/48H05K3/382Y10T428/12431Y10T428/12438Y10T428/12472Y10T428/12569Y10T428/1291Y10T428/12993
    • A process for producing an electrodeposited copper foil with its surface prepared, comprising the steps of: subjecting an electrodeposited copper foil having a shiny side and a matte side whose average surface roughness (Rz) is in the range of 2.5 to 10 &mgr;m to at least one mechanical polishing so that the average surface roughness (Rz) of the matte side becomes in the range of 1.5 to 3.0 &mgr;m; and subjecting the matte side having undergone the mechanical polishing to a selective chemical polishing so that the average surface roughness (Rz) of the matte side becomes in the range of 0.8 to 2.5 &mgr;m. The invention further provides an electrodeposited copper foil with its surface prepared, produced by the above process, and still further provides PWBs and a multilayer laminate of PWBs, produced with the use of the above electrodeposited copper foil with its surface prepared. The mechanical polishing followed by chemical polishing of the matte side enables obtaining an electrodeposited copper foil with its surface prepared, the matte side of which exhibits excellent properties, and hence enables obtaining PWBs and a multilayer PWBs which have excellent properties.
    • 一种制备其表面的电沉积铜箔的方法,包括以下步骤:将平均表面粗糙度(Rz)在2.5至10μm的范围内的平均表面粗糙度(Rz)的光致侧面和无光泽面的电解铜箔至少 一次机械抛光使得无光面的平均表面粗糙度(Rz)在1.5-3.0μm的范围内; 并对经过机械抛光的磨砂面进行选择性化学抛光,使得无光面的平均表面粗糙度(Rz)在0.8〜2.5μm的范围内。 本发明还提供了通过上述方法制备的其表面的电沉积铜箔,并且还进一步提供PWB和PWB的多层层压体,其使用其上制备的上述电沉积铜箔制备。 机械抛光后,通过无光泽化学抛光,可以得到其表面准备的电沉积铜箔,其哑光面具有优异的性能,因此能够获得具有优异性能的PWB和多层PWB。