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1. 发明授权

US08520217B2 Talbot interferometer, its adjustment method, and measurement method 有权
标题翻译： Talbot干涉仪，其调整方法和测量方法
公开(公告)号：US08520217B2
公开(公告)日：2013-08-27
申请号：US12765037
申请日：2010-04-22
申请人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
发明人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G01B9/02097 , G01B9/02024 , G01B2290/30
摘要： A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.
摘要翻译： Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个衍射光栅中的一个和使用移动单元的图像拾取装置。

2. 发明申请

US20100271636A1 TALBOT INTERFEROMETER, ITS ADJUSTMENT METHOD, AND MEASUREMENT METHOD 有权
标题翻译： TALBOT干扰仪，其调整方法和测量方法
公开(公告)号：US20100271636A1
公开(公告)日：2010-10-28
申请号：US12765037
申请日：2010-04-22
申请人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
发明人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
IPC分类号： G01B9/02
CPC分类号： G01B9/02097 , G01B9/02024 , G01B2290/30
摘要： A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.
摘要翻译： Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个衍射光栅中的一个和使用移动单元的图像拾取装置。

3. 发明授权

US07952726B2 Measurement apparatus, exposure apparatus having the same, and device manufacturing method 失效
标题翻译：测量装置，具有该测量装置的曝光装置和装置制造方法
公开(公告)号：US07952726B2
公开(公告)日：2011-05-31
申请号：US12280926
申请日：2007-02-28
申请人： Seima Kato , Chidane Ouchi
发明人： Seima Kato , Chidane Ouchi
IPC分类号： G01B9/02 , G03B27/54
CPC分类号： G03F7/706
摘要： A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.
摘要翻译：测量装置包括布置在目标光学系统的物平面上并具有透射测量光的窗口的第一掩模，具有用于减小测量光的相干性的反射表面的第二掩模和配置在所述衍射光栅中的衍射光栅通过第一掩模和目标光学系统，将衍射光栅与目标光学系统的像面之间的距离Lg分别满足Lg = m·Pg2 /λ 其中Pg是衍射光栅的光栅间距，λ是测量光的波长，m是除0之外的整数。

4. 发明授权

US08077391B2 Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method 失效
标题翻译：波前像差测量方法，掩模，波前像差测量装置，曝光装置和装置制造方法
公开(公告)号：US08077391B2
公开(公告)日：2011-12-13
申请号：US12391918
申请日：2009-02-24
申请人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
发明人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
IPC分类号： G02B5/18 , G01B9/02
CPC分类号： G03F7/706 , G03F1/44
摘要： A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.
摘要翻译：一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

5. 发明申请

US20090213389A1 WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 失效
标题翻译： WAVEFRONT ABERRATION测量方法，MASK，WAVEFRONT ABERRATION测量装置，曝光装置和装置制造方法
公开(公告)号：US20090213389A1
公开(公告)日：2009-08-27
申请号：US12391918
申请日：2009-02-24
申请人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
发明人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G03F1/44
摘要： A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.
摘要翻译：一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

6. 发明申请

US20100190115A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS HAVING THE SAME, AND DEVICE MANUFACTURING METHOD 失效
标题翻译：测量装置，具有该装置的曝光装置和装置制造方法
公开(公告)号：US20100190115A1
公开(公告)日：2010-07-29
申请号：US12280926
申请日：2007-02-28
申请人： Seima Kato , Chidane Ouchi
发明人： Seima Kato , Chidane Ouchi
IPC分类号： G03F7/20 , G01B11/02 , G03B27/54
CPC分类号： G03F7/706
摘要： A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.
摘要翻译：测量装置包括布置在目标光学系统的物平面上并具有透射测量光的窗口的第一掩模，具有用于减小测量光的相干性的反射表面的第二掩模和配置在所述衍射光栅中的衍射光栅通过第一掩模和目标光学系统，将衍射光栅与目标光学系统的像面之间的距离Lg分别满足Lg = m·Pg2 /λ 其中Pg是衍射光栅的光栅间距，λ是测量光的波长，m是除0之外的整数。

7. 发明申请

US20090268188A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090268188A1
公开(公告)日：2009-10-29
申请号：US12419194
申请日：2009-04-06
申请人： Seima Kato , Chidane Ouchi
发明人： Seima Kato , Chidane Ouchi
IPC分类号： G03B27/72
CPC分类号： G03F7/706 , G03F7/70066
摘要： An exposure apparatus includes an illumination optical system. The illumination optical system includes a first member configured to define an illuminated region of a reflective mask having a pattern to be projected onto a substrate; a second member configured to define an illuminated region in which a measurement pattern used in measuring wavefront aberration of a projection optical system is illuminated, the second member being able to be inserted into and removed from an optical path of the illumination optical system; and a condensing mirror configured to condense light from the first member on the pattern to be projected onto the substrate and light from the second member on the measurement pattern. The illuminated region defined by the second member is smaller than the illuminated region defined by the first member.
摘要翻译：曝光装置包括照明光学系统。所述照明光学系统包括：第一构件，被配置为限定具有要投影到衬底上的图案的反射掩模的照明区域; 第二构件，被配置为限定照明区域，其中用于测量投影光学系统的波前像差的测量图案被照射，所述第二构件能够插入到所述照明光学系统的光路中并从所述照明光学系统的光路中移除; 以及会聚镜，其被配置为将来自第一构件的光在要投影到衬底上的图案上聚集，并且来自第二构件的光在测量图案上。由第二构件限定的照明区域小于由第一构件限定的照明区域。

8. 发明授权

US08004691B2 Measuring apparatus, exposure apparatus and method, and device manufacturing method 有权
标题翻译：测量装置，曝光装置和方法以及装置制造方法
公开(公告)号：US08004691B2
公开(公告)日：2011-08-23
申请号：US11721397
申请日：2006-04-24
申请人： Chidane Ouchi , Akihiro Nakauchi , Seima Kato
发明人： Chidane Ouchi , Akihiro Nakauchi , Seima Kato
IPC分类号： G01B9/02 , G02B27/42
CPC分类号： G03F7/706 , G01M11/0264 , G01M11/0271
摘要： A measuring apparatus includes a pinhole mask, located on an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, in which Lg=m·Pg2/λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus detects an interferogram formed by interference between a plurality of the measuring light beams split by the diffraction grating. The plurality of measuring light beams includes an aberration of the optical system.
摘要翻译：一种测量装置，包括：针孔掩模，位于待测光学系统的物平面上，并且具有多个用于从测量光束产生球面波的针孔;以及衍射光栅，用于分割具有通过针孔掩模和满足Lg = m·Pg2 /λ的光学系统，其中Pg是衍射光栅的光栅间距，λ是测量光束的波长，m是除零以外的整数， Lg是衍射光栅与光学系统的像平面之间的距离。测量装置检测由由衍射光栅分裂的多个测量光之间的干涉形成的干涉图。多个测量光束包括光学系统的像差。

9. 发明申请

US20090290136A1 MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：测量装置，曝光装置和方法以及装置制造方法
公开(公告)号：US20090290136A1
公开(公告)日：2009-11-26
申请号：US11721397
申请日：2006-04-24
申请人： Chidane Ouchi , Akihiro Nakauchi , Seima Kato
发明人： Chidane Ouchi , Akihiro Nakauchi , Seima Kato
IPC分类号： G03B27/54 , G01B9/02
CPC分类号： G03F7/706 , G01M11/0264 , G01M11/0271
摘要： A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, wherein Lg=m·Pg2/λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus calculates a wavefront aberration of the optical system from an interferogram formed by causing interference of the measuring light beams split by the diffraction grating.
摘要翻译：测量装置包括：针孔掩模，位于待测光学系统的物平面上，并且具有多个用于从测量光束产生球面波的针孔;以及衍射光栅，用于分割具有通过针孔掩模和光学系统，其中满足Lg = m.Pg2 /λ，其中Pg是衍射光栅的光栅间距，λ是测量光束的波长，m是除零以外的整数，以及 Lg是衍射光栅与光学系统的像面之间的距离。测量装置根据由衍射光栅分裂的测量光束的干涉而形成的干涉图来计算光学系统的波前像差。

10. 发明授权

US09107637B2 X-ray imaging apparatus and wavefront measuring apparatus 有权
标题翻译： X射线成像装置和波前测量装置
公开(公告)号：US09107637B2
公开(公告)日：2015-08-18
申请号：US13511896
申请日：2011-01-21
申请人： Chidane Ouchi , Naoki Kohara
发明人： Chidane Ouchi , Naoki Kohara
IPC分类号： A61B6/00 , A61B6/06 , G21K1/06 , A61B6/02
CPC分类号： A61B6/484 , A61B6/027 , A61B6/06 , A61B6/4291 , G21K1/06 , G21K2207/005
摘要： There is provided an X-ray imaging apparatus which images a specimen. The X-ray imaging apparatus comprises: an X-ray source; a diffraction grating configured to diffract an X-ray from the X-ray source; an X-ray detector configured to detect the X-ray diffracted by the diffraction grating; and a calculator configured to calculate phase information of the specimen on the basis of an intensity distribution of the X-ray detected by the X-ray detector, wherein the calculator obtains a spatial frequency spectrum from the plural intensity distributions, and calculates the phase information from the obtained spatial frequency spectrum.
摘要翻译：提供了对样本进行成像的X射线成像装置。 X射线成像装置包括：X射线源; 构造成从X射线源衍射X射线的衍射光栅; X射线检测器，被配置为检测由衍射光栅衍射的X射线; 以及计算器，被配置为基于由所述X射线检测器检测到的X射线的强度分布来计算所述样本的相位信息，其中所述计算器从所述多个强度分布中获得空间频谱，并且计算所述相位信息从获得的空间频谱。

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