专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20150357167A1 APPARATUS AND METHOD FOR MASS ANALYZED ION BEAM 有权
标题翻译：大分析离子束的装置和方法
公开(公告)号：US20150357167A1
公开(公告)日：2015-12-10
申请号：US14299681
申请日：2014-06-09
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： W. Davis Lee , Svetlana Radovanov , Peter F. Kurunczi
IPC分类号： H01J37/32
CPC分类号： H01J37/32678 , H01J37/3056 , H01J37/321 , H01J37/32192 , H01J37/32412 , H01J37/32422
摘要： In one embodiment, a processing apparatus includes a plasma chamber configured to house a plasma comprising first ions and second ions. The apparatus may further include a resonance RF power supply to generate a drive signal that is coupled to the plasma chamber, the drive signal having a drive frequency. The apparatus may also include a magnet assembly to generate a magnetic field in the plasma chamber, wherein the magnet assembly is configured to generate a first magnetic field strength that imparts a first cyclotron frequency for the first ions that matches the drive frequency of the drive signal, wherein the first magnetic field strength imparts a second cyclotron frequency for the second ions that does not match the drive frequency of the drive signal, and wherein the first ions are selectively driven into a chamber wall of the plasma chamber.
摘要翻译：在一个实施例中，处理设备包括等离子体室，其被配置为容纳包含第一离子和第二离子的等离子体。该装置还可以包括谐振RF电源以产生耦合到等离子体室的驱动信号，该驱动信号具有驱动频率。该装置还可以包括磁体组件以在等离子体室中产生磁场，其中磁体组件被配置为产生第一磁场强度，该第一磁场强度赋予与驱动信号的驱动频率匹配的第一离子的第一回旋加速器频率，其中所述第一磁场强度对于与所述驱动信号的驱动频率不匹配的所述第二离子施加第二回旋加速器频率，并且其中所述第一离子被选择性地驱动到所述等离子体室的室壁中。

2. 外观设计

USD832994S1 Tetrode deceleration lens 有权
公开(公告)号：USD832994S1
公开(公告)日：2018-11-06
申请号：US29561959
申请日：2016-04-21
申请人： Varian Semiconductor Equipment Associates, Inc.
设计人： W. Davis Lee

3. 发明授权

US09773636B2 Apparatus and method for generating high current negative hydrogen ion beam 有权
公开(公告)号：US09773636B2
公开(公告)日：2017-09-26
申请号：US14831468
申请日：2015-08-20
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： W. Davis Lee , Neil Bassom , Anthony Renau
IPC分类号： H01J37/08 , H01J37/317
CPC分类号： H01J37/08 , H01J27/028 , H01J27/205 , H01J27/24 , H01J37/3171 , H01J2237/0815 , H01J2237/082 , H01J2237/31701
摘要： An apparatus to generate negative hydrogen ions. The apparatus may include an ion source chamber having a gas inlet to receive H2 gas; a light source directing radiation into the ion source chamber to generate excited H2 molecules having an excited vibrational state from at least some of the H2 gas; a low energy electron source directing low energy electrons into the ion source chamber, wherein H− ions are generated from at least some of the excited H2 molecules; and an extraction assembly arranged to extract the H− ions from the ion source chamber.

4. 发明申请

US20160172159A1 APPARATUS AND METHOD TO CONTROL AN ION BEAM 有权
标题翻译：装置和控制离子束的方法
公开(公告)号：US20160172159A1
公开(公告)日：2016-06-16
申请号：US14572016
申请日：2014-12-16
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： James S. Buff , Edward W. Bell , W. Davis Lee
IPC分类号： H01J37/317 , H01J37/147
CPC分类号： H01J37/3171 , H01J37/04 , H01J37/304
摘要： An apparatus to control a ribbon ion beam. The apparatus may include a coil assembly comprising a plurality of electromagnetic coils configured to generate a magnetic field proximate the ribbon beam, the magnetic field extending in a first direction that forms a non-zero angle with respect to a direction of propagation of the ribbon ion beam; a current source assembly configured to supply current to the coil assembly; and a controller configured to control the current source assembly to send at least one dithering current signal to the coil assembly responsive to a beam current measurement of the ribbon ion beam, wherein the at least one dithering current signal generates a fluctuation in magnetic field strength of the magnetic field.
摘要翻译：一种控制带状离子束的装置。该装置可以包括线圈组件，该线圈组件包括多个电磁线圈，其被配置为在带状束附近产生磁场，该磁场沿相对于带状离子的传播方向形成非零角度的第一方向延伸光束; 电流源组件，被配置为向所述线圈组件提供电流; 以及控制器，其被配置为响应于所述带状离子束的束电流测量来控制所述电流源组件向所述线圈组件发送至少一个抖动电流信号，其中所述至少一个抖动电流信号产生磁场强度的波动磁场。

5. 发明申请

US20150325464A1 SYSTEM AND APPARATUS FOR HOLDING A SUBSTRATE OVER WIDE TEMPERATURE RANGE 有权
标题翻译：用于在宽温度范围内保持基板的系统和装置
公开(公告)号：US20150325464A1
公开(公告)日：2015-11-12
申请号：US14275779
申请日：2014-05-12
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Roger B. Fish , W. Davis Lee
IPC分类号： H01L21/683 , H01L21/67
CPC分类号： H01L21/68742 , H01L21/67103 , H01L21/6831 , H01L21/6833
摘要： An apparatus to support a substrate may include a base, a clamp portion to apply a clamping voltage to the substrate, and a displacement assembly configured to hold the clamp portion and base together in a first operating position, and to move the clamp portion with respect to the base from the first operating position to a second operating position, wherein the clamp portion and base are separate from one another in the second operating position.
摘要翻译：用于支撑基板的装置可以包括基座，用于向基板施加钳位电压的夹持部分以及构造成将夹持部分保持在第一操作位置并且将夹持部分相对于第一操作位置移动的位移组件从第一操作位置到第二操作位置到基座，其中夹紧部分和基部在第二操作位置彼此分离。

6. 发明申请

US20170053776A1 APPARATUS AND METHOD FOR GENERATING HIGH CURRENT NEGATIVE HYDROGEN ION BEAM 有权
标题翻译：用于产生高电流负氢离子束的装置和方法
公开(公告)号：US20170053776A1
公开(公告)日：2017-02-23
申请号：US14831468
申请日：2015-08-20
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： W. Davis Lee , Neil Bassom , Anthony Renau
IPC分类号： H01J37/08 , H01J37/317
CPC分类号： H01J37/08 , H01J27/028 , H01J27/205 , H01J27/24 , H01J37/3171 , H01J2237/0815 , H01J2237/082 , H01J2237/31701
摘要： An apparatus to generate negative hydrogen ions. The apparatus may include an ion source chamber having a gas inlet to receive H2 gas; a light source directing radiation into the ion source chamber to generate excited H2 molecules having an excited vibrational state from at least some of the H2 gas; a low energy electron source directing low energy electrons into the ion source chamber, wherein H− ions are generated from at least some of the excited H2 molecules; and an extraction assembly arranged to extract the H− ions from the ion source chamber.
摘要翻译：产生负氢离子的装置。该装置可以包括具有用于接收H 2气体的气体入口的离子源室; 将辐射源引导到离子源室中以产生具有来自至少一些H 2气体的激发的振动状态的激发的H 2分子; 将低能电子引导到离子源室中的低能电子源，其中从至少一些被激发的H 2分子产生H离子; 以及提取组件，被布置成从离子源室提取H-离子。

7. 发明授权

US09530682B2 System and apparatus for holding a substrate over wide temperature range 有权
标题翻译：用于在宽温度范围内保持基板的系统和装置
公开(公告)号：US09530682B2
公开(公告)日：2016-12-27
申请号：US14275779
申请日：2014-05-12
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Roger B. Fish , W. Davis Lee
IPC分类号： H01L21/683 , H01T23/00 , H01L21/687 , H01L21/67
CPC分类号： H01L21/68742 , H01L21/67103 , H01L21/6831 , H01L21/6833
摘要： An apparatus to support a substrate may include a base, a clamp portion to apply a clamping voltage to the substrate, and a displacement assembly configured to hold the clamp portion and base together in a first operating position, and to move the clamp portion with respect to the base from the first operating position to a second operating position, wherein the clamp portion and base are separate from one another in the second operating position.
摘要翻译：用于支撑基板的装置可以包括基座，用于向基板施加钳位电压的夹持部分以及构造成将夹持部分保持在第一操作位置并且将夹持部分相对于第一操作位置移动的位移组件从所述第一操作位置到所述基座到第二操作位置，其中所述夹持部分和所述基部在所述第二操作位置彼此分离。

8. 发明授权

US09972475B2 Apparatus and method to control an ion beam 有权
公开(公告)号：US09972475B2
公开(公告)日：2018-05-15
申请号：US14572016
申请日：2014-12-16
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： James S. Buff , Edward W. Bell , W. Davis Lee
IPC分类号： H01J37/244 , H01J37/317 , H01J37/04 , H01J37/304
CPC分类号： H01J37/3171 , H01J37/04 , H01J37/304
摘要： An apparatus to control a ribbon ion beam. The apparatus may include a coil assembly comprising a plurality of electromagnetic coils configured to generate a magnetic field proximate the ribbon beam, the magnetic field extending in a first direction that forms a non-zero angle with respect to a direction of propagation of the ribbon ion beam; a current source assembly configured to supply current to the coil assembly; and a controller configured to control the current source assembly to send at least one dithering current signal to the coil assembly responsive to a beam current measurement of the ribbon ion beam, wherein the at least one dithering current signal generates a fluctuation in magnetic field strength of the magnetic field.

9. 发明授权

US09536712B2 Apparatus and method for mass analyzed ion beam 有权
标题翻译：用于质量分析离子束的装置和方法
公开(公告)号：US09536712B2
公开(公告)日：2017-01-03
申请号：US14299681
申请日：2014-06-09
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： W. Davis Lee , Svetlana Radovanov , Peter F. Kurunczi
IPC分类号： H01J37/32 , H01J37/305
CPC分类号： H01J37/32678 , H01J37/3056 , H01J37/321 , H01J37/32192 , H01J37/32412 , H01J37/32422
摘要： In one embodiment, a processing apparatus includes a plasma chamber configured to house a plasma comprising first ions and second ions. The apparatus may further include a resonance RF power supply to generate a drive signal that is coupled to the plasma chamber, the drive signal having a drive frequency. The apparatus may also include a magnet assembly to generate a magnetic field in the plasma chamber, wherein the magnet assembly is configured to generate a first magnetic field strength that imparts a first cyclotron frequency for the first ions that matches the drive frequency of the drive signal, wherein the first magnetic field strength imparts a second cyclotron frequency for the second ions that does not match the drive frequency of the drive signal, and wherein the first ions are selectively driven into a chamber wall of the plasma chamber.
摘要翻译：在一个实施例中，处理设备包括等离子体室，其被配置为容纳包含第一离子和第二离子的等离子体。该装置还可以包括谐振RF电源以产生耦合到等离子体室的驱动信号，该驱动信号具有驱动频率。该装置还可以包括磁体组件以在等离子体室中产生磁场，其中磁体组件被配置为产生第一磁场强度，该第一磁场强度赋予与驱动信号的驱动频率匹配的第一离子的第一回旋加速器频率，其中所述第一磁场强度对于与所述驱动信号的驱动频率不匹配的所述第二离子施加第二回旋加速器频率，并且其中所述第一离子被选择性地驱动到所述等离子体室的室壁中。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式