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1. 发明授权

US08393885B2 Processing apparatus 有权
标题翻译：处理装置
公开(公告)号：US08393885B2
公开(公告)日：2013-03-12
申请号：US12120710
申请日：2008-05-15
申请人： Kazuyuki Kasumi , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Toshinobu Tokita
发明人： Kazuyuki Kasumi , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Toshinobu Tokita
IPC分类号： B29C59/00 , B29C59/02 , H01L21/302
CPC分类号： B29C43/021 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29C2043/3634 , B29L2011/0016 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and a recovery unit for recovering the resist.
摘要翻译：一种处理装置，用于通过将模具压靠在抗蚀剂上将模具上的凸版图案转印到基板上的抗蚀剂上，包括用于在基板和模具之间供应抗蚀剂的供应商和用于回收抗蚀剂的回收单元。

2. 发明授权

US07815424B2 Imprinting machine and device manufacturing method 有权
标题翻译：压印机和器件制造方法
公开(公告)号：US07815424B2
公开(公告)日：2010-10-19
申请号：US11297031
申请日：2005-12-07
申请人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
发明人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
IPC分类号： B29C59/02
CPC分类号： G03F9/703 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7049
摘要： An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.
摘要翻译：使具有图案的模具与物体接触并将图案转印到物体上的压印机包括测量单元，其在模具接触物体时测量模具的位置。

3. 发明授权

US07233383B2 Exposure apparatus, device manufacturing method, pattern generator and maintenance method to check for pixel deterioration 有权
标题翻译：曝光装置，装置制造方法，图案发生器和维护方法来检查像素劣化
公开(公告)号：US07233383B2
公开(公告)日：2007-06-19
申请号：US11112695
申请日：2005-04-21
申请人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Kazuyuki Kasumi
发明人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Kazuyuki Kasumi
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70291 , G03F7/70691
摘要： An exposure apparatus for exposing a predetermined pattern onto an object via a projection optical system includes a pattern generating unit that includes plural pixels, and generates the predetermined pattern by driving the plural pixels, a measuring unit for measuring at least one of optical performance of the pattern generating unit and a driving state of the plural pixels, and a maintenance unit for maintaining the pattern generating unit based on a measuring result by the measuring unit.
摘要翻译：一种用于经由投影光学系统将预定图案曝光到物体上的曝光装置包括：图形生成单元，包括多个像素，并通过驱动多个像素产生预定图案;测量单元，用于测量至少一个光学性能图案生成单元和多个像素的驱动状态，以及维护单元，用于基于测量单元的测量结果来维持图案生成单元。

4. 发明申请

US20050269035A1 Fine pattern forming apparatus and fine pattern inspecting apparatus 有权
标题翻译：精细图案形成装置和精细图案检查装置
公开(公告)号：US20050269035A1
公开(公告)日：2005-12-08
申请号：US11147562
申请日：2005-06-07
申请人： Eigo Kawakami , Hirohisa Ota , Takashi Nakamura , Kazuyuki Kasumi , Toshinobu Tokita
发明人： Eigo Kawakami , Hirohisa Ota , Takashi Nakamura , Kazuyuki Kasumi , Toshinobu Tokita
IPC分类号： G01Q30/04 , G01B5/28 , G01Q60/24 , G01Q80/00 , G03F7/20
CPC分类号： G03F7/2049 , G01Q10/06 , G01Q70/06 , G01Q80/00
摘要： Disclosed is a fine pattern forming apparatus and a fine pattern inspecting apparatus. In one preferred form, the fine pattern forming apparatus includes a surface irregularity information reading device for detecting a shape signal corresponding to a surface irregularity of a surface of an original, while scanning the surface by use of a first probe, and a surface irregularity information writing device for processing a substrate to be processed, while scanning a surface of the substrate by use of a second probe, wherein an applied electric voltage to the second probe is changed in accordance with the shape signal while a distance between the second probe and the substrate is kept substantially constant, or the distance between the second probe and the substrate is changed in accordance with the shape signal while the applied electric voltage to the second probe is kept substantially constant, such that the substrate is processed in accordance with the surface irregularity of the original.
摘要翻译：公开了一种精细图案形成装置和精细图案检查装置。在一种优选形式中，精细图案形成装置包括：表面不规则信息读取装置，用于在利用第一探针扫描表面时检测与原件的表面的表面不规则相对应的形状信号，以及表面不规则信息用于处理待处理的基板的写入装置，同时通过使用第二探针扫描基板的表面，其中根据形状信号改变施加到第二探针的电压，同时第二探针和第二探针之间的距离基板保持基本恒定，或者第二探针和基板之间的距离根据形状信号而改变，同时施加到第二探针的电压保持基本上恒定，使得基板根据表面不规则性被加工的原来。

5. 发明授权

US08834144B2 Imprinting machine and device manufacturing method 有权
标题翻译：压印机和器件制造方法
公开(公告)号：US08834144B2
公开(公告)日：2014-09-16
申请号：US12710685
申请日：2010-02-23
申请人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
发明人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
IPC分类号： B29C59/02 , G03F9/00 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F9/703 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7049
摘要： An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.
摘要翻译：使具有图案的模具与物体接触并将图案转印到物体上的压印机包括测量单元，其在模具接触物体时测量模具的位置。

6. 发明授权

US08616874B2 Pattern transferring apparatus and pattern transferring method 有权
标题翻译：图案转印装置和图案转印方法
公开(公告)号：US08616874B2
公开(公告)日：2013-12-31
申请号：US11364694
申请日：2006-02-27
申请人： Kazuyuki Kasumi , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Toshinobu Tokita
发明人： Kazuyuki Kasumi , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Toshinobu Tokita
IPC分类号： A01J21/00
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.
摘要翻译：公开了一种图案转印装置，其可以防止对转印图案的损坏，并且实现快速脱模，而不管抗蚀剂的类型如何。图案转印装置通过使模具与装置接触而将模具上形成的图案转印到物体上，具有变形部，该变形部使得模具中的变形从物体脱模。该装置通过使模具与光固化树脂接触并向其施加光以将光固化树脂固化，将形成在模具上的图案转印到光固化树脂上。该装置具有将照射光强度的光照射到光固化树脂中要转印图案的转印区域以外的非转印区域的光学系统，其强度与光的照射光强度不同应用于转移区域。

7. 发明申请

US20100289190A1 PROCESSING APPARATUS AND METHOD 有权
标题翻译：处理装置和方法
公开(公告)号：US20100289190A1
公开(公告)日：2010-11-18
申请号：US11531856
申请日：2006-09-14
申请人： Eigo Kawakami , Hirohisa Ota , Takashi Nakamura , Kazuyuki Kasumi , Toshinobu Tokita
发明人： Eigo Kawakami , Hirohisa Ota , Takashi Nakamura , Kazuyuki Kasumi , Toshinobu Tokita
IPC分类号： B29C35/08 , G01B15/00 , B28B1/29
CPC分类号： G03F7/0002 , B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00
摘要： A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist.
摘要翻译：用于将模具的浮雕图案转印到抗蚀剂的处理方法包括以下步骤：将具有凹凸图案的模具压靠在基板上的抗蚀剂上，通过模具将曝光光照射到抗蚀剂上，使模具和基板相对振动在照射步骤期间彼此相对，并且从抗蚀剂中释放模具。

8. 发明授权

US07690912B2 Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same 有权
标题翻译：图案转印模具，图案转印装置和使用其的装置制造方法
公开(公告)号：US07690912B2
公开(公告)日：2010-04-06
申请号：US11364631
申请日：2006-02-27
申请人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
发明人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
IPC分类号： B29C33/44 , B29C35/08
CPC分类号： B82Y10/00 , B81C99/009 , B81C2201/0152 , B81C2201/036 , B82Y40/00 , G03F7/0002
摘要： One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.
摘要翻译：本发明的一个目的是提供一种图案转印模具，其可以容易且确定地提供脱模的起始区域和具有该图案转印模具的图案转印装置。公开了一种图案转印模具，其用于使模具与基板上的光固化树脂接触的图案转印装置，并通过光照射固化光固化树脂，以将形成在模具上的图案转印到照片上固化树脂。模具包括与光固化树脂接触的底面，底面部分包括形成图案的第一区域和形成在第一区域外部的第二区域。模具在第二区域具有脱模形状，脱模形状提供了从固化的光固化树脂脱模的起始区域。

9. 发明申请

US20060192320A1 Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same 有权
标题翻译：图案转印模具，图案转印装置和使用其的装置制造方法
公开(公告)号：US20060192320A1
公开(公告)日：2006-08-31
申请号：US11364631
申请日：2006-02-27
申请人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
发明人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
IPC分类号： B29C59/02
CPC分类号： B82Y10/00 , B81C99/009 , B81C2201/0152 , B81C2201/036 , B82Y40/00 , G03F7/0002
摘要： One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.
摘要翻译：本发明的一个目的是提供一种图案转印模具，其可以容易且确定地提供脱模的起始区域和具有该图案转印模具的图案转印装置。公开了一种图案转印模具，其用于使模具与基板上的光固化树脂接触的图案转印装置，并通过光照射固化光固化树脂，以将形成在模具上的图案转印到照片上固化树脂。模具包括与光固化树脂接触的底面，底面部分包括形成图案的第一区域和形成在第一区域外部的第二区域。模具在第二区域具有脱模形状，脱模形状提供了从固化的光固化树脂脱模的起始区域。

10. 发明申请

US20050275125A1 Processing apparatus and method 有权
标题翻译：处理装置和方法
公开(公告)号：US20050275125A1
公开(公告)日：2005-12-15
申请号：US11149046
申请日：2005-06-08
申请人： Eigo Kawakami , Hirohisa Ota , Takashi Nakamura , Kazuyuki Kasumi , Toshinobu Tokita
发明人： Eigo Kawakami , Hirohisa Ota , Takashi Nakamura , Kazuyuki Kasumi , Toshinobu Tokita
IPC分类号： G03F7/20 , G03F7/00 , H01L21/027 , B29C31/00 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, and an irradiation of light for exposing the resist onto the resist includes a mold chuck for holding the mold and for compressing the mold against the resist, and a deformation reducing part for reducing a deformation of the mold when the mold chuck applies a compression force to the mold.
摘要翻译：一种处理装置，用于通过将模具压靠在抗蚀剂上将模具上的浮雕图案转印到基板上的抗蚀剂上，以及用于将抗蚀剂暴露于抗蚀剂上的光的照射包括用于保持模具并压缩的模具卡盘抵抗抗蚀剂的模具，以及用于当模具卡盘向模具施加压缩力时减小模具的变形的变形减小部件。

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