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1. 发明申请

US20130032600A1 Valve For Container Filled With Halogen Gas Or Halogen Compound Gas 审中-公开
标题翻译：装有卤素气体或卤素化合物气体的集装箱阀门
公开(公告)号：US20130032600A1
公开(公告)日：2013-02-07
申请号：US13641642
申请日：2011-03-08
申请人： Tomonori Umezaki , Kenji Tanaka , Akifumi Yao , Tatsuo Miyazaki , Isamu Mori , Tadayuki Kawashima
发明人： Tomonori Umezaki , Kenji Tanaka , Akifumi Yao , Tatsuo Miyazaki , Isamu Mori , Tadayuki Kawashima
IPC分类号： F16K7/12 , F17C13/04 , F16K1/30
CPC分类号： F16K1/302 , F16J3/02 , F16K7/126 , F16K7/14 , F16K7/16 , F16K25/00 , F17C2205/0329 , F17C2205/0385 , F17C2205/0394 , F17C2223/0123 , F17C2260/036 , F17C2270/0518
摘要： A direct-touch diaphragm valve according to the present invention includes a valve body having inlet and outlet passages, a valve chamber being in communication with the inlet and outlet passages, a valve seat located around an open inner end of the inlet passage and a diaphragm arranged on the valve seat so as to hermetically seal the valve chamber and open or close the inlet and outlet passages, wherein the valve seat and the diaphragm have respective contact surfaces formed therebetween such that: such that: the contact surface of the valve seat has a surface roughness Ra of 0.1 to 10.0 μm and a curvature radius Ra of 100 to 1000 mm; and the area ratio Sb/Sa of a contact area Sb of the valve seat with the diaphragm to a gas contact surface area Sa of the diaphragm ranges from 0.2 to 10%.
摘要翻译：根据本发明的直接接触式隔膜阀包括具有入口和出口通道的阀体，与入口和出口通道连通的阀室，位于入口通道的开口内端周围的阀座和隔膜设置在所述阀座上，以便气密地密封所述阀室并打开或关闭所述入口和出口通道，其中所述阀座和所述隔膜具有形成在其间的各自的接触表面，使得：所述阀座的接触表面具有表面粗糙度Ra为0.1〜10.0μm，曲率半径Ra为100〜1000mm; 阀座与隔膜的接触面积Sb与隔膜的气体接触面积Sa的面积比Sb / Sa为0.2〜10％。

2. 发明申请

US20120100491A1 Semiconductor Production Equipment Including Fluorine Gas Generator 审中-公开
标题翻译：包括氟气发生器的半导体生产设备
公开(公告)号：US20120100491A1
公开(公告)日：2012-04-26
申请号：US13122643
申请日：2010-01-15
申请人： Isamu Mori , Akifumi Yao , Kenji Tanaka , Tatsuo Miyazaki
发明人： Isamu Mori , Akifumi Yao , Kenji Tanaka , Tatsuo Miyazaki
IPC分类号： F23J15/00 , C23C16/00 , H01L21/02 , C25B1/24 , C23C14/34
CPC分类号： H01M8/0656 , B01D53/68 , B01D53/77 , B01D2251/306 , B01D2251/604 , B01D2257/2047 , B01D2258/0216 , C25B1/02 , C25B1/245 , F23G7/065 , Y02E20/12 , Y02P70/56
摘要： A semiconductor production equipment includes a fluorine gas generator, and a detoxification device for combusting a waste gas containing a fluorine-based gas. The fluorine gas generator is configured to electrolyze hydrogen fluoride in an electrolytic bath of a molten salt containing hydrogen fluoride to generate a main product gas whose major component is fluorine gas at an anode side and generate a by-product gas whose major component is hydrogen at a cathode side. The semiconductor production equipment further includes a lead-out line for introducing the by-product gas generated from the fluorine gas generator to the detoxification device. The detoxification device includes a mechanism for using the by-product gas sent to the detoxification device as a combustion agent.
摘要翻译：半导体生产设备包括氟气发生器和用于燃烧含有氟基气体的废气的解毒装置。氟气发生器构成为在含有氟化氢的熔融盐的电解槽中电解氟化氢，以在阳极侧产生主要成分为氟气的主要产物气体，并产生主要成分为氢的副产物气体阴极侧。半导体生产设备还包括用于将从氟气发生器产生的副产物气引入解毒装置的引出线。排毒装置包括将送到解毒装置的副产物用作燃烧剂的机构。

3. 发明申请

US20120031752A1 Fluorine Gas Generating Device 审中-公开
标题翻译：氟气发生装置
公开(公告)号：US20120031752A1
公开(公告)日：2012-02-09
申请号：US13258954
申请日：2010-03-29
申请人： Isamu Mori , Tatsuo Miyazaki , Akifumi Yao , Takuya Kita
发明人： Isamu Mori , Tatsuo Miyazaki , Akifumi Yao , Takuya Kita
IPC分类号： C25B15/00 , C25B9/00 , C25B1/24
CPC分类号： C25B1/245 , C01B7/20 , C25B15/08
摘要： A fluorine gas generating device 100 is provided which facilitates the maintenance operation of recovery and replacement of an adsorbing material that adsorbs hydrogen fluoride and supplies fluorine gas in a stable manner. The device comprises a refining line 20 that includes refining devices that, with the aid of adsorbing material, remove hydrogen fluoride gas that has been evaporated from a molten salt of an electrolytic tank 1 and mixed to fluorine gas generated at a positive pole 103a of the electrolytic tank. The refining line 20 comprises a first refining section 21 that includes at least two refining devices arranged in parallel and a second refining section 22 that includes at least two refining devices arranged in parallel and is positioned downstream of the first refining section 21. Fluorine gas that has passed through either one of the refining devices of the first refining section 21 is selectively led to either one of the refining devices of the second refining section.
摘要翻译：提供了一种氟气发生装置100，其有助于回收和更换吸附氟化氢并以稳定的方式供应氟气的吸附材料的维护操作。该装置包括精炼管线20，其包括精炼装置，该装置借助于吸附材料除去从电解槽1的熔融盐蒸发的氟化氢气体，并混合到在正极103a处产生的氟气体电解槽。精炼生产线20包括第一精炼部分21，其包括平行布置的至少两个精炼装置和第二精炼部分22，该第二精炼部分22包括平行排列并且位于第一精炼部分21的下游的至少两个精炼装置。氟气已经通过了第一精炼部21的精炼装置中的任一个选择性地被引导到第二精炼部的精炼装置中的任一个。

4. 发明申请

US20120006487A1 System for In-Situ Mixing and Diluting Fluorine Gas 审中-公开
标题翻译：用于现场混合和稀释氟气的系统
公开(公告)号：US20120006487A1
公开(公告)日：2012-01-12
申请号：US13256842
申请日：2010-02-26
申请人： Akiou Kikuchi , Isamu Mori , Akifumi Yao , Tatsuo Miyazaki , Keita Nakahara
发明人： Akiou Kikuchi , Isamu Mori , Akifumi Yao , Tatsuo Miyazaki , Keita Nakahara
IPC分类号： H01L21/306
CPC分类号： C01B7/20 , B01F3/028 , B01F15/0408 , G05D11/132
摘要： [Task] It is a task to provide a fluorine gas supply system which can stably supply fluorine gas generated by a fluorine gas generation device to a semiconductor processing device in a large quantity and in a precise concentration.[Means for solving task] In the fluorine gas supply system, a mixed gas stored in a buffer tank is introduced into a gas introducing piping before the mixed gas is adjusted in the buffer tank to circulate the mixed gas and a monitoring device is disposed which measures a fluorine gas concentration within the mixed gas so that, in response to the obtained fluorine gas concentration, a flow quantity of inert gas supply source can be adjusted.
摘要翻译： [任务]提供一种能够将氟气产生装置产生的氟气稳定地供给到半导体处理装置的氟气供给系统的任务是大量且精确地集中。 [解决任务的方法]在氟气供给系统中，将缓冲罐内的混合气体引入到气体导入配管中，然后在缓冲罐内调节混合气体以使混合气体循环，并且设置监测装置，测量混合气体中的氟气浓度，使得响应于获得的氟气浓度，可以调节惰性气体供应源的流量。

5. 发明授权

US09194050B2 Fluorine gas generator 有权
标题翻译：氟气发生器
公开(公告)号：US09194050B2
公开(公告)日：2015-11-24
申请号：US14112850
申请日：2012-05-17
申请人： Takuya Kita , Tatsuo Miyazaki , Akifumi Yao
发明人： Takuya Kita , Tatsuo Miyazaki , Akifumi Yao
IPC分类号： C25B1/24 , C25B1/00 , C25B3/08 , C25B9/00 , C25C3/08 , C25B15/08 , C01B7/20 , B01D53/68 , B01D53/04
CPC分类号： C25B9/00 , B01D53/0407 , B01D53/685 , B01D2253/112 , B01D2256/26 , B01D2257/2047 , C01B7/20 , C25B1/245 , C25B15/08
摘要： A fluorine gas generating device 100 which is characterized by having a cylindrical member 31a for circulating therein the main-product gas, a gas feed port 51a for introducing the main-product gas into the cylindrical member 31a, a gas discharge port 52a for discharging the main-product gas from the cylindrical member 31a, an adsorbent holding member 201 arranged in the cylindrical member 31a to form a space to provide a channel for the main-product gas circulated in the cylindrical member 31a, a stirring blade 202 for stirring the main-product gas that is introduced through the gas feed port 51a, and a gas flow guiding cylinder 203 for circulating or diffusing the main-product gas in the space within the cylindrical member 31a.
摘要翻译：一种氟气产生装置100，其特征在于具有用于在其中循环主要产物气体的圆柱形构件31a，用于将主产物气体引入圆筒构件31a的气体供给口51a，用于排出主气体的气体排出口52a 来自圆柱形部件31a的主要产物气体，布置在圆柱形部件31a中的吸附剂保持部件201，以形成用于为在圆柱形部件31a中循环的主要产物气体提供通道的空间;搅拌叶片202，用于搅拌主体 - 通过气体供给口51a引入的副产物气体和用于使主体气体在筒状部件31a内的空间内循环或扩散的气流引导筒203。

6. 发明申请

US20120318665A1 Apparatus for Generating Fluorine Gas 审中-公开
标题翻译：氟气产生装置
公开(公告)号：US20120318665A1
公开(公告)日：2012-12-20
申请号：US13574177
申请日：2011-02-24
申请人： Tatsuo Miyazaki , Akifumi Yao , Takuya Kita
发明人： Tatsuo Miyazaki , Akifumi Yao , Takuya Kita
IPC分类号： C25B9/00 , C25B1/24
CPC分类号： C25B1/245 , B01D53/0423 , B01D53/0446 , B01D53/685 , B01D2256/26 , B01D2257/2047 , C25B15/08
摘要： [Object] To provide a fluorine gas generating system which can stably supply high purity fluorine gas while preventing blockade of a purification apparatus for adsorbing and removing hydrogen fluoride.[Solving means] A fluorine gas generating system characterized by including a purification apparatus 20 for adsorbing and removing hydrogen fluoride vaporized from a molten salt of an electrolysis tank 1 and mixed in fluorine gas generated at an anode 7, in which the purification apparatus 20 includes a cylindrical member through which main-product gas containing fluorine gas generated in the electrolysis tank 1 flows, a temperature regulator for regulating temperature of the cylindrical member, and an adsorbent holder disposed inside the cylindrical member, the adsorbent holder being disposed to form an aperture for securing a flow passage of the main-product gas inside the cylindrical member.
摘要翻译：本发明提供一种能够稳定地供给高纯度氟气同时防止用于吸附除去氟化氢的净化装置的氟系气体发生系统。 [解决方案]一种氟气发生系统，其特征在于包括：净化装置20，其用于吸附除去由电解槽1的熔融盐蒸发的氟化氢，并混合在阳极7产生的氟气中，净化装置20包括在电解槽1中产生的含有氟气的主要产物气体通过其流过的圆柱形构件，用于调节圆柱形构件温度的温度调节器和设置在圆柱形构件内部的吸附剂保持器，该吸附剂保持器设置成形成孔用于将主产品气体的流路固定在圆柱形构件内。

7. 发明申请

US20130008781A1 FLUORINE GAS GENERATING APPARATUS 有权
标题翻译：氟燃气发生装置
公开(公告)号：US20130008781A1
公开(公告)日：2013-01-10
申请号：US13520237
申请日：2010-11-30
申请人： Akiou Kikuchi , Akifumi Yao , Tatsuo Miyazaki , Nobuyuki Tokunaga
发明人： Akiou Kikuchi , Akifumi Yao , Tatsuo Miyazaki , Nobuyuki Tokunaga
IPC分类号： C25B1/24
CPC分类号： C25B1/245 , C01B7/20 , C25B9/00 , C25B15/08 , F17C7/04
摘要： A fluorine gas generating apparatus includes an electrolytic cell where the molten salt is retained and which is separated and divided above the liquid level of the molten salt into a first gas chamber where a product gas mainly containing a fluorine gas generated at an anode immersed in the molten salt is led and a second gas chamber where a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt is led, and a refining device refining the fluorine gas by coagulating with a cooling medium and trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode. The cooling medium for coagulation of the hydrogen fluoride gas in the refining device and discharged is re-used as a utility gas used at spots in the fluorine gas generating apparatus.
摘要翻译：氟气发生装置包括电解池，其中熔融盐保持并且在熔融盐的液面之上分离和分割成第一气室，在第一气室中主要含有在阳极中产生的氟气的产物浸没在引入熔融盐，引导第二气室，其中主要含有浸在熔盐中的阴极产生的氢气的副产物被引导，精炼装置通过用冷却介质凝结和捕获氟化氢气体来精炼氟气从电解池中的熔融盐中蒸发出来并混合在从阳极产生的产物气体中。精炼装置中的氟化氢气体的凝结用冷却介质被排出，作为在氟气发生装置的点处使用的有用气体。

8. 发明申请

US20120241313A1 FLUORINE GAS GENERATING APPARATUS 有权
标题翻译：氟燃气发生装置
公开(公告)号：US20120241313A1
公开(公告)日：2012-09-27
申请号：US13513812
申请日：2010-11-25
申请人： Akifumi Yao , Tatsuo Miyazaki , Yosuke Nakamura , Keita Nakahara , Nobuyuki Tokunaga
发明人： Akifumi Yao , Tatsuo Miyazaki , Yosuke Nakamura , Keita Nakahara , Nobuyuki Tokunaga
IPC分类号： C25B9/00 , C25B1/24
CPC分类号： C25B1/245
摘要： A fluorine gas generating apparatus generating a fluorine gas by electrolyzing hydrogen fluoride in molten salt, includes: an electrolytic cell including, above a liquid level of molten salt, a first gas chamber into which a product gas mainly containing the fluorine gas generated at an anode immersed in the molten salt and a second gas chamber separated from the first gas chamber into which a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt; a hydrogen fluoride supply source retaining hydrogen fluoride to be replenished in the electrolytic cell; a refining device trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode to refine the fluorine gas; and a recovery facility conveying and recovering the hydrogen fluoride trapped in the refining device in the electrolytic cell or the hydrogen fluoride supply source.
摘要翻译：一种通过在熔融盐中电解氟化氢产生氟气的氟气发生装置，包括：电解槽，其包括在熔融盐的液面以上的第一气室，主要含有在阳极产生的氟气的产物气体浸入熔融盐和从第一气室分离的第二气室，在该第一气室中主要含有在浸入熔盐中的阴极产生的氢气的副产物气体; 氟化氢供应源，其保留在电解池中补充的氟化氢; 精炼装置捕集从电解槽中的熔融盐蒸发的氟化氢气体，并混合在由阳极产生的产物气体中，以精炼氟气; 以及回收设备，其输送和回收截留在电解池或氟化氢供应源中的精炼装置中的氟化氢。

9. 发明申请

US20140083844A1 Fluorine Gas Generator 有权
标题翻译：氟气发生器
公开(公告)号：US20140083844A1
公开(公告)日：2014-03-27
申请号：US14112850
申请日：2012-05-17
申请人： Takuya Kita , Tatsuo Miyazaki , Akifumi Yao
发明人： Takuya Kita , Tatsuo Miyazaki , Akifumi Yao
IPC分类号： C25B15/08 , C25B9/00 , C25B1/24
CPC分类号： C25B9/00 , B01D53/0407 , B01D53/685 , B01D2253/112 , B01D2256/26 , B01D2257/2047 , C01B7/20 , C25B1/245 , C25B15/08
摘要： A fluorine gas generating device 100 which is characterized by having a cylindrical member 31a for circulating therein the main-product gas, a gas feed port 51a for introducing the main-product gas into the cylindrical member 31a, a gas discharge port 52a for discharging the main-product gas from the cylindrical member 31a, an adsorbent holding member 201 arranged in the cylindrical member 31a to form a space to provide a channel for the main-product gas circulated in the cylindrical member 31a, a stirring blade 202 for stirring the main-product gas that is introduced through the gas feed port 51a, and a gas flow guiding cylinder 203 for circulating or diffusing the main-product gas in the space within the cylindrical member 31a.
摘要翻译：一种氟气产生装置100，其特征在于具有用于在其中循环主要产物气体的圆柱形构件31a，用于将主产物气体引入圆筒构件31a的气体供给口51a，用于排出主气体的气体排出口52a 来自圆柱形部件31a的主要产物气体，布置在圆柱形部件31a中的吸附剂保持部件201，以形成用于为在圆柱形部件31a中循环的主要产物气体提供通道的空间;搅拌叶片202，用于搅拌主体 - 通过气体供给口51a引入的副产物气体和用于使主体气体在筒状部件31a内的空间内循环或扩散的气流引导筒203。

10. 发明授权

US08864961B2 Fluorine gas generating apparatus 有权
标题翻译：氟气发生装置
公开(公告)号：US08864961B2
公开(公告)日：2014-10-21
申请号：US13520237
申请日：2010-11-30
申请人： Akiou Kikuchi , Akifumi Yao , Tatsuo Miyazaki , Nobuyuki Tokunaga
发明人： Akiou Kikuchi , Akifumi Yao , Tatsuo Miyazaki , Nobuyuki Tokunaga
IPC分类号： C25B9/00 , C25B1/24 , C25B15/08 , C01B7/20 , F17C7/04
CPC分类号： C25B1/245 , C01B7/20 , C25B9/00 , C25B15/08 , F17C7/04
摘要： A fluorine gas generating apparatus includes an electrolytic cell where the molten salt is retained and which is separated and divided above the liquid level of the molten salt into a first gas chamber where a product gas mainly containing a fluorine gas generated at an anode immersed in the molten salt is led and a second gas chamber where a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt is led, and a refining device refining the fluorine gas by coagulating with a cooling medium and trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode. The cooling medium for coagulation of the hydrogen fluoride gas in the refining device and discharged is re-used as a utility gas used at spots in the fluorine gas generating apparatus.
摘要翻译：氟气发生装置包括电解池，其中熔融盐保持并且在熔融盐的液面之上分离和分割成第一气室，在第一气室中主要含有在阳极中产生的氟气的产物浸没在引入熔融盐，引导第二气室，其中主要含有浸在熔盐中的阴极产生的氢气的副产物被引导，精炼装置通过用冷却介质凝结和捕获氟化氢气体来精炼氟气从电解池中的熔融盐中蒸发出来并混合在从阳极产生的产物气体中。精炼装置中的氟化氢气体的凝结用冷却介质被排出，作为在氟气发生装置的点处使用的有用气体。

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