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1. 发明授权

US06641709B2 Mist trap mechanism and method for plating apparatus 失效
标题翻译：电镀设备的雾化捕集机理及方法
公开(公告)号：US06641709B2
公开(公告)日：2003-11-04
申请号：US10290293
申请日：2002-11-08
申请人： Wataru Okase , Koichiro Kimura , Takenobu Matsuo
发明人： Wataru Okase , Koichiro Kimura , Takenobu Matsuo
IPC分类号： C25D1700
CPC分类号： C25D21/04 , C25D17/001
摘要： A mist trap mechanism and method for a plating apparatus, which can provide an improved mist removing effect by a simple structure, are provided. A gas discharge passage is formed to connect the space in a plating chamber and space outside of the plating chamber and provided with a liquid spouting portion and a solid wall. The discharge gas collides with the liquid spouted from the liquid spouting portion, and the discharge gas collides with the solid wall which has its surface wetted with the liquid spouted from the liquid spouting portion. Such a two-staged collision of the discharge gas effectively takes the mist contained in the discharge gas into the liquid. A liquid recovery portion is disposed in connection with the gas discharge passage to collectively catch the mist in a state captured by the liquid.
摘要翻译：提供一种能够通过简单的结构提供改善的除雾效果的电镀装置的雾滴捕获机构和方法。形成气体排出通道，以连接电镀室中的空间和电镀室外的空间，并设置有液体喷射部分和固体壁。排出气体与从液体喷出部喷出的液体相撞，排出气体与表面被从液体喷出部喷出的液体润湿的固体壁碰撞。这种放电气体的两阶段碰撞有效地将放出气体中所含的雾气引入液体。液体回收部分与气体排出通道相连配置，以在由液体俘获的状态下集中地吸收雾气。

2. 发明申请

US20070022954A1 Gas treatment device and heat readiting method 审中-公开
标题翻译：气体处理装置和热读取方法
公开(公告)号：US20070022954A1
公开(公告)日：2007-02-01
申请号：US10570603
申请日：2004-08-30
申请人： Hachishiro Iizuka , Koichiro Kimura , Kyoko Ikeda , Tomoyuki Sakoda , Akira Yasumuro
发明人： Hachishiro Iizuka , Koichiro Kimura , Kyoko Ikeda , Tomoyuki Sakoda , Akira Yasumuro
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/455
摘要： A shower head formed by stacking a shower base, a gas diffusion plate, and a shower plate and supplying material gas and oxidizer gas to a wafer on a loading table through a first gas diffusion part and a second gas diffusion part formed in both faces of the gas diffusion plate, first gas outlets formed in the shower plate and communicating with a first gas diffusion space, and second gas outlets formed in the shower plate and communicating with a second gas diffusion space. A plurality of heat transfer columns fitted closely to the lower surface of the shower base are installed in the first gas diffusion part so that portions therebetween can form the first gas diffusion space, and radiant heat from the loading table is transmitted by the heat transfer columns in the thickness direction of the shower head.
摘要翻译：喷淋头，其通过堆叠淋浴器基座，气体扩散板和喷淋板而形成，并且通过第一气体扩散部和第二气体扩散部将第二气体扩散部和第二气体扩散部供给到装载台上的晶片，所述气体扩散板，形成在所述喷淋板中并与第一气体扩散空间连通的第一气体出口和形成在所述喷淋板中并与第二气体扩散空间连通的第二气体出口。在第一气体扩散部中安装有与淋浴器基座的下表面紧密配合的多个传热塔，使得它们之间的部分可以形成第一气体扩散空间，并且来自装载台的辐射热量通过传热塔在淋浴头的厚度方向上。

3. 发明授权

US08758511B2 Film forming apparatus and vaporizer 失效
标题翻译：成膜装置和蒸发器
公开(公告)号：US08758511B2
公开(公告)日：2014-06-24
申请号：US11660091
申请日：2005-08-12
申请人： Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
发明人： Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
IPC分类号： C23C16/448 , C23C16/455 , C23C16/00 , C23C16/44 , C23C16/458
CPC分类号： C23C16/4402 , C23C16/4401 , C23C16/4486 , C23C16/45561 , C23C16/4585
摘要： A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.
摘要翻译：一种成膜装置，包括用于供给液体或气液混合物的原料的原料供给部，用于蒸发原料以形成原料气体的原料蒸发部，以及用于导入使用所形成的原料气体的成膜处理，以及从原料蒸发部到成膜部的原料气体的输送路径上的过滤器。过滤器的外边缘通过循环支撑构件在其整个周边上被压靠在输送路径的内表面上，循环支撑构件通过沿着挤压方向的加载不如外边缘而变形，并被固定到传送路径的内表面处于压缩状态，在传送路径的内表面和支撑构件之间。

4. 发明授权

US06926817B2 Solution processing apparatus and solution processing method 失效
标题翻译：解决方案处理设备和解决方案处理方法
公开(公告)号：US06926817B2
公开(公告)日：2005-08-09
申请号：US10143014
申请日：2002-05-13
申请人： Yoshinori Marumo , Koichiro Kimura
发明人： Yoshinori Marumo , Koichiro Kimura
IPC分类号： C25D7/12 , C23C2/00 , C25D17/00 , C25D17/08 , H01L21/00 , H01L21/288 , C25D5/00
CPC分类号： H01L21/67057 , C23C2/003 , H01L21/2885
摘要： A plating apparatus includes a plating solution tank which stores a plating solution, a holder including an inner space to house a wafer and an opening for the wafer to be in contact with the plating solution, and a nitrogen supplying mechanism to supply nitrogen to the inner space of the holder.
摘要翻译：电镀装置包括：电镀溶液槽，存储电镀溶液;保持器，其包括用于容纳晶片的内部空间和用于与电镀液接触的晶片的开口;以及氮供给机构，用于向内部供给氮持有人的空间。

5. 发明申请

US20070095284A1 GAS TREATING DEVICE AND FILM FORMING DEVICE 审中-公开
标题翻译：气体处理装置和成膜装置
公开(公告)号：US20070095284A1
公开(公告)日：2007-05-03
申请号：US11562661
申请日：2006-11-22
申请人： Hachishiro IIZUKA , Koichiro Kimura
发明人： Hachishiro IIZUKA , Koichiro Kimura
IPC分类号： C23C16/00
CPC分类号： C23C16/45565 , C23C16/45574 , H01L21/31691
摘要： A gas treating device includes a mounting base to support a substrate, a treatment container, a post mix type shower head, and a gas supply mechanism having a source gas flow path to supply a source gas to the shower head and an oxidizing gas supply path to supply an oxidizing gas to the shower head. The shower head includes a bottom surface which faces the substrate on the mounting base via a predetermined space, a groove formed in the bottom surface, a plurality of source gas discharge ports communicated with the source gas flow path, and bored in the bottom surface except the groove to discharge the source gas, and a plurality of oxidizing gas discharge ports communicated with the oxidizing gas flow path, and bored in the groove to discharge the oxidizing gas.
摘要翻译：一种气体处理装置，包括：支撑基板的安装基座，处理容器，后混合型喷头，以及具有源气体流路的气体供给机构，该源气体流路将源气体供给到喷淋头，以及氧化气体供给路径以向喷淋头供应氧化气体。淋浴头包括经由预定空间与安装基座上的基板相对的底面，形成在底面中的凹槽，与源气体流路连通的多个源气体排出口，以及在底面中钻孔，除了用于排出源气体的槽和与氧化剂气体流路连通的多个氧化气体排出口，并且在槽中钻孔以排出氧化气体。

6. 外观设计

USD581012S1 Middle plate for the shower head 有权
标题翻译：中间淋浴头
公开(公告)号：USD581012S1
公开(公告)日：2008-11-18
申请号：US29226149
申请日：2005-03-24
申请人： Hachishiro Iizuka , Koichiro Kimura , Akira Yasumuro
设计人： Hachishiro Iizuka , Koichiro Kimura , Akira Yasumuro

7. 发明申请

US20070266944A1 Film Forming Apparatus and Vaporizer 失效
标题翻译：成膜装置和蒸发器
公开(公告)号：US20070266944A1
公开(公告)日：2007-11-22
申请号：US11660091
申请日：2005-08-12
申请人： Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
发明人： Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
IPC分类号： C23C16/02
CPC分类号： C23C16/4402 , C23C16/4401 , C23C16/4486 , C23C16/45561 , C23C16/4585
摘要： A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.
摘要翻译：一种成膜装置，包括用于供给液体或气液混合物的原料的原料供给部，用于蒸发原料以形成原料气体的原料蒸发部，以及用于导入使用所形成的原料气体的成膜处理，以及从原料蒸发部到成膜部的原料气体的输送路径上的过滤器。过滤器的外边缘通过循环支撑构件在其整个周边上被压靠在输送路径的内表面上，循环支撑构件通过沿着挤压方向的加载不如外边缘而变形，并被固定到传送路径的内表面处于压缩状态，在传送路径的内表面和支撑构件之间。

8. 发明授权

US4796244A Disc player 失效
标题翻译：光盘播放器
公开(公告)号：US4796244A
公开(公告)日：1989-01-03
申请号：US163913
申请日：1988-03-03
申请人： Yukiyasu Tsuruta , Saburo Yorizane , Koichiro Kimura , Tetsuo Noda , Taizo Isshiki , Masanori Okada , Masato Ishihara
发明人： Yukiyasu Tsuruta , Saburo Yorizane , Koichiro Kimura , Tetsuo Noda , Taizo Isshiki , Masanori Okada , Masato Ishihara
IPC分类号： G11B17/04 , G11B17/28 , G11B5/48
CPC分类号： G11B17/056
摘要： A disc player comprising a lift chassis 5 liftably supported on a main chassis 1 and having a signal reproduction unit 31 mounted thereon, and a drive slide 9 supported by the main chassis 1 and movable in a direction intersecting the direction of movement of the lift chassis 5. The drive slide 9 has a straight cam portion in engagement with a cam follower on the lift chassis 5 for reciprocatingly driving the lift chassis 5. An intermittent feed mechanism is provided between the drive slide 9 and a motor 23 for reciprocatingly moving the drive slide. The feed mechanism comprises a drive portion for receiving a torque directly from the motor, and a driven portion to be intermittently driven by the drive portion while the drive portion is in continuous rotation. The power given to the driven portion is delivered to the drive slide to thereby move the slide stepwise. The drive portion has an engaging portion which, while the drive slide is at rest, engages with the driven portion to lock the drive slide, whereby the reproduction unit can be held properly in position.
摘要翻译：一种光盘播放器，包括可提升地支撑在主机架1上并具有安装在其上的信号再现单元31的升降机架5和由主机架1支撑并可沿与提升机架的运动方向相交的方向移动的驱动滑动件9 驱动滑块9具有与升降机架5上的凸轮从动件接合的直的凸轮部分，用于往复驱动提升机架5.间歇进给机构设置在驱动滑动件9和马达23之间，用于使驱动器往复移动滑动。进给机构包括用于从马达直接接收扭矩的驱动部分和驱动部分连续旋转时由驱动部分间歇驱动的被驱动部分。给驱动部分的动力传递到驱动滑块，从而逐步移动滑块。驱动部分具有接合部分，当驱动滑块处于静止状态时，该啮合部分与被驱动部分接合以锁定驱动滑块，由此可以将再现单元保持在适当位置。

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