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1. 发明申请

US20070234951A1 METHODS AND APPARATUS FOR CLEANING A SUBSTRATE 审中-公开
标题翻译：清洗基板的方法和装置
公开(公告)号：US20070234951A1
公开(公告)日：2007-10-11
申请号：US11690621
申请日：2007-03-23
申请人： WEI LU , Jianshe Tang , Alexander Ko , Nelson Yee , Bo Xie , John Lee , Richard Endo
发明人： WEI LU , Jianshe Tang , Alexander Ko , Nelson Yee , Bo Xie , John Lee , Richard Endo
IPC分类号： B05C5/00
CPC分类号： H01L21/67051 , B08B3/024 , H01L21/6704
摘要： The present invention provides methods, apparatus, and systems for cleaning a substrate that include a controller and a nozzle coupled to the controller. The controller is adapted to direct the nozzle to dispense a uniform fluid spray pattern onto a substrate. The controller is adapted create the uniform fluid spray pattern by adjusting at least one operational parameter of the nozzle to cause a predefined percentage of droplets to be within a predetermined size range. Numerous other aspects are disclosed.
摘要翻译：本发明提供了用于清洁衬底的方法，装置和系统，其包括控制器和连接到控制器的喷嘴。控制器适于引导喷嘴将均匀的流体喷雾图案分配到基底上。通过调整喷嘴的至少一个操作参数来使控制器适应于产生均匀的流体喷射图案，以使预定百分比的液滴在预定的尺寸范围内。公开了许多其他方面。

2. 发明申请

US20080163891A1 METHOD AND APPARATUS OF MULTI STEPS ATOMIZATION FOR GENERATING SMALLER DIW DROPPLETS FOR WAFER CLEANING 审中-公开
标题翻译：用于生成用于清洁的小型二极管的多步骤原理的方法和装置
公开(公告)号：US20080163891A1
公开(公告)日：2008-07-10
申请号：US11621855
申请日：2007-01-10
申请人： JIANSHE TANG , Wei Lu , Bo Xie , Elias Martinez , Zhiyong Li , Kent Child , Richard Endo , Konstantin Smekalin
发明人： JIANSHE TANG , Wei Lu , Bo Xie , Elias Martinez , Zhiyong Li , Kent Child , Richard Endo , Konstantin Smekalin
IPC分类号： B08B3/00
CPC分类号： H01L21/02065 , H01L21/02057 , H01L21/67051
摘要： An apparatus for cleaning a wafer has a first chamber and a component coupled to the first chamber. The first chamber has a first input to form de-ionized water droplets. The component is coupled to the first chamber to further atomize and apply the atomized de-ionized water droplets on the wafer.
摘要翻译：用于清洁晶片的装置具有第一室和耦合到第一室的部件。第一室具有形成去离子水滴的第一输入。该组件耦合到第一室以进一步雾化并将雾化的去离子水滴施加在晶片上。

3. 发明申请

US20070254098A1 Apparatus for single-substrate processing with multiple chemicals and method of use 审中-公开
标题翻译：具有多种化学品的单基板处理装置和使用方法
公开(公告)号：US20070254098A1
公开(公告)日：2007-11-01
申请号：US11413651
申请日：2006-04-28
申请人： Alexander Ko , Richard Endo , Brian Brown , Kent Child , Ralph Wadensweiller
发明人： Alexander Ko , Richard Endo , Brian Brown , Kent Child , Ralph Wadensweiller
IPC分类号： B05D3/12 , B05C13/02
CPC分类号： H01L21/67051 , B05D1/005 , B05D7/56
摘要： A single-substrate apparatus for wet chemical processing of one or multiple sides of a substrate is described. Embodiments of the present invention enable multiple chemicals to be applied to the substrate in succession and reclaimed substantially free of cross contamination between chemicals. In an embodiment of the present invention, a rotatable fluid diverter is positioned between a rotatable pedestal and a nonrotatable multi-level catch cup to funnel fluid shed from a substrate to a predetermined level of the catch cup. The rotatable fluid diverter is designed to expel fluid over a narrow spray angle and thereby enable the pitch of the levels in the catch cup to be reduced so that the chamber volume of the single-substrate apparatus is reduced. In another embodiment of the present invention, the rotatable pedestal is moveable so that the fluid shed from the substrate can be directed to away from the multi-level catch cup.
摘要翻译：描述了用于衬底的一个或多个侧面的湿化学处理的单衬底装置。本发明的实施方案使多种化学品能够连续地应用于基材并且基本上没有化学品之间的交叉污染而被回收。在本发明的一个实施例中，可转动的流体转向器位于可转动的底座和不可转动的多级夹紧杯之间，用于使流体从衬底排出到捕捉杯的预定水平。可旋转流体转向器被设计成在窄的喷雾角度上排出流体，从而使得捕获杯中的液位的间距减小，使得单基底装置的腔体积减小。在本发明的另一个实施例中，可旋转底座是可移动的，使得从衬底脱落的流体可以被引导离开多级抓杯。

4. 发明授权

US09175391B2 Apparatus and method for combinatorial gas distribution through a multi-zoned showerhead 有权
标题翻译：通过多区淋浴喷头进行组合气体分配的装置和方法
公开(公告)号：US09175391B2
公开(公告)日：2015-11-03
申请号：US13116796
申请日：2011-05-26
申请人： Richard Endo , Tony P. Chiang
发明人： Richard Endo , Tony P. Chiang
IPC分类号： C23C16/455 , C23C16/52 , C23C16/04 , H01J37/32
CPC分类号： C23C16/45565 , C23C16/04 , C23C16/455 , C23C16/45514 , C23C16/45517 , C23C16/45519 , C23C16/45587 , C23C16/52 , H01J37/32366 , H01J37/3244 , H01J37/32449
摘要： A multi-zone, combinatorial, single wafer showerhead is used to concurrently develop hardware, materials, unit processes, and unit process sequences. The multi-zone, combinatorial, single wafer showerhead utilizes showerhead pucks to perform process sequences on isolated regions of a single substrate. The showerhead pucks are designed so that they are easily interchangeable to allow the characterization of the interaction between hardware characteristics, process parameters, and their influence on the result of the process sequence.
摘要翻译：多区域，组合单晶片喷头用于同时开发硬件，材料，单元工艺和单元工艺顺序。多区域，组合单晶片喷头利用喷头冰球在单个基板的隔离区域上执行处理顺序。喷头冰球设计成使得它们可以容易地互换，以便表征硬件特性，过程参数及其对过程顺序结果的影响之间的相互作用。

5. 发明申请

US20120301616A1 APPARATUS AND METHOD FOR COMBINATORIAL GAS DISTRIBUTION THROUGH A MULTI-ZONED SHOWERHEAD 有权
标题翻译：通过多区淋浴器组合气体分配的装置和方法
公开(公告)号：US20120301616A1
公开(公告)日：2012-11-29
申请号：US13116796
申请日：2011-05-26
申请人： Richard Endo , Tony P. Chiang
发明人： Richard Endo , Tony P. Chiang
IPC分类号： C23C16/455 , C23C16/52 , C23C16/458
CPC分类号： C23C16/45565 , C23C16/04 , C23C16/455 , C23C16/45514 , C23C16/45517 , C23C16/45519 , C23C16/45587 , C23C16/52 , H01J37/32366 , H01J37/3244 , H01J37/32449
摘要： A multi-zone, combinatorial, single wafer showerhead is used to concurrently develop hardware, materials, unit processes, and unit process sequences. The multi-zone, combinatorial, single wafer showerhead utilizes showerhead pucks to perform process sequences on isolated regions of a single substrate. The showerhead pucks are designed so that they are easily interchangeable to allow the characterization of the interaction between hardware characteristics, process parameters, and their influence on the result of the process sequence.
摘要翻译：多区域，组合单晶片喷头用于同时开发硬件，材料，单元工艺和单元工艺顺序。多区域，组合单晶片喷头利用喷头冰球在单个基板的隔离区域上执行处理顺序。喷头冰球设计成使得它们可以容易地互换，以便表征硬件特性，过程参数及其对过程顺序结果的影响之间的相互作用。

6. 发明申请

US20120160173A1 Vapor Based Processing System with Purge Mode 有权
标题翻译：具有吹扫模式的蒸汽处理系统
公开(公告)号：US20120160173A1
公开(公告)日：2012-06-28
申请号：US12978403
申请日：2010-12-23
申请人： Richard Endo , Edward Haywood
发明人： Richard Endo , Edward Haywood
IPC分类号： C23C16/455 , C23C16/52 , C23C16/458
CPC分类号： C23C16/45587 , C23C16/4401 , C23C16/4408 , C23C16/4412 , C23C16/45525 , C23C16/45544 , C23C16/45565 , C23C16/45574
摘要： Embodiments of the present invention provide vapor deposition tools. In one example, a vapor deposition tool includes housing. A substrate support is positioned within the housing and configured to support a substrate. A backing plate is positioned above the substrate support. A showerhead is positioned between the substrate support and the backing plate and has a plurality of openings therethrough. A fluid trap member is positioned around a periphery of the showerhead. A fluid trap member actuator is coupled to the fluid trap member and configured to move the fluid trap member between first and second positions relative to the backing plate.
摘要翻译：本发明的实施例提供蒸镀工具。在一个实例中，气相沉积工具包括壳体。衬底支撑件定位在壳体内并且构造成支撑衬底。衬板位于衬底支架上方。喷头位于基板支撑件和背板之间，并且具有穿过其中的多个开口。流体捕获构件围绕喷头的周边定位。流体捕集器构件致动器联接到流体捕获构件并且构造成使流体捕获构件相对于背板在第一和第二位置之间移动。

7. 发明申请

US20090047881A1 COMBINATORIAL PROCESSING INCLUDING ROTATION AND MOVEMENT WITHIN A REGION 有权
标题翻译：组合加工，包括一个地区的旋转和运动
公开(公告)号：US20090047881A1
公开(公告)日：2009-02-19
申请号：US11838653
申请日：2007-08-14
申请人： Peter Satitpunwaycha , Richard Endo , Zachary Fresco , Nitin Kumar
发明人： Peter Satitpunwaycha , Richard Endo , Zachary Fresco , Nitin Kumar
IPC分类号： B24B7/04 , H01L21/461
CPC分类号： H01L21/67046 , B24B37/00 , C25D17/00 , C25D21/12 , H01L21/67051 , H01L21/68764 , H01L21/68785
摘要： Combinatorial processing including rotation and movement within a region is described, including defining multiple regions of at least one substrate, processing the multiple regions of the at least one substrate in a combinatorial manner, rotating a head in one of the multiple regions to perform the processing, and repositioning the head relative to the one of the multiple regions while rotating the head during the processing.
摘要翻译：描述包括区域内的旋转和移动的组合处理，包括限定至少一个基板的多个区域，以组合的方式处理至少一个基板的多个区域，在多个区域中的一个区域中旋转头部以执行处理并且在处理期间旋转头部时，相对于多个区域中的一个重新定位头部。

8. 发明授权

US08906160B2 Vapor based processing system with purge mode 有权
标题翻译：具有吹扫模式的蒸汽处理系统
公开(公告)号：US08906160B2
公开(公告)日：2014-12-09
申请号：US12978403
申请日：2010-12-23
申请人： Richard Endo , Edward Haywood
发明人： Richard Endo , Edward Haywood
IPC分类号： C23C16/455 , C23C16/40 , C23C16/44
CPC分类号： C23C16/45587 , C23C16/4401 , C23C16/4408 , C23C16/4412 , C23C16/45525 , C23C16/45544 , C23C16/45565 , C23C16/45574
摘要： Embodiments of the present invention provide vapor deposition tools. In one example, a vapor deposition tool includes housing. A substrate support is positioned within the housing and configured to support a substrate. A backing plate is positioned above the substrate support. A showerhead is positioned between the substrate support and the backing plate and has a plurality of openings therethrough. A fluid trap member is positioned around a periphery of the showerhead. A fluid trap member actuator is coupled to the fluid trap member and configured to move the fluid trap member between first and second positions relative to the backing plate.
摘要翻译：本发明的实施例提供蒸镀工具。在一个实例中，气相沉积工具包括壳体。衬底支撑件定位在壳体内并且构造成支撑衬底。衬板位于衬底支架上方。喷头位于基板支撑件和背板之间，并且具有穿过其中的多个开口。流体捕获构件围绕喷头的周边定位。流体捕集器构件致动器联接到流体捕获构件并且构造成使流体捕获构件相对于背板在第一和第二位置之间移动。

9. 发明申请

US20120315396A1 APPARATUS AND METHOD FOR COMBINATORIAL PLASMA DISTRIBUTION THROUGH A MULTI-ZONED SHOWERHEAD 审中-公开
标题翻译：通过多区淋浴器组合等离子体分布的装置和方法
公开(公告)号：US20120315396A1
公开(公告)日：2012-12-13
申请号：US13159188
申请日：2011-06-13
申请人： Richard Endo , Kent Riley Child
发明人： Richard Endo , Kent Riley Child
IPC分类号： C23C16/455 , C23C16/52 , C23C16/50 , C23C16/458
CPC分类号： C23C16/04 , B01J2219/0043 , B01J2219/00443 , B01J2219/00527 , B01J2219/00585 , B01J2219/00596 , B01J2219/00603 , B01J2219/00659 , C23C16/45519 , C23C16/45565 , C23C16/45574 , C23C16/5096 , C23C16/52 , H01J37/3244 , H01J37/32449
摘要： A multi-zone, combinatorial, single wafer showerhead is used to concurrently develop hardware, materials, unit processes, and unit process sequences. The multi-zone, combinatorial, single wafer showerhead utilizes showerhead pucks to perform process sequences on isolated regions of a single substrate. The showerhead pucks are designed so that they are easily interchangeable to allow the characterization of the interaction between hardware characteristics, process parameters, and their influence on the result of the process sequence.
摘要翻译：多区域，组合单晶片喷头用于同时开发硬件，材料，单元工艺和单元工艺顺序。多区域，组合单晶片喷头利用喷头冰球在单个基板的隔离区域上执行处理顺序。喷头冰球设计成使得它们可以容易地互换，以便表征硬件特性，过程参数及其对过程顺序结果的影响之间的相互作用。

10. 发明授权

US08283264B2 Method and system for isolated and discretized process sequence integration 失效
标题翻译：用于离散和离散化过程序列整合的方法和系统
公开(公告)号：US08283264B2
公开(公告)日：2012-10-09
申请号：US12954328
申请日：2010-11-24
申请人： Tony P. Chiang , Richard Endo , James Tsung
发明人： Tony P. Chiang , Richard Endo , James Tsung
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： C23C16/52 , C23C14/042 , C23C14/54 , C23C14/568 , H01L21/67184 , H01L21/67207 , H01L21/67236 , H01L21/67276 , H01L21/67745 , H01L21/67769
摘要： A system for processing a semiconductor substrate is provided. The system includes a mainframe having a plurality of modules attached thereto. The modules include processing modules, storage modules, and transport mechanisms. The processing modules may include combinatorial processing modules and conventional processing modules, such as surface preparation, thermal treatment, etch and deposition modules. In one embodiment, at least one of the modules stores multiple masks. The multiple masks enable in-situ variation of spatial location and geometry across a sequence of processes and/or multiple layers of a substrate to be processed in another one of the modules. A method for processing a substrate is also provided.
摘要翻译：提供了一种用于处理半导体衬底的系统。该系统包括具有附接到其上的多个模块的主机。模块包括处理模块，存储模块和传输机制。处理模块可以包括组合处理模块和常规处理模块，例如表面处理，热处理，蚀刻和沉积模块。在一个实施例中，至少一个模块存储多个掩模。多个掩模使得能够在另一个模块中要处理的衬底的一系列工艺和/或多个层的空间位置和几何形状的原位变化。还提供了一种处理基板的方法。

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