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    • 1. 发明申请
    • Silicon-Based Schottky Barrier Detector With Improved Responsivity
    • 具有改善响应性的硅基肖特基势垒检测器
    • US20110221019A1
    • 2011-09-15
    • US13038470
    • 2011-03-02
    • Vipulkumar PatelPrakash GothoskarMark WebsterChristopher J. Lang
    • Vipulkumar PatelPrakash GothoskarMark WebsterChristopher J. Lang
    • H01L31/108
    • H01L31/101H01L31/1085
    • A planar, waveguide-based silicon Schottky barrier photodetector includes a third terminal in the form of a field plate to improve the responsivity of the detector. Preferably, a silicide used for the detection region is formed during a processing step where other silicide contact regions are being formed. The field plate is preferably formed as part of the first or second layer of CMOS metallization and is controlled by an applied voltage to modify the electric field in the vicinity of the detector's silicide layer. By modifying the electric field, the responsivity of the device is “tuned” so as to adjust the momentum of “hot” carriers (electrons or holes, depending on the conductivity of the silicon) with respect to the Schottky barrier of the device. The applied potential functions to align with the direction of momentum of the “hot” carriers in the preferred direction “normal” to the silicon-silicide interface, allowing for an increased number to move over the Schottky barrier and add to the generated photocurrent.
    • 平面的基于波导的硅肖特基势垒光电检测器包括场板形式的第三端子,以提高检测器的响应度。 优选地,在其中形成其它硅化物接触区域的处理步骤期间形成用于检测区域的硅化物。 场板优选地形成为第一或第二CMOS金属化层的一部分,并且通过施加的电压来控制,以修改检测器硅化物层附近的电场。 通过修改电场,器件的响应度被“调谐”,以相对于器件的肖特基势垒调节“热”载流子(电子或空穴,取决于硅的导电性)的动量。 所施加的电位功能与“硅”载体的优势方向“正常”硅硅化物界面的动量方向相一致,允许增加的数量移动到肖特基势垒上并增加产生的光电流。
    • 2. 发明授权
    • Silicon-based schottky barrier detector with improved responsivity
    • 基于硅的肖特基势垒检测器,具有更高的响应度
    • US08618625B2
    • 2013-12-31
    • US13038470
    • 2011-03-02
    • Vipulkumar PatelPrakash GothoskarMark WebsterChristopher J. Lang
    • Vipulkumar PatelPrakash GothoskarMark WebsterChristopher J. Lang
    • H01L31/0224
    • H01L31/101H01L31/1085
    • A planar, waveguide-based silicon Schottky barrier photodetector includes a third terminal in the form of a field plate to improve the responsivity of the detector. Preferably, a silicide used for the detection region is formed during a processing step where other silicide contact regions are being formed. The field plate is preferably formed as part of the first or second layer of CMOS metallization and is controlled by an applied voltage to modify the electric field in the vicinity of the detector's silicide layer. By modifying the electric field, the responsivity of the device is “tuned” so as to adjust the momentum of “hot” carriers (electrons or holes, depending on the conductivity of the silicon) with respect to the Schottky barrier of the device. The applied potential functions to align with the direction of momentum of the “hot” carriers in the preferred direction “normal” to the silicon-silicide interface, allowing for an increased number to move over the Schottky barrier and add to the generated photocurrent.
    • 平面的基于波导的硅肖特基势垒光电检测器包括场板形式的第三端子,以提高检测器的响应度。 优选地,在其中形成其它硅化物接触区域的处理步骤期间形成用于检测区域的硅化物。 场板优选地形成为第一或第二CMOS金属化层的一部分,并且通过施加的电压来控制,以修改检测器硅化物层附近的电场。 通过修改电场,器件的响应度被“调谐”,以相对于器件的肖特基势垒调节“热”载流子(电子或空穴,取决于硅的导电性)的动量。 所施加的电位功能与“硅”载体的优势方向“正常”硅硅化物界面的动量方向相一致,允许增加的数量移动到肖特基势垒上并增加产生的光电流。
    • 3. 发明授权
    • Offset launch mode from nanotaper waveguide into multimode fiber
    • 从纳米孔波导到多模光纤的偏移发射模式
    • US07706644B2
    • 2010-04-27
    • US12218367
    • 2008-07-15
    • Mark WebsterPrakash GothoskarVipulkumar PatelDavid Piede
    • Mark WebsterPrakash GothoskarVipulkumar PatelDavid Piede
    • G02B6/26
    • G02B6/30G02B6/3598G02B6/3636G02B6/3652G02B6/3692G02B6/4249
    • One or more nanotaper coupling waveguides formed within an optical substrate allows for straightforward, reproducible offset launch conditions to be achieved between an incoming signal and the core region of a multimode fiber (which may be disposed along an alignment fixture formed in the optical substrate), fiber array or other multimode waveguiding structure. Offset launching of a single mode signal into a multimode fiber couples the signal into favorable spatial modes which reduce the presence of differential mode dispersion along the fiber. This approach to providing single mode signal coupling into legacy multimode fiber is considered to be an improvement over the prior art which required the use of an interface element between a single mode fiber and multimode fiber, limiting the number of propagating signals and applications for the legacy multimode fiber. An optical switch may be used to select the specific nanotaper(s) for coupling into the multimode fiber.
    • 形成在光学衬底内的一个或多个纳米锥耦合波导允许在多模光纤(其可以沿着形成在光学衬底中的对准夹具设置)的入射信号和芯区域之间实现简单,可再现的偏移发射条件, 光纤阵列或其他多模波导结构。 偏移将单模信号发射到多模光纤中将信号耦合到有利的空间模式,这降低了沿着光纤的差分色散的存在。 将单模信号耦合提供给传统多模光纤的这种方法被认为是对需要使用单模光纤和多模光纤之间的接口元件的现有技术的改进,限制了传播信号的数量和遗留的应用 多模光纤 可以使用光学开关来选择用于耦合到多模光纤的特定纳米锥。
    • 9. 发明申请
    • Coupling between free space and optical waveguide using etched coupling surfaces
    • 使用蚀刻的耦合表面在自由空间和光波导之间耦合
    • US20090162013A1
    • 2009-06-25
    • US12316540
    • 2008-12-11
    • Mark WebsterVipulkumar PatelMary NadeauPrakash GothoskarDavid Piede
    • Mark WebsterVipulkumar PatelMary NadeauPrakash GothoskarDavid Piede
    • G02B6/42
    • G02B6/32G02B6/305G02B6/327
    • A plasma-based etching process is used to specifically shape the endface of an optical substrate supporting an optical waveguide into a contoured facet which will improve coupling efficiency between the waveguide and a free space optical signal. The ability to use standard photolithographic techniques to pattern and etch the optical endface facet allows for virtually any desired facet geometry to be formed—and replicated across the surface of a wafer for the entire group of assemblies being fabricated. A lens may be etched into the endface using a properly-defined photolithographic mask, with the focal point of the lens selected with respect to the parameters of the optical waveguide and the propagating free space signal. Alternatively, an angled facet may be formed along the endface, with the angle sufficient to re-direct reflected/scattered signals away from the optical axis.
    • 使用基于等离子体的蚀刻工艺来将支撑光波导的光学基板的端面特别地成形为轮廓刻面,这将提高波导与自由空间光信号之间的耦合效率。 使用标准光刻技术对光学端面小平面进行图案化和刻蚀的能力允许形成任何所需的刻面几何形状,并跨越制造的整组组件在晶片的表面上复制。 可以使用适当限定的光刻掩模将透镜蚀刻到端面中,相对于光波导的参数和传播的自由空间信号选择透镜的焦点。 或者,可以沿着端面形成成角度的小面,其角度足以将反射/散射信号重新引导远离光轴。
    • 10. 发明授权
    • Coupling between free space and optical waveguide using etched coupling surfaces
    • 使用蚀刻的耦合表面在自由空间和光波导之间耦合
    • US08121450B2
    • 2012-02-21
    • US12316540
    • 2008-12-11
    • Mark WebsterVipulkumar PatelMary NadeauPrakash GothoskarDavid Piede
    • Mark WebsterVipulkumar PatelMary NadeauPrakash GothoskarDavid Piede
    • G02B6/32G02B6/26G02B6/42
    • G02B6/32G02B6/305G02B6/327
    • A plasma-based etching process is used to specifically shape the endface of an optical substrate supporting an optical waveguide into a contoured facet which will improve coupling efficiency between the waveguide and a free space optical signal. The ability to use standard photolithographic techniques to pattern and etch the optical endface facet allows for virtually any desired facet geometry to be formed—and replicated across the surface of a wafer for the entire group of assemblies being fabricated. A lens may be etched into the endface using a properly-defined photolithographic mask, with the focal point of the lens selected with respect to the parameters of the optical waveguide and the propagating free space signal. Alternatively, an angled facet may be formed along the endface, with the angle sufficient to re-direct reflected/scattered signals away from the optical axis.
    • 使用基于等离子体的蚀刻工艺来将支撑光波导的光学基板的端面特别地成形为轮廓刻面,这将提高波导与自由空间光信号之间的耦合效率。 使用标准光刻技术对光学端面小平面进行图案化和刻蚀的能力允许形成任何所需的刻面几何形状,并跨越制造的整组组件在晶片的表面上复制。 可以使用适当限定的光刻掩模将透镜蚀刻到端面中,相对于光波导的参数和传播的自由空间信号选择透镜的焦点。 或者,可以沿着端面形成成角度的小面,其角度足以将反射/散射信号重新引导远离光轴。