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    • 4. 发明申请
    • Fine pattern forming apparatus and fine pattern inspecting apparatus
    • 精细图案形成装置和精细图案检查装置
    • US20050269035A1
    • 2005-12-08
    • US11147562
    • 2005-06-07
    • Eigo KawakamiHirohisa OtaTakashi NakamuraKazuyuki KasumiToshinobu Tokita
    • Eigo KawakamiHirohisa OtaTakashi NakamuraKazuyuki KasumiToshinobu Tokita
    • G01Q30/04G01B5/28G01Q60/24G01Q80/00G03F7/20
    • G03F7/2049G01Q10/06G01Q70/06G01Q80/00
    • Disclosed is a fine pattern forming apparatus and a fine pattern inspecting apparatus. In one preferred form, the fine pattern forming apparatus includes a surface irregularity information reading device for detecting a shape signal corresponding to a surface irregularity of a surface of an original, while scanning the surface by use of a first probe, and a surface irregularity information writing device for processing a substrate to be processed, while scanning a surface of the substrate by use of a second probe, wherein an applied electric voltage to the second probe is changed in accordance with the shape signal while a distance between the second probe and the substrate is kept substantially constant, or the distance between the second probe and the substrate is changed in accordance with the shape signal while the applied electric voltage to the second probe is kept substantially constant, such that the substrate is processed in accordance with the surface irregularity of the original.
    • 公开了一种精细图案形成装置和精细图案检查装置。 在一种优选形式中,精细图案形成装置包括:表面不规则信息读取装置,用于在利用第一探针扫描表面时检测与原件的表面的表面不规则相对应的形状信号,以及表面不规则信息 用于处理待处理的基板的写入装置,同时通过使用第二探针扫描基板的表面,其中根据形状信号改变施加到第二探针的电压,同时第二探针和第二探针之间的距离 基板保持基本恒定,或者第二探针和基板之间的距离根据形状信号而改变,同时施加到第二探针的电压保持基本上恒定,使得基板根据表面不规则性被加工 的原来。
    • 6. 发明授权
    • Pattern transferring apparatus and pattern transferring method
    • 图案转印装置和图案转印方法
    • US08616874B2
    • 2013-12-31
    • US11364694
    • 2006-02-27
    • Kazuyuki KasumiHirohisa OtaEigo KawakamiTakashi NakamuraToshinobu Tokita
    • Kazuyuki KasumiHirohisa OtaEigo KawakamiTakashi NakamuraToshinobu Tokita
    • A01J21/00
    • B29C59/026B82Y10/00B82Y40/00G03F7/0002
    • A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.
    • 公开了一种图案转印装置,其可以防止对转印图案的损坏,并且实现快速脱模,而不管抗蚀剂的类型如何。 图案转印装置通过使模具与装置接触而将模具上形成的图案转印到物体上,具有变形部,该变形部使得模具中的变形从物体脱模。 该装置通过使模具与光固化树脂接触并向其施加光以将光固化树脂固化,将形成在模具上的图案转印到光固化树脂上。 该装置具有将照射光强度的光照射到光固化树脂中要转印图案的转印区域以外的非转印区域的光学系统,其强度与光的照射光强度不同 应用于转移区域。