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    • 8. 发明授权
    • Fabrication of a multi-structure ion sensitive field effect transistor with a pH sensing layer of a tin oxide thin film
    • 制造具有氧化锡薄膜的pH感应层的多结构离子敏感场效应晶体管
    • US06218208B1
    • 2001-04-17
    • US09347226
    • 1999-07-02
    • Jung-Chuan ChouWen-Yaw ChungShen-Kan HsiungTai-Ping SunHung-Kwei Liao
    • Jung-Chuan ChouWen-Yaw ChungShen-Kan HsiungTai-Ping SunHung-Kwei Liao
    • H01L2100
    • G01N27/414
    • A sensitive material-tin oxide (SnO2) obtained by thermal evaporation or by r.f. reactive sputtering is used as a high-pH-sensitive material for a Multi-Structure Ion Sensitive Field Effect Transistor. The multi-structure of this Ion Sensitive Field Effect Transistor (ISFET) includes SnO2/SiO2 gate ISFET or SnO2/Si3N4/SiO2 gate ISFET respectively, and which have high performances such as a linear pH sensitivity of approximately 56˜58 mV/pH in a concentration range between pH2 and pH10. A low drift characteristics of approximately 5 mv/day, response time is less than 0.1 second, and an isothermal point of this ISFET sensor can be obtained if the device operates with an adequate drain-source current. In addition, this invention has other advantages, such as the inexpensive fabrication system, low cost, and mass production characteristics. Based on these characteristics, a disposal sensing device can be achieved. Thus, this invention has a high feasibility in Ion Sensitive Field Effect Transistor.
    • 通过热蒸发或r.f.获得的敏感材料 - 氧化锡(SnO 2)。 反应溅射用作多结构离子敏感场效应晶体管的高pH敏感材料。 该离子敏感场效应晶体管(ISFET)的多结构分别包括SnO 2 / SiO 2栅极ISFET或SnO 2 / Si 3 N 4 / SiO 2栅极ISFET,并且具有高性能,例如约56〜58mV / pH的线性pH灵敏度 pH2和pH10之间的浓度范围。 大约5mv /天的低漂移特性,响应时间小于0.1秒,如果器件以足够的漏源电流工作,则可以获得该ISFET传感器的等温点。 此外,本发明还具有廉价的制造系统,低成本和批量生产特性等其它优点。 基于这些特性,可以实现处置感测装置。 因此,本发明在离子敏感场效应晶体管中具有很高的可行性。