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1. 发明申请

US20100053588A1 Substrate Stage movement patterns for high throughput While Imaging a Reticle to a pair of Imaging Locations 审中-公开
标题翻译：基底阶段运动模式，用于高吞吐量，同时将刻线图成像到一对成像位置
公开(公告)号：US20100053588A1
公开(公告)日：2010-03-04
申请号：US12545487
申请日：2009-08-21
申请人： Michael B. Binnard , Eric Peter Goodwin , W. Thomas Novak , Daniel Gene Smith
发明人： Michael B. Binnard , Eric Peter Goodwin , W. Thomas Novak , Daniel Gene Smith
IPC分类号： G03B27/32
CPC分类号： G03B27/32
摘要： A new and useful optical imaging process is provided for imaging of a plurality of substrates, in a manner that makes efficient use of an optical imaging system with the capability to image a single reticle to a pair of imaging locations, and addresses the types of substrate stage movement patterns to accomplish such imaging in an efficient and effective manner. At least three substrates are imaged by moving their substrate stages in patterns whereby (i) two of the substrates are completely imaged at respective imaging locations, (ii) a substrate on at least one of the three stages is partially imaged at one imaging location and then partially imaged at the other imaging location, and (iii) the movement of the stages of the three substrates is configured to avoid movement of the stages of the three substrates in paths that would cause interference between movement of any one substrate stage with movement of any of the other substrate stages.
摘要翻译：提供了一种新的有用的光学成像方法，用于对多个基板进行成像，使得能够有效利用具有将单个掩模版成像到一对成像位置的能力的光学成像系统，并且寻址基板的类型阶段运动模式以有效和有效的方式完成这种成像。通过以图案移动它们的衬底台来成像至少三个衬底，由此（i）两个衬底在相应的成像位置处完全成像，（ii）三个阶段中的至少一个的衬底在一个成像位置被部分成像，然后在另一个成像位置部分地成像，并且（iii）三个基板的台阶的移动被配置为避免三个基板的阶段在路径中的移动，这将导致任何一个基板台的移动之间的干涉，任何其他衬底阶段。

2. 发明申请

US20090310115A1 APPARATUS AND METHOD FOR EXPOSING ADJACENT SITES ON A SUBSTRATE 审中-公开
标题翻译：用于在基板上暴露邻接位点的装置和方法
公开(公告)号：US20090310115A1
公开(公告)日：2009-12-17
申请号：US12469619
申请日：2009-05-20
申请人： W. Thomas Novak , Michael B. Binnard
发明人： W. Thomas Novak , Michael B. Binnard
IPC分类号： G03B27/58
CPC分类号： G03F7/70358 , G03F7/70425
摘要： An exposure apparatus (10) for transferring a mask pattern (452) from a mask (12) to a substrate (14) includes an illumination system (18), a mask stage assembly (22), a substrate stage assembly (24), and a control system (28). The substrate (14) includes a first site (1) and a second site (2) that are adjacent to each other and that are aligned with each other along a first axis. The illumination system (18) generates an illumination beam (35) that is directed at the mask (12). The mask stage assembly (22) retains and positions the mask (12) relative to the illumination beam (35). The substrate stage assembly (24) retains and positions the substrate (14). The control system (28) controls the illumination system (18) and the substrate stage assembly (24) so that the mask pattern (452) is sequentially transferred to the first site (1) and then the second site (2) while the substrate stage assembly (24) is moving the substrate (24) in a first mask direction along the first axis. With this design, the substrate (14) is being moved in the same direction along the first axis during the exposure of successive sites (1) (2) and there is no need to stop the substrate (14) and/or reverse the direction of the substrate (14) during the exposure of successive sites (1) (2). This allows the exposure apparatus (1) to have improved throughput for a given acceleration and deceleration profile.
摘要翻译：一种用于将掩模图案（452）从掩模（12）传送到基板（14）的曝光装置（10）包括照明系统（18），掩模台组件（22），基板台组件（24）和控制系统（28）。基板（14）包括彼此相邻并且沿着第一轴线彼此对准的第一位置（1）和第二位置（2）。照明系统（18）产生指向掩模（12）的照明光束（35）。掩模台组件（22）相对于照明光束（35）保持并定位掩模（12）。衬底台组件（24）保持并定位衬底（14）。控制系统（28）控制照明系统（18）和衬底台组件（24），使得掩模图案（452）顺序地转移到第一位置（1），然后第二位置（2），同时衬底台架组件（24）沿着第一轴线沿着第一掩模方向移动基板（24）。通过这种设计，在连续的位置（1）（2）的曝光期间，衬底（14）沿着第一轴在相同的方向上移动，并且不需要停止衬底（14）和/或反向在连续部位（1）（2）的曝光期间的衬底（14）。这允许曝光装置（1）对于给定的加速和减速曲线具有改进的吞吐量。

3. 发明授权

US07466396B2 Lithography apparatus and method utilizing pendulum interferometer system 失效
标题翻译：利用摆锤干涉仪系统的平版印刷设备和方法
公开(公告)号：US07466396B2
公开(公告)日：2008-12-16
申请号：US11546368
申请日：2006-10-12
申请人： Michael B. Binnard , Douglas C. Watson , W. Thomas Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
发明人： Michael B. Binnard , Douglas C. Watson , W. Thomas Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
IPC分类号： G03B27/74
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70833
摘要： Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
摘要翻译：标线片和/或晶片台干涉仪安装到与支撑光刻设备的投影光学系统的主体分离的支撑体上。这使得能够减小支撑投影光学系统的主体的尺寸，使其具有更有利的动态特性。

4. 发明授权

US09465305B2 Method for determining a commutation offset and for determining a compensation map for a stage 有权
标题翻译：用于确定换向偏移和用于确定载物台的补偿图的方法
公开(公告)号：US09465305B2
公开(公告)日：2016-10-11
申请号：US13101264
申请日：2011-05-05
申请人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
IPC分类号： H02K41/00 , G03F7/20 , H02P6/00
CPC分类号： G03F7/70758 , G03F7/70516 , G03F7/70775 , H02P6/006
摘要： A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
摘要翻译：用于确定相对于台架（220B）移动和定位平台（220A）的移动器组件（220C）的移动器（250A）的换向偏移的方法包括以闭环方式控制所述动子组件（220C）以使台架（220A）沿着第一轴线并且沿着第二轴线保持台架（220A）的位置，台架（220A）悬浮在平台底座（220B）上方。该方法还包括以下步骤：（i）将电流引导到移动器组件（220C）的线圈阵列（240），使得移动器组件（220C）在平台（220A）上施加干扰; 以及（ii）评估由所述移动器组件（220C）产生的由所述移动器（250A）产生的所述平台（220A）上的干扰所产生的一个或多个力。此外，用于产生补偿图（1402）的方法包括将多个激励信号顺序地引导到移动器组件（220C）的控制，并且确定由多个激励信号产生的控制命令。

5. 发明申请

US20100156198A1 SHIELD LAYER PLUS REFRIGERATED BACKSIDE COOLING FOR PLANAR MOTORS 审中-公开
标题翻译：平板电机的屏蔽层加热后备冷却
公开(公告)号：US20100156198A1
公开(公告)日：2010-06-24
申请号：US12643888
申请日：2009-12-21
申请人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
发明人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
IPC分类号： H02K9/20 , H02K41/03
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/19 , H02K9/20 , H02K41/031 , H02K2201/18
摘要： According to one aspect of the present invention, a motor arrangement includes at least one coil, a cover plate, and a shield layer. The at least one coil has a first side and a second side. The cover plate is positioned substantially over the first side of the at least one coil at a distance from the at least one coil. The shield layer is positioned between the first side of the at least one coil and the cover plate, and has a top surface. The top surface contacts the cover plate, and includes a liquid and a gas that form a mixture and cause the top surface to have a substantially constant temperature.
摘要翻译：根据本发明的一个方面，电动机装置包括至少一个线圈，盖板和屏蔽层。该至少一个线圈具有第一侧和第二侧。覆盖板基本上位于距离至少一个线圈一定距离的至少一个线圈的第一侧上方。屏蔽层位于至少一个线圈的第一侧和盖板之间，并具有顶面。顶表面接触盖板，并且包括形成混合物的液体和气体，并使顶表面具有基本恒定的温度。

6. 发明申请

US20080165451A1 High Efficiency Voice Coil Motor 审中-公开
公开(公告)号：US20080165451A1
公开(公告)日：2008-07-10
申请号：US12050675
申请日：2008-03-18
申请人： Michael B. Binnard , Jean-Marc Gery , Andrew J. Hazelton
发明人： Michael B. Binnard , Jean-Marc Gery , Andrew J. Hazelton
IPC分类号： G11B5/55
CPC分类号： H02K41/0356 , H02K2201/18
摘要： Methods and apparatus for increasing the efficiency of a voice coil motor (VCM) are disclosed. According to one aspect of the present invention, a cylindrical and radially symmetric VCM includes a plurality of sets of magnets, and a single coil. The plurality of sets of the magnets are each arranged in an array configuration, and cooperate to form a magnetic field. The coil receives current and has a plurality of windings. A first space is defined within the coil, and the plurality of sets of the magnets are arranged such that a first set of the magnets is positioned within the first space and a second set of the magnets is positioned external to the coil.

7. 发明授权

US07368838B2 High efficiency voice coil motor 失效
标题翻译：高效音圈电机
公开(公告)号：US07368838B2
公开(公告)日：2008-05-06
申请号：US10908178
申请日：2005-04-29
申请人： Michael B. Binnard , Jean-Marc Gery , Andrew J. Hazelton
发明人： Michael B. Binnard , Jean-Marc Gery , Andrew J. Hazelton
IPC分类号： H02K33/00
CPC分类号： H02K41/0356 , H02K2201/18
摘要： Methods and apparatus for increasing the efficiency of a voice coil motor (VCM) are disclosed. According to one aspect of the present invention, a cylindrical and radially symmetric VCM includes a plurality of sets of magnets, and a single coil. The plurality of sets of the magnets are each arranged in an array configuration, and cooperate to form a magnetic field. The coil receives current and has a plurality of windings. A first space is defined within the coil, and the plurality of sets of the magnets are arranged such that a first set of the magnets is positioned within the first space and a second set of the magnets is positioned external to the coil.
摘要翻译：公开了提高音圈电机（VCM）效率的方法和装置。根据本发明的一个方面，圆柱形和径向对称的VCM包括多组磁体和单个线圈。多组磁体各配置成阵列构造，并配合形成磁场。线圈接收电流并具有多个绕组。第一空间被限定在线圈内，并且多组磁体被布置成使得第一组磁体位于第一空间内，而第二组磁体位于线圈的外部。

8. 发明授权

US09529353B2 Methods for limiting counter-mass trim-motor force and stage assemblies incorporating same 有权
标题翻译：限制反质量调节马达力的方法和包含相同质量的马达的阶段组件
公开(公告)号：US09529353B2
公开(公告)日：2016-12-27
申请号：US13228341
申请日：2011-09-08
申请人： Pai-Hsueh Yang , Michael B. Binnard , Scott Coakley
发明人： Pai-Hsueh Yang , Michael B. Binnard , Scott Coakley
IPC分类号： G03B27/58 , G03B27/62 , G05B19/404 , G03F7/20
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/70766
摘要： An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a reactive motion of the counter-mass counter to the motion of the stage mass. At least one trim-motor is coupled to the counter-mass. A control system commands the trim-motor to regulate movement of the counter-mass in reaction to stage-mass motion. A PI feedback controller receives the following-error of the counter-mass and generates corresponding center-of-gravity (CG) force commands and trim-motor force commands to the trim-motor(s) to produce corrective counter-mass motion. A trim-motor force limiter receives trim-motor force commands and produces corresponding limited trim-motor force commands that are fed back as actual CG force commands to the feedback controller to modify integral terms of the feedback controller according to the limited trim-motor force commands.
摘要翻译：示例性的舞台组件具有可移动的舞台质量和反质量。舞台电机被耦合到舞台质量和反质量，使得由舞台电动机施加的舞台质量运动导致反质量计数器对舞台质量的运动的反作用运动。至少一个调整电机与反质量联接。控制系统命令微调电机调节反质量运动反应阶段质量运动。 PI反馈控制器接收反质量的跟随误差，并产生相应的重心（CG）力指令和微调电机力指令给微调电机，以产生校正反质量运动。修剪马达力限制器接收修剪马达力指令并产生相应的有限的修剪马达力命令，作为实际的CG力命令反馈到反馈控制器，以根据限制的修正马达力修改反馈控制器的积分项命令。

9. 发明授权

US08853988B2 Control systems and methods for compensating for effects of a stage motor 有权
标题翻译：用于补偿平台电机的影响的控制系统和方法
公开(公告)号：US08853988B2
公开(公告)日：2014-10-07
申请号：US12406322
申请日：2009-03-18
申请人： Michael B. Binnard , Scott Coakley , Douglas C. Watson , Pai-Hsueh Yang
发明人： Michael B. Binnard , Scott Coakley , Douglas C. Watson , Pai-Hsueh Yang
IPC分类号： G05B1/06 , G05B19/404 , G03F7/20
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/70758 , G05B2219/41128 , G05B2219/41443
摘要： Embodiments of the invention compensate for one or more effects of a stage motor in a precision stage device. A feedforward module receives an input signal corresponding to the effect of the motor and generates a feedforward control signal that can be used to modify a motor control signal to compensate for the effect of the motor. In some embodiments, a control system is provided to compensate for a back-electromotive force generated by a motor, while in other embodiments, a control system may compensate for an inductive effect of a motor. Embodiments of the invention may be useful in precision stage devices, for example, lithography devices such as steppers and scanners.
摘要翻译：本发明的实施例补偿了精密级装置中的级电动机的一个或多个效果。前馈模块接收与电动机的效果相对应的输入信号，并产生可用于修改电动机控制信号以补偿电动机的影响的前馈控制信号。在一些实施例中，提供控制系统以补偿由电动机产生的反电动势，而在其他实施例中，控制系统可以补偿电动机的感应效应。本发明的实施例可用于精密平台装置，例如平版印刷装置，例如步进器和扫描器。

10. 发明授权

US08705170B2 High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations 有权
标题翻译：高NA反射折射成像光学器件用于将掩模版成像到一对成像位置
公开(公告)号：US08705170B2
公开(公告)日：2014-04-22
申请号：US12547086
申请日：2009-08-25
申请人： David M. Williamson , Michael B. Binnard , Douglas C. Watson
发明人： David M. Williamson , Michael B. Binnard , Douglas C. Watson
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B27/1066 , G02B27/143 , G03F7/70225 , G03F7/7025 , G03F7/70275 , G03F7/70833
摘要： New and useful concepts for an imaging optical system configured to simultaneously image a reticle to a pair of imaging locations are provided, where the imaging optics comprise a pair of arms, each of which includes catadioptric imaging optics. In addition, the imaging optics are preferably designed to image a reticle simultaneously to the pair of imaging locations, at a numerical aperture of at least 1.3, and without obscuration of light by the imaging optics.
摘要翻译：提供了一种被配置为将掩模版同时成像到一对成像位置的成像光学系统的新的和有用的概念，其中成像光学器件包括一对臂，每个臂包括反射折射成像光学元件。此外，成像光学器件优选地设计成在至少为1.3的数值孔径同时成像成对位置的成对位置成像，并且不会由成像光学元件遮挡光。

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