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1. 发明申请

US20030198263A1 Method for energy control of pulsed driven, gas discharged-coupled beam sources 有权
标题翻译：脉冲驱动，气体放电耦合光束源的能量控制方法
公开(公告)号：US20030198263A1
公开(公告)日：2003-10-23
申请号：US10360067
申请日：2003-02-07
申请人： XTREME technologies GmbH
发明人： Juergen Kleinschmidt
IPC分类号： H01S003/10
CPC分类号： H01S3/134 , H01S3/225 , H01S3/2258
摘要： The invention is directed to a method for energy regulation of pulsed-operation gas discharge-coupled radiation sources, particularly of excimer lasers, F2 lasers and EUV radiation sources. The object of the invention is to find a novel possibility for energy regulation of pulsed-operation gas discharge-coupled radiation sources which permits a control of the charging voltage while taking into account the aging of gas discharge components (particularly of the work gas) without recalibration of the system. This object is met in that the pulse energy is measured for each individual pulse, at least the charging voltage is detected as influencing variable on the pulse energy for each individual pulse, the error of the current pulse energy is determined for that pulse in relation to a predetermined target value of the pulse energy, the set energy Es, the mean square deviation from the set energy is calculated by time-average over a large quantity of pulses, and the pulse energy is controlled for every pulse by a proportional regulation of the charging voltage, wherein the proportional regulation is carried out with an adapted regulating factor which is determined by minimizing the mean square deviation of the current pulse energy.
摘要翻译：本发明涉及一种用于脉冲操作气体放电耦合辐射源，特别是准分子激光器，F2激光器和EUV辐射源的能量调节方法。本发明的目的是找到一种新颖的脉冲操作气体放电耦合辐射源的能量调节的可能性，其允许控制充电电压，同时考虑到气体放电部件（特别是工作气体）的老化而没有重新校准系统。满足这个目的在于针对每个单个脉冲测量脉冲能量，至少将充电电压检测为对于每个脉冲对脉冲能量的影响变量，确定当前脉冲能量的误差相对于脉冲能量的预定目标值，设定能量Es，与设定能量的均方偏差通过大量脉冲的时间平均来计算，并且脉冲能量通过比例调节充电电压，其中所述比例调节是通过使当前脉冲能量的均方差最小来确定的适应调节因子进行的。

2. 发明申请

US20030178566A1 Detector arrangement for energy measurement of pulsed x-ray radiation 有权
标题翻译：用于脉冲X射线辐射能量测量的检测器布置
公开(公告)号：US20030178566A1
公开(公告)日：2003-09-25
申请号：US10393930
申请日：2003-03-20
申请人： XTREME technologies GmbH
发明人： Guido Schriever , Juergen Kleinschmidt
IPC分类号： G01T001/00
CPC分类号： G01T1/185 , G01T1/29
摘要： The invention is directed to a detector arrangement for energy measurement of pulsed x-ray radiation, particularly for monitoring the energy emitted by pulsed EUV radiation sources. The object of the invention, to find a novel possibility for energy measurement of high-energy x-ray radiation or EUV radiation which permits an accurate monitoring of the radiation dose over the entire life of the radiation source without continual calibration of the radiation detectors, is met according to the invention in that a closed vessel is provided which has an inlet opening for the radiation to be detected, is filled with a suitable gas under defined pressure for absorbing the radiation and has a linear extension, at least in the direction of incidence of the radiation, which is adapted to the absorption behavior of the gas so that the radiation to be detected is absorbed before it can reach a wall of the vessel, and at least one pressure sensor is arranged in the vessel for measuring a pressure wave generated due to the local temperature change occurring as a result of temporary intensive radiation absorption.
摘要翻译：本发明涉及用于脉冲X射线辐射能量测量的检测器装置，特别是用于监测由脉冲EUV辐射源发射的能量。本发明的目的是为了找到能量测量高能X射线辐射或EUV辐射的新颖可能性，其允许在辐射源的整个寿命期内对辐射剂量的精确监测，而不必对辐射探测器进行持续校准，根据本发明满足的是，提供了一个封闭的容器，其具有用于待检测的辐射的入口，在限定的压力下填充合适的气体以吸收辐射并具有线性延伸，至少在辐射的入射率适合于气体的吸收行为，使得待检测的辐射在其可以到达容器的壁之前被吸收，并且至少一个压力传感器布置在容器中用于测量压力波由于临时强烈的辐射吸收而导致局部温度变化而产生。

3. 发明申请

US20030201737A1 Method for the stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation 有权
标题翻译：用于在脉冲操作中稳定气体放电耦合辐射源的辐射输出的方法
公开(公告)号：US20030201737A1
公开(公告)日：2003-10-30
申请号：US10425301
申请日：2003-04-29
申请人： XTREME technologies GmbH
发明人： Juergen Kleinschmidt
IPC分类号： H05B039/04
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70041 , H05B41/34
摘要： A method is disclosed for stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation, particularly of an EUV source based on a gas discharge. The object of the disclosed invention is to find a novel possibility for stabilizing the radiation output of a gas discharge-coupled radiation source in pulsed operation which allows the pulse energy to be regulated on the basis of pulse energy fluctuations of the radiation emission detected through measurements without requiring regular calibration measurements of the E(U) curve in the stationary operating regime with continuous pulse sequences. According to the invention, this object is met in that continuous measurements of the pulse energy and at least one influencing variable are carried out for every radiation pulse of the EUV source, time averages of the pulse energy and influencing variable are formed, and the deviation of the actual measurement values from the average values are determined, so that a proportionality factor dE/dU determined by statistical analysis is available for PI regulation in the operating point of the averaged pulse energy.
摘要翻译：公开了一种用于在脉冲操作中稳定气体放电耦合辐射源的辐射输出的方法，特别是基于气体放电的EUV源。所公开的发明的目的是找到在脉冲操作中稳定气体放电耦合辐射源的辐射输出的新颖可能性，其允许基于通过测量检测到的辐射发射的脉冲能量波动来调节脉冲能量而不需要在具有连续脉冲序列的固定操作状态下对E（U）曲线进行常规校准测量。根据本发明，满足这个目的在于对EUV源的每个辐射脉冲执行脉冲能量和至少一个影响变量的连续测量，形成脉冲能量和影响变量的时间平均值，并且偏差确定来自平均值的实际测量值，使得通过统计分析确定的比例因子dE / dU可用于平均脉冲能量的操作点中的PI调节。

4. 发明申请

US20030068012A1 Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge 有权
标题翻译：基于气体放电产生极紫外（EUV）辐射的装置
公开(公告)号：US20030068012A1
公开(公告)日：2003-04-10
申请号：US10267373
申请日：2002-10-09
申请人： XTREME technologies GmbH;
发明人： Imtiaz Ahmad , Guido Schriever , Juergen Kleinschmidt
IPC分类号： H05H001/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles. The preionization discharge is triggered within a first electrode housing and the main discharge takes place between a narrowed output of the first electrode housing and a part of the second electrode housing close to the outlet opening of the discharge chamber. The plasma develops in a part of the second electrode housing covered by a tubular insulator and, as a result of the current-induced magnetic field, contracts to form a dense, hot plasma column, one end of which is located in the vicinity of the outlet opening of the second electrode housing.
摘要翻译：本发明涉及一种基于气体放电产生极紫外（EUV）辐射，即在11至14nm波长范围内的高能量光子辐射的方法和装置。本发明的目的是为了发现产生EUV辐射的新型可能性，其中通过稳定产生致密的热等离子体柱来实现系统的延长的使用寿命，根据本发明，可以在两个平行的盘形平面电极，在主要放电之前，沿着具有脉冲直流电压的气体放电产生的等离子体柱沿着圆柱形绝缘体的表面放电进行表面放电，该前置放电执行工作气体的离子化放电室通过快速带电粒子。预除电放电在第一电极壳体内触发，并且主放电发生在第一电极壳体的变窄的输出端和靠近放电室的出口的第二电极壳体的一部分之间。等离子体在由管状绝缘体覆盖的第二电极壳体的一部分中产生，并且由于电流感应磁场的结果而收缩以形成致密的热等离子体柱，其一端位于第二电极壳体的出口开口。

5. 发明申请

US20040145292A1 Radiation source with high average EUV radiation output 有权
公开(公告)号：US20040145292A1
公开(公告)日：2004-07-29
申请号：US10741882
申请日：2003-12-19
申请人： XTREME technologies GmbH
发明人： Imtiaz Ahmad , Juergen Kleinschmidt , Guido Schriever , Uwe Stamm , Sven Goetze
IPC分类号： H01J017/26
CPC分类号： H05G2/003
摘要： The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge. The object of the invention, to find a novel possibility for the realization of an EUV radiation source which achieves a high average radiation output in the EUV region and sufficiently long life and long-term stability, is met according to the invention in that a first electrode housing and a second electrode housing which are electrically separated from one another so as to be resistant to breakdown form parts of a vacuum chamber for a gas discharge for plasma generation, and the second electrode housing has an electrode collar which is enclosed concentrically by the first electrode housing so that the gas discharge is oriented substantially only parallel to the axis of symmetry of the electrode housings, and the electrode collar is stepped radially relative to the concentric insulator layer in such a way that at least one end region of the electrode collar is at a distance from the concentric insulator layer such that a concentric gap is formed. A substantially longer operating duration is achieved by the optimized electrode geometry in conjunction with material selection and effective heat dissipation.

6. 发明申请

US20030161362A1 Method for energy stabilization of gas discharged pumped in selected impulse following driven beam sources 有权
标题翻译：在驱动光束源之后以选定的脉冲泵送的气体的能量稳定化方法
公开(公告)号：US20030161362A1
公开(公告)日：2003-08-28
申请号：US10360372
申请日：2003-02-07
申请人： XTREME technologies GmbH
发明人： Juergen Kleinschmidt
IPC分类号： H01S003/10 , H01S003/13 , H01S003/22 , H01S003/223
CPC分类号： H01S3/09705 , H01S3/225
摘要： The invention is directed to a method for the energy stabilization of a gas discharge-pumped radiation source that is operated in defined pulse sequences, particularly for suppression of overshooting and undershooting of excimer lasers and EUV radiation sources in burst operation. It is the object of the invention to find a novel possibility for the stabilization of the energy emission of a gas discharge-pumped radiation source that is operated in defined pulse sequences (bursts) which makes it possible to take into account a temporary behavior of the radiation source at the beginning of every burst without repeated recalibration of the energy-voltage curve. In a method with proportional regulation of the charging voltage as a function of the measured pulse energy, the object stated above is met according to the invention in that the pulse energy En(p) to be adjusted for a current pulse in the current burst is calculated from the pulse energy of the preceding pulse in the current burst and an identical pulse En(pnull1) of a preceding precursor burst, wherein the precursor burst is an unregulated model burst and the high voltage which is to be adjusted currently for the current pulse is calculated from the current pulse energy En(p) by dividing by the rise dE/dU of the function of the pulse energy depending on the charging voltage in the linear operating range of the radiation source.
摘要翻译：本发明涉及一种用于以限定的脉冲序列操作的气体放电泵浦辐射源的能量稳定的方法，特别是用于在突发操作中抑制准分子激光器和EUV辐射源的过冲和下冲。本发明的目的是找到一种新颖的可能性，用于稳定以限定的脉冲序列（脉冲串）操作的气体放电泵浦辐射源的能量发射，这使得有可能考虑到辐射源在每次突发开始时不会重复重新校准能量 - 电压曲线。在根据本发明的充电电压成比例调节方法中，根据本发明满足上述目的，因为针对当前脉冲中的电流脉冲要调节的脉冲能量En（p）是根据当前脉冲串中先前脉冲的脉冲能量和前一个前置脉冲串的相同脉冲En（p-1）计算，其中前兆脉冲串是未调节的模型脉冲串，并且当前要调整的高电压根据辐射源的线性工作范围内的充电电压除以脉冲能量的函数的上升dE / dU，根据当前脉冲能量En（p）计算电流脉冲。

7. 发明申请

US20030146391A1 Arrangement for monitoring the energy radiated by an EUV radiation source 有权
标题翻译：用于监测由EUV辐射源辐射的能量的安排
公开(公告)号：US20030146391A1
公开(公告)日：2003-08-07
申请号：US10357899
申请日：2003-02-04
申请人： XTREME technologies GmbH
发明人： Juergen Kleinschmidt , Uwe Stamm
IPC分类号： G01J001/42
CPC分类号： G21K1/10 , G01J1/429 , G03F7/70558 , G03F7/7085
摘要： The invention is directed to an arrangement for monitoring the energy radiated by an EUV radiation source with respect to energy variations acting in an illumination beam path, particularly for controlling the dose stability in EUV lithography for chip fabrication in semiconductor technology. The object of the invention, to find a novel possibility for detecting variations in the radiation emitted by EUV sources which allows fluctuations in pulse energy as well as spatial fluctuations acting in the illumination beam path to be detected, is met according to the invention in a radiation source having a plasma column emitting extreme ultraviolet radiation in that a detection beam path is separated from the illumination beam path with respect to the plasma column and has an energy monitoring unit for measuring pulse energy, so that the illumination beam path is not impaired by the energy measurement, and the detection beam path is matched to the illumination beam path with respect to bundle extension and optical losses.
摘要翻译：本发明涉及一种用于监测由EUV辐射源辐射的能量相对于在照明光束路径中作用的能量变化的装置，特别是用于控制用于半导体技术中的芯片制造的EUV光刻中的剂量稳定性。本发明的目的是为了发现一种用于检测由EUV源发射的辐射的变化的新型可能性，其允许脉冲能量的波动以及在待检测的照明光束路径中作用的空间波动，根据本发明，在辐射源具有发射极紫外辐射的等离子体柱，因为检测光束路径相对于等离子体柱与照明光束路径分离，并且具有用于测量脉冲能量的能量监视单元，使得照明光束路径不受能量测量和检测光束路径相对于束延伸和光损耗与照明光束路径匹配。

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