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1. 发明申请

US20080073563A1 Exposure apparatus that includes a phase change circulation system for movers 审中-公开
标题翻译：包括移动器的相变循环系统的曝光装置
公开(公告)号：US20080073563A1
公开(公告)日：2008-03-27
申请号：US11479628
申请日：2006-07-01
申请人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
发明人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
IPC分类号： G01F23/00
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).
摘要翻译：用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330）。循环系统（330）将循环流体（378）引导到流体通道（370）中。循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。通过这种设计，可以优化液体（378A）和气体（378B）的管道。另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于通道入口处的循环流体（378）的温度（374）。此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体的状态的压力控制装置（996） 978）在通道入口附近（974）。通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。

2. 发明授权

US07869000B2 Stage assembly with lightweight fine stage and low transmissibility 有权
标题翻译：舞台装配轻巧细腻，传送率低
公开(公告)号：US07869000B2
公开(公告)日：2011-01-11
申请号：US11048405
申请日：2005-01-31
申请人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
发明人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70716
摘要： A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.
摘要翻译：沿着第二轴线沿着第三轴线沿着第一轴线移动工件（200）的台架组件（220）包括第一阶段（238），第一移动器组件（242），其使第一阶段（238）移动），保持所述工件（200）的第二级（240），第二移动器组件（244）和非接触式轴承（257）。第二移动器组件（244）沿着第一轴线沿着第二轴线和第三轴线相对于第一阶段（238）移动第二阶段（240）。非接触轴承（257）支撑第二级（240）的质量。此外，非接触式轴承（257）允许第二级（240）相对于第一级（238）沿着第一轴线并沿着第二轴线移动。第二移动器组件（244）可以以至少四个移动程度移动第二平台（240）。

3. 发明授权

US06963821B2 Stage counter mass system 失效
标题翻译：舞台柜体系
公开(公告)号：US06963821B2
公开(公告)日：2005-11-08
申请号：US10361700
申请日：2003-02-11
申请人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
发明人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
IPC分类号： B23Q11/00 , G03F7/20 , G01B11/24
CPC分类号： G03F7/70766 , B23Q11/0032 , G03F7/70725
摘要： A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.
摘要翻译：晶片台反质量组件通常包括支撑一个或多个阶段的基座和第一和第二反作用力。第一和第二阶段以一个或多个自由度移动。反恐怖主义至少有一个自由度，在理想条件下，可以抵抗运行阶段的运动，从而保持系统的重心，避免不必要的身体运动。然而，在实际情况下，反恐怖主义可能在行进或超越其理想轨迹。为了更紧密地跟踪理想轨迹，控制器启动微调电机，以将小的力施加到反作用体上，将其推向Y方向的参考位置。第二实施例还考虑到X位置，以消除扭矩的阶段。

4. 发明授权

US09007561B2 Immersion lithography apparatus with hydrophilic region encircling hydrophobic region which encircles substrate support 有权
标题翻译：浸没光刻设备，其环绕着包围衬底支撑的疏水区域的亲水区域
公开(公告)号：US09007561B2
公开(公告)日：2015-04-14
申请号：US13543238
申请日：2012-07-06
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a first subregion which substantially encircles the support, and a second subregion which substantially encircles the first subregion. The first subregion includes a first surface having a first characteristic and the second subregion includes a second surface having a second characteristic which is different from the first characteristic.
摘要翻译：曝光装置通过光学组件和设置在基板上的液体将光照射到基板上来曝光基板。曝光装置包括可相对于光学组件移动的舞台组件，舞台组件包括支撑衬底的支撑件，基本上环绕支撑件的第一子区域和基本上环绕第一子区域的第二子区域。第一子区域包括具有第一特征的第一表面，而第二子区域包括具有不同于第一特征的第二特征的第二表面。

5. 发明授权

US08243253B2 Lyophobic run-off path to collect liquid for an immersion lithography apparatus 有权
标题翻译：用于浸没式光刻设备的疏液流路以收集液体
公开(公告)号：US08243253B2
公开(公告)日：2012-08-14
申请号：US12155377
申请日：2008-06-03
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.
摘要翻译：用于将图像转印到装置的曝光装置包括光学组件，浸液系统和装置台组件。光学组件被定位成使得在装置上方存在间隙。浸没流体系统用浸没流体填充间隙。装置台组件包括倾斜区域，其有助于离开该间隙的浸没流体的移动远离装置。装置台组件可以包括收集区域和从收集区域回收浸没流体的回收系统。

6. 发明授权

US08094379B2 Optical arrangement of autofocus elements for use with immersion lithography 有权
标题翻译：用于浸没光刻的自动对焦元件的光学布置
公开(公告)号：US08094379B2
公开(公告)日：2012-01-10
申请号：US12461762
申请日：2009-08-24
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G02B3/12
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. A gap is formed between a member and a surface of the optical element through which the exposure beam does not pass. The liquid is supplied to the gap.
摘要翻译：光刻投影装置包括光学元件，通过该光学元件，用曝光光束照射基板。在曝光期间，光学元件和基板之间的空间被填充液体。在光学元件的部件和表面之间形成间隙，曝光光束不通过该光学元件。液体被供应到间隙。

7. 发明申请

US20110031416A1 Liquid jet and recovery system for immersion lithography 审中-公开
标题翻译：用于浸没光刻的液体喷射和回收系统
公开(公告)号：US20110031416A1
公开(公告)日：2011-02-10
申请号：US12923948
申请日：2010-10-15
申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G21G5/00 , G03B27/52
CPC分类号： G03F7/70341
摘要： A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge.
摘要翻译：用于制造半导体器件的光刻工具包括晶片台，透镜和液体分配组件，通过该液体分配组件将液体沿着远离所述晶片台的方向引导到设置在晶片台上的半导体晶片的表面和透镜之间半导体晶片在其边缘。

8. 发明授权

US07688421B2 Fluid pressure compensation for immersion lithography lens 有权
标题翻译：浸没式光刻镜的流体压力补偿
公开(公告)号：US07688421B2
公开(公告)日：2010-03-30
申请号：US11628942
申请日：2004-12-20
申请人： Douglas C. Watson , W. Thomas Novak
发明人： Douglas C. Watson , W. Thomas Novak
IPC分类号： G03B27/42 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70258 , G03F7/70341 , G03F7/70833 , G03F7/709
摘要： An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.
摘要翻译：一种浸没式光刻系统，用于补偿由浸液引起的光学位移。该系统包括光学组件（14），用于将由标线片（12）限定的图像投影到晶片（20）上。光学组件包括通过间隙（24）与晶片间隔开的最终光学元件（16）。提供浸入元件（22）以将浸没流体供应到间隙中并且回收逸出间隙的任何浸没流体。为由于浸没流体的压力变化引起的光学组件的最终光学元件上的力提供流体补偿系统。由变化的压力产生的所产生的力可能导致最终的光学元件变位。流体补偿系统被配置为在光学组件上提供基本相等但相反的力，以防止最终光学元件的位移。

9. 发明授权

US07443482B2 Liquid jet and recovery system for immersion lithography 有权
公开(公告)号：US07443482B2
公开(公告)日：2008-10-28
申请号：US11236759
申请日：2005-09-28
申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.

10. 发明申请

US20080239261A1 Run-off path to collect liquid for an immersion lithography apparatus 有权
标题翻译：径流路径，用于收集浸没光刻设备的液体
公开(公告)号：US20080239261A1
公开(公告)日：2008-10-02
申请号：US12155377
申请日：2008-06-03
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.
摘要翻译：用于将图像转印到装置的曝光装置包括光学组件，浸液系统和装置台组件。光学组件被定位成使得在装置上方存在间隙。浸没流体系统用浸没流体填充间隙。装置台组件包括倾斜区域，其有助于离开该间隙的浸没流体的移动远离装置。装置台组件可以包括收集区域和从收集区域回收浸没流体的回收系统。

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