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1. 发明授权

US07369962B2 Method and device for data integrity checking 失效
标题翻译：用于数据完整性检查的方法和设备
公开(公告)号：US07369962B2
公开(公告)日：2008-05-06
申请号：US11030728
申请日：2005-01-06
申请人： Torbjorn Sandstrom , Leif Odselius , Martin Olsson
发明人： Torbjorn Sandstrom , Leif Odselius , Martin Olsson
IPC分类号： G06F11/00
CPC分类号： H04N5/7458
摘要： The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.
摘要翻译：本发明涉及高速数据通路，有时包括混合的数字和模拟电压信号。特别地，它涉及用于在数字和/或模拟域中的大数据量的错误检查策略以及加速SLM中的微镜的电荷负载的模拟信号模式。在权利要求书，说明书和附图中描述了本发明的特定方面。

2. 发明申请

US20080244371A1 METHOD AND DEVICE FOR DATA INTEGRITY CHECKING 审中-公开
标题翻译：用于数据完整性检查的方法和设备
公开(公告)号：US20080244371A1
公开(公告)日：2008-10-02
申请号：US12115410
申请日：2008-05-05
申请人： Torbjorn Sandstrom , Leif Odselius , Martin Olsson
发明人： Torbjorn Sandstrom , Leif Odselius , Martin Olsson
IPC分类号： G06F7/02 , G06F11/07
CPC分类号： H04N5/7458
摘要： The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.
摘要翻译：本发明涉及高速数据通路，有时包括混合的数字和模拟电压信号。特别地，它涉及用于在数字和/或模拟域中的大数据量的错误检查策略以及加速SLM中的微镜的电荷负载的模拟信号模式。在权利要求书，说明书和附图中描述了本发明的特定方面。

3. 发明申请

US20050177326A1 Method and device for data integrity checking 失效
标题翻译：用于数据完整性检查的方法和设备
公开(公告)号：US20050177326A1
公开(公告)日：2005-08-11
申请号：US11030728
申请日：2005-01-06
申请人： Torbjorn Sandstrom , Leif Odselius , Martin Olsson
发明人： Torbjorn Sandstrom , Leif Odselius , Martin Olsson
IPC分类号： G03F7/20 , G06F11/08 , H04N5/74
CPC分类号： H04N5/7458
摘要： The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.
摘要翻译：本发明涉及高速数据通路，有时包括混合的数字和模拟电压信号。特别地，它涉及用于在数字和/或模拟域中的大数据量的错误检查策略以及加速SLM中的微镜的电荷负载的模拟信号模式。在权利要求书，说明书和附图中描述了本发明的特定方面。

4. 发明授权

US06624878B1 Laser writer 有权
标题翻译：激光作家
公开(公告)号：US06624878B1
公开(公告)日：2003-09-23
申请号：US09869922
申请日：2001-11-02
申请人： Torbjorn Sandstrom , Leif Odselius , Anders Thuren , Stefan Gullstrand
发明人： Torbjorn Sandstrom , Leif Odselius , Anders Thuren , Stefan Gullstrand
IPC分类号： G03B2742
CPC分类号： G03F7/70383
摘要： A system and method are provided for microlithographic writing on photosensitive substrates, and especially high precision printing of patterns, such as photomasks, for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. The method includes the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter a support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the same position where the writing was interrupted when the error condition ceases to exist.
摘要翻译：提供一种系统和方法用于感光基片上的微光刻，特别是用于半导体器件图案，显示面板，集成光学器件和电子互连结构的图案，例如光掩模的高精度印刷。该方法包括以下步骤：检测重要的临时写入错误状况并中断写入过程作为对这种错误状况的检测的响应。此后，支持表与写入中断时的位置相反，并且在错误条件不再存在时写入中断的相同位置重新启动写入过程。

5. 发明申请

US20080127031A1 Method and device for correcting SLM stamp image imperfections 有权
标题翻译：纠正SLM邮票图像缺陷的方法和装置
公开(公告)号：US20080127031A1
公开(公告)日：2008-05-29
申请号：US12026438
申请日：2008-02-05
申请人： Martin Olsson , Torbjorn Sandstrom , Mats Rosling
发明人： Martin Olsson , Torbjorn Sandstrom , Mats Rosling
IPC分类号： G06F17/50
CPC分类号： G03F7/70291 , G03F7/70283 , G03F7/705 , G03F7/70508 , G03F7/70558
摘要： The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to pattern data, such as corrections for distortions in the field of an SLM exposure stamp. It may be used to produce a device on a substrate. Alternatively, the present invention may be practiced as a device practicing disclosed methods or as an article of manufacture, particularly a memory, either volatile or non-volatile memory, including a program adapted to carry out the disclosed methods.
摘要翻译：本发明涉及工件的制造和精密图案化，包括制造用于光刻的光掩模，以及在诸如半导体衬底的其它衬底上的直接写入。特别地，它涉及对图案数据进行校正，例如在SLM曝光印章领域中的失真校正。它可用于在衬底上制造器件。或者，本发明可以实践为实施公开的方法或作为制品的设备，特别是易失性或非易失性存储器的存储器，包括适于执行所公开的方法的程序。

6. 发明申请

US20080074700A1 GRAPHICS ENGINE FOR HIGH PRECISION LITHOGRAPHY 有权
标题翻译：用于高精度光刻的图形发动机
公开(公告)号：US20080074700A1
公开(公告)日：2008-03-27
申请号：US11935267
申请日：2007-11-05
申请人： Martin Olsson , Stefan Gustavson , Torbjorn Sandstrom , Per Elmfors
发明人： Martin Olsson , Stefan Gustavson , Torbjorn Sandstrom , Per Elmfors
IPC分类号： B41J1/00
CPC分类号： G03F7/70508 , G03F1/76 , G03F7/70291 , G06T15/00
摘要： The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims, specification and drawings.
摘要翻译：本发明包括使用相位调制微镜阵列来产生具有高图像保真度，通过对焦的良好稳定性和良好的x-y对称性的强度图像的方法。在权利要求书，说明书和附图中描述了本发明的特定方面。

7. 发明申请

US20080080782A1 GRAPHICS ENGINE FOR HIGH PRECISION LITHOGRAPHY 有权
公开(公告)号：US20080080782A1
公开(公告)日：2008-04-03
申请号：US11934485
申请日：2007-11-02
申请人： Martin Olsson , Stefan Gustavson , Torbjorn Sandstrom , Per Elmfors
发明人： Martin Olsson , Stefan Gustavson , Torbjorn Sandstrom , Per Elmfors
IPC分类号： G06K9/40
CPC分类号： G03F7/70508 , G03F1/76 , G03F7/70291 , G06T15/00
摘要： The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims, specification and drawings.

8. 发明申请

US20050186692A1 Method and device for correcting SLM stamp image imperfections 有权
标题翻译：纠正SLM邮票图像缺陷的方法和装置
公开(公告)号：US20050186692A1
公开(公告)日：2005-08-25
申请号：US10987589
申请日：2004-11-12
申请人： Martin Olsson , Torbjorn Sandstrom , Mats Rosling
发明人： Martin Olsson , Torbjorn Sandstrom , Mats Rosling
IPC分类号： G03F7/20 , H01L21/66 , E21B47/022 , G01R31/26 , G03C5/00 , H01L21/76
CPC分类号： G03F7/70283 , G03F7/70291
摘要： The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to pattern data, such as corrections for distortions in the field of an SLM exposure stamp. It may be used to produce a device on a substrate. Alternatively, the present invention may be practiced as a device practicing disclosed methods or as an article of manufacture, particularly a memory, either volatile or non-volatile memory, including a program adapted to carry out the disclosed methods.
摘要翻译：本发明涉及工件的制造和精密图案化，包括制造用于光刻的光掩模，以及在诸如半导体衬底的其它衬底上的直接写入。特别地，它涉及对图案数据进行校正，例如在SLM曝光印章领域中的失真校正。它可用于在衬底上制造器件。或者，本发明可以实践为实施公开的方法或作为制品的设备，特别是易失性或非易失性存储器的存储器，包括适于执行所公开的方法的程序。

9. 发明授权

US08891157B2 Acousto-optic deflectors over one octave 有权
标题翻译：声光偏转器超过一个八度
公开(公告)号：US08891157B2
公开(公告)日：2014-11-18
申请号：US13220673
申请日：2011-08-29
申请人： Torbjorn Sandstrom
发明人： Torbjorn Sandstrom
IPC分类号： G02F1/33 , G02B26/00 , G01N21/00 , H01S3/10 , G02F1/11
CPC分类号： G02F1/33 , G02F1/113
摘要： The technology described applies an extended frequency range of over one octave to drive an acousto-optic deflector, thereby defying a design rule of thumb that limited bandwidth to just under one octave. A combination of extended frequency range and well-timed beam blanking reduces the proportion of a so-called chirp signal that is consumed by beam blanking. This increases the working, effective portion of the sweep signal.
摘要翻译：所描述的技术应用超过一个八度的扩展频率范围来驱动声光偏转器，从而将限制带宽限制在一个八度以下的设计经验法则。扩展频率范围和良好定时的波束消隐的组合减少了通过波束消隐消耗的所谓的啁啾信号的比例。这增加了扫描信号的工作，有效部分。

10. 发明申请

US20100208327A1 Pattern generator 有权
标题翻译：模式生成器
公开(公告)号：US20100208327A1
公开(公告)日：2010-08-19
申请号：US12662675
申请日：2010-04-28
申请人： Torbjorn Sandstrom
发明人： Torbjorn Sandstrom
IPC分类号： G02B26/00 , G03B27/42
CPC分类号： G03F7/70725 , B23K26/032 , B23K26/064 , B23K26/0648 , B41J2/465 , G02B26/0833 , G02B26/0841 , G02B27/0043 , G02B27/4205 , G03F7/2022 , G03F7/70041 , G03F7/70283 , G03F7/70291 , G03F7/704 , G03F7/70475 , G09G3/2007 , G09G3/346 , H04N1/195 , H04N5/7458 , H04N2201/0414
摘要： The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
摘要翻译：本发明涉及一种用于在对辐射敏感的工件上形成图案的装置，例如光掩模，显示面板或微光学装置。该装置可以包括用于发出闪光的源，具有适于被辐射照射的调制元件（像素）的空间调制器以及在工件上产生调制器的图像的投影系统。它还可以包括接收要写入的模式的数字描述的电子数据处理和传送系统，将模式转换成调制器信号，以及将信号馈送到调制器。可以提供电子控制系统来控制触发信号以补偿光源中的闪光到闪光时间抖动。

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