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    • 4. 发明授权
    • Display substrate and method of manufacturing the same
    • 显示基板及其制造方法
    • US08922730B2
    • 2014-12-30
    • US13597040
    • 2012-08-28
    • In-Woo Kim
    • In-Woo Kim
    • G02F1/1368G02F1/1343G02F1/1362
    • G02F1/136209G02F1/136213G02F2001/136222
    • A thin film transistor substrate includes a plurality of gate lines, a plurality of data lines, a first and a second thin film transistor being electrically connected with a first pixel and a second pixel, respectively. The first and the second pixels are located on a first and a second side with respect to one of the plurality of gate lines, respectively. The first and the second thin film transistors are located on a first and a second side with respect to one of the plurality of data lines, respectively. The one of the plurality of data lines extends substantially perpendicular to the gate line. The one of the plurality of data lines includes line portions between gate lines adjacent to each other and bent portions circumventing the first and second gate electrodes so as not to overlap with the first and second gate electrodes.
    • 薄膜晶体管基板包括多条栅极线,多条数据线,分别与第一像素和第二像素电连接的第一和第二薄膜晶体管。 第一和第二像素分别相对于多条栅极线之一位于第一和第二侧上。 第一和第二薄膜晶体管分别相对于多条数据线之一位于第一和第二侧。 多条数据线之一基本上垂直于栅极线延伸。 多个数据线之一包括彼此相邻的栅极线之间的线部分和围绕第一和第二栅极的弯曲部分,以便不与第一和第二栅电极重叠。
    • 5. 发明申请
    • DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    • 显示基板及其制造方法
    • US20120319119A1
    • 2012-12-20
    • US13597040
    • 2012-08-28
    • In-Woo Kim
    • In-Woo Kim
    • H01L29/786
    • G02F1/136209G02F1/136213G02F2001/136222
    • A display substrate in accordance with one or more embodiments includes a first line pattern, a first insulation layer, a second line pattern, a color filter layer and a pixel electrode, which are formed on a substrate. The first line pattern includes a gate line and a light-blocking layer. The light-blocking layer has a first opening portion formed in a storage capacitor region. The first insulation layer is formed on the substrate having the first line pattern. The second line pattern is formed on the first insulation layer. The color filter layer is formed on the substrate having the second line pattern, and has a second opening portion overlapping with the storage electrode. The pixel electrode is formed on the substrate having the color filter layer. Thus, short circuits between the storage electrode and the pixel electrode may be prevented.
    • 根据一个或多个实施例的显示基板包括形成在基板上的第一线图案,第一绝缘层,第二线图案,滤色器层和像素电极。 第一线图案包括栅极线和遮光层。 遮光层具有形成在保持电容器区域中的第一开口部。 第一绝缘层形成在具有第一线图案的基板上。 第二线图案形成在第一绝缘层上。 滤色器层形成在具有第二线图案的基板上,并且具有与存储电极重叠的第二开口部分。 像素电极形成在具有滤色器层的基板上。 因此,可以防止存储电极和像素电极之间的短路。
    • 6. 发明授权
    • Display substrate and method of manufacturing the same
    • 显示基板及其制造方法
    • US08259244B2
    • 2012-09-04
    • US12187078
    • 2008-08-06
    • In-Woo Kim
    • In-Woo Kim
    • G02F1/1368G02F1/1343
    • G02F1/136209G02F1/136213G02F2001/136222
    • A display substrate in accordance with one or more embodiments includes a first line pattern, a first insulation layer, a second line pattern, a color filter layer and a pixel electrode, which are formed on a substrate. The first line pattern includes a gate line and a light-blocking layer. The light-blocking layer has a first opening portion formed in a storage capacitor region. The first insulation layer is formed on the substrate having the first line pattern. The second line pattern is formed on the first insulation layer. The color filter layer is formed on the substrate having the second line pattern, and has a second opening portion overlapping with the storage electrode. The pixel electrode is formed on the substrate having the color filter layer. Thus, short circuits between the storage electrode and the pixel electrode may be prevented.
    • 根据一个或多个实施例的显示基板包括形成在基板上的第一线图案,第一绝缘层,第二线图案,滤色器层和像素电极。 第一线图案包括栅极线和遮光层。 遮光层具有形成在保持电容器区域中的第一开口部。 第一绝缘层形成在具有第一线图案的基板上。 第二线图案形成在第一绝缘层上。 滤色器层形成在具有第二线图案的基板上,并且具有与存储电极重叠的第二开口部分。 像素电极形成在具有滤色器层的基板上。 因此,可以防止存储电极和像素电极之间的短路。
    • 9. 发明申请
    • Mask for manufacturing a display substrate capable of improving image quality
    • 用于制造能够提高图像质量的显示基板的掩模
    • US20070026586A1
    • 2007-02-01
    • US11494085
    • 2006-07-26
    • Hyuk-Jin KimMin-Wook ParkIn-Woo Kim
    • Hyuk-Jin KimMin-Wook ParkIn-Woo Kim
    • H01L21/84
    • H01L27/1288G02F2001/13625G03F1/00G03F7/0007G03F7/70791H01L27/1214
    • A mask for forming a display substrate capable of improving color reproducibility by avoiding color spots and color shifts is presented. The mask includes a first sub-mask, a second sub-mask, a first overlapping portion and a second overlapping portion. The first sub-mask includes color reticles to form color pixels in a first active region of a display substrate. The second sub-mask includes color reticles to form color pixels in a second active region of the display substrate. The first overlapping portion is on a portion of the first sub-mask that overlaps the second sub-mask. The color reticles in the first overlapping portion are arranged at a different density from the rest of the first sub-mask. The second overlapping portion is on a portion of the second sub-mask that overlaps the first sub-mask. The color reticles in the second overlapping portion are arranged at a substantially same density as the first overlapping portion. Therefore, image display quality is improved.
    • 提出了一种用于形成能够通过避免颜色斑点和颜色偏移而改善颜色再现性的显示基板的掩模。 掩模包括第一子掩模,第二子掩模,第一重叠部分和第二重叠部分。 第一子掩模包括在显示基板的第一有源区域中形成彩色像素的彩色掩模版。 第二子掩模包括在显示基板的第二有源区域中形成彩色像素的色标线。 第一重叠部分在与第二子掩模重叠的第一子掩模的一部分上。 第一重叠部分中的着色掩模版布置成与第一子掩模的其余部分不同的密度。 第二重叠部分在与第一子掩模重叠的第二子掩模的一部分上。 第二重叠部分中的着色掩模版以与第一重叠部分基本相同的密度排列。 因此,图像显示质量得到改善。