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1. 发明授权

US06379860B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06379860B1
公开(公告)日：2002-04-30
申请号：US09220682
申请日：1998-12-23
申请人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
发明人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/115
摘要： A positive photosensitive composition is disclosed which comprises a compound generating an acid upon irradiation with actinic rays or a radiation and a resin having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, said resin being obtained by reacting an alkali-soluble resin having phenolic hydroxyl groups with at least one specific enol ether compound under acid conditions in a specific organic solvent. The positive photosensitive composition shows improved discrimination between nonimage areas and image areas, has high sensitivity, high resolving power, and high heat resistance, suffers little change in performance with the lapse of time from exposure to light to heat treatment (PED), and is free from defects, e.g., development defects.
摘要翻译：公开了一种正型感光性组合物，其包含在用光化射线照射时产生酸的化合物或辐射，以及具有通过酸作用分解的基团的树脂，以增强在碱性显影液中的溶解度，所述树脂是通过使具有酚羟基的碱溶性树脂与至少一种特定的烯醇醚化合物在酸性条件下在特定的有机溶剂中。正型感光性组合物显示出非图像区域和图像区域之间的区分改善，具有高灵敏度，高分辨率和高耐热性，随着从曝光到热处理（PED）的时间的流逝，性能几乎没有变化，并且是没有缺陷，例如发展缺陷。

2. 发明授权

US6136504A Positive-working photoresist composition 失效
标题翻译：正光刻胶组合物
公开(公告)号：US6136504A
公开(公告)日：2000-10-24
申请号：US280679
申请日：1999-03-29
申请人： Shiro Tan , Toru Fujimori , Toshiaki Aoai
发明人： Shiro Tan , Toru Fujimori , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides an excellent chemically-sensitized positive-working photoresist composition which exhibits a high resolution and a good dimensional stability with time, generates no development residue (scum) and standing waves and is less liable to loss of lone pattern. A novel positive-working photoresist composition is provided comprising at least (a) a copolymer A having at least structural units representedby the following general formulae (I), (II) and (III), (b) a compound which generates an acid when irradiated with actinic rays or radiation and (c) a solvent: ##STR1## wherein R.sub.1 and R.sub.2 each independently represent a hydrogen atom or methyl group; R.sub.3 represents a tertiary alkyl or cycloalkyl group which may be substituted; and X represents a divalent organic residue.
摘要翻译：本发明提供了一种优异的化学敏化正性光致抗蚀剂组合物，其显示出高分辨率和随时间稳定的尺寸稳定性，不产生显影残渣（浮渣）和驻波，并且不易损失孤单图案。提供了一种新型的正性光致抗蚀剂组合物，其包含至少（a）至少具有由以下通式（I），（II）和（III）表示的结构单元的共聚物A，（b）用光化射线或辐射照射，和（c）溶剂：其中R1和R2各自独立地表示氢原子或甲基; R3表示可以被取代的叔烷基或环烷基; X表示二价有机残基。

3. 发明授权

US06638683B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06638683B1
公开(公告)日：2003-10-28
申请号：US09103544
申请日：1998-06-24
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/115
摘要： A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.
摘要翻译：正型光致抗蚀剂组合物包含（a）由含有酚羟基的碱溶性树脂得到的树脂A的组合，通过用式（I）和（b）表示的基团代替10至80％的酚羟基，通过用式（II）或（III）表示的基团代替10〜80％的酚羟基或由至少一种以上的非聚合物溶解抑制化合物代替的酚醛羟基的碱溶性树脂得到的树脂B 选自叔烷基酯基和叔烷基碳酸酯基的一类基团;其中R 1，W，n和R 4如说明书中所定义。

4. 发明授权

US6004721A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US6004721A
公开(公告)日：1999-12-21
申请号：US18883
申请日：1998-02-05
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition is disclosed which comprises (a) a resin obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group having a specific structure, (b) a compound which generates an acid upon irradiation with actinic rays or a radiation, and (c) a solvent. This composition is an excellent, chemically amplified photoresist composition which has high resolution and gives a resist pattern having no depressions in an upper part thereof and having satisfactory adhesion to the substrate.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含（a）通过用具有特定结构的基团代替10至80％的酚羟基，由（b）化合物其在用光化射线或辐射照射时产生酸，和（c）溶剂。该组合物是优异的化学放大型光致抗蚀剂组合物，其具有高分辨率并且在其上部具有不具有凹陷的抗蚀剂图案，并且对基材具有令人满意的粘合性。

5. 发明授权

US06416925B1 Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06416925B1
公开(公告)日：2002-07-09
申请号：US09497281
申请日：2000-02-02
申请人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
发明人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.
摘要翻译：适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团的酸以增加在碱性显影剂中的溶解度。

6. 发明授权

US6042991A Positive working photosensitive composition 失效
公开(公告)号：US6042991A
公开(公告)日：2000-03-28
申请号：US25451
申请日：1998-02-18
申请人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
发明人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
IPC分类号： G03F7/004 , G03F7/039 , G03C1/72 , G03C1/73
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

7. 发明授权

US5318875A Positive quinonediazide photoresist composition containing select hydroxyphenol additive 失效
标题翻译：含有选择性羟基苯酚添加剂的正醌二叠氮化物光致抗蚀剂组合物
公开(公告)号：US5318875A
公开(公告)日：1994-06-07
申请号：US15921
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
IPC分类号： C07C45/46 , G03F7/022 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226 , C07C45/46 , G03F7/022
摘要： A positive photoresist composition includes an alkali-soluble resin, a quinonediazide compound and a compound selected from the group consisting of compounds represented by formulae (I), (II) and (III): ##STR1## wherein R.sub.1 to R.sub.27, which may be the same or different, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group, nitro group, alkenyl group, aryl group, aralkyl group, alkoxycarbonyl group, arylcarbonyl group, acyloxy group, acyl group, aryloxy group or aralkoxy group; ##STR2## wherein R.sub.31 represents an organic group, single bond, ##STR3## R.sub.32 represents a hydrogen atom, monovalent organic group or ##STR4## R.sub.33 to R.sub.37, which may be the same or different, and in which not all four groups for each of R.sub.33 to R.sub.37 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group, with the proviso that at least one of R.sub.33 to R.sub.35 is a hydroxyl group; X represents a divalent organic group; and m represents an integer 0 or 1; ##STR5## wherein R.sub.41 to R.sub.44, which may be the same or different and in which not all four groups for each of R.sub.41 to R.sub.44 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group; R.sub.45 and R.sub.46 each represents a hydrogen atom, alkyl group or ##STR6## a and c each represents an integer 0 or 1; and b represents an integer from 1 to 4.
摘要翻译：正型光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物和选自由式（I），（II）和（III）表示的化合物的化合物：其中R 1至R 27，可以相同或不同，分别表示氢原子，羟基，卤素原子，烷基，烷氧基，硝基，烯基，芳基，芳烷基，烷氧基羰基，芳基羰基，酰氧基，酰基，芳氧基或芳烷氧基; （II）其中R31表示有机基团，单键，R32表示氢原子，一价有机基团或R33至R37，其可以相同或不同，并且其中并不全部为四 R 33〜R 37各自可以相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基，条件是R 33〜R 35中的至少一个为羟基; X表示二价有机基团; m表示0或1的整数; （III）其中R41〜R44可以相同或不同，并且其中R41至R44中的每一个不是全部四个基团可以同时相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基; R 45和R 46各自表示氢原子，烷基或者a和c各自表示0或1的整数; b表示1〜4的整数。

8. 发明授权

US5358824A Photosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ring 失效
标题翻译：利用具有螺二双胍或螺二茚环的1,2-萘醌二叠氮化合物的感光树脂组合物
公开(公告)号：US5358824A
公开(公告)日：1994-10-25
申请号：US118590
申请日：1993-09-10
申请人： Shiro Tan , Yasunori Takata , Yoshimasa Aotani , Fumiyuki Nishiyama
发明人： Shiro Tan , Yasunori Takata , Yoshimasa Aotani , Fumiyuki Nishiyama
IPC分类号： G03F7/022 , H01L21/027 , H01L21/30 , G03F7/023
CPC分类号： G03F7/022
摘要： The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin:General formula (A) ##STR1## where R.sub.1 to R.sub.8 each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxyl group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or --OD, --N(R)--D (where R represents a hydrogen atom or an alkyl group, and D represents a 1,2-napthoquinoediazide-5-sulfonyl group or a 1,2-napthoquinoediazide-4-sulfonyl group), and at least one of R.sub.1 to R.sub.8 represents --OD or --N(R)--D; R.sub.9 to R.sub.12 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.9 and R.sub.10 and/or R.sub.11 and R.sub.12 may form a ring; R.sub.13 to R.sub.14 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.13 or R.sub.14 and any of R.sub.15 or R.sub.16 may form a ring, whereas at least one of R.sub.13 to R.sub.16 is a substitution group other than hydrogen; and Z represents an oxygen atom or a single bond.
摘要翻译：本发明的感光性树脂组合物含有5〜100重量份的具有下列通式（A）的感光材料和100重量份碱溶性树脂的混合物：通式（A）表示氢原子，羟基，卤素原子，烷基，烷氧基，芳烷基，芳基，氨基，单烷基氨基，二烷基氨基，酰氨基，烷基氨基甲酰基，芳基氨基甲酰基，烷基氨磺酰基基团，芳基氨磺酰基，羧基，氰基，硝基，酰基，烷氧基羰基，芳氧基羰基，酰氧基或-OD，-N（R）-D（其中R表示氢原子或烷基，D表示1,2-萘基叠氮基-5-磺酰基或1,2-萘醌亚叠氮基-4-磺酰基），R 1至R 8中的至少一个表示-OD或-N（ R）-D; R9至R12各自独立地表示氢原子，低级烷基或R9和R10和/或R11和R12可以形成环; R 13〜R 14各自独立地表示氢原子，低级烷基或R 13或R 14，R 15或R 16中的任一个可以形成环，而R 13〜R 16中的至少一个为氢以外的取代基。 Z表示氧原子或单键。

9. 发明授权

US06692883B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06692883B2
公开(公告)日：2004-02-17
申请号：US09838257
申请日：2001-04-20
申请人： Fumiyuki Nishiyama , Toru Fujimori , Shiro Tan
发明人： Fumiyuki Nishiyama , Toru Fujimori , Shiro Tan
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： A positive photoresist composition is disclosed, comprising a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, and a compound capable of generating an acid upon irradiation with actinic rays or radiation.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含具有包含特定基团的结构单元并且能够在酸的作用下分解以增加在碱性显影剂中的溶解度的树脂，具有包含特定基团的结构单元的树脂，并且能够在酸的作用下分解以增加在碱性显影剂中的溶解度，以及能够在用光化射线或辐射照射时能够产生酸的化合物。

10. 发明授权

US06207343B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06207343B1
公开(公告)日：2001-03-27
申请号：US09292052
申请日：1999-04-14
申请人： Toru Fujimori , Shiro Tan
发明人： Toru Fujimori , Shiro Tan
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a positive photosensitive composition comprising a compound having a group represented by the following general formula (Ia) or (Ib) which decomposes by the action of an acid to enhance its solubility in an alkaline developing solution and a compound which generates an acid upon irradiation with actinic rays or radiation: wherein R1a and R2a each represent a hydrogen atom or a C1-4 alkyl group; Wa represents a single bond or a divalent organic group; R3a represents a group which decomposes the action of an acid; R1b and R2b each represent a hydrogen atom or a C1-4 alkyl group; Wb represents a divalent organic group; and R3b represents a C11-20 chain alkyl group which may have substituents, a C11-20 cyclic alkyl group which may have substituents, a C11-30 aryl group which may have substituents or a C12-30 aralkyl group which may have substituents.
摘要翻译：本发明提供一种正型光敏组合物，其包含具有由以下通式（Ia）或（Ib）表示的基团的化合物，其通过酸的作用而分解，以增强其在碱性显影液中的溶解度和产生用光化射线或辐射照射时酸;其中R1a和R2a各自表示氢原子或C1-4烷基; Wa表示单键或二价有机基团; R3a表示分解酸的作用的基团; R1b和R2b各自表示氢原子或C1-4烷基; Wb表示二价有机基团; R3b表示可具有取代基的C11-20链烷基，可具有取代基的C11-20环状烷基，可具有取代基的C11-30芳基或可具有取代基的C12-30芳烷基。

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