会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 10. 发明授权
    • InxGa1-xAsYP1-Y quaternary etch stop for improved chemical resistivity of gallium arsenide field effect transistors
    • InxGa1-xAsYP1-Y四次蚀刻停止,用于提高砷化镓场效应晶体管的化学电阻率
    • US08288253B1
    • 2012-10-16
    • US13173006
    • 2011-06-30
    • Allen W. HansonAnthony Kaleta
    • Allen W. HansonAnthony Kaleta
    • H01L21/20H01L21/36
    • H01L21/30612H01L29/201H01L29/66462
    • A process for fabricating a semiconductor device. The process including (a) growing a channel layer on a buffer layer, (b) growing a barrier layer on the channel layer, (c) epitaxially growing a quaternary etch-stop layer on the barrier layer, (d) growing a first contact layer on the quaternary etch-stop layer, (e) growing a second contact layer on the first contact layer, (f) etching portions of the second contact layer to reveal a first recess surface, and (g) etching portions of the first contact layer to reveal a second recess surface. The second contact layer may be a highly doped contact layer. The second recess surface generally forms a gate region. The first and the second contact layers have a first etch rate and the quaternary etch-stop layer has a second etch rate in a chosen first etch chemistry.
    • 一种制造半导体器件的工艺。 该方法包括(a)在缓冲层上生长通道层,(b)在沟道层上生长阻挡层,(c)在阻挡层上外延生长四分之一蚀刻停止层,(d)生长第一接触 (e)在第一接触层上生长第二接触层,(f)蚀刻第二接触层的部分以露出第一凹部表面,以及(g)蚀刻第一接触部分 层以露出第二凹槽表面。 第二接触层可以是高度掺杂的接触层。 第二凹面通常形成栅极区域。 第一和第二接触层具有第一蚀刻速率,并且四次蚀刻停止层在所选择的第一蚀刻化学中具有第二蚀刻速率。