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1. 发明申请

US20040145292A1 Radiation source with high average EUV radiation output 有权
公开(公告)号：US20040145292A1
公开(公告)日：2004-07-29
申请号：US10741882
申请日：2003-12-19
申请人： XTREME technologies GmbH
发明人： Imtiaz Ahmad , Juergen Kleinschmidt , Guido Schriever , Uwe Stamm , Sven Goetze
IPC分类号： H01J017/26
CPC分类号： H05G2/003
摘要： The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge. The object of the invention, to find a novel possibility for the realization of an EUV radiation source which achieves a high average radiation output in the EUV region and sufficiently long life and long-term stability, is met according to the invention in that a first electrode housing and a second electrode housing which are electrically separated from one another so as to be resistant to breakdown form parts of a vacuum chamber for a gas discharge for plasma generation, and the second electrode housing has an electrode collar which is enclosed concentrically by the first electrode housing so that the gas discharge is oriented substantially only parallel to the axis of symmetry of the electrode housings, and the electrode collar is stepped radially relative to the concentric insulator layer in such a way that at least one end region of the electrode collar is at a distance from the concentric insulator layer such that a concentric gap is formed. A substantially longer operating duration is achieved by the optimized electrode geometry in conjunction with material selection and effective heat dissipation.

2. 发明申请

US20030190012A1 Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma 有权
标题翻译：基于热等离子体的辐射发生抑制粒子发射的布置
公开(公告)号：US20030190012A1
公开(公告)日：2003-10-09
申请号：US10407394
申请日：2003-04-04
申请人： XTREME technologies GmbH
发明人： Imtiaz Ahmad
IPC分类号： H05H001/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation sources. The object of the invention, to find a novel possibility for debris filtering in plasma-coupled radiation sources which permits a reliable retention of charged and uncharged particles without substantially reducing transmission or limiting the usable solid angle of radiation, is met, according to the invention, by an arrangement for the suppression of particle emission with generation of radiation based on a hot plasma having a vacuum chamber for generating the plasma in that the outlet opening of the vacuum chamber is followed by means for generating an electric field, wherein the electric field is oriented orthogonal to the central propagation direction of a divergent beam bundle exiting in a defined solid angle, and means for generating a gas sink so that a resulting particle flow is oriented parallel to the direction of the electric field. The particle flow is advantageously further reinforced in the direction of the gas sink by an oppositely arranged gas supply device.
摘要翻译：本发明涉及一种用于抑制在基于X射线辐射源（特别是EUV辐射源）中的热等离子体产生辐射中的颗粒发射的装置。本发明的目的是为了在等离子体耦合辐射源中发现碎片过滤的新颖可能性，其允许可靠地保持带电和不带电的粒子，而不会基本上减少透射或限制辐射的可用立体角，根据本发明通过基于具有用于产生等离子体的真空室的热等离子体产生辐射来抑制颗粒发射的布置，因为真空室的出口紧随其后的是产生电场的装置，其中电场定向成垂直于以限定的立体角度出射的发散束束的中心传播方向，以及用于产生气体吸收器的装置，使得所得到的颗粒流平行于电场的方向定向。颗粒流有利地通过相对布置的气体供应装置在气槽的方向上进一步增强。

3. 发明申请

US20030068012A1 Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge 有权
标题翻译：基于气体放电产生极紫外（EUV）辐射的装置
公开(公告)号：US20030068012A1
公开(公告)日：2003-04-10
申请号：US10267373
申请日：2002-10-09
申请人： XTREME technologies GmbH;
发明人： Imtiaz Ahmad , Guido Schriever , Juergen Kleinschmidt
IPC分类号： H05H001/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles. The preionization discharge is triggered within a first electrode housing and the main discharge takes place between a narrowed output of the first electrode housing and a part of the second electrode housing close to the outlet opening of the discharge chamber. The plasma develops in a part of the second electrode housing covered by a tubular insulator and, as a result of the current-induced magnetic field, contracts to form a dense, hot plasma column, one end of which is located in the vicinity of the outlet opening of the second electrode housing.
摘要翻译：本发明涉及一种基于气体放电产生极紫外（EUV）辐射，即在11至14nm波长范围内的高能量光子辐射的方法和装置。本发明的目的是为了发现产生EUV辐射的新型可能性，其中通过稳定产生致密的热等离子体柱来实现系统的延长的使用寿命，根据本发明，可以在两个平行的盘形平面电极，在主要放电之前，沿着具有脉冲直流电压的气体放电产生的等离子体柱沿着圆柱形绝缘体的表面放电进行表面放电，该前置放电执行工作气体的离子化放电室通过快速带电粒子。预除电放电在第一电极壳体内触发，并且主放电发生在第一电极壳体的变窄的输出端和靠近放电室的出口的第二电极壳体的一部分之间。等离子体在由管状绝缘体覆盖的第二电极壳体的一部分中产生，并且由于电流感应磁场的结果而收缩以形成致密的热等离子体柱，其一端位于第二电极壳体的出口开口。

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