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1. 发明申请

US20160122292A1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD 审中-公开
标题翻译：基站发生器，含有基站发生器的基板反应组合物和基站生成方法
公开(公告)号：US20160122292A1
公开(公告)日：2016-05-05
申请号：US14901525
申请日：2014-06-25
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD. , TOKYO UNIVERSITY OF SCIENCE FOUNDATION
发明人： Nobuhiko SAKAI , Kosuke YANABA , Koji ARIMITSU
IPC分类号： C07C279/26 , G03F7/004 , C07C65/28 , C07D209/48 , C07C59/84 , C07D311/86
CPC分类号： C07C279/26 , B01J19/123 , B01J19/127 , B01J19/128 , C07C59/84 , C07C65/28 , C07C2601/14 , C07C2603/24 , C07D209/48 , C07D311/86 , G03F7/0045
摘要： It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc.The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. (wherein R1 to R5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z− represents an anion derived from a carboxylic acid having a specific structure.)
摘要翻译：本发明的主题是提供一种对通用有机溶剂具有高溶解度的碱发生剂，可以直接溶解在诸如环氧基化合物的碱反应性化合物中，还具有高的性能耐碱性和低亲核性，并且产生强碱，包含碱产生剂和碱反应性化合物的碱反应性组合物，以及产生碱的方法等。本发明涉及由通式（A），包含该化合物的碱发生剂，包含碱发生剂和碱反应性化合物的碱反应性组合物，以及产生碱的方法等（其中R 1至R 5各自独立地表示氢原子;烷基;可具有取代基的芳基;或可具有取代基的芳烷基，R6表示氢原子;可具有取代基的烷基;可具有取代基的烷基甲基炔基; 可以具有取代基的芳基; 或可具有取代基的芳基烷基，R7表示氢原子; 可以具有氨基的烷基; 可以具有取代基的芳基; 或可以具有取代基的芳烷基，Z-表示衍生自具有特定结构的羧酸的阴离子。）

2. 发明申请

US20190002403A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR 审中-公开
公开(公告)号：US20190002403A1
公开(公告)日：2019-01-03
申请号：US15747253
申请日：2016-07-22
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD.
发明人： Kosuke YANABA , Nobuhiko SAKAI , Shigeaki IMAZEKI
IPC分类号： C07C279/26 , C08G59/40 , C08G75/02 , C08L63/00 , C08K5/31
CPC分类号： C07C279/26 , C07C251/30 , C07C2601/14 , C07F5/02 , C07F9/5463 , C08G59/4021 , C08G59/42 , C08G59/66 , C08G59/686 , C08G75/02 , C08K5/29 , C08K5/31 , C08L63/00 , C08L101/00 , C08L2312/06 , C09K3/00
摘要： The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. In the formula, four pieces of R1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R2 each independently represent a fluorine atom or a trifluoromethyl group; R3, R6, R7 and R10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R4 and R5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R4 and R5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R8 and R9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R8 and R9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R3 to R10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

3. 发明申请

US20160342084A1 ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL 审中-公开
标题翻译：酸和放射生物剂和产生酸和放射性的方法
公开(公告)号：US20160342084A1
公开(公告)日：2016-11-24
申请号：US15038955
申请日：2014-11-21
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD.
发明人： Nobuhiko SAKAI , Kosuke YANABA
IPC分类号： G03F7/004 , C07C317/14 , C07D335/16
摘要： It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical.The present invention relates to a compound represented by the general formula (A); an acid- and radical-generating agent comprising the compound; and a method for generating an acid and a radical: wherein n pieces of R1 each independently represent an alkyl group, which may have a specific functional group in the chain, or in which a hydrogen atom may be substituted by a halogen atom; an alkoxy group, in which a hydrogen atom may be substituted by a halogen atom; an aryl group or an aryloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; or an arylalkyl group or an arylalkyloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; n pieces of R2 and R3 each independently represent a hydrogen atom, an alkyl group or an alkoxycarbonyl group; R4 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an alkoxycarbonyl group, a dialkylamino group or a nitro group; Y represents an oxygen atom, a sulfur atom, or a carbonyl group; n pieces of Z each independently represent a sulfonyl group or an alkoxyphosphoryl group; n represents 1 or 2.

4. 发明申请

US20160340374A1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR 审中-公开
标题翻译：基于硼酸盐的基因发生器和包含这种基因发生器的基础反应性组合物
公开(公告)号：US20160340374A1
公开(公告)日：2016-11-24
申请号：US15114048
申请日：2015-01-22
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD.
发明人： Nobuhiko SAKAI , Kosuke YANABA
IPC分类号： C07F9/22 , G03F7/004 , C07F5/02 , C07D487/04 , C07C279/26 , C07D233/50
CPC分类号： C07F9/22 , C07C229/26 , C07C279/02 , C07C279/04 , C07C279/16 , C07C279/18 , C07C279/26 , C07C2601/14 , C07D233/50 , C07D487/04 , C07F5/027 , C07F9/065 , C07F9/5337 , C07F9/572 , C07F9/6584 , C07F9/65848 , G03F7/0045
摘要： An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound.The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound. (wherein R1 represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R2 to R4 each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z+ represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)
摘要翻译：（其中R1表示烷基;可被卤素原子，烷基，烷氧基或烷硫基取代的芳基炔基;烯基; 2-糠基乙炔基; 2-噻吩基乙炔基;或 2,6-二噻吩基; R 2〜R 4各自独立地表示烷基;可被卤素原子，烷基，烷氧基或烷硫基取代的芳基炔基;可被取代的芳基具有卤素原子，烷基，烷氧基或烷硫基;呋喃基;噻吩基或N-烷基取代的吡咯基; Z +表示具有胍基的铵阳离子，双胍基或磷腈鎓基或磷鎓阳离子）

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