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1. 发明授权

US06293847B1 Apparatus for chemical mechanical polishing endpoint detection using a hydrogen sensor 有权
标题翻译：使用氢传感器进行化学机械抛光终点检测的设备
公开(公告)号：US06293847B1
公开(公告)日：2001-09-25
申请号：US09418087
申请日：1999-10-14
申请人： William Graham Easter , John Albert Maze , Frank Miceli , Sudhanshu Misra , Allen Yen
发明人： William Graham Easter , John Albert Maze , Frank Miceli , Sudhanshu Misra , Allen Yen
IPC分类号： B24B5100
CPC分类号： B24B37/013 , B24B49/10 , G01B21/08 , G01N33/005
摘要： An apparatus for determining endpoint in the chemical mechanical polishing of a metal film using an acidic slurry includes a hydrogen sensor which senses the amount of hydrogen vapor being produced as a result of the reaction between the metal film and the acidic slurry. When the concentration of hydrogen vapor in the reaction area drops, endpoint is attained and the polishing operation may be terminated or otherwise adjusted. Hydrogen sensing elements include a palladium gate MOS transistor, expandable plastics and a tungsten oxide film.
摘要翻译：使用酸性浆料确定金属膜的化学机械抛光中的终点的装置包括氢传感器，其感测由于金属膜和酸性浆料之间的反应而产生的氢蒸汽的量。当反应区域中的氢蒸汽的浓度下降时，达到终点，并且可以终止或以其它方式调整抛光操作。氢传感元件包括钯栅极MOS晶体管，可膨胀塑料和氧化钨膜。

2. 发明授权

US06369799B1 Computer pointer device for handicapped persons 失效
标题翻译：残疾人电脑指针装置
公开(公告)号：US06369799B1
公开(公告)日：2002-04-09
申请号：US09360134
申请日：1999-07-23
申请人： Frank Miceli , John Albert Maze , William Graham Easter
发明人： Frank Miceli , John Albert Maze , William Graham Easter
IPC分类号： G09G508
CPC分类号： G06F3/011 , A61F4/00 , G06F3/0354
摘要： A method and apparatus for controlling a pointer on a computer screen adapted for use by individuals with limited or no manual dexterity. A track ball is positioned to protrude from the upper surface of a generally partially cylindrically shaped base. A mating cradle sits on top of the base with its lower surface in contact with the upper surface of the track ball and the upper surface of the base. The upper surface of the cradle support is shaped to accept the forearm of an operator. The track ball is coupled in a known fashion to operate a pointer on a computer display. The operator can move the cursor up and down on the screen by pushing his or her arm outwardly or inwardly and can move the cursor left to right on the screen by rotating his or her arm in the cradle about its longitudinal axis.
摘要翻译：一种用于控制计算机屏幕上的指针的方法和装置，其适于有限或无手动灵巧的个人使用。轨道球被定位成从大体上部分圆柱形的基部的上表面突出。配对托架位于基座的顶部，其下表面与轨道球的上表面和基座的上表面接触。托架支撑件的上表面成形为接受操作者的前臂。跟踪球以已知的方式耦合以在计算机显示器上操作指针。操作者可以通过向上或向内推动他或她的手臂来在屏幕上上下移动光标，并且可以通过在摇篮上绕其纵轴旋转他或她的手臂在摇篮上将光标左右移动到屏幕上。

3. 发明授权

US06234868B1 Apparatus and method for conditioning a polishing pad 有权
标题翻译：调整抛光垫的装置和方法
公开(公告)号：US06234868B1
公开(公告)日：2001-05-22
申请号：US09303172
申请日：1999-04-30
申请人： William Graham Easter , John Albert Maze , Frank Miceli
发明人： William Graham Easter , John Albert Maze , Frank Miceli
IPC分类号： B24B722
CPC分类号： B24B53/017 , B24B49/16
摘要： An apparatus and method for conditioning a polishing pad used in a chemical mechanical polishing (CMP) process. The polishing pad is conditioned by the application of a conditioning device to the surface of the rotating polishing pad. The amount of force which is applied to the conditioning device is directly controlled by a force control mechanism so as to make the conditioning process more consistent.
摘要翻译：用于调理用于化学机械抛光（CMP）工艺中的抛光垫的装置和方法。通过将调理装置应用于旋转的抛光垫的表面来调节抛光垫。施加到调节装置的力的量由力控制机构直接控制，以使调节过程更一致。

4. 发明授权

US06287173B1 Longer lifetime warm-up wafers for polishing systems 失效
标题翻译：抛光系统寿命更长的预热晶圆
公开(公告)号：US06287173B1
公开(公告)日：2001-09-11
申请号：US09481236
申请日：2000-01-11
申请人： Annette Margaret Crevasse , William Graham Easter , Alvaro Maury , John Albert Maze , Frank Miceli
发明人： Annette Margaret Crevasse , William Graham Easter , Alvaro Maury , John Albert Maze , Frank Miceli
IPC分类号： B24B53007
CPC分类号： B24B37/042
摘要： A method for preparing a chemical mechanical polishing apparatus for polishing product substrates includes polishing designated “warm-up” substrates until polishing pad characteristics have achieved steady state conditions. The reusable warm-up substrates may be formed of a mechanically resistant material or a material having substantially the same removal characteristic as the product film to be polished. The reusable warm-up substrates may also be formed of a mechanically resistant film formed over a semiconductor substrate. The polishing pad characteristic of pad compression may be determined using a previously established correlation or it may be measured.
摘要翻译：制备用于抛光产品基板的化学机械抛光装置的方法包括抛光指定的“预热”基板，直到抛光垫特性已经达到稳定状态。可重复使用的预热基板可以由机械抵抗材料或具有与待抛光的产品膜具有基本相同的去除特性的材料形成。可重复使用的预热基板也可以由在半导体衬底上形成的机械抵抗膜形成。可以使用先前建立的相关性来确定衬垫压缩的抛光垫特性，或者可以测量。

5. 发明授权

US06183652B2 Method for removing microorganism contamination from a polishing slurry 失效
标题翻译：从研磨浆中除去微生物污染物的方法
公开(公告)号：US06183652B2
公开(公告)日：2001-02-06
申请号：US09415126
申请日：1999-10-08
申请人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze , Frank Miceli
发明人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze , Frank Miceli
IPC分类号： C02F148
CPC分类号： C02F1/32 , C02F2103/346
摘要： A method for removing microorganism contamination from a polishing slurry used for chemical mechanical polishing operations in the semiconductor manufacturing industry includes treating a slurry stream with ultraviolet (uv) energy to destroy the microorganisms, then filtering the uv-treated stream to remove the destroyed microorganisms before the slurry is delivered to the polishing apparatus.
摘要翻译：用于从用于半导体制造业的化学机械抛光操作的抛光浆料中除去微生物污染物的方法包括用紫外线（uv）能量处理浆料流以破坏微生物，然后过滤经过紫外线处理的流以除去破坏的微生物，然后将浆料输送到抛光装置。

6. 发明授权

US06728364B2 Analog phone bank connector 失效
标题翻译：模拟电话银行连接器
公开(公告)号：US06728364B2
公开(公告)日：2004-04-27
申请号：US09821557
申请日：2001-03-29
申请人： William Graham Easter , Dale Delano Evans , John Albert Maze, III , Frank Miceli
发明人： William Graham Easter , Dale Delano Evans , John Albert Maze, III , Frank Miceli
IPC分类号： H04M500
CPC分类号： H04Q1/142
摘要： A connector and associated method for interconnecting a plurality of adjacent paired wire terminations on a standard 110 style punch down wiring block for a telephone system. The connector includes two isolated conductors disposed along the length of the connector body and a plurality of pins connected to the respective conductors and extending away from the body. The pins are adapted for insertion into respective 110 style punch down block terminations when the connector is installed in a connected position on the wiring block, thereby connecting in parallel a plurality of telephones hard-wired to the adjacent paired wire terminations. The connector may be formed to have one or more break points disposed between respective pairs of the pins for easy breaking/cutting of the connector to a desired length for interconnecting a predetermined number of telephones. The connector may further include pairs of legs formed on opposed sides of the pins, with each leg having an indentation for receiving a mating projection formed on the wiring block for snap connection to the wiring block.
摘要翻译：一种连接器和相关联的方法，用于互连用于电话系统的标准110型冲压布线块上的多个相邻成对的电线终端。连接器包括沿着连接器主体的长度设置的两个隔离的导体，以及连接到各个导体并且远离主体延伸的多个销。当连接器安装在接线块上的连接位置时，这些销适于插入相应的110型冲压块端子中，从而并联连接硬连线到相邻成对的电线终端的多个电话。连接器可以形成为具有设置在各对销之间的一个或多个断点，用于容易地将连接器断开/切割到所需长度以互连预定数量的电话。连接器还可以包括形成在销的相对侧上的成对的腿，每个腿具有用于接收形成在接线块上的配合突起的凹口，用于卡扣连接到接线块。

7. 发明授权

US06518987B1 Mouse and mouse template for a motion impaired user 失效
标题翻译：运动受损用户的鼠标和鼠标模板
公开(公告)号：US06518987B1
公开(公告)日：2003-02-11
申请号：US09410548
申请日：1999-10-01
申请人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze , Frank Miceli
发明人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze , Frank Miceli
IPC分类号： G09G500
CPC分类号： G06F3/0395 , G06F3/03543 , G06F3/0482
摘要： A computer system for a motion impaired user includes a housing, a processor in the housing, and a display connected to the processor for displaying at least one menu of selectable commands arranged in a sequence. A mouse is connected to the processor for positioning a pointer on the display responsive to movement of the mouse. The computer further includes a mouse template having at least one elongate body having a plurality of stations therealong corresponding to the sequence of selectable commands and cooperates with the mouse for assisting the motion impaired user so that when the mouse is positioned at a station, the pointer on the display is positioned at the corresponding selectable command of the menu.
摘要翻译：用于运动受损用户的计算机系统包括壳体，壳体中的处理器和连接到处理器的显示器，用于显示以序列排列的可选择命令的至少一个菜单。鼠标连接到处理器，用于根据鼠标的移动将指针定位在显示器上。计算机还包括具有至少一个细长主体的鼠标模板，该主体具有对应于可选择命令序列的多个站，并且与鼠标协作以辅助运动受损用户，使得当鼠标位于站时，指针在显示器上位于菜单的相应可选择命令。

8. 发明授权

US06517416B1 Chemical mechanical polisher including a pad conditioner and a method of manufacturing an integrated circuit using the chemical mechanical polisher 有权
标题翻译：化学机械抛光机，包括垫调节剂和使用该化学机械抛光机制造集成电路的方法
公开(公告)号：US06517416B1
公开(公告)日：2003-02-11
申请号：US09477833
申请日：2000-01-05
申请人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze, III , Frank Miceli
发明人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze, III , Frank Miceli
IPC分类号： B24B100
CPC分类号： B24B53/017
摘要： A method of manufacturing a semiconductor device employing a polishing pad conditioner that directs a fluid stream at a polishing pad to remove accumulated material from the pad. The fluid stream may contact a large area of the polishing pad or a smaller area where the fluid stream is moved to condition different areas of the polishing pad. The fluid stream may include abrasive particles to promote the removal of the accumulated materials. The velocity of the fluid stream may be increased or decreased to promote removal of the accumulated materials. In yet another embodiment, the present invention is directed to a process for manufacturing an integrated circuit using a CMP process where the pad has been conditioned using the fluid stream. The present invention is also directed to a chemical mechanical planarization system including a pad conditioner.
摘要翻译：一种制造半导体器件的方法，该半导体器件采用抛光垫调节器，其将抛光垫处的流体流引导以从衬垫去除积聚的材料。流体流可接触抛光垫的大面积或移动流体流的较小区域以调节抛光垫的不同区域。流体流可以包括磨料颗粒以促进积聚的材料的去除。可以增加或减少流体流的速度以促进积聚的材料的去除。在另一个实施例中，本发明涉及使用CMP工艺制造集成电路的方法，其中衬垫已经使用流体流调节。本发明还涉及一种包括垫调节剂的化学机械平面化系统。

9. 发明授权

US06290883B1 Method for making porous CMP article 失效
标题翻译：制造多孔CMP制品的方法
公开(公告)号：US06290883B1
公开(公告)日：2001-09-18
申请号：US09386262
申请日：1999-08-31
申请人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze , Frank Miceli, III
发明人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze , Frank Miceli, III
IPC分类号： B29C4402
CPC分类号： B24B37/11 , B24D3/32 , B24D18/00 , B29C44/105 , B29C44/3446
摘要： A method and apparatus for making a chemical mechanical polishing (CMP) article dissolves gas into solidifiable material, and reduces pressure on the solidifiable material to form gas bubbles therein while solidifying the solidifiable material to make a matrix with voids therein. The gas bubbles are preferably formed to define voids interconnected with adjacent voids to thereby define a porous matrix. The porous matrix ensures uniform distribution of the CMP slurry for greater polishing uniformity. The method produces a CMP pad, for example, with very uniform porosity throughout its thickness so that polishing remains uniform as the pad is consumed in use. The gas and the solidifiable material may preferably be non-reactive with one another. The gas may comprise at least one inert gas, such as nitrogen or argon, for example. The solidifiable material may be a polymer-forming liquid and at least one of a curing and cross-linking agent mixed therein. The polymer-forming liquid may comprise urethane, for example, so that the resulting matrix is polyurethane.
摘要翻译：用于制造化学机械抛光（CMP）制品的方法和设备将气体溶解成可固化材料，并且在固化可固化材料以制备其中具有空隙的基质的同时降低可凝固材料上的压力以形成气泡。气泡优选形成为限定与相邻空隙互连的空隙，从而限定多孔基质。多孔基体确保CMP浆料的均匀分布，以获得更大的抛光均匀性。该方法例如在其整个厚度上产生具有非常均匀孔隙率的CMP垫，使得在使用中消耗垫时抛光保持均匀。气体和可固化材料可优选彼此不反应。气体可以包括至少一种惰性气体，例如氮气或氩气。可凝固材料可以是聚合物形成液体，并且其中混合有固化和交联剂中的至少一种。例如，聚合物形成液体可以包含氨基甲酸酯，使得得到的基质是聚氨酯。

10. 发明授权

US06368955B1 Method of polishing semiconductor structures using a two-step chemical mechanical planarization with slurry particles having different particle bulk densities 有权
标题翻译：使用具有不同颗粒体积密度的浆料颗粒的两步化学机械平面化研磨半导体结构的方法
公开(公告)号：US06368955B1
公开(公告)日：2002-04-09
申请号：US09444817
申请日：1999-11-22
申请人： William Graham Easter , John Albert Maze, III , Frank Miceli
发明人： William Graham Easter , John Albert Maze, III , Frank Miceli
IPC分类号： H01L214763
CPC分类号： H01L21/3212
摘要： The present invention is a method for removing a portion of a liner film and a metallization layer superimposed over the liner film to expose an underlying dielectric layer on a semiconductor wafer. Specifically, at least a portion of the metallization layer is removed by chemical mechanical polishing the metallization layer using a first polishing slurry having a plurality of first abrasive particles and at least a portion of the liner film is removed by chemical mechanical polishing the liner film using a second polishing slurry having a plurality of second abrasive particles. The first abrasive particles and the second abrasive particles used in the polishing steps have different bulk densities.
摘要翻译：本发明是一种用于去除衬里膜的一部分和重叠在衬里膜上的金属化层的方法，以暴露半导体晶片上的下面的电介质层。具体地说，通过使用具有多个第一磨料颗粒的第一抛光浆料进行化学机械抛光金属化层来去除金属化层的至少一部分，并且通过用衬里膜进行化学机械抛光来除去衬垫膜的至少一部分具有多个第二磨料颗粒的第二抛光浆料。在抛光步骤中使用的第一磨料颗粒和第二磨料颗粒具有不同的体积密度。

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