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    • 3. 发明申请
    • Liquid Precursor for Depositing Group 4 Metal Containing Films
    • 用于沉积第4组含金属膜的液体前体
    • US20110135838A1
    • 2011-06-09
    • US12950352
    • 2010-11-19
    • Xinjian LeiJohn Anthony Thomas NormanDaniel P. Spence
    • Xinjian LeiJohn Anthony Thomas NormanDaniel P. Spence
    • C23C16/30C07F7/28C23C16/44C23C16/50C23C16/48C23C16/56
    • C07F17/00C07F7/003
    • The present invention is related to a family of liquid group 4 precursors represented by the formula: (pyr*)M(OR1)(OR2)(OR3) wherein pyr* is an alkyl substituted pyrrolyl, wherein M is group 4 metals include Ti, Zr, and Hf; wherein R1-3 can be same or different and selected from group consisting of linear or branched C1-6 alkyls; preferably C1-3 alkyls; R4 is selected from the group consisting of C1-6 alkyls, preferably branched C3-5 alkyls substituted at 2, 5 positions to prevent the pyrrolyl coordinated to the metal center in η1 fashion; n=2, 3, 4. Most preferably the invention is directed to (2,5-di-tert-butylpyrrolyl)(tris(ethoxy)titanium, (2,5-di-tert-amylpyrrolyl)(tris(ethoxy)titanium, and (2,5-di-tert-amylpyrrolyl)(tris(iso-propoxy)titanium. The invention is also directed to (cyclopentadienyl)(2,5-di-methylpyrrolyl)(bis(ethoxy))titanium. Deposition methods using these compounds are also contemplated.
    • 本发明涉及一种由式(pyr *)M(OR1)(OR2)(OR3)表示的液体组4前体,其中pyr *是烷基取代的吡咯基,其中M是第4族金属包括Ti, Zr和Hf; 其中R1-3可以相同或不同,并且选自直链或支链C 1-6烷基; 优选C 1-3烷基; R 4选自C 1-6烷基,优选在2,5位取代的支链C 3-5烷基,以防止以“1”方式与金属中心配位的吡咯基; 最优选本发明涉及(2,5-二叔丁基吡咯基)(三(乙氧基)钛,(2,5-二叔戊基吡咯基)(三(乙氧基)钛 本发明还涉及(环戊二烯基)(2,5-二甲基吡咯基)(双(乙氧基))钛。沉积方法 也考虑使用这些化合物。
    • 6. 发明授权
    • Liquid precursor for depositing group 4 metal containing films
    • 用于沉积第4组含金属膜的液体前体
    • US08592606B2
    • 2013-11-26
    • US12950352
    • 2010-11-19
    • Xinjian LeiJohn Anthony Thomas NormanDaniel P. Spence
    • Xinjian LeiJohn Anthony Thomas NormanDaniel P. Spence
    • C07F7/00C07F7/28C23C16/00
    • C07F17/00C07F7/003
    • The present invention is related to a family of liquid group 4 precursors represented by the formula: (pyr*)M(OR1)(OR2)(OR3) wherein pyr* is an alkyl substituted pyrrolyl, wherein M is group 4 metals include Ti, Zr, and Hf; wherein R1-3 can be same or different and selected from group consisting of linear or branched C1-6 alkyls; preferably C1-3 alkyls; R4 is selected from the group consisting of C1-6 alkyls, preferably branched C3-5 alkyls substituted at 2, 5 positions to prevent the pyrrolyl coordinated to the metal center in η1 fashion; n=2, 3, 4. Most preferably the invention is directed to (2,5-di-tert-butylpyrrolyl)(tris(ethoxy)titanium, (2,5-di-tert-amylpyrrolyl)(tris(ethoxy)titanium, and (2,5-di-tert-amylpyrrolyl)(tris(iso-propoxy)titanium. The invention is also directed to (cyclopentadienyl)(2,5-di-methylpyrrolyl)(bis(ethoxy))titanium. Deposition methods using these compounds are also contemplated.
    • 本发明涉及一种由式(pyr *)M(OR1)(OR2)(OR3)表示的液体组4前体,其中pyr *是烷基取代的吡咯基,其中M是第4族金属包括Ti, Zr和Hf; 其中R1-3可以相同或不同,并且选自直链或支链C 1-6烷基; 优选C 1-3烷基; R4选自C1-6烷基,优选在2,5位取代的支链C3-5烷基,以防止以eta1方式与金属中心配位的吡咯啉; 最优选本发明涉及(2,5-二叔丁基吡咯基)(三(乙氧基)钛,(2,5-二叔戊基吡咯基)(三(乙氧基)钛 本发明还涉及(环戊二烯基)(2,5-二甲基吡咯基)(双(乙氧基))钛。沉积方法 也考虑使用这些化合物。