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    • 3. 发明授权
    • TFT-LCD array substrate and manufacturing method thereof
    • TFT-LCD阵列基板及其制造方法
    • US08441592B2
    • 2013-05-14
    • US12886894
    • 2010-09-21
    • Weifeng ZhouZhenyu XieJian GuoXing MingXin Zhao
    • Weifeng ZhouZhenyu XieJian GuoXing MingXin Zhao
    • G02F1/136G02F1/1333
    • G02F1/136227G02F1/136286G02F2001/136236H01L27/124H01L27/1248H01L27/1288
    • A method of manufacturing a thin film transistor liquid crystal display (TFT-LCD) array substrate comprises: forming a gate line and a gate electrode on a base substrate, and then depositing a gate insulating layer on the base substrate; forming an active layer, a data line, a source electrode, and a drain electrode on the gate insulating layer, and removing the gate insulating layer in the region other than the regions of the active layer, the data line, the source electrode and the drain electrode; forming a first via hole, a second via hole and a third via hole in a photoresist layer by an exposing and developing process; and forming a pixel electrode, a first connection electrode and a second connection electrode on the photosensitive resin layer. The pixel electrode is connected with the drain electrode through the third via hole.
    • 制造薄膜晶体管液晶显示器(TFT-LCD)阵列基板的方法包括:在基底基板上形成栅极线和栅电极,然后在基底基板上沉积栅极绝缘层; 在所述栅极绝缘层上形成有源层,数据线,源电极和漏电极,并且除去所述有源层,所述数据线,所述源极和所述源极之外的区域中的所述栅极绝缘层 漏电极 通过曝光和显影工艺在光致抗蚀剂层中形成第一通孔,第二通孔和第三通孔; 在感光性树脂层上形成像素电极,第一连接电极和第二连接电极。 像素电极通过第三通孔与漏电极连接。