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1. 发明授权

US08664594B1 Electron-optical system for high-speed and high-sensitivity inspections 失效
标题翻译：用于高速和高灵敏度检测的电子光学系统
公开(公告)号：US08664594B1
公开(公告)日：2014-03-04
申请号：US13095574
申请日：2011-04-27
申请人： Xinrong Jiang , Liqun Han , Mohammed Tahmassebpur , Salam Harb , John D. Greene
发明人： Xinrong Jiang , Liqun Han , Mohammed Tahmassebpur , Salam Harb , John D. Greene
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/28 , G01N2223/418 , G01N2223/611 , H01J2237/004 , H01J2237/2817
摘要： The present disclosure provides an electron beam column with substantially improved resolution and/or throughput for inspecting manufactured substrates. The electron beam column comprises an electron gun, a scanner, an objective lens, and a detector. In accordance with one embodiment, the electron gun includes a gun lens having a flip-up pole piece configuration. In accordance with another embodiment, the scanner comprises a dual scanner having a pre-scanner and a main scanner, and the detector may be configured between the electron gun and the pre-scanner. In accordance with another embodiment, the electron beam column includes a continuously-variable aperture configured to select a beam current. Other embodiments relate to methods of using an electron beam column for automated inspection of manufactured substrates. In one embodiment, for example, an aperture size is adjusted to achieve a minimum spot size given a selected beam current and a column-condition domain being used.
摘要翻译：本公开提供了一种电子束柱，其具有用于检查制造的基底的显着改善的分辨率和/或通过量。电子束柱包括电子枪，扫描仪，物镜和检测器。根据一个实施例，电子枪包括具有翻转极片构造的枪形透镜。根据另一个实施例，扫描器包括具有预扫描器和主扫描器的双扫描器，并且检测器可以配置在电子枪和预扫描器之间。根据另一实施例，电子束列包括被配置为选择束电流的连续可变孔径。其他实施例涉及使用电子束柱来自动检查制造的基板的方法。在一个实施例中，例如，在给定所选择的束电流和使用列条件域的情况下，调节孔径尺寸以实现最小斑点尺寸。

2. 发明申请

US20110142382A1 Shielding, Particulate Reducing High Vacuum Components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US20110142382A1
公开(公告)日：2011-06-16
申请号：US13034770
申请日：2011-02-25
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： F16C29/00 , B23K31/02 , B32B15/00
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种形成用于电子枪的高真空环境中的闸阀的方法，该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯，并且具有拉伸强度强度为约750兆帕，加工镍铁包层，将芯焊接到包层以形成闸阀，并加工闸阀，以消除芯和包层之间的界面处的任何尺寸差异。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后一部分提供了由镍合金壳提供的场屏蔽，由非磁性合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，该合金具有低氧化速度的优点，所以由于诸如电子束轰击的条件，存在较少的污染物积聚。

3. 发明授权

US08092927B2 Shielding, particulate reducing high vacuum components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US08092927B2
公开(公告)日：2012-01-10
申请号：US13034770
申请日：2011-02-25
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： B32B15/04 , B32B15/18 , F16C29/00 , F16C29/02
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种形成用于电子枪的高真空环境中的闸阀的方法，该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯，并且具有拉伸强度强度为约750兆帕，加工镍铁包层，将芯焊接到包层以形成闸阀，并加工闸阀，以消除芯和包层之间的界面处的任何尺寸差异。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后一部分提供了由镍合金壳提供的场屏蔽，由非磁性合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，该合金具有低氧化速度的优点，所以由于诸如电子束轰击的条件，存在较少的污染物积聚。

4. 发明授权

US07919193B1 Shielding, particulate reducing high vacuum components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US07919193B1
公开(公告)日：2011-04-05
申请号：US11877713
申请日：2007-10-24
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： B32B15/04 , B32B15/18
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A component for use in a high vacuum environment, the component including a core of non-magnetic Hastelloy with a cladding of nickel-iron covering the core at least in part. The component can be, for example, at least one of a gate valve for use in a high vacuum environment of an electron gun, a bearing, a slide way, a gate valve bearing, a rotary slide, a linear slide, an electron beam column, and electron beam chamber, and a vacuum chamber. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic Hastelloy, good vacuum performance, and tight mechanical tolerance control. Also, because Hastelloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种用于高真空环境的部件，该部件包括非磁性哈氏合金的核心，其中镍铁包层至少部分地覆盖芯部。该部件可以是例如用于电子枪的高真空环境中的闸阀中的至少一个，轴承，滑动方式，闸阀轴承，旋转滑块，线性滑块，电子束柱和电子束室，以及真空室。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后部分提供了由镍合金壳提供的场屏蔽，由非磁性哈氏合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，哈氏合金具有低氧化速度的优点，因为诸如电子束轰击的条件，污染物积聚较少。

5. 发明申请

US20120241606A1 MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION 有权
标题翻译：用于高速电子束检测的多光束系统
公开(公告)号：US20120241606A1
公开(公告)日：2012-09-27
申请号：US13095585
申请日：2011-04-27
申请人： Liqun Han , Xinrong Jiang , John D. Greene
发明人： Liqun Han , Xinrong Jiang , John D. Greene
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： G01N23/2251 , G01N2223/102 , G01N2223/611 , H01J37/04 , H01J37/28 , H01J2237/0435 , H01J2237/04926 , H01J2237/1205 , H01J2237/15 , H01J2237/2446
摘要： One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。另外，被配置为检测单个二次电子束的检测系统。所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。还公开了其它特征和实施例。

6. 发明授权

US08362425B2 Multiple-beam system for high-speed electron-beam inspection 有权
标题翻译：用于高速电子束检测的多光束系统
公开(公告)号：US08362425B2
公开(公告)日：2013-01-29
申请号：US13095585
申请日：2011-04-27
申请人： Liqun Han , Xinrong Jiang , John D. Greene
发明人： Liqun Han , Xinrong Jiang , John D. Greene
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： G01N23/2251 , G01N2223/102 , G01N2223/611 , H01J37/04 , H01J37/28 , H01J2237/0435 , H01J2237/04926 , H01J2237/1205 , H01J2237/15 , H01J2237/2446
摘要： One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。另外，被配置为检测单个二次电子束的检测系统。所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。还公开了其它特征和实施例。

7. 发明授权

US08461526B2 Electron beam column and methods of using same 有权
标题翻译：电子束柱及其使用方法
公开(公告)号：US08461526B2
公开(公告)日：2013-06-11
申请号：US12958174
申请日：2010-12-01
申请人： Marian Mankos , Liqun Han , Xinrong Jiang , Rex Runyon , Carmela Moreno
发明人： Marian Mankos , Liqun Han , Xinrong Jiang , Rex Runyon , Carmela Moreno
IPC分类号： G01N23/00
CPC分类号： H01J37/04 , H01J2237/0458 , H01J2237/0492 , H01J2237/063 , H01J2237/1035 , H01J2237/14 , H01J2237/186 , H01J2237/24535
摘要： In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.
摘要翻译：在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。发射电子的源被定位在第一真空室内。光束限制孔被配置成通过发射电子的有限角度范围。磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。可控制偏转器被配置为在衬底表面的区域上扫描束斑。还公开了其它特征和实施例。

8. 发明授权

US07821187B1 Immersion gun equipped electron beam column 有权
标题翻译：沉枪配电子束柱
公开(公告)号：US07821187B1
公开(公告)日：2010-10-26
申请号：US12204841
申请日：2008-09-05
申请人： Xinrong Jiang , Marian Mankos , Liqun Han
发明人： Xinrong Jiang , Marian Mankos , Liqun Han
IPC分类号： H01J27/02
CPC分类号： H01J37/063 , H01J37/145
摘要： An electron gun of the type having an electron emitter for emitting electrons, including an electrostatic lens and a magnetic lens formed by pole pieces with a winding coil disposed between the magnetic pole pieces. The magnetic lens forms a rotationally symmetrical magnetic field in a gap formed by the pole pieces. The magnetic field forms the magnetic lens and focuses the electrons emitted from the emitter. A vacuum tube separates the electron gun from the magnetic lens. The electron gun is sealed in a vacuum by the vacuum tube and the magnetic lens is shielded in air.
摘要翻译：一种具有用于发射电子的电子发射器的电子枪，包括静电透镜和由极片形成的磁性透镜，该磁极具有设置在磁极片之间的绕组线圈。磁性透镜在由极片形成的间隙中形成旋转对称的磁场。磁场形成磁透镜并聚焦从发射器发射的电子。真空管将电子枪与磁性透镜分开。电子枪由真空管密封在真空中，磁性透镜在空气中被屏蔽。

9. 发明授权

US09053900B2 Apparatus and methods for high-resolution electron beam imaging 有权
标题翻译：用于高分辨率电子束成像的装置和方法
公开(公告)号：US09053900B2
公开(公告)日：2015-06-09
申请号：US13438543
申请日：2012-04-03
申请人： Xinrong Jiang , Liqun Han
发明人： Xinrong Jiang , Liqun Han
IPC分类号： G21K5/04 , H01J37/153 , H01J37/05 , H01J37/28
CPC分类号： H01J37/153 , H01J37/05 , H01J37/28 , H01J2237/1534
摘要： One embodiment relates to an apparatus for high-resolution electron beam imaging. The apparatus includes an energy filter configured to limit an energy spread of the electrons in the incident electron beam. The energy filter may be formed using a stigmatic Wien filter and a filter aperture. Another embodiment relates to a method of forming an incident electron beam for a high-resolution electron beam apparatus. Another embodiment relates to a stigmatic Wien filter that includes curved conductive electrodes. Another embodiment relates to a stigmatic Wien filter that includes a pair of magnetic yokes and a multipole deflector. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及用于高分辨率电子束成像的装置。该装置包括被配置为限制入射电子束中的电子的能量扩散的能量过滤器。能量滤波器可以使用固定的维恩滤波器和滤波器孔来形成。另一实施例涉及形成用于高分辨率电子束装置的入射电子束的方法。另一实施例涉及一种包括弯曲导电电极的标准维恩滤波器。另一实施例涉及一种包括一对磁轭和多极偏转器的标准维恩滤波器。还公开了其它实施例，方面和特征。

10. 发明授权

US08859982B2 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents 有权
标题翻译：双透镜枪电子束装置和用于高分辨率成像和高光束和低光束电流的方法
公开(公告)号：US08859982B2
公开(公告)日：2014-10-14
申请号：US13618760
申请日：2012-09-14
申请人： Xinrong Jiang , Liqun Han
发明人： Xinrong Jiang , Liqun Han
IPC分类号： H01J37/14
CPC分类号： H01J37/063 , H01J3/029 , H01J3/08 , H01J37/09 , H01J2237/0458 , H01J2237/30472
摘要： One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及一种电子束装置，其包括用于发射电子束的双透镜电子枪。电子束是第一操作模式中的高束流电子束和处于第二操作模式的低束流电子束。该装置还包括在第一操作模式中超出远光束电子束的路径的列孔径，并且在第二操作模式中围绕电子束装置的光轴居中。另一个实施例涉及一种电子枪，其包括第一枪形透镜，光束限制孔和第二枪形透镜。第一个枪形透镜在电子穿过光束限制孔径之前聚焦电子，而第二个枪形透镜在电子通过光束限制孔径后聚焦电子。还公开了其它实施例，方面和特征。

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