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1. 发明申请

US20220223443A1 STATE DETERMINATION DEVICE, STATE DETERMINATION METHOD, AND COMPUTER-READABLE RECORDING MEDIUM 有权
公开(公告)号：US20220223443A1
公开(公告)日：2022-07-14
申请号：US17598077
申请日：2020-03-18
申请人： TOKYO ELECTRON LIMITED
发明人： Junnosuke MAKI , Masaomi TOYONAGA , Atsushi OHTA , Motoi OKADA , Takuro TSUTSUI , Kei SANO , Mistsuteru YANO
IPC分类号： H01L21/67 , G01L5/00 , G05B19/4155
摘要： A state determination device determines the state of a drive mechanism configured to operate while holding a substrate in a substrate processing apparatus. The state determination part includes: an acquisition part configured to acquire operation data for the drive mechanism; a model generation part configured to generate a monitoring model for the drive mechanism by executing machine learning using an auto-encoder based on normal operation data that is derived from the operation data acquired by the acquisition part when the drive mechanism is operating normally; and a first determination part configured to determine the state of the drive mechanism based on first output data obtained by inputting, to the monitoring model, evaluation data that is derived from the operation data acquired by the acquisition part when the drive mechanism is being evaluated.

2. 发明申请

US20140240486A1 SUBSTRATE PROCESSING APPARATUS, MONITORING DEVICE OF SUBSTRATE PROCESSING APPARATUS, AND MONITORING METHOD OF SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板处理装置，基板处理装置的监视装置以及基板处理装置的监视方法
公开(公告)号：US20140240486A1
公开(公告)日：2014-08-28
申请号：US14183912
申请日：2014-02-19
申请人： TOKYO ELECTRON LIMITED
发明人： Motoi OKADA , Shigeyuki IIDA
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , H01L21/67288
摘要： Disclosed is monitoring device of monitoring a state of a substrate processing process in a substrate processing apparatus. The monitoring device includes: an imaging unit configured to image a processing state of the substrate processing process; a storage unit; a storage control unit configured to store a moving picture imaged by the imaging unit after adding a time stamp to the moving picture; a group classification unit configured to group a plurality of moving pictures stored in the storage unit into moving pictures of a normal group and moving pictures of a group other than the normal group; and a threshold generation unit configured to generate a threshold for detecting an abnormal moving picture based on the moving pictures of the normal group grouped by the group classification unit.
摘要翻译：公开了一种监视基板处理装置中的基板处理工序的状态的监视装置。监视装置包括：成像单元，被配置为对基板处理处理的处理状态进行成像; 存储单元; 存储控制单元，被配置为在向所述运动图像添加时间戳之后存储由所述成像单元成像的运动图像; 组分类单元，被配置为将存储在存储单元中的多个运动图像分组成正常组的运动图像和正常组以外的组的运动图像; 以及阈值生成单元，其被配置为基于由所述组分类单元分组的所述正常组的运动图像生成用于检测异常运动图像的阈值。

3. 发明申请

US20220400232A1 MONITORING APPARATUS, SUBSTRATE PROCESSING APPARATUS, MONITORING METHOD, AND STORAGE MEDIUM 有权
公开(公告)号：US20220400232A1
公开(公告)日：2022-12-15
申请号：US17776800
申请日：2020-11-04
申请人： Tokyo Electron Limited
发明人： Yuichiro KUNUGIMOTO , Keishi HAMADA , Takafumi HAYAMA , Motoi OKADA , Shoki HAMAGUCHI
IPC分类号： H04N7/18 , H04N5/232 , G06T7/00 , H04N5/91 , G03F7/16
摘要： A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate held by a substrate holder of the substrate processing apparatus; a monitoring data generation unit that generates monitoring video data based on imaging video data captured by the imaging unit during an execution of a substrate process performed by the substrate processing apparatus including a first process and a second process; and a monitoring condition changing unit that changes a generation condition of the monitoring video data during the execution of the substrate process so that at least a resolution or a number of frames of the monitoring video data during an execution of the second process is different from the monitoring video data during an execution of the first process.

4. 发明申请

US20210304383A1 ABNORMALITY DETECTION APPARATUS AND ABNORMALITY DETECTION METHOD 有权
公开(公告)号：US20210304383A1
公开(公告)日：2021-09-30
申请号：US17205422
申请日：2021-03-18
申请人： Tokyo Electron Limited
发明人： Motoi OKADA
IPC分类号： G06T7/00 , G06N20/00 , B05B12/08
摘要： An abnormality detection apparatus is provided. The abnormality detection apparatus includes a first generation part configured to generate pseudo-abnormal image data by synthesizing a substantially circular image at a random position of an image of normal image data obtained by photographing equipment that includes a liquid supply and supplies a liquid from the liquid supply without an abnormality, a second generation part configured to generate a determination model for determining whether the equipment is normal or abnormal by performing learning of the normal image data and the pseudo-abnormal image data, an acquisition part configured to acquire image data obtained by photographing the equipment, and a detection part configured detect an abnormality in the equipment from the image data acquired by the acquisition part using the determination model.

5. 发明申请

US20130236088A1 PROCESS MONITORING DEVICE AND PROCESS MONITORING METHOD IN SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS 有权
标题翻译：半导体制造装置和半导体制造装置中的工艺监测装置和工艺监测方法
公开(公告)号：US20130236088A1
公开(公告)日：2013-09-12
申请号：US13783624
申请日：2013-03-04
申请人： TOKYO ELECTRON LIMITED
发明人： Yasutoshi UMEHARA , Motoi OKADA , Shuji IWANAGA
IPC分类号： G06T7/00
CPC分类号： G06T7/001 , G06T2207/10016 , G06T2207/30148
摘要： Provide is a process monitoring device in a semiconductor manufacturing apparatus that can readily and reliably monitor the process in the semiconductor manufacturing apparatus. The process monitoring device includes a storage unit that stores a normal state moving image data indicating a normal state of the process; an image capturing unit that captures an image of a state of the process to be monitored to acquire a moving image data; an abnormality level calculation unit configured to extract a feature amount for each frame of the moving image data and the normal state moving image data, and calculate an abnormality level based on the extracted feature amount; and a display unit that displays the abnormality level calculated by the abnormality level calculation unit in association with a frame position of the moving image data.
摘要翻译：提供一种可以容易且可靠地监视半导体制造装置中的处理的半导体制造装置中的过程监视装置。处理监视装置包括存储单元，存储指示处理的正常状态的正常状态运动图像数据; 图像捕获单元，捕获要监视的处理的状态的图像以获取运动图像数据; 异常度计算单元，被配置为提取运动图像数据和正常状态运动图像数据的每帧的特征量，并且基于提取的特征量来计算异常水平; 以及显示单元，其与运动图像数据的帧位置相关联地显示由异常水平计算单元计算的异常水平。

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