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1. 发明授权

US4918870A Floating subcarriers for wafer polishing apparatus 失效
标题翻译：晶圆抛光装置的浮子副载波
公开(公告)号：US4918870A
公开(公告)日：1990-04-24
申请号：US864282
申请日：1986-05-16
申请人： Walter Torbert , Kenneth C. Struven , Robert E. Lorenzini , Anthony C. Bonora
发明人： Walter Torbert , Kenneth C. Struven , Robert E. Lorenzini , Anthony C. Bonora
IPC分类号： H01L21/304 , B24B37/10
CPC分类号： B24B37/102
摘要： A polishing apparatus has a conventional carrier with a plurality of floating subcarriers. The benefits of single wafer polishing are achieved with the economies of multiple wafer polishing by adding the plurality of floating subcarriers to the conventional carrier. Each subcarrier has a single wafer adhered to its underside. Axial freedom is provided to duplicate the dynamics of single wafer polishing. The required axial freedom is obtained by axially loading each subcarrier via a mechanical spring or via pneumatic/hydraulic devices. In two variations, each subcarrier is also allowed auto-rotational freedom. In another two variations, the subcarriers are rotationally driven. In all variations, the wafers adhered to the floating subcarriers are substantially uniformly polished and the total indicated reading of the maximum deviation on the wafer surface is improved.
摘要翻译：抛光装置具有具有多个浮动副载波的常规载体。通过将多个浮动副载波添加到常规载体，通过多晶片抛光的经济性实现单晶片抛光的优点。每个子载波具有粘附到其下侧的单个晶片。提供轴向自由度以复制单晶片抛光的动力学。所需的轴向自由度是通过经由机械弹簧或通过气动/液压装置轴向加载每个副载波而获得的。在两个变型中，每个子载波也允许自动旋转自由度。在另外两个变型中，副载波被旋转驱动。在所有变型中，粘附到浮动子载波上的晶片被基本均匀地抛光，并且提高了晶片表面上最大偏差的总体指示读数。

2. 发明申请

US20080029125A1 Method and apparatus for damage-free, single wafer, sonic boundary layer, megasonic cleaning 审中-公开
标题翻译：用于无损，单晶片，声波边界层，超声波清洗的方法和装置
公开(公告)号：US20080029125A1
公开(公告)日：2008-02-07
申请号：US11888598
申请日：2007-07-31
申请人： Michael B. Olesen , Kenneth C. Struven , Paul Mendes
发明人： Michael B. Olesen , Kenneth C. Struven , Paul Mendes
IPC分类号： B08B3/12
CPC分类号： B08B3/12 , H01L21/67051 , H01L21/67057
摘要： A method and apparatus for megasonic cleaning of semiconductor wafers. The wafer is positioned so that the surface to be cleansed is parallel to and faces the radiating surface of a quartz or similar resonator which receives sonic waves through a liquid medium from a transducer. The sonic waves striking the wafer are preferably at about a 5° to 30° offset angle from a normally directed wave to the plane of the wafer. The layered medium is gasified and serves to couple the transducer to the resonator. A layer of degasified cleaning fluid is positioned between the resonator and the wafer.
摘要翻译：用于半导体晶片的超声波清洗的方法和装置。晶片被定位成使得被清洁的表面平行于石英或类似谐振器的辐射表面，该石英或类似谐振器通过来自换能器的液体介质接收声波。撞击晶片的声波优选地与正常定向的波到晶片的平面大约5°至30°的偏移角。分层介质被气化并用于将换能器耦合到谐振器。一层脱气的清洗液位于谐振器和晶片之间。

3. 发明授权

US5383488A Apparatus and method for protecting chemical bath seals 失效
标题翻译：用于保护化学浴液密封的装置和方法
公开(公告)号：US5383488A
公开(公告)日：1995-01-24
申请号：US188817
申请日：1994-01-31
申请人： Kenneth C. Struven
发明人： Kenneth C. Struven
IPC分类号： B08B3/04 , H01L21/00 , H01L21/304 , H01L21/306 , F16K49/00
CPC分类号： H01L21/67086 , H01L21/67057 , Y10T137/6858
摘要： A bath in which articles are processed by immersion in hot liquid chemicals has a chemical receptacle seated in a casing. Wetting of internal components in the casing, such as heating elements and thermal insulation, is prevented by a seal between the receptacle and the rim of the casing. The otherwise exposed seal is isolated from the external environment of the bath by a barrier of flowing water. The water flow shields the sealing material from corrosive chemical drips and fumes and also has a cooling effect which decreases thermal expansion of components in the region of the seal and thereby reduces structural stresses.
摘要翻译：通过浸入热液体化学品中处理制品的浴具有一个坐在外壳中的化学容器。通过容器和外壳边缘之间的密封来防止外壳中的内部部件（例如加热元件和隔热件）的润湿。否则暴露的密封件通过流动的水屏障与浴的外部环境隔离。水流屏蔽了密封材料的腐蚀性化学滴落和烟雾，并且还具有降低密封区域中部件热膨胀从而降低结构应力的冷却效果。

4. 发明授权

US5205082A Wafer polisher head having floating retainer ring 失效
标题翻译：晶圆抛光头具有浮动固定环
公开(公告)号：US5205082A
公开(公告)日：1993-04-27
申请号：US811568
申请日：1991-12-20
申请人： Norm Shendon , Kenneth C. Struven , Robert J. Kolenkow
发明人： Norm Shendon , Kenneth C. Struven , Robert J. Kolenkow
IPC分类号： B24B37/30 , H01L21/304
CPC分类号： B24B37/30
摘要： A polishing head for polishing a semiconductor wafer is described. The head design enables a wafer retainer to float during polishing and yet extend beyond a wafer carrier to define a pocket for the wafer and thereby facilitate wafer changing. The head construction also enables the carrier to be selectively projected beyond the retainer so that the surface of the carrier is easily accessible for changing an insert or the like. The head uses a positive air pressure to press the wafer against the polishing pad and the head includes interfering mechanical constructions which provide the positions mentioned above.

5. 发明授权

US06209555B1 Substrate cassette for ultrasonic cleaning 失效
标题翻译：用于超声波清洗的基板盒
公开(公告)号：US06209555B1
公开(公告)日：2001-04-03
申请号：US09299990
申请日：1999-04-27
申请人： Kenneth C. Struven
发明人： Kenneth C. Struven
IPC分类号： B08B310
CPC分类号： H01L21/67313 , B08B3/12 , H01L21/67057 , H01L21/67326 , Y10S134/902
摘要： A cassette for supporting electrical component substrates in a megasonic processing bath includes a pair of end panels spaced apart longitudinally, a pair of side rails extending longitudinally along opposed sides of the substrate cassette, and at least one bottom support extending between lower portions of the end panels. The supports include a plurality of shallow channels extending laterally therein and spaced regularly therealong to receive edge portions of the substrates. The side rails and bottom supports of the cassette are all formed of plate components that are dimensioned to transmit the maximum amount of the megasonic energy projected into the processing bath, so that the components do not cause sound-shadowing of the substrates supported in the cassette. The side rails and bottom supports are formed of narrow plates having a thickness equal to an integer multiple (i.e., 1, 2, 3, etc.) or an even fractional (i.e., ½, ¼, etc.) number of wavelengths of the ultrasonic energy in the material that comprises the side rails and bottom supports. The wavelength matching dimensions of the structural components couples the sound energy into the quartz to a maximum extent, and it is transmitted through the quartz to the liquid bath as well as to the substrates supported by the structural components. In addition, the narrow plate components may be tilted to be non-horizontal to shed detrimental bubbles that may form in the liquid of the megasonic bath.
摘要翻译：一种用于在兆声波处理槽中支撑电气元件基板的盒子包括一对沿纵向隔开的端面板，一对沿着基板盒的相对侧纵向延伸的侧轨，以及至少一个在端部的下部之间延伸的底部支撑件面板。支撑件包括多个在其中横向延伸并且间隔规则地延伸的浅槽，以容纳基板的边缘部分。盒的侧轨和底部支撑都由板组件形成，其尺寸被设计成传递投射到处理槽中的最大量的兆声波能量，使得部件不会引起支撑在盒中的基板的声音遮蔽。侧轨和底部支撑件由厚度等于整数倍（即1,2,3等）或甚至分数（即，1/2，1/4等）的波长的窄板形成在包括侧轨和底支撑的材料中的超声波能量。结构部件的波长匹配尺寸将声能最大限度地耦合到石英中，并且其通过石英传输到液槽以及由结构部件支撑的基板。此外，窄板部件可以倾斜成非水平的，以排除可能在兆瓦浴液体中形成的有害气泡。

6. 发明申请

US20070215173A1 Heated single wafer megasonic processing plate 审中-公开
标题翻译：加热单晶片超声波处理板
公开(公告)号：US20070215173A1
公开(公告)日：2007-09-20
申请号：US11725105
申请日：2007-03-16
申请人： Paul V. Mendes , Kenneth C. Struven , Michael Olesen
发明人： Paul V. Mendes , Kenneth C. Struven , Michael Olesen
IPC分类号： B08B3/12 , B08B6/00 , C23G1/00
CPC分类号： H01L21/67057 , H01L21/67086
摘要： A method and apparatus for heating a megasonic wafer processing plate to approximate the temperature of the processing liquid, whereby the chemical processing of the wafer is optimized. Heater blankets may be secured to the back side of the megasonic plate, or internal heating elements or passages may be disposed within the plate.
摘要翻译：一种用于加热兆比特晶片处理板以近似处理液体的温度的方法和装置，从而优化了晶片的化学处理。加热器毯可以固定到兆声道板的背面，或者可以在板内设置内部加热元件或通道。

7. 发明授权

US06523557B2 Megasonic bath 失效
标题翻译：超声波浴
公开(公告)号：US06523557B2
公开(公告)日：2003-02-25
申请号：US09738463
申请日：2000-12-13
申请人： Kenneth C. Struven
发明人： Kenneth C. Struven
IPC分类号： B08B312
CPC分类号： H01L21/67057 , B08B3/12 , Y10S134/902
摘要： In a substrate bath that processes substrate wafers using megasonic energy, a tank that is provided with reflecting surfaces that direct the megasonic energy to those portions of the substrates that would otherwise be sonically shadowed by the cassette that supports the substrates. In one aspect, a pair of curved wall surfaces are formed within the tank, each extending from one side wall to the bottom wall in curvilinear fashion and oriented longitudinally, the paired curved wall surfaces being disposed in laterally spaced, enantiomorpic relationship. The curved surfaces are arranged so that a significant amount of the megasonic energy impinges at an angle less than the critical angle, so that the energy is reflected in a diverging field that intersects the substrates and strikes those portions of the substrates that are shadowed by the cassette structure. Thus the megasonic cleaning, (etching or processing of the substrate) process is improved significantly.
摘要翻译：在使用兆声波能量处理衬底晶片的衬底浴中，设置有反射表面的罐，该反射表面将兆声波能量引导到否则将被支撑衬底的盒的声音遮蔽的衬底的那些部分。在一个方面，在槽内形成一对弯曲的壁表面，每一个弯曲的壁表面以曲线形式从一个侧壁延伸到底壁并纵向定向，所述一对弯曲的壁表面以横向间隔开的对映异体关系设置。弯曲表面布置成使得大量的兆声波能量以小于临界角的角度入射，使得能量反射在与基板相交的发散场中，并且撞击被基底遮蔽的基底的那些部分盒式结构。因此，显着改善了超声波清洗（基板的蚀刻或加工）工艺。

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