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1. 发明授权

US07212380B2 Magnetic write head with recessed overcoat 失效
标题翻译：磁性写头与凹进的大衣
公开(公告)号：US07212380B2
公开(公告)日：2007-05-01
申请号：US10831834
申请日：2004-04-26
申请人： Wen-Chien David Hsiao , Wipul Pemsiri Jayaekara , Edward Hin Pong Lee , Vladimir Nikitin , Patrick Rush Webb , Sue Siyang Zhang
发明人： Wen-Chien David Hsiao , Wipul Pemsiri Jayaekara , Edward Hin Pong Lee , Vladimir Nikitin , Patrick Rush Webb , Sue Siyang Zhang
IPC分类号： G11B5/31 , G11B5/187 , G11B5/255 , G11B5/39
CPC分类号： G11B5/1278 , G11B5/3143
摘要： A magnetoresistive read/write head having a first layer of alumina and a second layer of silicon dioxide overlaying a P3 layer of the head. In a preferred embodiment, the silicon dioxide layer is recessed away from an Air Bearing Surface (ABS) to reduce protrusion of a P2 layer and the P3 layer in the head, and to reduce degradation in the magnetic properties of the pole tips of the P2 and P3 layer ends.
摘要翻译：具有第一氧化铝层和覆盖头部的P3层的第二二氧化硅层的磁阻读写头。在优选实施例中，二氧化硅层从空气轴承表面（ABS）凹入，以减少P2层和P3中头部的突出，并减少P2的极尖的磁性能的降低和P3层结束。

2. 发明授权

US07323112B2 Method of fabricating electronic component using resist structure with no undercut 有权
标题翻译：使用没有底切的抗蚀剂结构制造电子元件的方法
公开(公告)号：US07323112B2
公开(公告)日：2008-01-29
申请号：US10652053
申请日：2003-08-29
申请人： Amanda Baer , Marie-Claire Cyrille , Frederick Hayes Dill , Wipul Pemsiri Jayaekara , Jui-Lung Li , Hugo Alberto Emilio Santini , Benjamin Lu Chen Wang
发明人： Amanda Baer , Marie-Claire Cyrille , Frederick Hayes Dill , Wipul Pemsiri Jayaekara , Jui-Lung Li , Hugo Alberto Emilio Santini , Benjamin Lu Chen Wang
IPC分类号： B44C1/22
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3116 , G11B5/3163 , G11B5/3903 , G11B5/3909 , G11B5/3967 , G11B2005/3996 , H01J2237/3114
摘要： A method for milling a structure. A single- or multi-layer resist having no undercut is added to a surface of a structure to be milled, the surface to be milled defining a plane. A milling process, such as ion milling, is performed. The milling process includes milling the structure at high incidence and milling the structure at razing incidence. The milling process can be performed only once, or repeated multiple times. High incidence can be defined as about 65 to about 90 degrees from the plane of the surface being milled. Razing incidence can be defined as about 0 to about 30 degrees from the plane of the surface being milled.
摘要翻译：一种铣削结构的方法。将未切割的单层或多层抗蚀剂加入要研磨的结构的表面，待研磨的表面限定一个平面。进行铣削加工，例如离子铣削。铣削过程包括以高发射率铣削结构并铣削结构。铣削加工只能执行一次，或重复多次。可以将高入射率定义为从被研磨表面的平面约65度至约90度。闪电发生率可以定义为距被研磨表面的平面约0至约30度。

3. 发明授权

US07139153B2 Magnetic pole tip for perpendicular magnetic recording 有权
标题翻译：磁极尖用于垂直磁记录
公开(公告)号：US07139153B2
公开(公告)日：2006-11-21
申请号：US10785236
申请日：2004-02-23
申请人： Richard Hsiao , Wipul Pemsiri Jayaekara , Jeffrey S. Lille
发明人： Richard Hsiao , Wipul Pemsiri Jayaekara , Jeffrey S. Lille
IPC分类号： G11B5/147
CPC分类号： G11B5/1278 , Y10T29/49021
摘要： A method for forming a magnetic structure, such as a pole tip, includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.
摘要翻译：用于形成诸如极尖的磁性结构的方法包括形成磁性材料的磁极尖端层。将一层聚酰亚胺前体材料添加到极尖层上方并固化。将含硅抗蚀剂层添加到聚酰亚胺前体材料层上方并图案化。将抗蚀剂层暴露于氧等离子体以将抗蚀剂转化为玻璃状材料。去除固化的聚酰亚胺前体材料的暴露部分以暴露极尖层的部分。去除极尖端部的暴露部分以形成极尖。然后可以进行化学机械抛光（CMP）以除去残留在极尖顶部的任何不需要的材料。

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