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    • 1. 发明授权
    • Novel compounds and process
    • 新型化合物和工艺
    • US3911164A
    • 1975-10-07
    • US39723773
    • 1973-09-14
    • UPJOHN CO
    • SAYIGH ADNAN A RSTUBER FRED AULRICH HENRI
    • C08F8/34D06P1/642D06P5/22G03F7/012B05D3/06C08J7/04C08J7/10
    • G03F7/012C08F8/34D06P1/6423D06P5/22Y10T428/31786Y10T428/31859Y10T428/31942C08F222/06C08F222/08
    • Radiation (thermal and light)-sensitive polymers are provided which are characterized by the recurring unit of the formula:

      wherein R'' is lower-alkoxy or phenyl; one of R2 and R3 is hydrogen and the other is

      WHEREIN A alkylene from 2 to 10 carbon atoms having 2 to 6 carbon atoms between valencies, R'''' lower-alkyl or halogen, x is 1 to 2, y is 0 to 2, and x + y 1 to 3. Water soluble salts also disclosed. The polymers are useful for chemically bonding basic dyestuffs to non-dyereceptive substrates (e.g. polyethylene) by coating the substrate with radiation sensitive polymer and exposing the coated substrate to irradiation. The treated substrate is then contacted with a basic dyestuff which bonds thereto via the free carboxylic groups in the coating. The irradiation can be carried out imagewise to produce an appropriate image on the substrate which image is developed by dissolving out unexposed radiation-sensitive polymer prior to application of the dye. Bonding of the radiation-sensitive polymers of the invention to substrates in the above manner can also be employed as a means of rendering hydrophilic a variety of substrates which are hydrophobic.
    • 提供了辐射(热和光)敏感聚合物,其特征在于下式的重复单元:R'| - CH --- CH --- CH - CH2 - | COOR2COOR3其中R' 烷氧基或苯基; R 2和R 3中的一个是氢,另一个是O(SO 2 N 3)x并联-AOC-NH-角“R”,其中A是2价之间碳原子数2至10个的碳原子之间的亚芳基,R“= 低级烷基或卤素,x为1至2,y为0至2,x + y = 1至3.还公开了水溶性盐。 聚合物可用于通过用辐射敏感聚合物涂覆基底并将涂覆的基底暴露于照射来将碱性染料化学键合到非感染性底物(例如聚乙烯)。 然后将经处理的基材与经由涂层中的游离羧基与其键合的碱性染料接触。 照射可以成像进行,以在衬底上产生合适的图像,该图像通过在施加染料之前溶解未曝光的辐射敏感聚合物来显影。 本发明的辐射敏感性聚合物以上述方式粘合到基材上也可以用作亲水性的使疏水性的各种底物的方法。