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    • 1. 发明申请
    • AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED WITH APPROXIMATION AND FINE DIFFRACTION MODELS
    • 自动化过程控制使用参数确定与近似和微分散模型
    • US20090063077A1
    • 2009-03-05
    • US11848214
    • 2007-08-30
    • WEI LIUSHIFANG LIWEIDUNG YANGMANUEL MADRIAGA
    • WEI LIUSHIFANG LIWEIDUNG YANGMANUEL MADRIAGA
    • G06F19/00
    • G05B19/41875G01N21/4788G03F7/70625G05B2219/32182G05B2219/32186G05B2219/32188G05B2219/37224
    • Provided is a method of controlling a fabrication cluster using a machine learning system, the machine learning system trained developed using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signal is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A first machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A library of simulated fine diffraction signals and profile parameters is generated using the trained first machine learning system and using ranges and corresponding resolutions of the profile parameters. The library is used to train a second machine learning system. A measured diffraction signal is input into the trained second machine learning system to determine at least one profile parameter. The at least one profile parameter is used to adjust at least one process parameter or equipment setting of the fabrication cluster.
    • 提供了一种使用机器学习系统来控制制造集群的方法,使用光学测量模型训练的机器学习系统,包括轮廓模型,近似衍射模型和精细衍射模型的光学测量模型。 基于结构的近似衍射模型生成模拟近似衍射信号。 通过从每个模拟的细衍射信号中减去模拟近似衍射信号并与相应的轮廓参数配对来获得差分衍射信号。 使用差分衍射信号和相应的轮廓参数对来训练第一机器学习系统。 使用训练有素的第一机器学习系统并使用轮廓参数的范围和相应的分辨率来生成模拟的细衍射信号和轮廓参数的库。 该图书馆用于训练第二台机器学习系统。 测量的衍射信号被输入到训练有素的第二机器学习系统中以确定至少一个轮廓参数。 至少一个轮廓参数用于调整至少一个制造集群的过程参数或设备设置。
    • 2. 发明申请
    • Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology
    • 在光学计量学中使用近似和精细衍射模型确定结构的轮廓参数
    • US20090063076A1
    • 2009-03-05
    • US11848154
    • 2007-08-30
    • WEI LIUSHIFANG LIWEIDONG YANG
    • WEI LIUSHIFANG LIWEIDONG YANG
    • G01N37/00
    • G02B27/0012G01B11/0625G03F7/705G03F7/70625
    • Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A measured diffraction signal adjusted by the simulated approximation diffraction signal is input into the trained machine learning system and generates the corresponding profile parameters.
    • 提供了一种用于使用光学测量模型来确定结构的一个或多个轮廓参数的方法,光学测量模型包括轮廓模型,近似衍射模型和细小的衍射模型。 基于结构的近似衍射模型生成模拟近似衍射信号。 通过从每个模拟的细衍射信号中减去模拟的近似衍射信号并与相应的轮廓参数配对来获得一组差分衍射信号。 使用差分衍射信号和相应的轮廓参数对来训练机器学习系统。 通过模拟近似衍射信号调整的测量衍射信号被输入到经过训练的机器学习系统中,并产生相应的轮廓参数。
    • 3. 发明申请
    • DETERMINING PROFILE PARAMETERS OF A STRUCTURE USING APPROXIMATION AND FINE DIFFRACTION MODELS IN OPTICAL METROLOGY
    • 使用光学计量学中的近似和微分衍射模型确定结构的剖面参数
    • US20090063075A1
    • 2009-03-05
    • US11846462
    • 2007-08-28
    • WEI LIUSHIFANG LIWEIDONG YANG
    • WEI LIUSHIFANG LIWEIDONG YANG
    • G06F19/00
    • G01B11/24G03F7/70625
    • Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters and used to generate a library of difference diffraction signals. A measured diffraction signal adjusted by the simulated approximation diffraction signal is matched against the library to determine at least one profile parameter of the structure.
    • 提供了一种用于使用光学测量模型来确定结构的一个或多个轮廓参数的方法,光学测量模型包括轮廓模型,近似衍射模型和细小的衍射模型。 基于结构的近似衍射模型生成模拟近似衍射信号。 通过从每个模拟的细衍射信号中减去模拟的近似衍射信号并与相应的轮廓参数配对并用于产生差分衍射信号的文库,获得一组差分衍射信号。 通过模拟近似衍射信号调整的测量的衍射信号与文库匹配以确定结构的至少一个轮廓参数。
    • 4. 发明申请
    • ADJUSTING DEVICE
    • 调整设备
    • US20130233991A1
    • 2013-09-12
    • US13543912
    • 2012-07-09
    • WEI LIUXUE-DONG TANG
    • WEI LIUXUE-DONG TANG
    • F16M13/00
    • F16M11/046
    • An adjusting device for adjusting a height of an object, includes a support base, an adjusting portion movably secured to the support base and adapted for holding the object, a driving portion engaging with the adjusting portion, and a limiting mechanism. The adjusting portion is capable of rotating to drive the adjusting portion to move relative to the support base to adjust the height of the object. The limiting mechanism is adapted to prevent the adjusting portion from rotating when the adjusting portion is driven to move relative to the support base.
    • 用于调节物体高度的调节装置包括支撑基座,可移动地固定到支撑基座并适于保持物体的调节部分,与调节部分接合的驱动部分和限制机构。 调节部分能够旋转以驱动调节部分相对于支撑基座移动以调节物体的高度。 限制机构适于当调节部分被驱动以相对于支撑基座移动时防止调节部分旋转。
    • 7. 发明申请
    • ELECTRONIC DEVICE HAVING DETECTOR WINDOW
    • 具有检测器窗口的电子设备
    • US20120182674A1
    • 2012-07-19
    • US13206815
    • 2011-08-10
    • TING-TING ZHAOWEI LIUMIN-LI LIBAO-GANG ZHAO
    • TING-TING ZHAOWEI LIUMIN-LI LIBAO-GANG ZHAO
    • H05K7/00
    • G11B17/0405G11B33/10
    • An electronic device includes a body, a detector window, and a fixing mechanism for securing the detector window to the body. The detector window is capable of being inserted into the body in a first direction, and includes at least one hook member. The fixing mechanism includes at least one latching member, at least one first limiting member and at least one second limiting member. The at least one latching member hooks the at least one hook member to limit the movement of the detector window in the first direction. The at least one latching first limiting member and the at least one second limiting member respectively are arranged opposite sides of the latching member and respectively resisting against opposite sides of the at least one hook member to cooperatively limit the movement of the detector window in a second direction perpendicular to the first direction.
    • 电子设备包括主体,检测器窗口和用于将检测器窗口固定到主体的固定机构。 检测器窗口能够沿第一方向插入到主体中,并且包括至少一个钩构件。 固定机构包括至少一个闩锁构件,至少一个第一限制构件和至少一个第二限制构件。 所述至少一个闩锁构件钩住所述至少一个钩构件以限制所述检测器窗在第一方向上的移动。 所述至少一个闩锁第一限制件和所述至少一个第二限制件分别布置在所述闩锁构件的相对侧面并且分别抵靠所述至少一个钩构件的相对侧面以协同地限制所述检测器窗口在第二 方向垂直于第一方向。