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1. 发明申请

US20120260855A1 DEPOSITING APPARATUS FOR FORMING THIN FILM 审中-公开
标题翻译：用于形成薄膜的沉积装置
公开(公告)号：US20120260855A1
公开(公告)日：2012-10-18
申请号：US13440377
申请日：2012-04-05
申请人： Whang Sin CHO , Ki Chul Song , Seung Chul Jung , Woo Jung Ahn
发明人： Whang Sin CHO , Ki Chul Song , Seung Chul Jung , Woo Jung Ahn
IPC分类号： C23C16/448 , C23C16/52
CPC分类号： C23C14/24 , C23C14/12 , C23C14/26 , C23C14/544 , C23C14/564
摘要： A depositing apparatus for forming a thin film includes a source container in which a source material to be deposited on a substrate is accommodated in a solid or liquid state; an evaporation chamber which couples and communicates with the source container above the source container, and through which an evaporated source material from the source container passes; a spraying hole which is formed on a top of the evaporation chamber, and sprays upward the evaporated source material passed through the evaporation chamber; a first heater which is provided above the source material inside the evaporation chamber or the source container, and supplies heat to the source material to evaporate the source material accommodated in the source container; and a block plate is provided above the first heater inside the evaporation chamber.
摘要翻译：用于形成薄膜的沉积设备包括：源容器，其中要沉积在基底上的源材料以固体或液体状态容纳; 蒸发室，其在源容器上方与源容器联接并连通，并且来自源容器的蒸发源材料通过该蒸发室; 喷雾孔形成在蒸发室的顶部，并向上喷射通过蒸发室的蒸发源材料; 第一加热器，其设置在所述蒸发室或所述源容器内的所述源材料上方，并且向所述源材料供给热量以蒸发容纳在所述源容器中的源材料; 并且在蒸发室内的第一加热器上方设置有阻挡板。

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