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1. 发明授权

US08698111B2 Extreme ultraviolet light generation system 有权
标题翻译：极紫外光发生系统
公开(公告)号：US08698111B2
公开(公告)日：2014-04-15
申请号：US13283922
申请日：2011-10-28
申请人： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Hideo Hoshino
发明人： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Hideo Hoshino
IPC分类号： G21G4/00
CPC分类号： H05G2/008 , H05G2/006
摘要： An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.
摘要翻译：通过激发目标材料以将目标材料转化成等离子体来产生极紫外光的装置可以包括：框架; 产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 用于柔性地连接所述框架和所述室的第一连接构件; 用于将目标供给单元固定到框架的机构; 以及用于灵活地将目标供应单元连接到室的第二连接构件。

2. 发明申请

US20120104290A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：极致超紫外光发生系统
公开(公告)号：US20120104290A1
公开(公告)日：2012-05-03
申请号：US13283922
申请日：2011-10-28
申请人： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Hideo Hoshino
发明人： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Hideo Hoshino
IPC分类号： G21K5/00 , H05H1/24
CPC分类号： H05G2/008 , H05G2/006
摘要： An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.
摘要翻译：通过激发目标材料以将目标材料转化成等离子体来产生极紫外光的装置可以包括：框架; 产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 用于柔性地连接所述框架和所述室的第一连接构件; 用于将目标供给单元固定到框架的机构; 以及用于灵活地将目标供应单元连接到室的第二连接构件。

3. 发明授权

US06577664B1 Excimer laser device 有权
标题翻译：准分子激光装置
公开(公告)号：US06577664B1
公开(公告)日：2003-06-10
申请号：US09466063
申请日：1999-12-17
申请人： Hisashi Nara , Toshihiro Nishisaka
发明人： Hisashi Nara , Toshihiro Nishisaka
IPC分类号： H01S322
CPC分类号： F16C39/02 , F16C32/0442 , H01S3/02 , H01S3/03 , H01S3/225
摘要： An excimer laser device capable of suppressing vibration of a cross flow fan, and preventing breakage of magnetic bearings when the vibration increases is provided. For this purpose, the device has a configuration that in the excimer laser device including magnetic bearings (12) each having an inner ring section (10, 30) and an outer ring section (11, 31), and a cross flow fan (1) for circulating a laser gas in a chamber (2), touch-down bearings (15) are provided on the outer peripheral side of a rotating shaft (9), and the inner peripheral face of an inner peripheral portion (15B) of the touch-down bearing (15) and the outer peripheral face of the rotating shaft (9) are disposed opposite each other with a predetermined clearance smaller than a gap (4) between the outer peripheral face of the inner ring section (10, 30) and the inner peripheral face of the outer ring section (11, 31).
摘要翻译：提供能够抑制横流风扇的振动并且防止振动增加时磁轴承断裂的准分子激光装置。为此，该装置具有在准分子激光装置中具有各自具有内圈部（10,30）和外圈部（11,31）以及横流风扇（1）的磁性轴承（12）的结构），用于在腔室（2）中循环激光气体，在旋转轴（9）的外周侧设置有触下轴承（15），并且内周部（15B）的内周面下降轴承（15）和旋转轴（9）的外周面以比内圈部（10,30）的外周面之间的间隙（4）小的规定间隙相对配置，和外圈部（11,31）的内周面。

4. 发明授权

US06337872B1 Once through fan for excimer laser apparatus 有权
标题翻译：一次通过风扇进行准分子激光设备
公开(公告)号：US06337872B1
公开(公告)日：2002-01-08
申请号：US09422857
申请日：1999-10-25
申请人： Hisashi Nara , Kiyoharu Nakao , Hakaru Mizoguchi , Toshihiro Nishisaka , Tatsuo Enami
发明人： Hisashi Nara , Kiyoharu Nakao , Hakaru Mizoguchi , Toshihiro Nishisaka , Tatsuo Enami
IPC分类号： H01S322
CPC分类号： H01S3/036 , H01S3/225
摘要： The invention provides an once through fan for an excimer laser apparatus having a reduced vibration and being capable of increasing a rotational speed. In order to obtain this, in an once through fan (1) for an excimer laser apparatus provided with a blade portion (6) having a plurality of blades, a rotary shaft (4) for rotating the blade portion and a magnetic bearing (7) rotatably supporting the rotary shaft in a non-contact manner so as to circulate a laser gas sealed within a chamber (2) in accordance with a rotation of the blade portion, a rotor (21) of a motor (23) installed within the chamber (2) and rotating the rotary shaft (4) is mounted on an outer peripheral portion of the rotary shaft, and at least one magnetic bearing (7, 7) for supporting the rotary shaft is arranged in each of both sides in an axial direction of the rotor.
摘要翻译：本发明提供了一种具有减小的振动并能够增加转速的准分子激光装置的一次通过风扇。为了获得这一点，在设置有具有多个叶片的叶片部分（6）的准分子激光装置的一次通过风扇（1）中，用于使叶片部分旋转的旋转轴（4）和磁性轴承（7））以不接触的方式可旋转地支撑旋转轴，以便根据叶片部分的旋转使密封在腔室（2）内的激光气体循环;马达（23）的转子（21）安装在室（2）并旋转旋转轴（4）安装在旋转轴的外周部分上，并且至少一个用于支撑旋转轴的磁轴承（7,7）以轴向方向布置在两侧转子方向。

5. 发明授权

US09052615B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US09052615B2
公开(公告)日：2015-06-09
申请号：US12543582
申请日：2009-08-19
申请人： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Kouji Kakizaki , Michio Shinozaki
发明人： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Kouji Kakizaki , Michio Shinozaki
IPC分类号： G21K5/04 , G03F7/20
CPC分类号： G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
摘要翻译： EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室预定位置和维护区域。

6. 发明申请

US20100193711A1 EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
标题翻译：极致超紫外光源系统
公开(公告)号：US20100193711A1
公开(公告)日：2010-08-05
申请号：US12685835
申请日：2010-01-12
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/02
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

7. 发明授权

US08759804B2 Chamber apparatus and extreme ultraviolet light generation system 有权
标题翻译：室内设备和极紫外光发生系统
公开(公告)号：US08759804B2
公开(公告)日：2014-06-24
申请号：US13122354
申请日：2011-03-11
申请人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
发明人： Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/008 , G03B27/54 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
摘要翻译：与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

8. 发明授权

US08324600B2 Apparatus and method for measuring and controlling target trajectory in chamber apparatus 有权
标题翻译：装置和方法，用于测量和控制腔室装置中的目标轨迹
公开(公告)号：US08324600B2
公开(公告)日：2012-12-04
申请号：US12783219
申请日：2010-05-19
申请人： Hideyuki Hayashi , Tooru Abe , Kouji Kakizaki , Toshihiro Nishisaka
发明人： Hideyuki Hayashi , Tooru Abe , Kouji Kakizaki , Toshihiro Nishisaka
IPC分类号： H05G2/00 , G21G4/00
CPC分类号： H05G2/003 , H05G2/006
摘要： An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position.
摘要翻译：一种用于测量和控制腔室装置内的目标轨迹的装置，用于通过用来自外部驱动器激光器的驱动器激光束照射从目标喷嘴提供的液滴目标产生的等离子体产生极紫外光。该装置包括：用于调节目标喷嘴的位置和角度中的至少一个的喷嘴调节机构; 目标轨迹测量单元，用于测量目标轨迹以获得关于目标轨迹的轨迹信息; 目标轨迹角检测单元，用于获得与由所述轨迹信息表示的目标轨迹与预定目标轨迹之间的角度偏差相关的值; 以及喷嘴调节控制器，用于基于与角度偏差相关的值来控制喷嘴调节机构，使得液滴目标通过预定的激光束照射位置。

9. 发明授权

US06389049B2 Discharge circuit for pulsed laser and pulsed power source 有权
标题翻译：脉冲激光和脉冲电源放电电路
公开(公告)号：US06389049B2
公开(公告)日：2002-05-14
申请号：US09166681
申请日：1998-10-05
申请人： Daisuke Yoshida , Toshihiro Nishisaka , Yuichi Takabayashi , Takashi Matsunaga , Hisashi Yanase , Tadao Shibuya , Yasuo Kataoka , Masayuki Tani , Eiji Sasamoto , Hiroyuki Hiyoshi , Kiyoshi Hara
发明人： Daisuke Yoshida , Toshihiro Nishisaka , Yuichi Takabayashi , Takashi Matsunaga , Hisashi Yanase , Tadao Shibuya , Yasuo Kataoka , Masayuki Tani , Eiji Sasamoto , Hiroyuki Hiyoshi , Kiyoshi Hara
IPC分类号： H01S310
CPC分类号： H03K3/57 , H01S5/042
摘要： A discharge circuit for pulsed laser comprising a power source, main discharge electrodes for generating a laser beam, a main discharge capacitor charged with electrical charges for generating the main discharge between the main discharge electrodes, and a switching circuit for performing switching operations to charge the main discharge capacitor with electrical charges supplied from the power source in a prescribed repetition cycle, is provided, in parallel to the main discharge capacitors, with a circuit element for consuming or grounding the reverse current from the power source caused by overshoot generated directly after the main discharge, thereby attaining stable laser output without ill effects from overshoot voltage generated directly following discharge.
摘要翻译：一种用于脉冲激光器的放电电路，包括电源，用于产生激光束的主放电电极，充满用于在主放电电极之间产生主放电的电荷的主放电电容器和用于执行开关操作的开关电路，与主放电电容器并联设置的用于从电源提供的电荷的主放电电容器用于消除或接地来自电源的反向电流的电路元件，其由直接在主放电，从而获得稳定的激光输出，而不会因放电后直接产生的过冲电压而产生不良影响。

10. 发明申请

US20120119118A1 EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM 审中-公开
标题翻译：极致超紫外光源系统
公开(公告)号：US20120119118A1
公开(公告)日：2012-05-17
申请号：US13359315
申请日：2012-01-26
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/00
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。

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