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    • 5. 发明授权
    • Thin-film structure for chalcogenide electrical switching devices and
process therefor
    • 混合电气开关器件的薄膜结构及其工艺
    • US5177567A
    • 1993-01-05
    • US732544
    • 1991-07-19
    • Patrick J. KlersyDavid C. JablonskiStanford R. Ovshinsky
    • Patrick J. KlersyDavid C. JablonskiStanford R. Ovshinsky
    • H01L45/00
    • H01L45/1675H01L45/04H01L45/06H01L45/126H01L45/141H01L45/1625
    • Disclosed herein is a novel thin-film structure for solid state thin-film electrical switching devices fabricated of chalcogenide material that overcomes a number of design weaknesses existing in the prior art. The novel structure of the instant invention employs a thin layer of insulating material beneath the body of chalcogenide material so as to carefully define the filament location. Since the filament location has been fixed, switching, due to edge conduction pathways has been substantially eliminated. At the same time, the use of a thin insulating layer precludes step coverage faults of the prior art. The requirement for the thin layer of insulator material to withstand the switching voltage is addressed through the use of a second thicker layer of insulator material which is deposited only after the chalcogenide material has been formed. This improved structure demonstrates the advantages of higher fabrication yields and more repeatable electrical switching characteristics.
    • 本文公开了一种用于克服现有技术中存在的许多设计缺点的由硫族化物材料制成的固态薄膜电开关器件的新型薄膜结构。 本发明的新颖结构在硫族化物材料的主体下方采用绝缘材料薄层,以便仔细地确定丝条的位置。 由于灯丝位置已被固定,所以由于边缘传导路径的切换已被基本消除。 同时,使用薄的绝缘层可防止现有技术的步骤覆盖故障。 绝缘材料薄层承受开关电压的要求是通过使用仅在形成硫族化物材料之后沉积的绝缘体材料的第二较厚层来解决的。 这种改进的结构表现出更高的制造成本和更可重复的电开关特性的优点。