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1. 发明申请

US20050149902A1 Eigen decomposition based OPC model 失效
标题翻译：基于特征分解的OPC模型
公开(公告)号：US20050149902A1
公开(公告)日：2005-07-07
申请号：US10981750
申请日：2004-11-05
申请人： Xuelong Shi , Robert Socha , Thomas Laidig , Douglas Broeke
发明人： Xuelong Shi , Robert Socha , Thomas Laidig , Douglas Broeke
IPC分类号： G03F1/00 , G03F1/36 , G03F7/20 , G06F17/50 , G06K9/00 , H01L21/027
CPC分类号： G03F1/36 , G03F7/705
摘要： Model OPC is developed based on eigen decomposition of an aerial image expected to be produced by a mask pattern on a surface of a resist. With the eigen decomposition method the aerial image intensity distribution around a point (x, y) is accurately described in the model. A scalar approach may be used in the eigen decomposition model which treats the light wave through the mask as a scalar quantity. A eigen decomposition alternatively may use a vector approach which utilizes a vector to describe the light wave and the pupil function. A predicted SPIF may be generated from the aerial image which may be used to verify the mask modeling process by comparing the predicted SPIF to an experimentally determined SPIF. The model OPC, once calibrated, may be used to evaluate performance of a mask and refine features of the mask.
摘要翻译：基于通过抗蚀剂表面上的掩模图案预期产生的空间图像的特征分解开发OPC模型。利用特征分解方法，在模型中准确描述了点（x，y）周围的空间图像强度分布。在本征分解模型中可以使用标量法，其将通过掩模的光波视为标量。本征分解可以使用向量来描述光波和瞳孔函数的矢量方法。可以从空间图像生成预测的SPIF，其可以用于通过将预测的SPIF与实验确定的SPIF进行比较来验证掩模建模过程。模型OPC，一旦校准，可以用于评估掩模的性能和细化掩模的特征。

2. 发明申请

US20050142470A1 Feature optimization using interference mapping lithography 有权
标题翻译：使用干涉映射光刻技术进行特征优化
公开(公告)号：US20050142470A1
公开(公告)日：2005-06-30
申请号：US10975342
申请日：2004-10-29
申请人： Robert Socha , Xuelong Shi , Douglas Broeke , Jang Chen
发明人： Robert Socha , Xuelong Shi , Douglas Broeke , Jang Chen
IPC分类号： G03F1/14 , G06F17/50 , G03C5/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70125
摘要： Disclosed concepts include a method of, and program product for, optimizing an illumination profile of a pattern to be formed in a surface of a substrate relative to a given mask. Steps include mathematically representing resolvable feature(s) from the given mask, generating an interference map representation from the previous step, modifying the interference map representation to maximize intensity corresponding to the resolvable features, and determining assist feature size(s) such that intensity side lobes do not print.
摘要翻译：公开的概念包括用于优化相对于给定掩模在衬底表面中形成的图案的照明轮廓的方法和程序产品。步骤包括在数学上表示来自给定掩码的可解析特征，从前一步骤生成干涉图表示，修改干涉图表示以最大化对应于可解析特征的强度，以及确定辅助特征尺寸，使强度侧裂片不打印。

3. 发明授权

US08395757B2 Optimized polarization illumination 有权
标题翻译：优化极化照明
公开(公告)号：US08395757B2
公开(公告)日：2013-03-12
申请号：US12773775
申请日：2010-05-04
申请人： Robert Socha , Donis Flagello , Steve Hansen
发明人： Robert Socha , Donis Flagello , Steve Hansen
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/705 , G03F7/70125 , G03F7/70341 , G03F7/70566 , G03F7/70616
摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
摘要翻译：公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。对于照明器上的多个点可以重复这一点。

4. 发明申请

US20070273853A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070273853A1
公开(公告)日：2007-11-29
申请号：US11655999
申请日：2007-01-22
申请人： Arno Bleeker , Donis Flagello , Robert Socha , James Greeneich , Kars Troost
发明人： Arno Bleeker , Donis Flagello , Robert Socha , James Greeneich , Kars Troost
IPC分类号： G03B27/32
CPC分类号： G03B27/54 , G03F7/70116 , G03F7/705
摘要： A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.
摘要翻译：将图案布局的图像转印到基板的表面上的方法，包括为图案布局的第一区域选择第一照明轮廓，以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓，使得图案布局的第一区域被第一照明轮廓照亮，并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。

5. 发明申请

US20060204090A1 Method, program product and apparatus for optimizing illumination for full-chip layer 失效
公开(公告)号：US20060204090A1
公开(公告)日：2006-09-14
申请号：US11359781
申请日：2006-02-23
申请人： Robert Socha , Jang Chen
发明人： Robert Socha , Jang Chen
IPC分类号： G06K9/00
CPC分类号： G03F7/705 , G03F7/70125
摘要： Optimization of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined so as to generate a pitch frequency histogram of the full-chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch frequency histogram is equated to be the first eigenfunction from the sum of coherent system representation of a transformation cross coefficient. An integral equation for the first eigenfunction of the transformation cross coefficient is solved so as to define the optimal illumination for imaging the full-chip layer.

6. 发明申请

US20050134822A1 Optimized polarization illumination 有权
标题翻译：优化极化照明
公开(公告)号：US20050134822A1
公开(公告)日：2005-06-23
申请号：US10921878
申请日：2004-08-20
申请人： Robert Socha , Donis Flagello , Steve Hansen
发明人： Robert Socha , Donis Flagello , Steve Hansen
IPC分类号： G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： G03F7/705 , G03F7/70125 , G03F7/70341 , G03F7/70566 , G03F7/70616
摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
摘要翻译：公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。对于照明器上的多个点可以重复这一点。

7. 发明授权

US09080282B2 Laundry moisture sensing, control, diagnostic and method 有权
标题翻译：洗衣水分检测，控制，诊断和方法
公开(公告)号：US09080282B2
公开(公告)日：2015-07-14
申请号：US13361375
申请日：2012-01-30
申请人： Michael J. Zambrowicz , Stephen L. Harris , Robert Socha
发明人： Michael J. Zambrowicz , Stephen L. Harris , Robert Socha
IPC分类号： F26B25/00 , D06F58/04 , D06F58/28
CPC分类号： D06F58/04 , D06F58/28 , D06F2058/2838 , D06F2058/2883
摘要： A laundry dryer includes a drum. A moisture sensing system detects an average moisture content of launderable items as they are dried within the drum and provides a moisture signal to an electronic controller. A user interface presenting a setpoint selection element such that when a moisture setpoint is selected by a machine operator during a drying cycle, an operational state of the dryer machine is controlled by the electronic controller based on the moisture setpoint and the moisture signal.
摘要翻译：洗衣机包括滚筒。湿度感测系统检测洗涤物品在滚筒内干燥时的平均含水量，并向电子控制器提供湿度信号。一种用户界面，其呈现设定点选择元件，使得当在干燥循环期间机器操作者选择湿度设定点时，干燥机的操作状态由电子控制器基于湿度设定点和湿度信号来控制。

8. 发明申请

US20090053621A1 Source and Mask Optimization by Changing Intensity and Shape of the Illumination Source 有权
标题翻译：通过改变照明源的强度和形状的源和掩模优化
公开(公告)号：US20090053621A1
公开(公告)日：2009-02-26
申请号：US12186410
申请日：2008-08-05
申请人： Robert Socha
发明人： Robert Socha
IPC分类号： G03F1/00
CPC分类号： G06T7/001 , G03F7/70091 , G03F7/70125 , G03F7/70425 , G03F7/70433 , G03F7/705
摘要： An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. An optimum mask may be determined by changing the magnitude and phase of the diffraction orders to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. Primitive rectangles having a size set to a minimum feature size of a mask maker are assigned to the located minimum and maximum transmission areas ad centered at a desired location. The edges of the primitive rectangle are varied to match optimal diffraction orders O(m,n). The optimal CPL mask OCPL(x,y) is then formed.
摘要翻译：通过改变照射源的强度和形状来优化照明光源，以在图像平面中形成图像，使得在用户选择的碎片点处的最小ILS最大化，同时迫使碎裂点处的强度处于小的强度范围内。可以通过改变衍射级的大小和相位来确定最佳掩模，以在图像平面中形成使用户选择的碎片点处的最小ILS最大化的图像，同时迫使碎裂点处的强度在小的强度范围内。具有设置为掩模制造者的最小特征尺寸的尺寸的原始矩形被分配给位于期望位置的所定位的最小和最大传输区域。改变原始矩形的边缘以匹配最佳衍射阶数O（m，n）。然后形成最佳CPL掩模OCPL（x，y）。

9. 发明申请

US20080043215A1 Optimized polarization illumination 有权
标题翻译：优化极化照明
公开(公告)号：US20080043215A1
公开(公告)日：2008-02-21
申请号：US11907648
申请日：2007-10-16
申请人： Robert Socha , Donis Flagello , Steve Hansen
发明人： Robert Socha , Donis Flagello , Steve Hansen
IPC分类号： G03B27/72
CPC分类号： G03F7/705 , G03F7/70125 , G03F7/70341 , G03F7/70566 , G03F7/70616
摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
摘要翻译：公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。对于照明器上的多个点可以重复这一点。

10. 发明申请

US20130192081A1 LAUNDRY MOISTURE SENSING, CONTROL, DIAGNOSTIC AND METHOD 有权
标题翻译：洗衣水感测，控制，诊断和方法
公开(公告)号：US20130192081A1
公开(公告)日：2013-08-01
申请号：US13361375
申请日：2012-01-30
申请人： Michael J. Zambrowicz , Stephen L. Harris , Robert Socha
发明人： Michael J. Zambrowicz , Stephen L. Harris , Robert Socha
IPC分类号： F26B21/06 , F26B3/00
CPC分类号： D06F58/04 , D06F58/28 , D06F2058/2838 , D06F2058/2883
摘要： A laundry dryer includes a drum. A moisture sensing system detects an average moisture content of launderable items as they are dried within the drum and provides a moisture signal to an electronic controller. A user interface presenting a setpoint selection element such that when a moisture setpoint is selected by a machine operator during a drying cycle, an operational state of the dryer machine is controlled by the electronic controller based on the moisture setpoint and the moisture signal.
摘要翻译：洗衣机包括滚筒。湿度感测系统检测洗涤物品在滚筒内干燥时的平均含水量，并向电子控制器提供湿度信号。一种用户界面，其呈现设定点选择元件，使得当在干燥循环期间机器操作者选择湿度设定点时，干燥机的操作状态由电子控制器基于湿度设定点和湿度信号来控制。

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