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    • 3. 发明申请
    • Alkaline developer for radiation sensitive compositions
    • 用于辐射敏感组合物的碱性显影剂
    • US20050106510A1
    • 2005-05-19
    • US10956871
    • 2004-10-01
    • Willi-Kurt GriesMarc Van DammePascal MeeusMario Boxhorn
    • Willi-Kurt GriesMarc Van DammePascal MeeusMario Boxhorn
    • G03C5/16G03F7/32
    • G03F7/322
    • The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.
    • 本发明涉及一种用于辐照敏感组合物的碱性显影剂,该显色剂基于水和至少一种具有碱性反应的无机盐,其中显影剂的pH至少为11,并且包含至少三种结构不同的式 (A),(B)和(C),其特征在于式(A)的表面活性剂具有一个阴离子基团,式(B)的表面活性剂具有两个阴离子基团,式(C)的表面活性剂是非离子的 并且具有至少一个非离子亲水基团,并且显影剂中式(A),(B)和(C)的每种表面活性剂的浓度相对于显影剂的总重量为至少0.05重量% 。 开发人员的沉积少,在使用时具有优异的稳定性。
    • 4. 发明授权
    • Alkaline developer for radiation sensitive compositions
    • 用于辐射敏感组合物的碱性显影剂
    • US07186498B2
    • 2007-03-06
    • US10956871
    • 2004-10-01
    • Willi-Kurt GriesMarc Van DammePascal MeeusMario Boxhorn
    • Willi-Kurt GriesMarc Van DammePascal MeeusMario Boxhorn
    • G03F7/32
    • G03F7/322
    • The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.
    • 本发明涉及一种用于辐照敏感组合物的碱性显影剂,该显色剂基于水和至少一种具有碱性反应的无机盐,其中显影剂的pH至少为11,并且包含至少三种结构不同的式 (A),(B)和(C),其特征在于式(A)的表面活性剂具有一个阴离子基团,式(B)的表面活性剂具有两个阴离子基团,式(C)的表面活性剂是非离子的 并且具有至少一个非离子亲水基团,并且显影剂中式(A),(B)和(C)的每种表面活性剂的浓度相对于显影剂的总重量为至少0.05重量% 。 开发人员的沉积少,在使用时具有优异的稳定性。
    • 7. 发明申请
    • Method for making a lithographic printing plate
    • 平版印刷版的制造方法
    • US20060014103A1
    • 2006-01-19
    • US11173466
    • 2005-06-30
    • Joan VermeerschPascal MeeusDirk Kokkelenberg
    • Joan VermeerschPascal MeeusDirk Kokkelenberg
    • G03F7/00
    • B41C1/1025B41C2201/02B41C2201/14B41C2210/04B41C2210/06B41C2210/22B41C2210/24Y10S430/145
    • A method for making a lithographic printing plate is disclosed which comprises the steps of: (i) providing a negative-working, heat-sensitive lithographic printing plate precursor comprising a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating comprising an image-recording layer which comprises hydrophobic thermoplastic polymer particles and a hydrophilic binder, wherein the hydrophobic thermoplastic polymer particles have an average particle size in the range from 45 nm to 63 nm and wherein the amount of the hydrophobic thermoplastic polymer particles in the image-recording layer is at least 70% by weight relative to the image-recording layer; (ii) exposing the coating to heat or infrared light, thereby inducing coalescence of the thermoplastic polymer particles at exposed areas of the coating; (iii) developing the precursor by applying an aqueous, alkaline solution, thereby removing non-exposed areas of the coating from the support, wherein the aqueous alkaline solution has a pH≧11 and comprises a phosphate buffer or a silicate buffer.
    • 公开了一种制备平版印刷版的方法,其包括以下步骤:(i)提供负性工作的热敏平版印刷版原版,其包含具有亲水性表面的支持体或设有亲水层和涂层 提供在其上的涂层包括包含疏水性热塑性聚合物颗粒和亲水性粘合剂的图像记录层,其中所述疏水性热塑性聚合物颗粒的平均粒度在45nm至63nm的范围内,并且其中所述疏水性热塑性聚合物的量 图像记录层中的聚合物颗粒相对于图像记录层为至少70重量% (ii)将涂层暴露于热或红外光,从而在涂层的暴露区域引起热塑性聚合物颗粒的聚结; (iii)通过施加水性碱性溶液来显影前体,从而从载体除去涂层的未曝光区域,其中碱性水溶液的pH> = 11且包含磷酸盐缓冲液或硅酸盐缓冲液。
    • 8. 发明授权
    • Method for developing an exposed photographic silver halide material
    • 用于显影曝光的照相卤化银材料的方法
    • US06379877B1
    • 2002-04-30
    • US08594721
    • 1996-01-31
    • Freddy HenderickxAnn VerbeeckPascal MeeusHieronymus Andriessen
    • Freddy HenderickxAnn VerbeeckPascal MeeusHieronymus Andriessen
    • G03C530
    • G03C5/383G03C5/30G03C8/365
    • According to this invention a developer has been disclosed having a low pH value between 9.6 and 11.0, preferably between 9.6 and 10.3, and comprising hydroquinone in an amount from 0 to less than 30 g per liter, an auxiliary developing agent, and as silver halide complexing agents alkali metal sulphite salts, preferably sodium salts, in an amount from 0 to less than 50 g per liter, more preferably to less than 40 g per liter, and thiocyanate salts in amounts from 0.1 to 3 g, more preferably from 0.5 to 2.5 g per liter, and at least 1 g of a compound corresponding to the formula (I), a precursor thereof, a derivative thereof and/or a metal salt thereof wherein each of A, B and D independently represents an oxygen atom or NR1; X represents an oxygen atom, a sulphur atom, NR2; CR3R4; C═O; C═NR5 or C═S; Y represents an oxygen atom, a sulphur atom, NR′2; CR′3R′4; C═O; C═NR′5 or C═S; Z represents an oxygen atom, a sulphur atom, NR″2; CR″3R″4; C═O; C═NR″5 or C═S; n equals 0, 1 or 2; each of R1 to R5, R′1 to R′5 and R″1 to R″5, independently represents hydrogen, subsituted or unsubstituted alkyl, aralkyl, hydroxyalkyl, carboxyalkyl; substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl or substituted or unsubstituted heterocyclyl; and wherein R3 and R4, R′3 and R′4, R″3 and R″4, may further form together a ring; and wherein in the case that X═CR3R4 and Y═CR′3R′4, R3 and R′3 and/or R4 and R′4 may form a ring and wherein in the case that Y═CR′3R′4 and Z═CR″3R″4 with n=1 or 2, R′3 and R″3 and/or R′4 and R″4 may form a ring.
    • 根据本发明,已经公开了具有9.6至11.0之间的低pH值,优选9.6至10.3的显影剂,并且包含量为0至小于30g /升的氢醌,辅助显影剂和卤化银 络合剂碱金属亚硫酸盐,优选钠盐,其量为0至小于50克/升,更优选至少于40克/升,硫氰酸盐的量为0.1至3克,更优选为0.5至 2.5g /升,和至少1g对应于式(I)的化合物,其前体,其衍生物和/或其金属盐,其中A,B和D的独立地表示氧原子或NR 1; X 表示氧原子,硫原子,NR 2; CR3R4; C = O; C = NR5或C = S; Y表示氧原子,硫原子,NR'2; CR'3R'4; C = O; C = NR'5或C = S; Z表示氧原子,硫原子,NR'2; CR''3R''4; C = O; C = NR''5或C = S; n等于0,1或2; R1至R5,R'1至R'5和R'1至R'5各自独立地表示氢,取代或未取代的 烷基,芳烷基,羟基烷基,羧基烷基; 取代或未取代的烯基,取代或未取代的炔基,取代或未取代的环烷基,取代或未取代的环烯基,取代或未取代的芳基或取代或未取代的杂环基; 并且其中R 3和R 4,R'3和R'4,R“3和R”4可进一步一起形成环; 并且在X = CR 3 R 4和Y = CR 3 R 4的情况下,R 3和R'3和/或R 4和R'4可以形成环,并且其中在Y = CR'3R'4和Z = 具有n = 1或2的CR''3R''4,R'3和R'3和/或R'4和R'4可以形成环。
    • 10. 发明授权
    • Developing solution and method for developing an exposed silver halide
photographic material
    • US5593817A
    • 1997-01-14
    • US594144
    • 1996-01-31
    • Freddy HenderickxAnn VerbeeckPascal MeeusHieronymus Andriessen
    • Freddy HenderickxAnn VerbeeckPascal MeeusHieronymus Andriessen
    • G03C5/29G03C5/30G03C5/305G03C5/31G03C5/38G03C8/36
    • G03C8/365G03C5/30G03C5/305G03C5/31G03C5/383
    • A photographic developing solution and a method of developing silver halide materials in the said developing solution is disclosed, the said developing solution comprising hydroquinone in an amount from 0 to 30 g per litre, an auxiliary developer, and silver halide complexing agents in an amount from 0 to 50 g per litre, characterized in that said developer further comprisesin amounts from 0.1 to 5 g per litre a compound corresponding to the formula (I), accompanied by charge compensating anions,Z'N.sup.+ --R--N.sup.+ Z" (I)wherein at least divalent group R contains at least one oxyethylene group and wherein Z' and Z", being the same or different, are composed of enough atoms to form a heterocyclic aromatic 5- or 6-ring;andat least 1 g of a compound corresponding to the formula (II), a precursor thereof, a derivative thereof and/or a metal salt thereof ##STR1## wherein each of A, B and D independently represents an oxygen atom or NR.sup.1 ;X represents an oxygen atom, a sulphur atom, NR.sup.2 ; CR.sup.3 R.sup.4 ;C=O; C=NR.sup.5 or C=S;Y represents an oxygen atom, a sulphur atom, NR.sup.'2 ; CR.sup.'3 R.sup.'4 ; C=O, C=NR.sup.'5 or C=S;Z represents an oxygen atom, a sulphur atom, NR.sup."2 ; CR.sup."3 R.sup."4 ; C=O; C=NR.sup."5 or C=S;n equals 0, 1 or 2;each of R.sup.1 to R.sup.5, R.sup.'1 to R.sup.'5 and R.sup."1 to R.sup."5 independently represents hydrogen, alkyl, aralkyl, hydroxyalkyl, carboxyalkyl; alkenyl, alkynyl, cycloalkyl, cycloalkenyl, aryl or heterocyclyl;and whereinR.sup.3 and R.sup.4, R.sup.'3 and R.sup.'4, R.sup."3 and R.sup."4, may further form together a ring; andwherein in the case that X=CR.sup.3 R.sup.4 and Y=CR.sup.'3 R.sup.'4, R.sup.3 and R.sup.'3 and/or R.sup.4 and R.sup.'4 may form a ring and wherein in the case that Y=CR.sup.'3 R.sup.'4 and Z=CR.sup."3 R.sup."4 with n=1 or 2, R.sup.'3 and R.sup."3 and/or R.sup.'4 and R.sup."4 may form a ring.