专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100271636A1 TALBOT INTERFEROMETER, ITS ADJUSTMENT METHOD, AND MEASUREMENT METHOD 有权
标题翻译： TALBOT干扰仪，其调整方法和测量方法
公开(公告)号：US20100271636A1
公开(公告)日：2010-10-28
申请号：US12765037
申请日：2010-04-22
申请人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
发明人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
IPC分类号： G01B9/02
CPC分类号： G01B9/02097 , G01B9/02024 , G01B2290/30
摘要： A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.
摘要翻译： Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个衍射光栅中的一个和使用移动单元的图像拾取装置。

2. 发明授权

US08520217B2 Talbot interferometer, its adjustment method, and measurement method 有权
标题翻译： Talbot干涉仪，其调整方法和测量方法
公开(公告)号：US08520217B2
公开(公告)日：2013-08-27
申请号：US12765037
申请日：2010-04-22
申请人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
发明人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G01B9/02097 , G01B9/02024 , G01B2290/30
摘要： A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.
摘要翻译： Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个衍射光栅中的一个和使用移动单元的图像拾取装置。

3. 发明授权

US09107637B2 X-ray imaging apparatus and wavefront measuring apparatus 有权
标题翻译： X射线成像装置和波前测量装置
公开(公告)号：US09107637B2
公开(公告)日：2015-08-18
申请号：US13511896
申请日：2011-01-21
申请人： Chidane Ouchi , Naoki Kohara
发明人： Chidane Ouchi , Naoki Kohara
IPC分类号： A61B6/00 , A61B6/06 , G21K1/06 , A61B6/02
CPC分类号： A61B6/484 , A61B6/027 , A61B6/06 , A61B6/4291 , G21K1/06 , G21K2207/005
摘要： There is provided an X-ray imaging apparatus which images a specimen. The X-ray imaging apparatus comprises: an X-ray source; a diffraction grating configured to diffract an X-ray from the X-ray source; an X-ray detector configured to detect the X-ray diffracted by the diffraction grating; and a calculator configured to calculate phase information of the specimen on the basis of an intensity distribution of the X-ray detected by the X-ray detector, wherein the calculator obtains a spatial frequency spectrum from the plural intensity distributions, and calculates the phase information from the obtained spatial frequency spectrum.
摘要翻译：提供了对样本进行成像的X射线成像装置。 X射线成像装置包括：X射线源; 构造成从X射线源衍射X射线的衍射光栅; X射线检测器，被配置为检测由衍射光栅衍射的X射线; 以及计算器，被配置为基于由所述X射线检测器检测到的X射线的强度分布来计算所述样本的相位信息，其中所述计算器从所述多个强度分布中获得空间频谱，并且计算所述相位信息从获得的空间频谱。

4. 发明申请

US20120281217A1 X-RAY IMAGING APPARATUS AND WAVEFRONT MEASURING APPARATUS 有权
标题翻译： X射线成像装置和WAVEFRONT测量装置
公开(公告)号：US20120281217A1
公开(公告)日：2012-11-08
申请号：US13511896
申请日：2011-01-21
申请人： Chidane Ouchi , Naoki Kohara
发明人： Chidane Ouchi , Naoki Kohara
IPC分类号： G01T1/36 , G01N21/59
CPC分类号： A61B6/484 , A61B6/027 , A61B6/06 , A61B6/4291 , G21K1/06 , G21K2207/005
摘要： There is provided an X-ray imaging apparatus which images a specimen. The X-ray imaging apparatus comprises: an X-ray source; a diffraction grating configured to diffract an X-ray from the X-ray source; an X-ray detector configured to detect the X-ray diffracted by the diffraction grating; and a calculator configured to calculate phase information of the specimen on the basis of an intensity distribution of the X-ray detected by the X-ray detector, wherein the calculator obtains a spatial frequency spectrum from the plural intensity distributions, and calculates the phase information from the obtained spatial frequency spectrum.
摘要翻译：提供了对样本进行成像的X射线成像装置。 X射线成像装置包括：X射线源; 构造成从X射线源衍射X射线的衍射光栅; X射线检测器，被配置为检测由衍射光栅衍射的X射线; 以及计算器，被配置为基于由所述X射线检测器检测到的X射线的强度分布来计算所述样本的相位信息，其中所述计算器从所述多个强度分布中获得空间频谱，并且计算所述相位信息从获得的空间频谱。

5. 发明授权

US09063055B2 X-ray imaging apparatus 有权
标题翻译： X射线成像装置
公开(公告)号：US09063055B2
公开(公告)日：2015-06-23
申请号：US13610365
申请日：2012-09-11
申请人： Chidane Ouchi
发明人： Chidane Ouchi
IPC分类号： G01N23/04 , A61B6/00
CPC分类号： G01N23/04 , A61B6/484 , G01N2223/313 , G01N2223/3301
摘要： An X-ray imaging apparatus for imaging a subject includes a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source, a shielding grating configured to shield part of the interference pattern, a detector configured to detect the X-ray radiation passing through the shielding grating, and a moving unit configured to change an angle between each of the diffraction grating, the shielding grating and the detector and an optical axis, wherein the detector is configured to detect the X-ray according to a change in the angle between each of the diffraction grating, the shielding grating and the detector and the optical axis.
摘要翻译：用于成像对象的X射线成像装置包括被构造成通过衍射来自X射线源的X射线辐射而形成干涉图案的衍射光栅，被配置为屏蔽部分干涉图案的屏蔽光栅，被配置为检测穿过屏蔽光栅的X射线辐射，以及被配置为改变每个衍射光栅，屏蔽光栅和检测器之间的角度和光轴的移动单元，其中检测器被配置为根据涉及每个衍射光栅，屏蔽光栅和检测器之间的角度以及光轴的变化。

6. 发明授权

US09043182B2 Absolute position measurement apparatus and method 有权
标题翻译：绝对位置测量装置及方法
公开(公告)号：US09043182B2
公开(公告)日：2015-05-26
申请号：US12676002
申请日：2008-11-18
申请人： Yuzo Seo , Chidane Ouchi , Takao Ukaji
发明人： Yuzo Seo , Chidane Ouchi , Takao Ukaji
IPC分类号： G01C9/00 , G01B9/02
CPC分类号： G01B9/02083 , G01B9/02007 , G01B2290/70
摘要： An absolute position measurement apparatus measures an absolute position of an object to be measured using a first light source and a second light source which has coherency lower than that of the first light source. The absolute position measurement apparatus includes a measurement part which measures a point where phases of interference signals from the first and the second light sources coincide with each other or a point where an intensity of the interference signal from the second light source is maximized, an origin defining part which defines the point measured by the measurement part as an origin position, a phase storing part which stores the phase of the interference signal from the first light source at the origin position, an origin redefining part which redefines the origin position, and a position calculating part which calculates the absolute position of the object to be measured.
摘要翻译：绝对位置测量装置使用具有低于第一光源的相干性的第一光源和第二光源来测量被测量物体的绝对位置。绝对位置测量装置包括测量部分，其测量来自第一和第二光源的干扰信号的相位彼此一致的点或来自第二光源的干扰信号的强度最大化的点，原点将由测量部分测量的点定义为原点位置的定义部分，存储来自第一光源的干涉信号在原点位置的相位的相位存储部分，重新定义原点位置的原点重新定义部分，以及位置计算部，其计算被测量物体的绝对位置。

7. 发明授权

US08077391B2 Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method 失效
标题翻译：波前像差测量方法，掩模，波前像差测量装置，曝光装置和装置制造方法
公开(公告)号：US08077391B2
公开(公告)日：2011-12-13
申请号：US12391918
申请日：2009-02-24
申请人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
发明人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
IPC分类号： G02B5/18 , G01B9/02
CPC分类号： G03F7/706 , G03F1/44
摘要： A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.
摘要翻译：一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

8. 发明申请

US20090213389A1 WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 失效
标题翻译： WAVEFRONT ABERRATION测量方法，MASK，WAVEFRONT ABERRATION测量装置，曝光装置和装置制造方法
公开(公告)号：US20090213389A1
公开(公告)日：2009-08-27
申请号：US12391918
申请日：2009-02-24
申请人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
发明人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G03F1/44
摘要： A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.
摘要翻译：一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

9. 发明授权

US06961132B2 Interference system and semiconductor exposure apparatus having the same 失效
标题翻译：干涉系统和具有相同的半导体曝光装置
公开(公告)号：US06961132B2
公开(公告)日：2005-11-01
申请号：US10693880
申请日：2003-10-28
申请人： Chidane Ouchi
发明人： Chidane Ouchi
IPC分类号： G01B9/02 , G01B11/24 , G01J9/02 , G01M11/00 , G01M11/02 , G03F7/20 , H01L21/027
CPC分类号： G03F7/706 , G01B9/02057 , G01B9/02065 , G01J9/02
摘要： An exposure apparatus for exposing a substrate with a pattern of an original includes a projection optical system for projecting the pattern of the original onto the substrate with light from a light source, and an interferometer for measuring an optical characteristic of the projection optical system by use of the light from the light source, which passes a pinhole and the projection optical system. The pinhole has a diameter which is smaller than a diameter of an Airy disc.
摘要翻译：用于以原稿的图案曝光基板的曝光装置包括投影光学系统，用于利用来自光源的光将原稿的图案投影到基板上，以及用于通过使用来测量投影光学系统的光学特性的干涉仪来自光源的光通过针孔和投影光学系统。针孔的直径小于艾里版圆盘的直径。

10. 发明授权

US06853442B2 Projection exposure apparatus and device manufacturing method that change a resonator length of a continuous emission excimer laser 失效
标题翻译：改变连续发射准分子激光器的谐振器长度的投影曝光装置和装置制造方法
公开(公告)号：US06853442B2
公开(公告)日：2005-02-08
申请号：US09986324
申请日：2001-11-08
申请人： Chidane Ouchi
发明人： Chidane Ouchi
IPC分类号： G02B13/18 , G02B13/22 , G02B13/24 , G03F7/20 , H01L21/027 , H01S3/00 , H01S3/0943 , H01S3/105 , G03B27/72 , G03B27/54
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70066 , G03F7/701 , G03F7/70241 , G03F7/70575 , G03F7/70958
摘要： A projection exposure apparatus includes a continuous emission excimer laser for providing laser light having a predetermined wavelength, an illumination optical system for illuminating a pattern of a reticle with laser light having the predetermined wavelength, a projection optical system for projecting the illuminated pattern of the reticle onto a substrate, wherein the projection optical system is provided by a lens system made of a substantially single glass material, a laser for injecting light having the predetermined wavelength into a resonator of the continuous emission excimer laser, a wavemeter for measuring the wavelength of the laser light from the continuous emission excimer laser, and a changing device for changing a resonator length of the continuous emission excimer laser on the basis of a signal from the wavemeter so that the wavelength of the laser light from the continuous emission excimer laser becomes equal to the predetermined wavelength.
摘要翻译：投影曝光装置包括用于提供具有预定波长的激光的连续发射准分子激光器，用于用具有预定波长的激光照射掩模版图案的照明光学系统，用于投影光罩图案的投影光学系统其中投影光学系统由基本上单一的玻璃材料制成的透镜系统提供，用于将具有预定波长的光注入到连续发射准分子激光器的谐振器中的激光器，用于测量连续发射准分子激光器的波长的波长计来自连续发射准分子激光器的激光以及用于根据来自波长计的信号改变连续发射准分子激光器的谐振器长度的改变装置，使得来自连续发射准分子激光器的激光的波长等于预定波长。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式