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1. 发明授权

US07629572B2 Optical devices and related systems and methods 有权
标题翻译：光器件及相关系统及方法
公开(公告)号：US07629572B2
公开(公告)日：2009-12-08
申请号：US11418872
申请日：2006-05-05
申请人： Vitaliy Shklover , Holger Kierey , Holger Muenz , Michel Le Maire , Bernhard Weigl
发明人： Vitaliy Shklover , Holger Kierey , Holger Muenz , Michel Le Maire , Bernhard Weigl
IPC分类号： G01J1/32 , G02B13/08
CPC分类号： G02B27/0988 , G02B1/115 , G02B5/22 , G02B13/08 , G02B27/0966 , G03F7/70591 , G03F7/70958 , G03F7/70975
摘要： The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.
摘要翻译：本发明涉及一种光束强度不均匀性校正装置，其包括具有防反射性的光入射面的光学元件。根据本发明，为了增强光束强度的均匀性，局部地修改了防反射特性。本发明还涉及一种用于修正具有一个或多个光学元件的光学系统中的光束的强度分布的方法，其中所述方法包括：a）将光学系统与布置在预定位置的一个或多个光学元件组合，b ）测量强度分布，c）计算局部所需的光学元件之一的吸收和/或反射的增加或减少以将测量的强度分布修改为预定的强度分布，d）从光学系统中去除光学元件，e）局部地根据计算修正光学元件之一的吸收和/或反射，f）将光学元件安装在光学系统中的预定位置。

2. 发明申请

US20080272275A1 Optical devices and related systems and methods 有权
标题翻译：光器件及相关系统及方法
公开(公告)号：US20080272275A1
公开(公告)日：2008-11-06
申请号：US11418872
申请日：2006-05-05
申请人： Vitaliy Shklover , Holger Kierey , Holger Muenz , Michel Le Maire , Bernhard Weigl
发明人： Vitaliy Shklover , Holger Kierey , Holger Muenz , Michel Le Maire , Bernhard Weigl
IPC分类号： G01J1/32
CPC分类号： G02B27/0988 , G02B1/115 , G02B5/22 , G02B13/08 , G02B27/0966 , G03F7/70591 , G03F7/70958 , G03F7/70975
摘要： The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.
摘要翻译：本发明涉及一种光束强度不均匀性校正装置，其包括具有防反射性的光入射面的光学元件。根据本发明，为了增强光束强度的均匀性，局部地修改了防反射特性。本发明还涉及一种用于修正具有一个或多个光学元件的光学系统中的光束的强度分布的方法，其中所述方法包括：a）将光学系统与布置在预定位置的一个或多个光学元件组合，b ）测量强度分布，c）计算局部所需的光学元件之一的吸收和/或反射的增加或减少以将测量的强度分布修改为预定的强度分布，d）从光学系统中去除光学元件，e）局部地根据计算修正光学元件之一的吸收和/或反射，f）将光学元件安装在光学系统中的预定位置。

3. 发明授权

US08342701B2 Reflective optical element for use in an EUV system 有权
标题翻译：用于EUV系统的反光光学元件
公开(公告)号：US08342701B2
公开(公告)日：2013-01-01
申请号：US12851187
申请日：2010-08-05
申请人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
发明人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , G02B7/181 , G02B7/1815
摘要： A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.
摘要翻译：公开了一种用于EUV系统的反射光学元件。反射型光学元件包括至少部分地由基底材料制成的基体。冷却介质可以流过的至少一个冷却通道布置在基体中。提供具有大于50W / mK的热导率的材料作为基材。反射光学元件还包括施加在基板材料上的抛光层。抛光层包括可通过研磨加工的非晶材料。

4. 发明申请

US20110051267A1 REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM 有权
标题翻译：在EUV系统中使用的反射光学元件
公开(公告)号：US20110051267A1
公开(公告)日：2011-03-03
申请号：US12851187
申请日：2010-08-05
申请人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
发明人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , G02B7/181 , G02B7/1815
摘要： A reflective optical element (10) for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.
摘要翻译：公开了一种用于EUV系统的反射光学元件（10）。反射型光学元件包括至少部分地由基底材料制成的基体。冷却介质可以流过的至少一个冷却通道布置在基体中。提供具有大于50W / mK的热导率的材料作为基材。反射光学元件还包括施加在基板材料上的抛光层。抛光层包括可通过研磨加工的非晶材料。

5. 发明授权

US07175773B1 Method for manufacturing a blazed grating, such a blazed grating and a spectrometer having such a blazed grating 失效
标题翻译：用于制造闪耀光栅的方法，这种闪耀光栅和具有这种闪耀光栅的光谱仪
公开(公告)号：US07175773B1
公开(公告)日：2007-02-13
申请号：US10866957
申请日：2004-06-14
申请人： Klaus Heidemann , Holger Kierey , Bruno Nelles
发明人： Klaus Heidemann , Holger Kierey , Bruno Nelles
IPC分类号： B29D11/00
CPC分类号： B29D11/00278 , G02B5/1838 , G02B5/1852 , G02B5/1861
摘要： In a method for manufacturing a blazed grating from a prefabricated initial blazed grating, a blazed grating the substrate of a first material of which has a surface, which has an initial surface profile having an initial blaze angle, is provided. An auxiliary layer of a second material is applied onto the surface of the substrate, wherein the second material is different from the first material. The auxiliary layer is removed at least partially by means of etching, wherein the etching is carried out at least until the etching simultaneously acts on the auxiliary layer and on the initial surface profile of the substrate. A ratio between an etching rate for the auxiliary layer and an etching rate for the substrate is adjusted such that the initial blaze angle is reduced to a final blaze angle. Further, a blazed grating manufactured in that way and an optical device having such a blazed grating, are described.
摘要翻译：在从预制的初始闪耀光栅制造闪耀光栅的方法中，提供了一种闪耀光栅，其第一材料的基板具有具有初始表面轮廓的表面，该初始表面轮廓具有初始辉光角。第二材料的辅助层被施加到基底的表面上，其中第二材料不同于第一材料。至少部分通过蚀刻去除辅助层，其中蚀刻至少直到蚀刻同时作用于辅助层和基板的初始表面轮廓上。调整辅助层的蚀刻速率与基板的蚀刻速率之间的比率，使得初始闪耀角降低到最终的火焰角。此外，描述了以这种方式制造的闪耀光栅和具有这种闪耀光栅的光学装置。

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