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1. 发明授权

US07175773B1 Method for manufacturing a blazed grating, such a blazed grating and a spectrometer having such a blazed grating 失效
标题翻译：用于制造闪耀光栅的方法，这种闪耀光栅和具有这种闪耀光栅的光谱仪
公开(公告)号：US07175773B1
公开(公告)日：2007-02-13
申请号：US10866957
申请日：2004-06-14
申请人： Klaus Heidemann , Holger Kierey , Bruno Nelles
发明人： Klaus Heidemann , Holger Kierey , Bruno Nelles
IPC分类号： B29D11/00
CPC分类号： B29D11/00278 , G02B5/1838 , G02B5/1852 , G02B5/1861
摘要： In a method for manufacturing a blazed grating from a prefabricated initial blazed grating, a blazed grating the substrate of a first material of which has a surface, which has an initial surface profile having an initial blaze angle, is provided. An auxiliary layer of a second material is applied onto the surface of the substrate, wherein the second material is different from the first material. The auxiliary layer is removed at least partially by means of etching, wherein the etching is carried out at least until the etching simultaneously acts on the auxiliary layer and on the initial surface profile of the substrate. A ratio between an etching rate for the auxiliary layer and an etching rate for the substrate is adjusted such that the initial blaze angle is reduced to a final blaze angle. Further, a blazed grating manufactured in that way and an optical device having such a blazed grating, are described.
摘要翻译：在从预制的初始闪耀光栅制造闪耀光栅的方法中，提供了一种闪耀光栅，其第一材料的基板具有具有初始表面轮廓的表面，该初始表面轮廓具有初始辉光角。第二材料的辅助层被施加到基底的表面上，其中第二材料不同于第一材料。至少部分通过蚀刻去除辅助层，其中蚀刻至少直到蚀刻同时作用于辅助层和基板的初始表面轮廓上。调整辅助层的蚀刻速率与基板的蚀刻速率之间的比率，使得初始闪耀角降低到最终的火焰角。此外，描述了以这种方式制造的闪耀光栅和具有这种闪耀光栅的光学装置。

2. 发明授权

US06788465B2 Littrow grating and use of a littrow grating 失效
标题翻译： Littrow光栅和使用littrow光栅
公开(公告)号：US06788465B2
公开(公告)日：2004-09-07
申请号：US09863002
申请日：2001-05-22
申请人： Bernd Kleemann , Klaus Heidemann
发明人： Bernd Kleemann , Klaus Heidemann
IPC分类号： G02B518
CPC分类号： G02B5/1833 , G02B5/1838 , G02B5/1861
摘要： A Littrow grating (1) comprises a multiplicity of parallel diffraction structures (3) succeeding one another periodically. The latter are arranged on a support (2) defining a base area (4). A diffraction structure (3) comprises a blaze flank (5) inclined towards the base area (4) substantially at the Littrow angle (&dgr;). In addition the diffraction structure (3) comprises a counter-flank (6) which forms with the blaze flank (5) at the apex of a diffraction structure (3) an apex angle (&agr;) which is less than 90°. The counter-flank (6) comprises at least two substantially plane area sections (7, 8). The latter extend, bordering one another and inclined relative to one another through an angle of inclination (&bgr;), parallel with the extension direction of the diffraction structure (3). Due to the inclination of the at least two area sections (7, 8) relative to one another, the counter-flank (6) exhibits all in all a concave surface viewed from the light incidence side. A Littrow grating (1) of high reflectivity is obtained, which may be achieved with the removal of only a small amount of material at the manufacturing stage.
摘要翻译： Ligrow光栅（1）包括周期性地彼此相继的多个平行衍射结构（3）。后者布置在限定基部区域（4）的支撑件（2）上。衍射结构（3）包括基本上以Littrow角（delta）朝向基部区域（4）倾斜的火焰侧面（5）。此外，衍射结构（3）包括在衍射结构（3）的顶点处形成具有小于90°的顶角（α）的火焰侧面（5）的相对侧面（6）。对面（6）包括至少两个基本上平面的区域部分（7,8）。后者彼此相邻并且通过与衍射结构（3）的延伸方向平行的倾斜角（β）相对于彼此倾斜。由于至少两个区域部分（7,8）相对于彼此的倾斜，所以相对侧面（6）在从光入射侧观察的全部凹凸表面中全部展现出来。获得高反射率的Ligrow光栅（1），这可以通过在制造阶段仅去除少量材料来实现。

3. 发明授权

US4462626A Conveyor belt repair tool 失效
标题翻译：输送带修理工具
公开(公告)号：US4462626A
公开(公告)日：1984-07-31
申请号：US500281
申请日：1983-06-01
申请人： Klaus Heidemann
发明人： Klaus Heidemann
IPC分类号： F16G3/00 , A44B21/00
CPC分类号： F16G3/006 , Y10T24/2191
摘要： A conveyor belt tool for repairing a broken conveyor belt which has sliding clamps to match the tool size to the belt width and thickness.
摘要翻译：一种传送带工具，用于修复破碎的传送带，该传送带具有滑动夹具以使工具尺寸与带的宽度和厚度相匹配。

4. 发明申请

US20050180013A1 Grating element for filtering wavelengths < 100 nm 审中-公开
标题翻译：用于滤波波长<100 nm的光栅元件
公开(公告)号：US20050180013A1
公开(公告)日：2005-08-18
申请号：US10945626
申请日：2004-09-21
申请人： Klaus Heidemann , Karlfrid Osterried
发明人： Klaus Heidemann , Karlfrid Osterried
IPC分类号： G01J3/18 , G02B5/18 , G02B27/00
CPC分类号： G02B27/4244 , G02B5/1838 , G02B5/1861 , G02B27/0043
摘要： There is provided a grating apparatus for filtering wavelengths ≦100 nm. The grating apparatus includes multiple individual grating elements having grating lines. The individual grating elements are positioned one behind another on a curved support surface in relation to a plane spanned by the grating apparatus in a direction of beans of a light bundle that is incident on the grating apparatus.
摘要翻译：提供了用于滤波波长<= 100nm的光栅装置。光栅装置包括具有光栅线的多个单独光栅元件。各个光栅元件相对于光栅装置沿着入射在光栅装置上的光束的方向的平面相对于弯曲的支撑表面一个定位。

5. 发明授权

US06600602B2 Diffraction grating and uses of a diffraction grating 失效
$Diffraction grating and uses of a diffraction grating$
公开(公告)号：US06600602B2
公开(公告)日：2003-07-29
申请号：US09863745
申请日：2001-05-23
申请人： Bernd Kleemann , Klaus Heidemann
发明人： Bernd Kleemann , Klaus Heidemann
IPC分类号： G02B2744
CPC分类号： G02B5/1838 , G02B5/1814 , G02B5/1861 , G03H1/0244
摘要： A diffraction grating (1) has a multiplicity of parallel diffraction structures succeeding one another periodically. The latter are arranged on a support (2) and each incorporate a slat (3) extending from a base area (4) of the support (2). Said slat has a substantially rectangular cross-section. The width w of the slat (3) comes to less than 100 nm, preferably between 20 nm and 60 nm, more preferably in the area of 50 nm. Advantageous uses of the diffraction grating (1) are obtained e.g. in a Littrow configuration, preferably in third order of the incident light beams (8), in particular at a light wavelength that is less than 250 nm.

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