会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明授权
    • Method for the preparation of relief structures
    • 浮雕结构的制备方法
    • US3957512A
    • 1976-05-18
    • US444552
    • 1974-02-21
    • Wolfgang KleebergRoland RubnerWieland Bartel
    • Wolfgang KleebergRoland RubnerWieland Bartel
    • C07C255/34C08F290/00C08F299/00C08G18/67C08G73/00C08G73/10G03F7/004G03F7/038G03C1/68G03C5/00
    • C07C255/00G03F7/0387
    • Novel cyclic monomers leaving two functional groups capable of undergoing condensation reactions to form amide, urea or urethane linkages and at least one photo or radiation-reactive group are condensed with cyclic comonomers to form a soluble, substantially-linear condensation pre-polymer. A solution of the prepolymer is applied to a substrate and the solution is evaporated off to form a film or foil. The photo or radiation-sensitive layer or foil is exposed or irradiated through a pattern, the unexposed or unirradiated part is dissolved or stripped off, and the relief structure which remains is annealed if necessary. The relief structures obtained are distinguished particularly by the sharpness of their edges, good mechanical and chemical properties as well as good insulating properties. They are suited particularly for the preparation of miniaturized insulating layers.
    • 留下两个能够进行缩合反应以形成酰胺,脲或氨基甲酸酯键和至少一个光或反应性基团的官能团的新型环状单体与环状共聚单体缩合形成可溶的基本上线性的缩合预聚物。 将预聚物的溶液施加到基材上,蒸发溶液以形成膜或箔。 照片或辐射敏感层或箔通过图案曝光或照射,未曝光或未照射部分被溶解或剥离,并且如果需要,保留的浮雕结构退火。 获得的浮雕结构的特征在于其边缘的锐度,良好的机械和化学性质以及良好的绝缘性能。 它们特别适用于制备小型化绝缘层。