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    • 7. 发明申请
    • Systems and methods for three-dimensional lithography and nano-indentation
    • 三维光刻和纳米压痕的系统和方法
    • US20050257709A1
    • 2005-11-24
    • US10699287
    • 2003-10-31
    • Tony MulePaul KohlMuhannad BakirKevin MartinJames MeindlHiren Thacker
    • Tony MulePaul KohlMuhannad BakirKevin MartinJames MeindlHiren Thacker
    • B41F1/00B81C1/00G03F7/00
    • G03F7/00B81B2201/042B81B2201/047B81B2201/058B81B2203/0384B81C1/00119B81C2201/0108B81C2201/0152B81C2201/0159B82Y10/00B82Y40/00G03F7/0002G03F7/0015
    • Systems and methods for three dimensional lithography, nano-indentation, and combinations thereof are disclosed. One exemplary three dimensional lithography method, among others, includes: providing a substrate having at least one optical element, wherein the optical element is selected from a refractive element and a diffractive element; disposing a polymer layer on the substrate and the at least one optical element, wherein the polymer layer includes a polymer material selected from a positive-tone polymer material and a negative-tone polymer material; positioning a mask adjacent the polymer layer, wherein the mask does not cover at least one directly exposed portion of the polymer material directly overlaying the at least one element; and exposing the at least one directly exposed portion of the polymer material to optical energy, wherein the optical energy passes through the at least one directly exposed portion of the polymer material and interacts with the element, and the element redirects the optical energy through the polymer material forming at least one area of indirectly exposed polymer material.
    • 公开了用于三维光刻,纳米压痕及其组合的系统和方法。 一种示例性的三维光刻方法,其中包括:提供具有至少一个光学元件的衬底,其中所述光学元件选自折射元件和衍射元件; 在所述基板和所述至少一个光学元件上设置聚合物层,其中所述聚合物层包括选自正性聚合物材料和负性聚合物材料的聚合物材料; 将掩模定位在所述聚合物层附近,其中所述掩模不覆盖直接覆盖所述至少一个元件的聚合物材料的至少一个直接暴露部分; 并且将所述聚合物材料的至少一个直接暴露部分暴露于光能,其中所述光能通过所述聚合物材料的所述至少一个直接暴露部分并且与所述元件相互作用,并且所述元件将所述光能重定向通过所述聚合物 形成间接暴露的聚合物材料的至少一个区域的材料。
    • 9. 发明授权
    • Electrostatic actuators with intrinsic stress gradient
    • 具有固有应力梯度的静电执行器
    • US06625004B1
    • 2003-09-23
    • US09944867
    • 2001-08-31
    • Jurgen MusolfPaul Kohl
    • Jurgen MusolfPaul Kohl
    • H01G501
    • H01H59/0009B82Y30/00H01G5/18H01H2059/0081
    • An electrostatic actuator with an intrinsic stress gradient is provided. The electrostatic actuator comprises an electrode and an electrostatically actuated beam fixed at one end relative to the electrode. The electrostatically actuated beam further includes a metal layer made substantially of a single metal with an induced stress gradient therein. The stress gradient in the metal layer determines the initial curvature of the beam. Upon electrostatic actuation of the beam, the beam is deflected from its initial curvature relative to the electrode. In one embodiment, the electrostatically actuated beam is used as a top movable electrode of an electrostatically actuated variable capacitor. The capacitance of the electrostatically actuated capacitor is changed upon electrostatic actuation of the beam.
    • 提供具有固有应力梯度的静电致动器。 静电致动器包括相对于电极在一端固定的电极和静电致动的光束。 静电致动光束还包括基本上由其中具有诱发应力梯度的单一金属制成的金属层。 金属层中的应力梯度决定了梁的初始曲率。 在光束的静电致动时,光束相对于电极从其初始曲率偏转。 在一个实施例中,静电驱动的光束用作静电驱动的可变电容器的顶部可移动电极。 静电驱动的电容器的电容在光束的静电驱动时改变。