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1. 发明申请

US20060038309A1 Micro-shape transcription method, micro-shape transcription apparatus, and optical-component manufacture method 审中-公开
标题翻译：微型转录法，微型转录装置，光学元件制造方法等
公开(公告)号：US20060038309A1
公开(公告)日：2006-02-23
申请号：US11253560
申请日：2005-10-20
申请人： Tsuguhiro Korenaga , Makoto Umetani , Hiroyuki Asakura
发明人： Tsuguhiro Korenaga , Makoto Umetani , Hiroyuki Asakura
IPC分类号： B29D11/00
CPC分类号： B29D11/00769 , B29C43/021 , B29C59/022 , B29C2043/025 , B29C2059/023 , B29D11/00 , B29K2995/0034 , B29L2011/00 , B29L2011/0075
摘要： A micro-shape transcription method has preparing a mold having a transcription face on which a concavo-convex pattern is formed, pressing the transcription face against a base material softened by heating, then forcibly separating the mold from the base material to transcribe a reverse pattern of the concavo-convex pattern to the surface of the base material, wherein when assuming a temperature for pressing the mold against the base material as T1 (° C.), a temperature for separating the mold from the base materials T2 (° C.), thermal expansion coefficients of the mold and the base material as αa and αb, and the maximum distance between the transcription center of the transcription face and the concavo-convex pattern as d (mm), the following relations (1) and (2): T1≧T2 (1) |αa−αb|·(T1−T2)·d≦4×10−2 (2) are simultaneously satisfied.
摘要翻译：微型转印方法制备具有形成凹凸图案的转录面的模具，将转印面压在通过加热软化的基材上，然后强制地将模具与基材分离以转印反转图案的凹凸图案的基底材料的表面，其中当假设将模具压在基材上的温度为T 1℃（℃）时，将模具分离的温度基础材料T 2（℃），模具和基材的热膨胀系数为αα和αB b，以及转录面的转录中心与凹凸图案之间的最大距离为d（mm），以下关系式（1）和（2）：<？in-line-formula description =“In-line Formulas”end =“lead”？> T <1 > = T 2（1）<？in-line-formula description =“In-line Formulas”end =“tail”？ > <？in-line-fo rmulae description =“In-line Formulas”end =“lead”？> | a a （2）<？in-line-formula description =“在线公式”end =“tail”？>同时满意。

2. 发明授权

US06989114B1 Micro-shape transcription method, micro-shape transcription apparatus, and optical-component manufacture method 有权
标题翻译：微型转录法，微型转录装置，光学元件制造方法
公开(公告)号：US06989114B1
公开(公告)日：2006-01-24
申请号：US09609250
申请日：2000-06-30
申请人： Tsuguhiro Korenaga , Makoto Umetani , Hiroyuki Asakura
发明人： Tsuguhiro Korenaga , Makoto Umetani , Hiroyuki Asakura
IPC分类号： B29D11/00
CPC分类号： B29D11/00769 , B29C43/021 , B29C59/022 , B29C2043/025 , B29C2059/023 , B29D11/00 , B29K2995/0034 , B29L2011/00 , B29L2011/0075
摘要： A micro-shape transcription method has preparing a mold having a transcription face on which a concavo-convex pattern is formed, pressing the transcription face against a base material softened by heating, then forcibly separating the mold from the base material to transcribe a reverse pattern of the concavo-convex pattern to the surface of the base material, wherein when assuming a temperature for pressing the mold against the base material as T1 (° C.), a temperature for separating the mold from the base material as T2 (° C.), thermal expansion coefficients of the mold and the base material as αa and αb, and the maximum distance between the transcription center of the transcription face and the concavo-convex pattern as d (mm), the following relations (1) and (2): T1≧T2 (1) |αa−αb|·(T1−T2)·d≦4×10−2 (2) are simultaneously satisfied.
摘要翻译：微型转印方法制备具有形成凹凸图案的转录面的模具，将转印面压在通过加热软化的基材上，然后强制地将模具与基材分离以转印反转图案的凹凸图案的基底材料的表面，其中当假设将模具压在基材上的温度为T 1℃（℃）时，将模具分离的温度基材作为T 2（℃），模具和基材的热膨胀系数为αα和αB 2，和转录面的转录中心与凹凸图案之间的最大距离为d（mm），以下关系式（1）和（2）：<？in-line-formula description =“In-Line Formulas” end =“lead”？> T <1> = T 2（1）<？in-line-formula description =“In-line Formulas”end =“tail” ？> <？in-line-fo rmulae description =“In-line Formulas”end =“lead”？> | a a （2）<？in-line-formula description =“在线公式”end =“tail”？>同时满意。

3. 发明申请

US20100271706A1 OPTICAL MEMBER AND OPTICAL SYSTEM, OPTICAL UNIT AND OPTICAL DEVICE INCLUDING THE OPTICAL MEMBER 审中-公开
标题翻译：光学部件和光学系统，光学单元和光学装置，包括光学部件
公开(公告)号：US20100271706A1
公开(公告)日：2010-10-28
申请号：US12305871
申请日：2007-06-20
申请人： Kazuhiro Yamada , Yasuhiro Tanaka , Michihiro Yamagata , Makoto Umetani , Takamasa Tamura , Motonobu Yoshikawa , Hiroshi Yamaguchi , Masaaki Sunohara
发明人： Kazuhiro Yamada , Yasuhiro Tanaka , Michihiro Yamagata , Makoto Umetani , Takamasa Tamura , Motonobu Yoshikawa , Hiroshi Yamaguchi , Masaaki Sunohara
IPC分类号： G02B1/11
CPC分类号： G02B1/118 , G03G15/0435 , G03G2215/00177 , G03G2215/0402
摘要： The present disclosure relates to an optical member in which an antireflection concave-convex structure for suppressing reflection of light is provided on its surface, and an optical system, an optical unit and an optical device each including the optical member.The present disclosure provides an optical member in which the generation of reflection light and diffraction light is sufficiently suppressed and which can be fabricated in a simple manner.A antireflection concave-convex structure (15) for suppressing reflection of light, formed of filiform convex portions (16) regularly arranged, is provided on an interior surface (1a) of a lens tube (1). The antireflection concave-convex structure (15) is configured so that an angle between a normal vector of an incident plane of the light whose reflection is to be suppressed and a vector connecting respective apexes of adjacent two of the structure units at the incident surface is 60 degrees or less.
摘要翻译：本发明涉及一种光学部件，其中在其表面上设置有用于抑制光反射的抗反射凹凸结构，以及每个包括光学部件的光学系统，光学单元和光学装置。本公开提供了一种光学构件，其中反射光的产生和衍射光被充分地抑制，并且可以以简单的方式制造。在透镜管（1）的内表面（1a）上设置用于抑制由规则排列的丝状凸部（16）形成的光的反射的防反射凹凸结构（15）。防反射凹凸结构（15）被构造为使得要抑制反射的光的入射面的法线向量与连接入射面相邻的两个结构单元的顶点的矢量之间的角度为 60度以下。

4. 发明授权

US5538528A Glass optical element press-molding die having a tantalum containing alloy surface layer 失效
标题翻译：具有含钽合金表面层的玻璃光学元件压制成型模具
公开(公告)号：US5538528A
公开(公告)日：1996-07-23
申请号：US178858
申请日：1994-01-07
申请人： Yoshinari Kashiwagi , Makoto Umetani , Masaki Aoki
发明人： Yoshinari Kashiwagi , Makoto Umetani , Masaki Aoki
IPC分类号： C03B11/00 , C03B11/08
CPC分类号： C03B11/086 , C03B2215/12 , C03B2215/16 , C03B2215/17 , C03B2215/34 , C03B2215/72 , Y10S425/808
摘要： A die for press-molding a glass optical element which includes a base material having a surface to press-mold glass and a tantalum(Ta)-containing alloy thin layer on the surface, the base material being heat-resistant and strong enough to withstand press-molding.
摘要翻译：一种用于压制模制玻璃光学元件的模具，其包括具有表面压制模具玻璃的表面的基材和在表面上的含钽（Ta）的合金薄层），所述基材耐热且足够坚固以承受压模。

5. 发明授权

US4953385A Information storage stamper and method of manufacturing disks using the same 失效
标题翻译：信息存储模具及其制造方法
公开(公告)号：US4953385A
公开(公告)日：1990-09-04
申请号：US396622
申请日：1989-08-22
申请人： Masaki Aoki , Hideo Torii , Kiyoshi Kuribayashi , Hideto Monji , Makoto Umetani , Eiji Fujii
发明人： Masaki Aoki , Hideo Torii , Kiyoshi Kuribayashi , Hideto Monji , Makoto Umetani , Eiji Fujii
IPC分类号： G11B5/84 , G11B7/26
CPC分类号： G11B7/26 , G11B5/84 , Y10S425/81
摘要： On a cemented carbide alloy disk or a cermet disk having been coated with either an iridium (Ir) alloy film or a ruthenium (Ru) alloy film is formed guide grooves by photography or ECR ion etching. The disk thus obtained is used as an optical or magnetic disk stamper. Next, a glass or aluminium disk is placed between a pair of stampers obtained as above and molded under pressure while heating thereby to make guide grooves of an optical or magnetic disk.
摘要翻译：在用铱（Ir）合金膜或钌（Ru）合金膜涂覆的硬质合金圆盘或金属陶瓷盘上，通过摄影或ECR离子蚀刻形成引导槽。将如此获得的盘用作光盘或磁盘压模。接下来，将玻璃或铝盘放置在如上获得的一对压模之间，同时在加热的同时模压成型，从而形成光盘或磁盘的导槽。

6. 发明授权

US6003336A Method of manufacturing a die for press-molding optical elements 失效
标题翻译：制造用于模压光学元件的模具的方法
公开(公告)号：US6003336A
公开(公告)日：1999-12-21
申请号：US623889
申请日：1996-03-29
申请人： Yoshinari Kashiwagi , Makoto Umetani , Hidenao Kataoka , Kenji Inoue , Shoji Nakamura , Satoru Morimoto
发明人： Yoshinari Kashiwagi , Makoto Umetani , Hidenao Kataoka , Kenji Inoue , Shoji Nakamura , Satoru Morimoto
IPC分类号： B29C43/08 , B32B15/01 , C03B11/08 , C03B40/02 , C23C14/06 , C23C14/16 , C23C14/34 , C23C14/58 , C23C28/00 , C23C28/02 , C23C16/06
CPC分类号： C23C14/5873 , B32B15/01 , C03B11/086 , C03B40/02 , C23C14/06 , C23C14/067 , C23C14/16 , C23C14/3414 , C23C28/00 , C23C28/02 , C23C28/323 , C23C28/34 , C23C28/347 , B29C2043/3618 , B29C43/021 , B29L2011/0016 , C03B2215/12 , C03B2215/16 , C03B2215/17 , C03B2215/31 , C03B2215/32 , C03B2215/34
摘要： A die for press-molding glass optical elements which can press-mold glass optical elements having high melting points and various shapes repeatedly, which includes a base material having high strength on which a cutting layer having heat resistance and free cutting machinability is formed. After cutting the cutting layer into the desired shape with high accuracy, the die is coated with a surface protective film.
摘要翻译：一种用于压制玻璃光学元件的模具，其可以重复地压制具有高熔点和各种形状的玻璃光学元件，该模具包括具有高强度的基材，其上形成具有耐热性和自由切削加工性的切割层。在将切割层以高精度切割成所需形状之后，模具被表面保护膜涂覆。

7. 发明授权

US4842633A Method of manufacturing molds for molding optical glass elements and diffraction gratings 失效
$Method of manufacturing molds for molding optical glass elements and diffraction gratings$
标题翻译：制造用于模制光学玻璃元件和衍射光栅的模具的方法
公开(公告)号：US4842633A
公开(公告)日：1989-06-27
申请号：US235301
申请日：1988-08-23
申请人： Kiyoshi Kuribayashi , Makoto Umetani , Hideto Monji , Masaki Aoki
发明人： Kiyoshi Kuribayashi , Makoto Umetani , Hideto Monji , Masaki Aoki
IPC分类号： B22F5/00 , C03B11/08
CPC分类号： C03B11/086 , B22F5/007 , C03B11/082 , C03B2215/12 , C03B2215/16 , C03B2215/17 , C03B2215/22 , C03B2215/32 , C03B2215/34 , C03B2215/41 , C03B2215/412 , Y10S359/90
摘要： A base material excellent in heat resistance and high-temperature strength is processed into a desired configuration. The processed base material is coated with a heat-resistant film having excellent strength at high temperatures and low reactivity with a glass material to be molded. A resist is applied on the heat resistant film and a desired pattern is drawn thereon by means of electron beam, ion beam, hologram exposure, or ordinary photolithography. Or if a mold having deep unevenness of the pressing surface is required, the resist is applied after an intermediate layer which permits selective etching is formed on the heat resistant film, and the required pattern is drawn thereon by means of electron beam, ion beam, hologram exposure, or ordinary photolithography. The intermediate layer is removed by wet etching or dry etching to emphasize unevenness of the mask. The resist film or the resist film and intermediate layer film are completely removed and a part of the heat-resistant film is removed to obtain a mold having the desired configuration of the molding surface.
摘要翻译：将耐热性和耐高温性优异的基材加工成所希望的结构。加工后的基材在高温下具有优异的强度和与待成型的玻璃材料的反应性低的耐热膜。将抗蚀剂施加在耐热膜上，并且通过电子束，离子束，全息曝光或普通光刻法将期望的图案拉到其上。或者如果需要具有挤压表面的深度不均匀的模具，则在耐热膜上形成允许选择性蚀刻的中间层之后施加抗蚀剂，并且通过电子束，离子束，全息曝光或普通光刻。通过湿蚀刻或干蚀刻去除中间层，以强调掩模的不均匀性。完全除去抗蚀剂膜或抗蚀膜和中间层膜，除去一部分耐热膜，得到具有所需成型面的模具。

8. 发明授权

US08184373B2 Optical element and method for producing the same 有权
标题翻译：光学元件及其制造方法
公开(公告)号：US08184373B2
公开(公告)日：2012-05-22
申请号：US11596283
申请日：2005-05-09
申请人： Yasuhiro Tanaka , Makoto Umetani , Hiroshi Yamaguchi , Motonobu Yoshikawa , Katsuhiko Hayashi
发明人： Yasuhiro Tanaka , Makoto Umetani , Hiroshi Yamaguchi , Motonobu Yoshikawa , Katsuhiko Hayashi
IPC分类号： G02B27/10
CPC分类号： G02B1/118 , G02B3/0018 , G02B3/0031 , G02B3/0056 , G02B5/1809 , G02F2201/38 , Y10T428/24405
摘要： The present invention relates to a structure comprising: a resin pattern (A)3 formed on a base material 1 and having structure units of a predetermined shape; and a resin pattern (B)5 formed on a surface of the resin pattern (A)3 and having microscopic structure units, of a predetermined shape, arranged at a period shorter than or equal to a wavelength range of a using light, and to a method for producing the structure, comprising the steps of: (i) forming a resin layer 2 on the base material 1 and subjecting the resin layer 2 to an exposure-development process so as to form the resin pattern (A)3; and (ii) subjecting a surface of the resin pattern (A)3 to an exposure-development process so as to form the resin pattern (B)5, wherein the steps (i) and (ii) are sequential.
摘要翻译：本发明涉及一种结构，包括：形成在基材1上并具有预定形状的结构单元的树脂图案（A）3; 以及树脂图案（B）5，其形成在树脂图案（A）3的表面上并且具有以比使用光的波长范围小的时间排列的预定形状的微观结构单元，并且一种制造该结构体的方法，包括以下步骤：（i）在基材1上形成树脂层2，对树脂层2进行曝光显影处理以形成树脂图案（A）3; 和（ii）对树脂图案（A）3的表面进行曝光显影处理以形成树脂图案（B）5，其中步骤（i）和（ii）是顺序的。

9. 发明申请

US20050093210A1 Method for producing optical element having antireflection structure, and optical element having antireflection structure produced by the method 审中-公开
标题翻译：具有防反射结构的光学元件的制造方法以及通过该方法制造的具有抗反射结构的光学元件
公开(公告)号：US20050093210A1
公开(公告)日：2005-05-05
申请号：US10975929
申请日：2004-10-29
申请人： Makoto Umetani , Yoshiyuki Shimizu , Yoshiharu Yamamoto , Michihiro Yamagata , Yasuhiro Tanaka , Hiroshi Yamaguchi
发明人： Makoto Umetani , Yoshiyuki Shimizu , Yoshiharu Yamamoto , Michihiro Yamagata , Yasuhiro Tanaka , Hiroshi Yamaguchi
IPC分类号： C03B11/08 , C03C15/00 , C03C17/06 , G02B5/00 , H05B6/00 , B29D24/00
CPC分类号： G02B5/003 , C03B11/082 , C03B11/086 , C03B2215/10 , C03B2215/17 , C03B2215/412 , C03C15/00 , C03C17/06 , Y02P40/57
摘要： A cylinder-shaped Cr mask having a diameter of 0.15 μm is formed at a pitch of 0.15 μm on a quartz glass substrate. The quartz glass substrate on which the cylinder-shaped Cr mask is formed is placed in a RF dry-etching apparatus and the surface of the quartz glass substrate is etched with CHF3+O2 gas. Thus, a cone-shaped antireflection structure with a pitch of 0.15 μm and a height of 0.15 μm is formed on the surface of the quartz glass substrate. An Ir—Rh alloy film having a thickness of 0.05 μm for protecting the surface is formed on the surface (pressing surface) of the quartz glass substrate provided with the cone-shaped antireflection structure to form a mold having an antireflection structure. An optical material 11 (crown based borosilicate glass) to which a releasing agent containing carbon (C) particulates for mold release is applied is press-molded with the mold having an antireflection structure, and the press-molded optical material is released from the mold having an antireflection structure without cooling. After the press-molded optical material is cooled, the releasing agent is removed.
摘要翻译：在石英玻璃基板上以0.15μm的间距形成直径为0.15μm的圆筒状Cr掩模。将形成有圆筒形Cr掩模的石英玻璃基板放置在RF干蚀刻装置中，并用CHF 3 + O 2 2蚀刻石英玻璃基板的表面， / SUB气体。因此，在石英玻璃基板的表面上形成具有0.15μm的间距和0.15μm的高度的锥形防反射结构。在设置有锥形防反射结构的石英玻璃基板的表面（按压面）上形成厚度为0.05μm的用于保护表面的Ir-Rh合金膜，以形成具有防反射结构的模具。将具有用于脱模的碳（C）颗粒的脱模剂施加到其上的光学材料11（冠状硼硅酸盐玻璃）用具有抗反射结构的模具进行压模，并且将模压的光学材料从模具中释放具有防反射结构而不冷却。压制成型的光学材料冷却后，除去脱模剂。

10. 发明授权

US5700307A Die for press-molding optical elements 失效
标题翻译：模压成型光学元件
公开(公告)号：US5700307A
公开(公告)日：1997-12-23
申请号：US281690
申请日：1994-07-28
申请人： Yoshinari Kashiwagi , Makoto Umetani , Hidenao Kataoka , Kenji Inoue , Shoji Nakamura , Satoru Morimoto
发明人： Yoshinari Kashiwagi , Makoto Umetani , Hidenao Kataoka , Kenji Inoue , Shoji Nakamura , Satoru Morimoto
IPC分类号： B29C43/08 , B32B15/01 , C03B11/08 , C03B40/02 , C23C14/06 , C23C14/16 , C23C14/34 , C23C14/58 , C23C28/00 , C23C28/02 , C03B11/06
CPC分类号： C23C14/5873 , B32B15/01 , C03B11/086 , C03B40/02 , C23C14/06 , C23C14/067 , C23C14/16 , C23C14/3414 , C23C28/00 , C23C28/02 , C23C28/321 , C23C28/323 , C23C28/34 , C23C28/347 , B29C2043/3618 , B29C43/021 , B29L2011/0016 , C03B2215/12 , C03B2215/16 , C03B2215/17 , C03B2215/31 , C03B2215/32 , C03B2215/34 , Y10S425/808
摘要： A die for press-molding glass optical elements which can press-mold glass optical elements having high melting points and various shapes repeatedly, which includes a base material having high strength on which a cutting layer having heat resistance and free cutting machinability is formed. After cutting the cutting layer into the desired shape with high accuracy, the die is coated with a surface protective film.
摘要翻译：一种用于压制玻璃光学元件的模具，其可以重复地压制具有高熔点和各种形状的玻璃光学元件，该模具包括具有高强度的基材，其上形成具有耐热性和自由切削加工性的切割层。在将切割层以高精度切割成所需形状之后，模具被表面保护膜涂覆。

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