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1. 发明申请

US20120307851A1 SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 有权
公开(公告)号：US20120307851A1
公开(公告)日：2012-12-06
申请号：US13572484
申请日：2012-08-10
申请人： Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI , Hakaru MIZOGUCHI
发明人： Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI , Hakaru MIZOGUCHI
IPC分类号： H01S3/10 , H01S3/0943 , H01S3/13
CPC分类号： H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

2. 发明申请

US20120236894A1 WAVELENGTH CONVERSION DEVICE, SOLID-STATE LASER APPARATUS, AND LASER SYSTEM 审中-公开
标题翻译：波长转换装置，固态激光装置和激光系统
公开(公告)号：US20120236894A1
公开(公告)日：2012-09-20
申请号：US13367099
申请日：2012-02-06
申请人： Takashi ONOSE , Hakaru MIZOGUCHI , Osamu WAKABAYASHI
发明人： Takashi ONOSE , Hakaru MIZOGUCHI , Osamu WAKABAYASHI
IPC分类号： H01S5/50 , G02F1/355
CPC分类号： H01S3/2375 , G02F1/3544 , G02F1/3551 , G02F2001/3503 , G02F2001/3507 , G02F2201/38 , H01S3/0092 , H01S3/1625 , H01S3/1636 , H01S3/2251 , H01S3/2333
摘要： A wavelength conversion device in this disclosure may include: a nonlinear crystal including a first surface; a first film to be joined to the first surface and including at least one layer; and a first prism to be joined to the first film.
摘要翻译：本公开中的波长转换装置可以包括：包括第一表面的非线性晶体; 要连接到第一表面并且包括至少一个层的第一膜; 以及与第一膜接合的第一棱镜。

3. 发明申请

US20130215916A1 LASER APPARATUS 有权
标题翻译：激光装置
公开(公告)号：US20130215916A1
公开(公告)日：2013-08-22
申请号：US13590558
申请日：2012-08-21
申请人： Kouji KAKIZAKI , Shinji OKAZAKI , Osamu WAKABAYASHI , Takashi ONOSE , Shinichi MATSUMOTO
发明人： Kouji KAKIZAKI , Shinji OKAZAKI , Osamu WAKABAYASHI , Takashi ONOSE , Shinichi MATSUMOTO
IPC分类号： H01S3/10 , H01S5/06
CPC分类号： H01S3/10 , H01S3/005 , H01S3/08004 , H01S3/08086 , H01S3/10092 , H01S3/1055 , H01S3/106 , H01S3/1625 , H01S3/225 , H01S3/2251 , H01S3/2325 , H01S3/235 , H01S3/2375 , H01S5/0092 , H01S5/0604 , H01S5/06216 , H01S5/4012 , H01S5/4087
摘要： A laser apparatus includes a master oscillator capable of outputting a laser beam having a spectrum that includes at least three wavelength peaks, a multi-wavelength oscillation control mechanism capable of controlling energy of each of the wavelength peaks, a spectrum detecting unit that detects the spectrum of the above-mentioned laser beam, and a controller that controls the multi-wavelength oscillation control mechanism based on a detection result detected by the spectrum detecting unit.
摘要翻译：激光装置包括能够输出具有包括至少三个波长峰值的光谱的激光束的主振荡器，能够控制每个波长峰值的能量的多波长振荡控制机构，检测频谱的频谱检测单元以及控制器，其基于由所述频谱检测单元检测到的检测结果来控制所述多波长振荡控制机构。

4. 发明申请

US20100054297A1 OPTICAL ELEMENT FOR GAS LASER AND GAS LASER APPARATUS USING THE SAME 有权
标题翻译：用于气体激光和气体激光装置的光学元件
公开(公告)号：US20100054297A1
公开(公告)日：2010-03-04
申请号：US12545495
申请日：2009-08-21
申请人： Osamu WAKABAYASHI , Shinji Nagai , Kouji Kakizaki , Satoshi Tanaka
发明人： Osamu WAKABAYASHI , Shinji Nagai , Kouji Kakizaki , Satoshi Tanaka
IPC分类号： H01S3/08
CPC分类号： H01S3/005 , G02B1/02 , H01S3/0057 , H01S3/08009 , H01S3/08054 , H01S3/10061 , H01S3/2251
摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
摘要翻译：进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。

5. 发明申请

US20100051832A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100051832A1
公开(公告)日：2010-03-04
申请号：US12543582
申请日：2009-08-19
申请人： Toshihiro NISHISAKA , Yukio WATANABE , Osamu WAKABAYASHI , Kouji KAKIZAKI , Michio SHINOZAKI
发明人： Toshihiro NISHISAKA , Yukio WATANABE , Osamu WAKABAYASHI , Kouji KAKIZAKI , Michio SHINOZAKI
IPC分类号： G21K5/04
CPC分类号： G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
摘要翻译： EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室预定位置和维护区域。

6. 发明申请

US20110158281A1 GAS DISCHARGE CHAMBER 有权
标题翻译：气体放电室
公开(公告)号：US20110158281A1
公开(公告)日：2011-06-30
申请号：US12899886
申请日：2010-10-07
申请人： Shinji NAGAI , Fumika YOSHIDA , Osamu WAKABAYASHI , Kouji KAKIZAKI
发明人： Shinji NAGAI , Fumika YOSHIDA , Osamu WAKABAYASHI , Kouji KAKIZAKI
IPC分类号： H01S3/034
CPC分类号： H01S3/034 , G02B1/02 , G02B5/3091 , H01S3/0346 , H01S3/08054 , H01S3/0816 , H01S3/225 , H01S3/2251
摘要： A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.
摘要翻译：使用减少由于机械应力（窗口保持器和激光气体压力）的破裂的氟化钙晶体，来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度，并抑制了劣化由于强紫外线（特别是ArF）激光照射。气体放电室的第一窗口（2）和第二窗口（3）具有与其氟化钙晶体的（111）晶面平行的入射面和发射平面。关于进入氟化钙晶体的激光通过包括第一窗口（2）和第二窗口（3）中的每一个的<111>轴和<001>轴的平面的布置，从内侧看室（1），第一窗口（2）和第二窗口（3）被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。

7. 发明申请

US20110310365A1 CHAMBER APPARATUS AND METHOD OF MAINTAINING TARGET SUPPLY UNIT 有权
标题翻译：室内装置和维护目标供应单元的方法
公开(公告)号：US20110310365A1
公开(公告)日：2011-12-22
申请号：US13051649
申请日：2011-03-18
申请人： Takayuki YABU , Kouji KAKIZAKI , Yukio WATANABE , Osamu WAKABAYASHI
发明人： Takayuki YABU , Kouji KAKIZAKI , Yukio WATANABE , Osamu WAKABAYASHI
IPC分类号： G03B27/52
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
摘要翻译：与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。

8. 发明申请

US20100140512A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100140512A1
公开(公告)日：2010-06-10
申请号：US12603872
申请日：2009-10-22
申请人： Takashi SUGANUMA , Masato MORIYA , Tamotsu ABE , Kouji KAKIZAKI , Osamu WAKABAYASHI
发明人： Takashi SUGANUMA , Masato MORIYA , Tamotsu ABE , Kouji KAKIZAKI , Osamu WAKABAYASHI
IPC分类号： G21K5/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70191 , G03F7/70575 , G03F7/70591 , G03F7/7085 , H05G2/005
摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.
摘要翻译：可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。

9. 发明申请

US20120248344A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：极致超紫外光发生系统
公开(公告)号：US20120248344A1
公开(公告)日：2012-10-04
申请号：US13523446
申请日：2012-06-14
申请人： Osamu WAKABAYASHI , Tatsuya Yanagida
发明人： Osamu WAKABAYASHI , Tatsuya Yanagida
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , H05G2/005
摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
摘要翻译：与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统用于控制激光束的光束强度分布。

10. 发明申请

US20120305811A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
公开(公告)号：US20120305811A1
公开(公告)日：2012-12-06
申请号：US13572248
申请日：2012-08-10
申请人： Osamu WAKABAYASHI , Tatsuya YANAGIDA , Hakazu MIZOGUCHI
发明人： Osamu WAKABAYASHI , Tatsuya YANAGIDA , Hakazu MIZOGUCHI
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , H05G2/003
摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.

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